IL126189A - Method and apparatus for drying and cleaning objects using aerosols - Google Patents

Method and apparatus for drying and cleaning objects using aerosols

Info

Publication number
IL126189A
IL126189A IL12618997A IL12618997A IL126189A IL 126189 A IL126189 A IL 126189A IL 12618997 A IL12618997 A IL 12618997A IL 12618997 A IL12618997 A IL 12618997A IL 126189 A IL126189 A IL 126189A
Authority
IL
Israel
Prior art keywords
liquid
enclosed chamber
drying
rinse liquid
chamber
Prior art date
Application number
IL12618997A
Other languages
English (en)
Hebrew (he)
Other versions
IL126189A0 (en
Original Assignee
All In One Microservice Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/616,165 external-priority patent/US5685086A/en
Application filed by All In One Microservice Inc filed Critical All In One Microservice Inc
Publication of IL126189A0 publication Critical patent/IL126189A0/xx
Publication of IL126189A publication Critical patent/IL126189A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements for supplying or controlling air or other gases for drying solid materials or objects
    • F26B21/40—Arrangements for supplying or controlling air or other gases for drying solid materials or objects using gases other than air
    • F26B21/471—Arrangements for supplying or controlling air or other gases for drying solid materials or objects using gases other than air condensing vapours onto the surface of the materials to be dried
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/005—Drying solid materials or objects by processes not involving the application of heat by dipping them into or mixing them with a chemical liquid, e.g. organic; chemical, e.g. organic, dewatering aids
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
IL12618997A 1996-03-14 1997-03-13 Method and apparatus for drying and cleaning objects using aerosols IL126189A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/616,165 US5685086A (en) 1995-06-07 1996-03-14 Method and apparatus for drying objects using aerosols
US62468996A 1996-03-25 1996-03-25
PCT/US1997/003952 WO1997033702A1 (en) 1996-03-14 1997-03-13 Method and apparatus for drying and cleaning objects using aerosols

Publications (2)

Publication Number Publication Date
IL126189A0 IL126189A0 (en) 1999-05-09
IL126189A true IL126189A (en) 2001-08-08

Family

ID=27087685

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12618997A IL126189A (en) 1996-03-14 1997-03-13 Method and apparatus for drying and cleaning objects using aerosols

Country Status (7)

Country Link
EP (1) EP0886548B1 (de)
JP (1) JP3955924B2 (de)
KR (1) KR100299486B1 (de)
CA (1) CA2248759A1 (de)
DE (1) DE69733686T2 (de)
IL (1) IL126189A (de)
WO (1) WO1997033702A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999026976A1 (en) * 1997-11-26 1999-06-03 Eli Lilly And Company Tnf ligand family gene
US6270584B1 (en) * 1997-12-03 2001-08-07 Gary W. Ferrell Apparatus for drying and cleaning objects using controlled aerosols and gases
TW417182B (en) * 1998-06-02 2001-01-01 Cfmt Inc Wet processing methods for the manufacture of electronic components using liquids of varying temperature
JP3174038B2 (ja) * 1999-01-18 2001-06-11 東邦化成株式会社 基板乾燥方法およびその装置
KR100592997B1 (ko) * 2000-01-17 2006-06-23 도호 카세이 가부시키가이샤 기판 건조방법 및 그 장치
JP3802446B2 (ja) 2002-05-15 2006-07-26 東邦化成株式会社 基板乾燥方法およびその装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS553607B2 (de) * 1973-01-05 1980-01-25
US4310973A (en) * 1977-12-01 1982-01-19 Phillips Petroleum Co. Drying polymer solutions
US4334366A (en) * 1980-09-24 1982-06-15 Jetsonic Processes, Ltd. Sonic energy perforated drum for rotary dryers
US4561192A (en) * 1982-11-29 1985-12-31 Dairyman's Cooperative Creamery Assoc. Spray drying apparatus and method
DE68921757T2 (de) * 1989-11-23 1995-10-26 Cfm Technologies Inc Verfahren zum Trocknen von Oberflächen.
US5054210A (en) * 1990-02-23 1991-10-08 S&K Products International, Inc. Isopropyl alcohol vapor dryer system
US5000208A (en) * 1990-06-21 1991-03-19 Micron Technology, Inc. Wafer rinser/dryer
US5143103A (en) * 1991-01-04 1992-09-01 International Business Machines Corporation Apparatus for cleaning and drying workpieces
JP2639771B2 (ja) * 1991-11-14 1997-08-13 大日本スクリーン製造株式会社 基板の洗浄・乾燥処理方法並びにその処理装置
US5229171A (en) * 1991-12-23 1993-07-20 Research Triangle Institute Apparatus and method for uniformly coating a substrate in an evacuable chamber
US5226242A (en) * 1992-02-18 1993-07-13 Santa Clara Plastics, Division Of Preco, Inc. Vapor jet dryer apparatus and method
US5419351A (en) * 1993-04-02 1995-05-30 National Semiconductor Corporation Final rinse/dry system for critical cleaning applications
JP3347814B2 (ja) * 1993-05-17 2002-11-20 大日本スクリーン製造株式会社 基板の洗浄・乾燥処理方法並びにその処理装置
CH688556A5 (it) * 1993-12-09 1997-11-14 Franco Carloni Apparecchio elettrodomestico per lavare e/o asciugare utilizzante l'acqua calda dell'impianto centralizzato circolante in serpentine.
US5653045A (en) * 1995-06-07 1997-08-05 Ferrell; Gary W. Method and apparatus for drying parts and microelectronic components using sonic created mist

