FR2814599B1 - Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violet - Google Patents
Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violetInfo
- Publication number
- FR2814599B1 FR2814599B1 FR0012286A FR0012286A FR2814599B1 FR 2814599 B1 FR2814599 B1 FR 2814599B1 FR 0012286 A FR0012286 A FR 0012286A FR 0012286 A FR0012286 A FR 0012286A FR 2814599 B1 FR2814599 B1 FR 2814599B1
- Authority
- FR
- France
- Prior art keywords
- application
- laser device
- light generation
- ultra violet
- extreme ultra
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
- X-Ray Techniques (AREA)
- Laser Surgery Devices (AREA)
Priority Applications (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0012286A FR2814599B1 (fr) | 2000-09-27 | 2000-09-27 | Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violet |
| CNB018162320A CN1279666C (zh) | 2000-09-27 | 2001-09-19 | 高峰值功率激光设备及其在产生远紫外光中的应用 |
| KR10-2003-7004352A KR20030036839A (ko) | 2000-09-27 | 2001-09-19 | 하이 피크 파워 레이저 장치 및 극 자외선 광의생성으로의 적용 |
| JP2002531558A JP5036118B2 (ja) | 2000-09-27 | 2001-09-19 | 高ピーク出力レーザ装置および該装置の極紫外線光生成への適用 |
| AU2001286170A AU2001286170A1 (en) | 2000-09-27 | 2001-09-19 | High-peak-power laser device and application to the generation of light in the extreme ultraviolet |
| RU2003112229/28A RU2301485C2 (ru) | 2000-09-27 | 2001-09-19 | Лазерное устройство с высокой пиковой мощностью для генерирования света в вакуумной ультрафиолетовой области спектра |
| US10/381,015 US20040022295A1 (en) | 2000-09-27 | 2001-09-19 | High-peak-power laser device and application to the generation of light in the extreme ultraviolet |
| AT01965537T ATE263447T1 (de) | 2000-09-27 | 2001-09-19 | Laser mit hoher spitzenleistung und dessen anwendung zur erzeugung von licht im extrem-uv- bereich |
| PCT/IB2001/001714 WO2002027872A1 (fr) | 2000-09-27 | 2001-09-19 | Systeme de lasers possedant une puissance de crete elevee et son utilisation pour generer de la lumiere dans l'ultraviolet extreme |
| EP01965537A EP1320913B1 (fr) | 2000-09-27 | 2001-09-19 | Systeme de lasers possedant une puissance de crete elevee et son utilisation pour generer de la lumiere dans l'ultraviolet extreme |
| KR1020087013881A KR100900164B1 (ko) | 2000-09-27 | 2001-09-19 | 하이 피크 파워 레이저 장치 및 극 자외선 광의 생성으로의적용 |
| DE60102597T DE60102597T2 (de) | 2000-09-27 | 2001-09-19 | Laser mit hoher spitzenleistung und dessen anwendung zur erzeugung von licht im extrem-uv-bereich |
| TW090123750A TW515134B (en) | 2000-09-27 | 2001-09-26 | High-peak-power laser device and application to the generation of light in the extreme ultraviolet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0012286A FR2814599B1 (fr) | 2000-09-27 | 2000-09-27 | Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2814599A1 FR2814599A1 (fr) | 2002-03-29 |
| FR2814599B1 true FR2814599B1 (fr) | 2005-05-20 |
Family
ID=8854730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR0012286A Expired - Fee Related FR2814599B1 (fr) | 2000-09-27 | 2000-09-27 | Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violet |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US20040022295A1 (fr) |
