ES8401918A1 - Un procedimiento mejorado para preparar un revestimiento transparente que lleva oxido de silicio. - Google Patents
Un procedimiento mejorado para preparar un revestimiento transparente que lleva oxido de silicio.Info
- Publication number
- ES8401918A1 ES8401918A1 ES517489A ES517489A ES8401918A1 ES 8401918 A1 ES8401918 A1 ES 8401918A1 ES 517489 A ES517489 A ES 517489A ES 517489 A ES517489 A ES 517489A ES 8401918 A1 ES8401918 A1 ES 8401918A1
- Authority
- ES
- Spain
- Prior art keywords
- silicon
- coating process
- alkoxy substituted
- substituted silicon
- bearing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Polymers (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Catalysts (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
Abstract
PROCEDIMIENTO PARA LA PREPARACION DE UN REVESTIMIENTO TRANSPARENTE QUE LLEVA OXIDO DE SILICIO, PARTICULARMENTE PARA LA FORMACION DE RECUBRIMIENTOS O REVESTIMIENTOS POR DESCOMPOSICION TERMICA Y REACCION CON OXIGENO DE REACTIVOS QUE LLEVAN SILICIO, EFECTUANDOSE DICHA REACCION EN FASE DE VAPOR EN UNA SUPERFICIE CALIENTE SOBRE LA QUE SE DEPOSITA EL RECUBRIMIENTO.CONSISTE EN HACER REACCIONAR UN GAS QUE CONTIENE SILICIO, A TEMPERATURAS ELEVADAS, CON UN AGENTE OXIDANTE GASEOSO, PARA OXIDAR DICHO SILICIO EN LA SUPERFICIE CALIENTE DE UN OBJETO A RECUBRIR. EL GAS QUE CONTIENEEL SILICIO ES PORTADOR AL MENOS DE UN COMPUESTO QUE LLEVA SILICIO DE FORMULAS: R(R2SI)N OR O RO(R2SI)N, EN LAS QUE R ES CUALQUIER ALCOHILO INFERIOR Y N ES UN NUMERO ENTERO COMPRENDIDO ENTRE 2 Y 10.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/323,249 US4386117A (en) | 1981-11-20 | 1981-11-20 | Coating process using alkoxy substituted silicon-bearing reactant |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES8401918A1 true ES8401918A1 (es) | 1984-01-01 |
| ES517489A0 ES517489A0 (es) | 1984-01-01 |
Family
ID=23258350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES517489A Granted ES517489A0 (es) | 1981-11-20 | 1982-11-19 | Un procedimiento mejorado para preparar un revestimiento transparente que lleva oxido de silicio. |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US4386117A (es) |
| JP (1) | JPS58501946A (es) |
| AU (1) | AU553492B2 (es) |
| BE (1) | BE895069A (es) |
| BR (1) | BR8207989A (es) |
| CA (1) | CA1200444A (es) |
| CH (1) | CH655675B (es) |
| DE (1) | DE3249203T1 (es) |
| ES (1) | ES517489A0 (es) |
| FR (1) | FR2516815B1 (es) |
| GB (1) | GB2122596B (es) |
| IT (1) | IT1153087B (es) |
| MX (1) | MX162142A (es) |
| NL (1) | NL8220464A (es) |
| SE (1) | SE442861B (es) |
| WO (1) | WO1983001750A1 (es) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5926942A (ja) * | 1982-08-02 | 1984-02-13 | Nippon Sheet Glass Co Ltd | 金属酸化物被覆ガラスの製造方法 |
| US4792460A (en) * | 1986-07-15 | 1988-12-20 | Electric Power Research Institute, Inc. | Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium |
| US5173452A (en) * | 1989-02-15 | 1992-12-22 | Dobuzinsky David M | Process for the vapor deposition of polysilanes photoresists |
| US5221352A (en) * | 1989-06-19 | 1993-06-22 | Glaverbel | Apparatus for pyrolytically forming an oxide coating on a hot glass substrate |
| RU2118302C1 (ru) * | 1991-12-26 | 1998-08-27 | ЕЛФ Атокем Норт Америка, Инк. | Способ получения покрытия на стеклянной подложке (варианты) |
| ES2137984T3 (es) * | 1991-12-26 | 2000-01-01 | Atochem North America Elf | Composicion de revestimiento para vidrio. |
| US5599387A (en) * | 1993-02-16 | 1997-02-04 | Ppg Industries, Inc. | Compounds and compositions for coating glass with silicon oxide |
| US5356718A (en) * | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
| US5863337A (en) * | 1993-02-16 | 1999-01-26 | Ppg Industries, Inc. | Apparatus for coating a moving glass substrate |
| US5395698A (en) * | 1993-06-04 | 1995-03-07 | Ppg Industries, Inc. | Neutral, low emissivity coated glass articles and method for making |
| CH690511A5 (de) * | 1994-09-01 | 2000-09-29 | Balzers Hochvakuum | Optisches Bauteil und Verfahren zum Herstellen eines solchen. |
| DE4433206A1 (de) * | 1994-09-17 | 1996-03-21 | Goldschmidt Ag Th | Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten |
| US5744215A (en) * | 1996-01-04 | 1998-04-28 | Ppg Industries, Inc. | Reduction of haze in transparent coatings |
| JP5290488B2 (ja) | 2000-09-28 | 2013-09-18 | プレジデント アンド フェロウズ オブ ハーバード カレッジ | 酸化物、ケイ酸塩及びリン酸塩の気相成長 |
| KR100996816B1 (ko) | 2002-03-28 | 2010-11-25 | 프레지던트 앤드 펠로우즈 오브 하바드 칼리지 | 이산화규소 나노라미네이트의 증기증착 |
| US7372610B2 (en) | 2005-02-23 | 2008-05-13 | Sage Electrochromics, Inc. | Electrochromic devices and methods |
| US20080032064A1 (en) * | 2006-07-10 | 2008-02-07 | President And Fellows Of Harvard College | Selective sealing of porous dielectric materials |
| US9856400B2 (en) | 2012-04-27 | 2018-01-02 | Burning Bush Group, Llc | High performance silicon based coating compositions |
| US10138381B2 (en) | 2012-05-10 | 2018-11-27 | Burning Bush Group, Llc | High performance silicon based thermal coating compositions |
| JP6158921B2 (ja) | 2012-07-03 | 2017-07-05 | バーニング ブッシュ グループ、 エルエルシー | 高性能ケイ素系コーティング組成物 |
| US9006355B1 (en) | 2013-10-04 | 2015-04-14 | Burning Bush Group, Llc | High performance silicon-based compositions |
| GB201507330D0 (en) | 2015-04-29 | 2015-06-10 | Pilkington Group Ltd | Splash screen |
| GB201902032D0 (en) * | 2019-02-14 | 2019-04-03 | Pilkington Group Ltd | Apparatus and process for determining the distance between a glass substrate and a coater |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3242007A (en) * | 1961-11-15 | 1966-03-22 | Texas Instruments Inc | Pyrolytic deposition of protective coatings of semiconductor surfaces |
| NL7202331A (es) * | 1972-01-24 | 1973-07-26 | ||
| US4187336A (en) * | 1977-04-04 | 1980-02-05 | Gordon Roy G | Non-iridescent glass structures |
| US4206252A (en) * | 1977-04-04 | 1980-06-03 | Gordon Roy G | Deposition method for coating glass and the like |
| CA1134214A (en) * | 1978-03-08 | 1982-10-26 | Roy G. Gordon | Deposition method |
| US4261650A (en) * | 1978-12-18 | 1981-04-14 | International Business Machines Corporation | Method for producing uniform parallel alignment in liquid crystal cells |
| DE3016010C2 (de) * | 1980-04-25 | 1985-01-10 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
-
1981
- 1981-11-20 US US06/323,249 patent/US4386117A/en not_active Expired - Lifetime
-
1982
- 1982-10-25 GB GB08318227A patent/GB2122596B/en not_active Expired
- 1982-10-25 JP JP58500143A patent/JPS58501946A/ja active Pending
- 1982-10-25 DE DE823249203T patent/DE3249203T1/de active Granted
- 1982-10-25 BR BR8207989A patent/BR8207989A/pt not_active IP Right Cessation
- 1982-10-25 NL NL8220464A patent/NL8220464A/nl unknown
- 1982-10-25 WO PCT/US1982/001529 patent/WO1983001750A1/en not_active Ceased
- 1982-10-25 CH CH401183A patent/CH655675B/fr unknown
- 1982-10-28 AU AU89873/82A patent/AU553492B2/en not_active Ceased
- 1982-11-18 FR FR8219332A patent/FR2516815B1/fr not_active Expired
- 1982-11-18 MX MX195237A patent/MX162142A/es unknown
- 1982-11-19 CA CA000415942A patent/CA1200444A/en not_active Expired
- 1982-11-19 ES ES517489A patent/ES517489A0/es active Granted
- 1982-11-19 BE BE0/209516A patent/BE895069A/fr not_active IP Right Cessation
- 1982-11-19 IT IT24336/82A patent/IT1153087B/it active
-
1983
- 1983-07-20 SE SE8304070A patent/SE442861B/sv not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| GB2122596B (en) | 1986-05-08 |
| IT1153087B (it) | 1987-01-14 |
| DE3249203C2 (es) | 1991-04-18 |
| CA1200444A (en) | 1986-02-11 |
| IT8224336A1 (it) | 1984-05-19 |
| IT8224336A0 (it) | 1982-11-19 |
| FR2516815B1 (fr) | 1987-03-20 |
| AU553492B2 (en) | 1986-07-17 |
| GB8318227D0 (en) | 1983-08-03 |
| JPS58501946A (ja) | 1983-11-17 |
| US4386117A (en) | 1983-05-31 |
| BR8207989A (pt) | 1983-10-04 |
| MX162142A (es) | 1991-04-02 |
| FR2516815A1 (fr) | 1983-05-27 |
| NL8220464A (nl) | 1983-10-03 |
| CH655675B (es) | 1986-05-15 |
| AU8987382A (en) | 1983-05-26 |
| ES517489A0 (es) | 1984-01-01 |
| SE8304070L (sv) | 1983-07-20 |
| WO1983001750A1 (en) | 1983-05-26 |
| BE895069A (fr) | 1983-05-19 |
| GB2122596A (en) | 1984-01-18 |
| SE442861B (sv) | 1986-02-03 |
| SE8304070D0 (sv) | 1983-07-20 |
| DE3249203T1 (de) | 1983-12-01 |
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