IE39231B1 - Improvements in or relating to light sensistive material - Google Patents

Improvements in or relating to light sensistive material

Info

Publication number: IE39231B1
Authority: IE; Ireland
Prior art keywords: acid; group; poly; reaction product; resin
Prior art date: 1973-04-26

Application number

IE859/74A

Other languages

English (en)

Other versions

IE39231L (en

Original Assignee

Vickers Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1973-04-26

Filing date

1974-04-22

Publication date

1978-08-30

1974-04-22 Application filed by Vickers Ltd filed Critical Vickers Ltd

1974-10-26 Publication of IE39231L publication Critical patent/IE39231L/xx

1978-08-30 Publication of IE39231B1 publication Critical patent/IE39231B1/xx

Links

239000000463 material Substances 0.000 title abstract 5
-1 poly(vinylalcohol) Polymers 0.000 abstract 9
229920005989 resin Polymers 0.000 abstract 8
239000011347 resin Substances 0.000 abstract 8
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 7
239000007795 chemical reaction product Substances 0.000 abstract 6
GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 abstract 6
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 abstract 3
150000004820 halides Chemical class 0.000 abstract 3
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 3
229920000642 polymer Polymers 0.000 abstract 3
CNAQPKDRSLQHIN-UHFFFAOYSA-N 2-(1-chlorosulfonyl-3-phenylprop-2-enylidene)propanedioic acid Chemical compound OC(=O)C(C(O)=O)=C(S(Cl)(=O)=O)C=CC1=CC=CC=C1 CNAQPKDRSLQHIN-UHFFFAOYSA-N 0.000 abstract 2
PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract 2
OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 2
ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 2
229920002873 Polyethylenimine Polymers 0.000 abstract 2
125000000217 alkyl group Chemical group 0.000 abstract 2
125000003118 aryl group Chemical group 0.000 abstract 2
229920002678 cellulose Polymers 0.000 abstract 2
239000001913 cellulose Substances 0.000 abstract 2
150000001875 compounds Chemical class 0.000 abstract 2
229920001577 copolymer Polymers 0.000 abstract 2
125000004093 cyano group Chemical group *C#N 0.000 abstract 2
XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 abstract 2
239000003822 epoxy resin Substances 0.000 abstract 2
125000002485 formyl group Chemical class [H]C(*)=O 0.000 abstract 2
125000005843 halogen group Chemical group 0.000 abstract 2
125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 2
229920000647 polyepoxide Polymers 0.000 abstract 2
WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 1
ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 abstract 1
229940093475 2-ethoxyethanol Drugs 0.000 abstract 1
PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 abstract 1
OKUVGYDBZPSDHQ-UHFFFAOYSA-N 3-chloro-2-(2-chlorosulfonylphenyl)-3-phenylprop-2-enoic acid Chemical compound C=1C=CC=C(S(Cl)(=O)=O)C=1C(C(=O)O)=C(Cl)C1=CC=CC=C1 OKUVGYDBZPSDHQ-UHFFFAOYSA-N 0.000 abstract 1
AGLGZHVPJKOOQW-UHFFFAOYSA-N 3-chlorosulfonyl-2-cyano-5-phenylpenta-2,4-dienoic acid Chemical compound OC(=O)C(C#N)=C(S(Cl)(=O)=O)C=CC1=CC=CC=C1 AGLGZHVPJKOOQW-UHFFFAOYSA-N 0.000 abstract 1
PQXPAFTXDVNANI-UHFFFAOYSA-N 4-azidobenzoic acid Chemical compound OC(=O)C1=CC=C(N=[N+]=[N-])C=C1 PQXPAFTXDVNANI-UHFFFAOYSA-N 0.000 abstract 1
XXKYTTAVNYTVFC-UHFFFAOYSA-N 4-azidobenzoyl chloride Chemical compound ClC(=O)C1=CC=C(N=[N+]=[N-])C=C1 XXKYTTAVNYTVFC-UHFFFAOYSA-N 0.000 abstract 1
239000005711 Benzoic acid Substances 0.000 abstract 1
WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 abstract 1
BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 abstract 1
239000004593 Epoxy Substances 0.000 abstract 1
PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 abstract 1
229920001311 Poly(hydroxyethyl acrylate) Polymers 0.000 abstract 1
239000004115 Sodium Silicate Substances 0.000 abstract 1
229920000147 Styrene maleic anhydride Polymers 0.000 abstract 1
DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 abstract 1
235000011054 acetic acid Nutrition 0.000 abstract 1
125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 abstract 1
150000007933 aliphatic carboxylic acids Chemical class 0.000 abstract 1
125000003545 alkoxy group Chemical group 0.000 abstract 1
125000004453 alkoxycarbonyl group Chemical group 0.000 abstract 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
229910052782 aluminium Inorganic materials 0.000 abstract 1
239000004411 aluminium Substances 0.000 abstract 1
150000004984 aromatic diamines Chemical class 0.000 abstract 1
125000003710 aryl alkyl group Chemical group 0.000 abstract 1
125000004104 aryloxy group Chemical group 0.000 abstract 1
235000010233 benzoic acid Nutrition 0.000 abstract 1
IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 1
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
125000002843 carboxylic acid group Chemical group 0.000 abstract 1
229930016911 cinnamic acid Natural products 0.000 abstract 1
235000013985 cinnamic acid Nutrition 0.000 abstract 1
239000007859 condensation product Substances 0.000 abstract 1
ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 abstract 1
238000001035 drying Methods 0.000 abstract 1
LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 abstract 1
229920003986 novolac Polymers 0.000 abstract 1
150000002924 oxiranes Chemical group 0.000 abstract 1
125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 abstract 1
229920006287 phenoxy resin Polymers 0.000 abstract 1
239000013034 phenoxy resin Substances 0.000 abstract 1
229920002338 polyhydroxyethylmethacrylate Polymers 0.000 abstract 1
229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
235000019260 propionic acid Nutrition 0.000 abstract 1
IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 abstract 1
125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 abstract 1
235000019795 sodium metasilicate Nutrition 0.000 abstract 1
239000001488 sodium phosphate Substances 0.000 abstract 1
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract 1
229910052911 sodium silicate Inorganic materials 0.000 abstract 1
BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 1
239000006188 syrup Substances 0.000 abstract 1
235000020357 syrup Nutrition 0.000 abstract 1
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract 1
RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 abstract 1
229910000406 trisodium phosphate Inorganic materials 0.000 abstract 1
235000019801 trisodium phosphate Nutrition 0.000 abstract 1
229920001567 vinyl ester resin Polymers 0.000 abstract 1
229960000834 vinyl ether Drugs 0.000 abstract 1
229920002554 vinyl polymer Polymers 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1483—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Organic Chemistry (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Chemical & Material Sciences (AREA)
Phenolic Resins Or Amino Resins (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Materials For Photolithography (AREA)
Processes Of Treating Macromolecular Substances (AREA)
Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Polymerisation Methods In General (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

