HU188635B - Apparatus for reactive application of layer with plasmatrone - Google Patents

Apparatus for reactive application of layer with plasmatrone Download PDF

Info

Publication number: HU188635B
Authority: HU; Hungary
Prior art keywords: coated; objects; wall; plasmatron; electrically conductive
Prior art date: 1979-03-22

Application number

HU66480A

Other languages

English (en)

Hungarian (hu)

Inventor

Harald Bilz

Ulrich Heisig

Siegfried Schiller

Klaus Goedicke

Karl Steinfelder

Johannes Struempel

Juergen Henneberger

Ingo Steinhauer

Original Assignee

Kombinat Veb Keramische Werke Hermsdorf,Dd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1979-03-22

Filing date

1980-03-20

Publication date

1986-05-28

1980-03-20 Application filed by Kombinat Veb Keramische Werke Hermsdorf,Dd filed Critical Kombinat Veb Keramische Werke Hermsdorf,Dd

1986-05-28 Publication of HU188635B publication Critical patent/HU188635B/hu

Links

238000004157 plasmatron Methods 0.000 claims abstract description 9
239000002800 charge carrier Substances 0.000 claims abstract description 6
238000000889 atomisation Methods 0.000 claims description 11
230000008021 deposition Effects 0.000 claims description 3
150000001875 compounds Chemical class 0.000 abstract description 8
239000007921 spray Substances 0.000 abstract description 8
238000005507 spraying Methods 0.000 abstract description 6
239000011248 coating agent Substances 0.000 abstract description 4
238000000576 coating method Methods 0.000 abstract description 4
239000012495 reaction gas Substances 0.000 abstract description 4
150000001247 metal acetylides Chemical class 0.000 abstract description 2
238000002955 isolation Methods 0.000 abstract 1
239000011159 matrix material Substances 0.000 abstract 1
238000006243 chemical reaction Methods 0.000 description 9
239000007789 gas Substances 0.000 description 8
230000008020 evaporation Effects 0.000 description 5
238000001704 evaporation Methods 0.000 description 5
238000009833 condensation Methods 0.000 description 4
230000005494 condensation Effects 0.000 description 4
238000000034 method Methods 0.000 description 4
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
230000003213 activating effect Effects 0.000 description 2
230000004913 activation Effects 0.000 description 2
238000000151 deposition Methods 0.000 description 2
239000002184 metal Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
239000006199 nebulizer Substances 0.000 description 2
238000010025 steaming Methods 0.000 description 2
239000000126 substance Substances 0.000 description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000010494 dissociation reaction Methods 0.000 description 1
230000005593 dissociations Effects 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000000463 material Substances 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
230000010534 mechanism of action Effects 0.000 description 1
239000002923 metal particle Substances 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
239000000203 mixture Substances 0.000 description 1
239000010936 titanium Substances 0.000 description 1
229910052719 titanium Inorganic materials 0.000 description 1
MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
238000001771 vacuum deposition Methods 0.000 description 1
238000009834 vaporization Methods 0.000 description 1
230000008016 vaporization Effects 0.000 description 1
238000010792 warming Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Coating By Spraying Or Casting (AREA)
Physical Vapour Deposition (AREA)

HU66480A 1979-03-22 1980-03-20 Apparatus for reactive application of layer with plasmatrone HU188635B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DD21173979A DD142568A1 (de)	1979-03-22	1979-03-22	EINRICHTUNG ZUM REAKTIVEN BESCHICHTEN MIT DEM PLASM&TRON

Publications (1)

Publication Number	Publication Date
HU188635B true HU188635B (en)	1986-05-28

Family

ID=5517280

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
HU66480A HU188635B (en)	1979-03-22	1980-03-20	Apparatus for reactive application of layer with plasmatrone

Country Status (2)

Country	Link
DD (1)	DD142568A1 (de)
HU (1)	HU188635B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3272669D1 (en) *	1982-03-18	1986-09-25	Ibm Deutschland	Plasma-reactor and its use in etching and coating substrates
US4428812A (en) *	1983-04-04	1984-01-31	Borg-Warner Corporation	Rapid rate reactive sputtering of metallic compounds
US4428811A (en) *	1983-04-04	1984-01-31	Borg-Warner Corporation	Rapid rate reactive sputtering of a group IVb metal
DE3331707A1 (de) *	1983-09-02	1985-03-21	Leybold-Heraeus GmbH, 5000 Köln	Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
DE3503398A1 (de) *	1985-02-01	1986-08-07	W.C. Heraeus Gmbh, 6450 Hanau	Sputteranlage zum reaktiven beschichten eines substrates mit hartstoffen
DE3503397A1 (de) *	1985-02-01	1986-08-07	W.C. Heraeus Gmbh, 6450 Hanau	Sputteranlage zum reaktiven beschichten eines substrates mit hartstoffen
DE3521053A1 (de) *	1985-06-12	1986-12-18	Leybold-Heraeus GmbH, 5000 Köln	Vorrichtung zum aufbringen duenner schichten auf ein substrat
NL9002176A (nl) *	1990-10-08	1992-05-06	Philips Nv	Werkwijze voor het verminderen van deeltjescontaminatie tijdens sputteren en een sputterinrichting voor gebruik van een dergelijke werkwijze.

1979
- 1979-03-22 DD DD21173979A patent/DD142568A1/de not_active IP Right Cessation
1980
- 1980-03-20 HU HU66480A patent/HU188635B/hu unknown

Also Published As

Publication number	Publication date
DD142568A1 (de)	1980-07-02

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