FI63263C - Elektroplaederingsloesning innehaollande trivalent krom i laogkoncentration - Google Patents

Elektroplaederingsloesning innehaollande trivalent krom i laogkoncentration Download PDF

Info

Publication number: FI63263C
Authority: FI; Finland
Prior art keywords: chromium; solution; plating; content; layer
Prior art date: 1978-11-11

Application number

FI793514A

Other languages

English (en)

Finnish (fi)

Other versions

FI793514A7 (fi

FI63263B (fi

Inventor

Donald John Barclay

James Michael Linford Vigar

Original Assignee

Ibm

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1978-11-11

Filing date

1979-11-09

Publication date

1983-05-10

1978-11-11 Priority claimed from GB7844177A external-priority patent/GB2033427B/en

1979-11-09 Application filed by Ibm filed Critical Ibm

1980-05-12 Publication of FI793514A7 publication Critical patent/FI793514A7/fi

1982-12-10 Priority to FI824259A priority Critical patent/FI65286C/fi

1983-01-31 Application granted granted Critical

1983-01-31 Publication of FI63263B publication Critical patent/FI63263B/fi

1983-05-10 Publication of FI63263C publication Critical patent/FI63263C/fi

Links

239000011651 chromium Substances 0.000 claims description 110
229910052804 chromium Inorganic materials 0.000 claims description 106
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 104
239000000243 solution Substances 0.000 claims description 67
238000009713 electroplating Methods 0.000 claims description 13
ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 12
ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 claims description 12
CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 claims description 10
235000003704 aspartic acid Nutrition 0.000 claims description 10
OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 claims description 10
235000001014 amino acid Nutrition 0.000 claims description 6
150000001413 amino acids Chemical class 0.000 claims description 6
239000007864 aqueous solution Substances 0.000 claims description 5
YRTKBCIAQCXVCM-UHFFFAOYSA-K chromium(3+);trithiocyanate Chemical compound [Cr+3].[S-]C#N.[S-]C#N.[S-]C#N YRTKBCIAQCXVCM-UHFFFAOYSA-K 0.000 claims description 5
239000006172 buffering agent Substances 0.000 claims description 3
239000003446 ligand Substances 0.000 claims 1
238000007747 plating Methods 0.000 description 40
238000000034 method Methods 0.000 description 15
FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 9
230000000052 comparative effect Effects 0.000 description 8
238000002474 experimental method Methods 0.000 description 7
238000005259 measurement Methods 0.000 description 7
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
238000000576 coating method Methods 0.000 description 6
238000002310 reflectometry Methods 0.000 description 6
229910000831 Steel Inorganic materials 0.000 description 5
229940024606 amino acid Drugs 0.000 description 5
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 5
239000004327 boric acid Substances 0.000 description 5
JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 5
239000011780 sodium chloride Substances 0.000 description 5
239000010959 steel Substances 0.000 description 5
DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
239000011248 coating agent Substances 0.000 description 4
239000011521 glass Substances 0.000 description 4
239000000203 mixture Substances 0.000 description 4
VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 4
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 3
239000010949 copper Substances 0.000 description 3
229910052802 copper Inorganic materials 0.000 description 3
