FR2380639A2 - Transistor a effet de champ de memorisation a canal n - Google Patents

Transistor a effet de champ de memorisation a canal n

Info

Publication number
FR2380639A2
FR2380639A2 FR7802924A FR7802924A FR2380639A2 FR 2380639 A2 FR2380639 A2 FR 2380639A2 FR 7802924 A FR7802924 A FR 7802924A FR 7802924 A FR7802924 A FR 7802924A FR 2380639 A2 FR2380639 A2 FR 2380639A2
Authority
FR
France
Prior art keywords
field effect
effect transistor
channel
layer
memorization field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7802924A
Other languages
English (en)
French (fr)
Other versions
FR2380639B2 (2
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2643932A external-priority patent/DE2643932C2/de
Priority claimed from DE2643987A external-priority patent/DE2643987C2/de
Priority claimed from DE19772706205 external-priority patent/DE2706205A1/de
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of FR2380639A2 publication Critical patent/FR2380639A2/fr
Application granted granted Critical
Publication of FR2380639B2 publication Critical patent/FR2380639B2/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/65—Lateral DMOS [LDMOS] FETs
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/681—Floating-gate IGFETs having only two programming levels
    • H10D30/684—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection
    • H10D30/685—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection from the channel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Volatile Memory (AREA)
FR7802924A 1976-09-29 1978-02-02 Transistor a effet de champ de memorisation a canal n Granted FR2380639A2 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2643932A DE2643932C2 (de) 1974-09-20 1976-09-29 n-Kanal-Speicher-FET
DE2643987A DE2643987C2 (de) 1974-09-20 1976-09-29 n-Kanal-Speicher-FET
DE19772706205 DE2706205A1 (de) 1977-02-14 1977-02-14 N-kanal-speicher-fet

Publications (2)

Publication Number Publication Date
FR2380639A2 true FR2380639A2 (fr) 1978-09-08
FR2380639B2 FR2380639B2 (2) 1983-01-21

Family

ID=32096460

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7802924A Granted FR2380639A2 (fr) 1976-09-29 1978-02-02 Transistor a effet de champ de memorisation a canal n

Country Status (1)

Country Link
FR (1) FR2380639A2 (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2464536A1 (fr) * 1979-09-04 1981-03-06 Texas Instruments Inc Memoire semi-conductrice a grille flottante, programmable electriquement, et son procede de fabrication
EP0205637A1 (en) * 1985-06-25 1986-12-30 Eaton Corporation Trapped charge bidirectional power fet

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2033346A1 (2) * 1969-02-17 1970-12-04 Hughes Aircraft Co
FR2236247A1 (2) * 1973-07-05 1975-01-31 Tokyo Shibaura Electric Co

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2033346A1 (2) * 1969-02-17 1970-12-04 Hughes Aircraft Co
FR2236247A1 (2) * 1973-07-05 1975-01-31 Tokyo Shibaura Electric Co

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
EXBK/74 *
EXBK/77 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2464536A1 (fr) * 1979-09-04 1981-03-06 Texas Instruments Inc Memoire semi-conductrice a grille flottante, programmable electriquement, et son procede de fabrication
EP0205637A1 (en) * 1985-06-25 1986-12-30 Eaton Corporation Trapped charge bidirectional power fet

Also Published As

Publication number Publication date
FR2380639B2 (2) 1983-01-21

Similar Documents

Publication Publication Date Title
FR2381389A1 (fr) Transistor a effet de champ mis pour des tensions source-drain elevees
ES419843A1 (es) Un procedimiento mejorado para fabricar transistores.
FR2373881A1 (fr) Procede de fabrication de transistors a effet de champ de puissance et structures de transistors resultantes
FR2410364A1 (fr) Procede de fabrication d'avis d'isolement entre des dispositifs semi-conducteurs et dispositifs ainsi obtenus
GB1529023A (en) Self-aligned cmos process for bulk silicon device
KR910003816A (ko) 반도체기억장치의 셀구조
SE7507147L (sv) Felteffekttransistordon.
EP0304824A3 (en) Thin film mos transistor having pair of gate electrodes opposing across semiconductor layer
FR2396414A1 (fr) Transistor a effet de champ a canal de longueur extremement courte
FR2380639A2 (fr) Transistor a effet de champ de memorisation a canal n
ES8800789A1 (es) Perfeccionamientos en un dispositivo transistor mos
FR2396415A1 (fr) Transistor a effet de champ a canal de longueur extremement courte
FR2366668A2 (fr) Transistor a effet de champ de memorisation a canal n
FR2364542A1 (fr) Transistor mis-fet a canal n realise suivant la technique a film de silicium epitaxial sur isolant (esfi)
JPS55130173A (en) Insulated gate field effect transistor
GB1380466A (en) Gate protective device for insulated gate fieldeffect transistors
TW371355B (en) High voltage metal insulator semiconductor field effect transistor and semiconductor integrated circuit device
JPS56162861A (en) Semiconductor integrated circuit device
FR2397069A1 (fr) Procede pour fabriquer une cellule de memoire a semiconducteurs integree constituee par un transistor a effet de champ a electrode de commande isolee et par un condensateur
JPS5737880A (en) Field effect transistor
JPS56101758A (en) Semiconductor device
TW198130B (en) Structure and method of manufacturing thin film transistors
GB1363190A (en) Semiconductor memory device
JPS5762565A (en) Semiconductor device
JPS5636165A (en) Insulated gate type field-effect transistor