ES455931A1 - Procedimiento para el tratamiento de superficies vitreas. - Google Patents
Procedimiento para el tratamiento de superficies vitreas.Info
- Publication number
- ES455931A1 ES455931A1 ES455931A ES455931A ES455931A1 ES 455931 A1 ES455931 A1 ES 455931A1 ES 455931 A ES455931 A ES 455931A ES 455931 A ES455931 A ES 455931A ES 455931 A1 ES455931 A1 ES 455931A1
- Authority
- ES
- Spain
- Prior art keywords
- glass
- treatment
- leaching
- surface treatment
- silicium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- 238000002386 leaching Methods 0.000 title 1
- 238000004381 surface treatment Methods 0.000 title 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Abstract
Procedimiento para el tratamiento de superficies vítreas, para hacerlas resistentes al ataque químico, del tipo en el que los álcalis presentes en el vidrio son eliminados por reacción con ácido fluorhídrico, caracterizado porque la superficie vítrea a tratar es puesta en contacto con un corriente gaseosa que contiene un compuesto de fluor y de silicio y agua, a temperatura comprendida entre 400 y 700ºC.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT20198/76A IT1063385B (it) | 1976-02-16 | 1976-02-16 | Procedimento per il trattamento di vetro |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES455931A1 true ES455931A1 (es) | 1978-01-16 |
Family
ID=11164646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES455931A Expired ES455931A1 (es) | 1976-02-16 | 1977-02-15 | Procedimiento para el tratamiento de superficies vitreas. |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4107388A (es) |
| JP (1) | JPS6016378B2 (es) |
| BE (1) | BE851480A (es) |
| CA (1) | CA1100830A (es) |
| CH (1) | CH626313A5 (es) |
| DE (1) | DE2705176A1 (es) |
| ES (1) | ES455931A1 (es) |
| FR (1) | FR2340915A1 (es) |
| GB (1) | GB1537653A (es) |
| IT (1) | IT1063385B (es) |
| NL (1) | NL7701632A (es) |
| SE (1) | SE419336B (es) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4187094A (en) * | 1978-05-08 | 1980-02-05 | Corning Glass Works | Method for improving the durability of spontaneous NaF opal glassware |
| JPS5852935B2 (ja) * | 1978-11-20 | 1983-11-26 | 三菱マテリアル株式会社 | 光伝送用素材の製造方法 |
| GB2043040B (en) * | 1978-12-07 | 1982-12-15 | Tokyo Ohka Kogyo Co Ltd | Method for preventing leaching of contaminants from solid surfaces |
| DE3000954C2 (de) * | 1980-01-12 | 1982-04-22 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Verfahren zum Ätzen von Glasoberflächen, insbesondere bei der Glasfaser-Lichtleiter-Herstellung |
| JPS60163563U (ja) * | 1984-04-05 | 1985-10-30 | 三菱樹脂株式会社 | 記憶媒体収納カバ− |
| JPS6116774U (ja) * | 1984-07-04 | 1986-01-31 | 三菱樹脂株式会社 | 記憶媒体収納カセツト |
| EP0172698A1 (en) * | 1984-08-09 | 1986-02-26 | Owens-Illinois, Inc. | Method for increasing the chemical durability of borosilicate glass tubing and articles made therefrom |
| US5292354A (en) * | 1986-12-04 | 1994-03-08 | Glaverbel, Societe Anonyme | Method of producing dealkalized sheet glass |
| US5120605A (en) * | 1988-09-23 | 1992-06-09 | Zuel Company, Inc. | Anti-reflective glass surface |
| US4944986A (en) * | 1988-09-23 | 1990-07-31 | Zuel Company | Anti-reflective glass surface |
| JPH02296750A (ja) * | 1989-05-09 | 1990-12-07 | Agency Of Ind Science & Technol | 超微粒中空ガラス球状体の製造方法 |
| WO1995005348A1 (en) * | 1993-08-19 | 1995-02-23 | Cardinal Ig Company | Stain-resistant glass and method of making same |
| US6107166A (en) * | 1997-08-29 | 2000-08-22 | Fsi International, Inc. | Vapor phase cleaning of alkali and alkaline earth metals |