230000000694 effects Effects 0.000 description 3
AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
239000000758 substrate Substances 0.000 description 3
230000000007 visual effect Effects 0.000 description 3
239000000080 wetting agent Substances 0.000 description 3
CKLJMWTZIZZHCS-UHFFFAOYSA-N Aspartic acid Chemical compound OC(=O)C(N)CC(O)=O CKLJMWTZIZZHCS-UHFFFAOYSA-N 0.000 description 2
229910001369 Brass Inorganic materials 0.000 description 2
239000004471 Glycine Substances 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
239000010951 brass Substances 0.000 description 2
150000001844 chromium Chemical class 0.000 description 2
239000003086 colorant Substances 0.000 description 2
230000000875 corresponding effect Effects 0.000 description 2
238000005260 corrosion Methods 0.000 description 2
230000007797 corrosion Effects 0.000 description 2
238000009499 grossing Methods 0.000 description 2
238000011084 recovery Methods 0.000 description 2
239000010936 titanium Substances 0.000 description 2
229910052719 titanium Inorganic materials 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
DCXYFEDJOCDNAF-UHFFFAOYSA-N Asparagine Natural products OC(=O)C(N)CC(N)=O DCXYFEDJOCDNAF-UHFFFAOYSA-N 0.000 description 1
101100373490 Enterobacteria phage T4 y06C gene Proteins 0.000 description 1
BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
DCXYFEDJOCDNAF-REOHCLBHSA-N L-asparagine Chemical compound OC(=O)[C@@H](N)CC(N)=O DCXYFEDJOCDNAF-REOHCLBHSA-N 0.000 description 1
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
230000002411 adverse Effects 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
229960001230 asparagine Drugs 0.000 description 1
235000009582 asparagine Nutrition 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
150000001845 chromium compounds Chemical class 0.000 description 1
BFGKITSFLPAWGI-UHFFFAOYSA-N chromium(3+) Chemical compound [Cr+3] BFGKITSFLPAWGI-UHFFFAOYSA-N 0.000 description 1
IAQWMWUKBQPOIY-UHFFFAOYSA-N chromium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Cr+4] IAQWMWUKBQPOIY-UHFFFAOYSA-N 0.000 description 1
238000005034 decoration Methods 0.000 description 1
239000008367 deionised water Substances 0.000 description 1
229910021641 deionized water Inorganic materials 0.000 description 1
230000008021 deposition Effects 0.000 description 1
239000003517 fume Substances 0.000 description 1
239000007789 gas Substances 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
150000002431 hydrogen Chemical class 0.000 description 1
230000000977 initiatory effect Effects 0.000 description 1
ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
229910001635 magnesium fluoride Inorganic materials 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
238000005457 optimization Methods 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
108090000765 processed proteins & peptides Proteins 0.000 description 1
239000002002 slurry Substances 0.000 description 1
ZVCDLGYNFYZZOK-UHFFFAOYSA-M sodium cyanate Chemical compound [Na]OC#N ZVCDLGYNFYZZOK-UHFFFAOYSA-M 0.000 description 1
RROSXLCQOOGZBR-UHFFFAOYSA-N sodium;isothiocyanate Chemical compound [Na+].[N-]=C=S RROSXLCQOOGZBR-UHFFFAOYSA-N 0.000 description 1
229910052717 sulfur Chemical group 0.000 description 1
239000011593 sulfur Chemical group 0.000 description 1
230000008016 vaporization Effects 0.000 description 1
238000009834 vaporization Methods 0.000 description 1
239000002699 waste material Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)
Paints Or Removers (AREA)
External Artificial Organs (AREA)
Chemically Coating (AREA)
Separation Using Semi-Permeable Membranes (AREA)