IE859/74A 1973-04-26 1974-04-22 Improvements in or relating to light sensistive material IE39231B1 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB1999473A GB1466252A (en)	1973-04-26	1973-04-26	Light-sensitive material

Publications (2)

Publication Number	Publication Date
IE39231L IE39231L (en)	1974-10-26
IE39231B1 true IE39231B1 (en)	1978-08-30

Family

ID=10138567

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IE859/74A IE39231B1 (en)	1973-04-26	1974-04-22	Improvements in or relating to light sensistive material

Country Status (16)

Country	Link
JP (1)	JPS5842460B2 (de)
AT (1)	AT344998B (de)
BE (1)	BE814282A (de)
CA (1)	CA1023491A (de)
CH (2)	CH607100A5 (de)
DE (1)	DE2420372A1 (de)
FI (1)	FI62911C (de)
FR (1)	FR2227556B1 (de)
GB (1)	GB1466252A (de)
IE (1)	IE39231B1 (de)
IT (1)	IT1010118B (de)
LU (1)	LU69940A1 (de)
NL (1)	NL175631C (de)
NO (1)	NO148794C (de)
SE (1)	SE418191B (de)
ZA (1)	ZA742559B (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6841335B2 (en) *	2002-07-29	2005-01-11	Kodak Polychrome Graphics Llc	Imaging members with ionic multifunctional epoxy compounds

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
BE758116A (fr) *	1969-10-30	1971-04-01	Fuji Photo Film Co Ltd	Compose a poids moleculaire eleve et son procede de preparation
JPS4944601B1 (de) *	1970-05-15	1974-11-29
BE790383A (fr) *	1971-10-22	1973-02-15	Howson Algraphy Ltd	Matière sensibles à la lumière