Also Published As

Publication number Publication date
CA2248759A1 (en) 1997-09-18
IL126189A0 (en) 1999-05-09
DE69733686T2 (de) 2006-05-04
KR100299486B1 (ko) 2001-09-06
JP2000507044A (ja) 2000-06-06
EP0886548A4 (de) 2002-03-20
WO1997033702A1 (en) 1997-09-18
EP0886548B1 (de) 2005-07-06
JP3955924B2 (ja) 2007-08-08
DE69733686D1 (de) 2005-08-11
KR19990087765A (ko) 1999-12-27
EP0886548A1 (de) 1998-12-30

Similar Documents

Publication Publication Date Title
US5964958A (en) Methods for drying and cleaning objects using aerosols
US5685086A (en) Method and apparatus for drying objects using aerosols
US6270584B1 (en) Apparatus for drying and cleaning objects using controlled aerosols and gases
JP6929981B2 (ja) 高アスペクト比半導体デバイス構造のための、汚染物質除去を伴うスティクションフリー乾燥処理
KR100452542B1 (ko) 세정물 건조장치 및 건조방법
KR100397455B1 (ko) 반도체의초미립자세정기
US6374837B2 (en) Single semiconductor wafer processor
US6491763B2 (en) Processes for treating electronic components
TW490757B (en) Apparatus for providing ozonated process fluid and methods for using same
TWI623968B (zh) 使用液態二氧化碳以使半導體基板乾燥的方法及設備
US5974689A (en) Chemical drying and cleaning system
EP0886548B1 (de) Verfahren und vorrichtung zur trocknung und reinigung von gegenständen mittels aerosolen
EP1235653A1 (de) Verbesserungen bei der trocknung und reinigung von körpern unter verwendung von aerosolen und gasen
JP2004235559A (ja) 基板処理方法および基板処理装置
KR101110905B1 (ko) 과포화된 세정 용액을 사용한 메가소닉 세정
CN1125963C (zh) 改进的化学干燥和净化系统
JP2001237211A (ja) 基板処理装置
JP2003045842A (ja) 表面付着異質物質の除去方法及び除去装置
WO2000007220A2 (en) Wet processing methods for the manufacture of electronic components using ozonated process fluids
JP3137244B2 (ja) 洗浄物の乾燥装置及びその乾燥方法
JPH0756323A (ja) 基板洗浄装置
JPH10335299A (ja) ウェーハ乾燥装置
JPH0789547B2 (ja) 乾燥方法
US20070261718A1 (en) Method and apparatus for ozone-enhanced cleaning of flat objects with pulsed liquid jet
WO2000024687A1 (en) Method and apparatus for cleaning objects using dilute ammonium bearing solutions

Legal Events

Date Code Title Description
FF Patent granted
RH1 Patent not in force