FI793514A 1978-11-11 1979-11-09 Elektroplaederingsloesning innehaollande trivalent krom i laogkoncentration FI63263C (fi)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
FI824259A FI65286C (fi)	1978-11-11	1982-12-10	Elektroplaeteringsfoerfarande vari anvaends trivalent krom i laog koncentration

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
GB7844177		1978-11-11
GB7844177A GB2033427B (en)	1978-11-11	1978-11-11	Chromium electroplating
GB7932300		1979-09-18
GB7932300A GB2038361B (en)	1978-11-11	1979-09-18	Trivalent chromium plating bath

Publications (3)

Publication Number	Publication Date
FI793514A7 FI793514A7 (fi)	1980-05-12
FI63263B FI63263B (fi)	1983-01-31
FI63263C true FI63263C (fi)	1983-05-10

Family

ID=26269549

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FI793514A FI63263C (fi)	1978-11-11	1979-11-09	Elektroplaederingsloesning innehaollande trivalent krom i laogkoncentration

Country Status (13)

Country	Link
US (1)	US4278512A (no)
AR (1)	AR222694A1 (no)
BR (1)	BR7907324A (no)
CA (1)	CA1150185A (no)
CH (1)	CH644157A5 (no)
DK (1)	DK151975C (no)
ES (1)	ES485756A1 (no)
FI (1)	FI63263C (no)
FR (1)	FR2441003A1 (no)
GB (1)	GB2038361B (no)
MX (1)	MX153195A (no)
NO (1)	NO151473C (no)
SE (1)	SE429981B (no)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB2093861B (en) *	1981-02-09	1984-08-22	Canning Materials W Ltd	Bath for electrodeposition of chromium
GB2110242B (en) *	1981-11-18	1985-06-12	Ibm	Electroplating chromium
GB2109816B (en) *	1981-11-18	1985-01-23	Ibm	Electrodeposition of chromium
GB2109815B (en) *	1981-11-18	1985-09-04	Ibm	Electrodepositing chromium
GB2109817B (en) *	1981-11-18	1985-07-03	Ibm	Electrodeposition of chromium
ATE33686T1 (de) *	1982-02-09	1988-05-15	Ibm	Elektrolytische abscheidung von chrom und seinen legierungen.
FR2529581A1 (fr) *	1982-06-30	1984-01-06	Armines	Bain d'electrolyse a base de chrome trivalent
CH665656A5 (fr) *	1983-12-29	1988-05-31	Heinz Emmenegger	Bain d'or acide et utilisation de ce bain en electroplastie.
US5294326A (en) *	1991-12-30	1994-03-15	Elf Atochem North America, Inc.	Functional plating from solutions containing trivalent chromium ion
JP2000017482A (ja) *	1998-06-26	2000-01-18	Nippon Piston Ring Co Ltd	耐摩耗性、疲労強度に優れた積層構造を有するクロムめっき皮膜
CN101638801A (zh) *	2008-07-30	2010-02-03	深圳富泰宏精密工业有限公司	壳体的表面处理方法
US8273235B2 (en) *	2010-11-05	2012-09-25	Roshan V Chapaneri	Dark colored chromium based electrodeposits
US8512541B2 (en)	2010-11-16	2013-08-20	Trevor Pearson	Electrolytic dissolution of chromium from chromium electrodes
EP2705176B1 (en)	2011-05-03	2016-04-13	ATOTECH Deutschland GmbH	Electroplating bath and method for producing dark chromium layers
DE102012008544A1 (de)	2012-05-02	2013-11-07	Umicore Galvanotechnik Gmbh	Verchromte Verbundwerkstoffe ohne Nickelschicht
EP3147388A1 (en) *	2015-09-25	2017-03-29	Enthone, Incorporated	Flexible color adjustment for dark cr(iii)-platings
KR20200052588A (ko)	2018-11-07	2020-05-15	윤종오	3가 크롬 합금 도금액, Ｃｒ-Ｔｉ-Ａｕ 합금 도금액, Ｃｒ-Ｔｉ-Ｎｉ 합금 도금액, Ｃｒ-Ｔｉ-Ｃｏ 합금 도금액 및 도금 제품

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1431639A (en) *	1974-12-11	1976-04-14	Ibm Uk	Electroplating chromium and its alloys
US4062737A (en) *	1974-12-11	1977-12-13	International Business Machines Corporation	Electrodeposition of chromium
US4141803A (en) *	1975-12-03	1979-02-27	International Business Machines Corporation	Method and composition for electroplating chromium and its alloys and the method of manufacture of the composition
US4161432A (en) *	1975-12-03	1979-07-17	International Business Machines Corporation	Electroplating chromium and its alloys
GB1596995A (en) *	1977-06-14	1981-09-03	Ibm	Electroplating chromium and its alloys

1979
- 1979-09-18 GB GB7932300A patent/GB2038361B/en not_active Expired
- 1979-10-18 US US06/086,092 patent/US4278512A/en not_active Expired - Lifetime
- 1979-10-26 CH CH962279A patent/CH644157A5/de not_active IP Right Cessation
- 1979-10-30 FR FR7927385A patent/FR2441003A1/fr active Granted
- 1979-11-07 ES ES485756A patent/ES485756A1/es not_active Expired
- 1979-11-08 SE SE7909250A patent/SE429981B/sv not_active IP Right Cessation
- 1979-11-09 DK DK475879A patent/DK151975C/da active
- 1979-11-09 FI FI793514A patent/FI63263C/fi not_active IP Right Cessation
- 1979-11-09 MX MX179977A patent/MX153195A/es unknown
- 1979-11-09 NO NO793615A patent/NO151473C/no unknown
- 1979-11-12 BR BR7907324A patent/BR7907324A/pt not_active IP Right Cessation
- 1979-11-13 CA CA000339759A patent/CA1150185A/en not_active Expired
1980
- 1980-03-14 AR AR280309A patent/AR222694A1/es active