1973
- 1973-04-26 GB GB1999473A patent/GB1466252A/en not_active Expired
1974
- 1974-04-22 IE IE859/74A patent/IE39231B1/xx unknown
- 1974-04-23 ZA ZA00742559A patent/ZA742559B/xx unknown
- 1974-04-23 FI FI1224/74A patent/FI62911C/fi active
- 1974-04-24 SE SE7405484A patent/SE418191B/xx unknown
- 1974-04-25 NO NO741505A patent/NO148794C/no unknown
- 1974-04-25 NL NLAANVRAGE7405575,A patent/NL175631C/xx not_active IP Right Cessation
- 1974-04-26 DE DE2420372A patent/DE2420372A1/de not_active Withdrawn
- 1974-04-26 LU LU69940A patent/LU69940A1/xx unknown
- 1974-04-26 CH CH1186877A patent/CH607100A5/xx not_active IP Right Cessation
- 1974-04-26 AT AT349474A patent/AT344998B/de not_active IP Right Cessation
- 1974-04-26 CH CH579774A patent/CH598621A5/xx not_active IP Right Cessation
- 1974-04-26 BE BE143702A patent/BE814282A/xx not_active IP Right Cessation
- 1974-04-26 FR FR7414649A patent/FR2227556B1/fr not_active Expired
- 1974-04-26 JP JP49046735A patent/JPS5842460B2/ja not_active Expired
- 1974-04-26 IT IT21939/74A patent/IT1010118B/it active
- 1974-05-27 CA CA200,931A patent/CA1023491A/en not_active Expired

Also Published As

Publication number	Publication date
SE418191B (sv)	1981-05-11
FR2227556A1 (de)	1974-11-22
CA1023491A (en)	1977-12-27
NO741505L (no)	1974-10-29
AU6823074A (en)	1975-10-30
ZA742559B (en)	1975-04-30
NL7405575A (de)	1974-10-29
CH598621A5 (de)	1978-05-12
NL175631C (nl)	1984-12-03
FI62911C (fi)	1983-03-10
FI62911B (fi)	1982-11-30
ATA349474A (de)	1977-12-15
NL175631B (nl)	1984-07-02
DE2420372A1 (de)	1974-11-07
AT344998B (de)	1978-08-25
NO148794B (no)	1983-09-05
NO148794C (no)	1983-12-14
BE814282A (fr)	1974-08-16
FR2227556B1 (de)	1980-08-29
JPS5031819A (de)	1975-03-28
IE39231L (en)	1974-10-26
LU69940A1 (de)	1974-08-06
IT1010118B (it)	1977-01-10
JPS5842460B2 (ja)	1983-09-20
GB1466252A (en)	1977-03-02
CH607100A5 (de)	1978-11-30

Publication	Publication Date	Title
US3869292A (en)	1975-03-04	Light-sensitive compositions and light-sensitive materials such as printing plates
US3902906A (en)	1975-09-02	Photosensitive material with quinone diazide moiety containing polymer
US3295974A (en)	1967-01-03	Light sensitive epoxy material for the photomechanical production of printing plates
US4179577A (en)	1979-12-18	Polymerisable esters derived from a phenolic unsaturated ketone
EP0083971B1 (de)	1987-04-01	Photoempfindliche Zusammensetzung
EP0021718B1 (de)	1984-03-21	Lichtempfindliches Kondensationsprodukt, lichtempfindliche Zusammensetzungen und lithographische Druckplatten, die dieses Kondensationsprodukt enthalten
US4540649A (en)	1985-09-10	Water developable photopolymerizable composition and printing plate element containing same
US3522049A (en)	1970-07-28	Photohardening
GB1460978A (en)	1977-01-06	Photosensitive composition
US3861921A (en)	1975-01-21	Subbing layers comprising polyamide and phenolic resin for metal bases of photopolymerizable elements
US3796578A (en)	1974-03-12	Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds
US4035189A (en)	1977-07-12	Image forming curable resin compositions
US3615532A (en)	1971-10-26	Printing plate compositions
JPS6381101A (ja)	1988-04-12	感光性樹脂
US3933885A (en)	1976-01-20	Cinnamylideneacetic acid esters
IE39231B1 (en)	1978-08-30	Improvements in or relating to light sensistive material
US4581313A (en)	1986-04-08	Photosensitive composition with polymer having diazonium salt in side chain
US3429839A (en)	1969-02-25	Epoxy polymer derived polymers containing quaternary phosphonium groups
US3702765A (en)	1972-11-14	Alkali-soluble light sensitive polymers and compositions and processes for using such polymers
US4229514A (en)	1980-10-21	Photosensitive composition
US4188221A (en)	1980-02-12	Photosensitive polyamide resin composition useful for making relief printing plate
US3770443A (en)	1973-11-06	Photosensitive composition comprising a photosensitive polymer
CA1061930A (en)	1979-09-04	Radiation sensitive polymers of oxygen-substituted maleimides and elements containing same
EP0036036B1 (de)	1985-03-20	Vesikularfilm
GB1580959A (en)	1980-12-10	Substituted acrylamide and polymers