| EP (1) | EP1320913B1 (fr) |
| JP (1) | JP5036118B2 (fr) |
| KR (2) | KR100900164B1 (fr) |
| CN (1) | CN1279666C (fr) |
| AT (1) | ATE263447T1 (fr) |
| AU (1) | AU2001286170A1 (fr) |
| DE (1) | DE60102597T2 (fr) |
| FR (1) | FR2814599B1 (fr) |
| RU (1) | RU2301485C2 (fr) |
| TW (1) | TW515134B (fr) |
| WO (1) | WO2002027872A1 (fr) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
| WO2004036705A1 (fr) | 2002-10-17 | 2004-04-29 | Lumenis Inc. | Systeme, procede et appareil pour produire des faisceaux laser d'au moins deux longueurs d'onde |
| FR2859545B1 (fr) | 2003-09-05 | 2005-11-11 | Commissariat Energie Atomique | Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet |
| FR2884652B1 (fr) * | 2005-04-19 | 2009-07-10 | Femlight Sa | Dispositif de generation d'impulsions laser amplifiees par fibres optiques a couches photoniques |
| JP4959956B2 (ja) * | 2005-06-07 | 2012-06-27 | 株式会社日立製作所 | アンテナ |
| US8253123B2 (en) | 2008-12-16 | 2012-08-28 | Koninklijke Philips Electronics N.V. | Method and device for generating EUV radiation or soft X-rays with enhanced efficiency |
| JP5314433B2 (ja) * | 2009-01-06 | 2013-10-16 | ギガフォトン株式会社 | 極端紫外光源装置 |
| JP5312959B2 (ja) * | 2009-01-09 | 2013-10-09 | ギガフォトン株式会社 | 極端紫外光源装置 |
| WO2011013779A1 (fr) | 2009-07-29 | 2011-02-03 | 株式会社小松製作所 | Source de lumière ultraviolette extrême, son procédé de commande, et support denregistrement sur lequel est enregistré un programme pour ledit procédé |
| JP5578483B2 (ja) * | 2009-09-01 | 2014-08-27 | 株式会社Ihi | Lpp方式のeuv光源とその発生方法 |
| US8462425B2 (en) | 2010-10-18 | 2013-06-11 | Cymer, Inc. | Oscillator-amplifier drive laser with seed protection for an EUV light source |
| US9335637B2 (en) | 2011-09-08 | 2016-05-10 | Kla-Tencor Corporation | Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation |
| JP6021454B2 (ja) * | 2011-10-05 | 2016-11-09 | ギガフォトン株式会社 | 極端紫外光生成装置および極端紫外光生成方法 |
| CN115119373B (zh) * | 2022-05-31 | 2025-12-05 | 广东省智能机器人研究院 | 极紫外光产生方法及装置 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4264869A (en) * | 1978-11-13 | 1981-04-28 | Hunter Robert O | Compressed pulse laser |
| JPS62160781A (ja) * | 1986-01-09 | 1987-07-16 | Agency Of Ind Science & Technol | レ−ザ光照射装置 |
| JPS63272092A (ja) * | 1987-04-30 | 1988-11-09 | Yoshiaki Arata | 超強力複合レ−ザ・ビ−ム造出法 |
| EP0377710A4 (en) * | 1988-06-16 | 1991-04-10 | Australasian Lasers Pty. Ltd. | Hybrid laser |
| US5009658A (en) * | 1989-04-14 | 1991-04-23 | Karl Storz Endoscopy-America, Inc. | Dual frequency laser lithotripter |
| JPH0442979A (ja) * | 1990-06-07 | 1992-02-13 | Asahi Glass Co Ltd | レーザダイオード励起固体レーザ |
| RU2014690C1 (ru) * | 1990-11-28 | 1994-06-15 | Научно-исследовательский институт комплексных испытаний оптико-электронных приборов и систем Всесоюзного научного центра "Государственный оптический институт им.С.И.Вавилова" | Способ получения импульса мощного лазерного излучения |
| US5235607A (en) * | 1990-12-27 | 1993-08-10 | Mitsui Petrochemical Industries, Ltd. | Solid-state laser device and machining apparatus |
| JPH06174660A (ja) * | 1992-10-08 | 1994-06-24 | Rikagaku Kenkyusho | X線像形成装置 |