| US6929861B2 (en) | 2002-03-05 | 2005-08-16 | Zuel Company, Inc. | Anti-reflective glass surface with improved cleanability |
| KR102195254B1 (ko) | 2013-12-30 | 2020-12-28 | 삼성디스플레이 주식회사 | 표시 장치 제조 방법 |
| CN112080654B (zh) * | 2020-09-25 | 2022-08-16 | 贵州省地质矿产中心实验室(贵州省矿产品黄金宝石制品质量检验站) | 一种磷稀土化学精矿浸出液中回收酸和硅的方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USB490662I5 (es) * | 1946-09-21 |
-
1976
- 1976-02-16 IT IT20198/76A patent/IT1063385B/it active
-
1977
- 1977-02-07 SE SE7701332A patent/SE419336B/xx unknown
- 1977-02-08 DE DE19772705176 patent/DE2705176A1/de not_active Ceased
- 1977-02-08 GB GB5132/77A patent/GB1537653A/en not_active Expired
- 1977-02-09 US US05/766,968 patent/US4107388A/en not_active Expired - Lifetime
- 1977-02-15 CA CA271,808A patent/CA1100830A/en not_active Expired
- 1977-02-15 FR FR7704216A patent/FR2340915A1/fr active Granted
- 1977-02-15 ES ES455931A patent/ES455931A1/es not_active Expired
- 1977-02-16 JP JP52015078A patent/JPS6016378B2/ja not_active Expired
- 1977-02-16 BE BE174972A patent/BE851480A/xx not_active IP Right Cessation
- 1977-02-16 CH CH192177A patent/CH626313A5/it not_active IP Right Cessation
- 1977-02-16 NL NL7701632A patent/NL7701632A/xx not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| US4107388A (en) | 1978-08-15 |
| BE851480A (fr) | 1977-06-16 |
| CA1100830A (en) | 1981-05-12 |
| FR2340915A1 (fr) | 1977-09-09 |
| GB1537653A (en) | 1979-01-10 |
| CH626313A5 (es) | 1981-11-13 |
| SE7701332L (sv) | 1977-08-17 |
| JPS52115818A (en) | 1977-09-28 |
| IT1063385B (it) | 1985-02-11 |
| NL7701632A (nl) | 1977-08-18 |
| FR2340915B1 (es) | 1982-04-02 |
| SE419336B (sv) | 1981-07-27 |
| DE2705176A1 (de) | 1977-08-18 |
| JPS6016378B2 (ja) | 1985-04-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES457595A1 (es) | Procedimiento para la formacion de recubrimientos metalicos o de compuesto metalico sobre una cara de un sustrato de vidrio. | |
| IE801592L (en) | Dry etching of metal film. | |
| ES438551A1 (es) | Un aparato para revestir vidrio. | |
| ATE88684T1 (de) | Verfahren zur beschichtung von glas. | |
| FR2456077A1 (fr) | Procede de formation d'un revetement d'oxyde d'etain sur une face d'un support de verre | |
| IL52505A0 (en) | A process for the stabilization of coatings of metal oxide particles on substrates | |
| JPS56122129A (en) | Manufacture of semiconductor device | |
| JPS6485140A (en) | Manufacture of noble metal catalyst carried by silica | |
| JPS5240059A (en) | Process for production of semiconductor device | |
| JPS5590439A (en) | Removal of glass latent flaw | |
| EP0171858A3 (en) | Method of making silicon carbide and coatings of silicon carbide on carbonaceous substrates | |
| JPS53117382A (en) | Burn mark preventing method | |
| JPS56130914A (en) | Manufacture of semiconductor device | |
| JPS52122479A (en) | Etching solution of silicon | |
| JPS543470A (en) | Etching method | |
| JPS57196585A (en) | Manufacture of high-speed mesa type semiconductor device | |
| JPS5461867A (en) | Production of semiconductor wafer | |
| JPS5290276A (en) | Production of semiconductor device | |
| JPS6448422A (en) | Pre-treating method of semiconductor wafer | |
| JPS6437432A (en) | Formation of asperities on glass surface | |
| JPS55161068A (en) | Etching method of semiconductor substrate | |
| JPS5382174A (en) | Surface processing method for semiconductor device | |
| JPS5626434A (en) | Forming method for pattern of semiconductor substrate | |
| JPS5368494A (en) | Polishing disk and method of maching in use of the same | |
| JPS57143831A (en) | Process of semiconductor wafer |