Also Published As

Publication number	Publication date
DK151975C (da)	1988-06-06
BR7907324A (pt)	1980-07-15
FR2441003B1 (no)	1982-12-03
GB2038361A (en)	1980-07-23
NO151473C (no)	1985-04-17
SE7909250L (sv)	1980-05-12
GB2038361B (en)	1983-08-17
FR2441003A1 (fr)	1980-06-06
ES485756A1 (es)	1980-07-01
SE429981B (sv)	1983-10-10
AR222694A1 (es)	1981-06-15
DK151975B (da)	1988-01-18
FI793514A7 (fi)	1980-05-12
DK475879A (da)	1980-05-12
NO151473B (no)	1985-01-02
NO793615L (no)	1980-05-13
MX153195A (es)	1986-08-21
US4278512A (en)	1981-07-14
CA1150185A (en)	1983-07-19
CH644157A5 (de)	1984-07-13
FI63263B (fi)	1983-01-31

Legal Events

Date	Code	Title	Description
1994-06-08	MM	Patent lapsed
2004-08-31	MM	Patent lapsed	Owner name: INTERNATIONAL BUSINESS MACHINES

Publication	Publication Date	Title
FI63263C (fi)	1983-05-10	Elektroplaederingsloesning innehaollande trivalent krom i laogkoncentration
KR101932785B1 (ko)	2018-12-27	전기도금 조 및 어두운 크롬층의 제조 방법
CN104285000B (zh)	2016-03-30	用于沉积半光亮镍或镍合金的伽伐尼镍或镍合金电镀浴
JPH08209379A (ja)	1996-08-13	アルカリ亜鉛および亜鉛合金電気めっき浴およびプロセス
FI63445C (fi)	1983-06-10	Process foer avsaettning av tjocka kromskikt fraon trivalentkromplaeteringsloesningar
FI65286B (fi)	1983-12-30	Elektroplaeteringsfoerfarande vari anvaends trivalent krom i laog koncentration
CN114059114A (zh)	2022-02-18	无氰低温黑色锡镍合金电镀液及电镀工艺
KR20180137531A (ko)	2018-12-27	어두운 색의 크롬계 전착물
IT8148564A1 (it)	1982-11-28	Composizione di bagno e metodo per elettrodepositare leghe di cobalto-zinco simulanti una placcatura di cromo
KR850000620B1 (ko)	1985-05-01	크롬 전기도금액
Ferber et al.	1990	Novel chromium layers formed by nitrogen‐ion implantation of conventional and ABCD electrodeposited films, part 4
GB2033427A (en)	1980-05-21	Chromium Electroplating
IE49204B1 (en)	1985-08-21	Low concentration trivalent chromium electroplating solution and process
JPS5827998A (ja)	1983-02-18	金属製品の着色方法
Shcherbina et al.	2019	Black Ni-based galvanic coatings
Zheng	2018	Highly reflective metallic thin films for high brightness LEDs
Milkovič et al.	2015	Structural Properties of Ni-Co Electroplated Coatings Studied by X-Ray Micro-Beam
Straschil et al.	1991	Electroplating of Thick and Ductile Palladium‐nickel Alloys
Poroch-Seriţan et al.	2025	STUDY ON THE INFLUENCE OF CURRENT DENSITY AND TEMPERATURE ABOUT ELECTRODEPOSITIONS OF NICKEL BY ELECTROLYTES OF TYPE WATTS
US5730809A (en)	1998-03-24	Passivate for tungsten alloy electroplating
Nakamura et al.	2010	Electrodeposition of CuSn Alloy from Noncyanide Sulfosuccinate Bath
Sriveeraraghavan et al.	2000	A new non-cyanide zinc plating bath