| US5375132A (en) * | 1993-05-05 | 1994-12-20 | Coherent, Inc. | Solid state laser with interleaved output |
| US5488619A (en) * | 1994-10-06 | 1996-01-30 | Trw Inc. | Ultracompact Q-switched microlasers and related method |
| KR100371125B1 (ko) * | 1994-11-15 | 2003-08-19 | 제이엠에이알 테크놀로지 컴파니 | 저가의 평균 전력과 휘도가 높은 고상 펄스 레이저 시스템 |
| JPH08327794A (ja) * | 1995-06-01 | 1996-12-13 | Olympus Optical Co Ltd | レーザプラズマ光源 |
| US5838709A (en) * | 1995-06-07 | 1998-11-17 | Nikon Corporation | Ultraviolet laser source |
| JPH11233867A (ja) * | 1998-02-10 | 1999-08-27 | Nikon Corp | パルスレーザ光発生装置 |
| JP2002529918A (ja) * | 1998-11-04 | 2002-09-10 | レイテック レーザー インダストリーズ リミテッド | 放射加算器 |
| JP2000208799A (ja) * | 1999-01-13 | 2000-07-28 | Kanegafuchi Chem Ind Co Ltd | 薄膜構成体の加工方法 |
| US6097742A (en) * | 1999-03-05 | 2000-08-01 | Coherent, Inc. | High-power external-cavity optically-pumped semiconductor lasers |
| FR2798781B1 (fr) * | 1999-09-22 | 2002-08-30 | Saint Louis Inst | Source laser pouvant emettre des faisceaux a implusions multiples programmables |
| US6541731B2 (en) * | 2000-01-25 | 2003-04-01 | Aculight Corporation | Use of multiple laser sources for rapid, flexible machining and production of vias in multi-layered substrates |
| US7068689B2 (en) * | 2001-01-18 | 2006-06-27 | Spectra-Physics Gmbh | Frequency-converted laser apparatus with frequency conversion crystals |
-
2000
- 2000-09-27 FR FR0012286A patent/FR2814599B1/fr not_active Expired - Fee Related
-
2001
- 2001-09-19 AT AT01965537T patent/ATE263447T1/de not_active IP Right Cessation
- 2001-09-19 EP EP01965537A patent/EP1320913B1/fr not_active Expired - Lifetime
- 2001-09-19 AU AU2001286170A patent/AU2001286170A1/en not_active Abandoned
- 2001-09-19 US US10/381,015 patent/US20040022295A1/en not_active Abandoned
- 2001-09-19 CN CNB018162320A patent/CN1279666C/zh not_active Expired - Fee Related
- 2001-09-19 RU RU2003112229/28A patent/RU2301485C2/ru not_active IP Right Cessation
- 2001-09-19 DE DE60102597T patent/DE60102597T2/de not_active Expired - Lifetime
- 2001-09-19 JP JP2002531558A patent/JP5036118B2/ja not_active Expired - Fee Related
- 2001-09-19 WO PCT/IB2001/001714 patent/WO2002027872A1/fr not_active Ceased
- 2001-09-19 KR KR1020087013881A patent/KR100900164B1/ko not_active Expired - Fee Related
- 2001-09-19 KR KR10-2003-7004352A patent/KR20030036839A/ko not_active Ceased
- 2001-09-26 TW TW090123750A patent/TW515134B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| RU2301485C2 (ru) | 2007-06-20 |
| JP2004510356A (ja) | 2004-04-02 |
| KR20030036839A (ko) | 2003-05-09 |
| US20040022295A1 (en) | 2004-02-05 |
| EP1320913B1 (fr) | 2004-03-31 |
| JP5036118B2 (ja) | 2012-09-26 |
| EP1320913A1 (fr) | 2003-06-25 |
| FR2814599A1 (fr) | 2002-03-29 |
| KR100900164B1 (ko) | 2009-06-02 |
| DE60102597T2 (de) | 2005-03-03 |
| ATE263447T1 (de) | 2004-04-15 |
| AU2001286170A1 (en) | 2002-04-08 |
| CN1505857A (zh) | 2004-06-16 |
| WO2002027872A1 (fr) | 2002-04-04 |
| DE60102597D1 (de) | 2004-05-06 |
| TW515134B (en) | 2002-12-21 |
| KR20080059476A (ko) | 2008-06-27 |
| CN1279666C (zh) | 2006-10-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |
Effective date: 20060531 |