IT1062510B - Dispositivo semiconduttore presentante una regione attiva di silicio amorfo - Google Patents
Dispositivo semiconduttore presentante una regione attiva di silicio amorfoInfo
- Publication number
- IT1062510B IT1062510B IT25040/76A IT2504076A IT1062510B IT 1062510 B IT1062510 B IT 1062510B IT 25040/76 A IT25040/76 A IT 25040/76A IT 2504076 A IT2504076 A IT 2504076A IT 1062510 B IT1062510 B IT 1062510B
- Authority
- IT
- Italy
- Prior art keywords
- active region
- amorphous silicon
- device presenting
- semiconductive device
- semiconductive
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/40—Crystalline structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/18—Photovoltaic cells having only Schottky potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
- H10P14/2901—Materials
- H10P14/2923—Materials being conductive materials, e.g. metallic silicides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/32—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by intermediate layers between substrates and deposited layers
- H10P14/3202—Materials thereof
- H10P14/3204—Materials thereof being Group IVA semiconducting materials
- H10P14/3211—Silicon, silicon germanium or germanium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
- H10P14/3411—Silicon, silicon germanium or germanium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US59958875A | 1975-07-28 | 1975-07-28 | |
| US65926876A | 1976-02-19 | 1976-02-19 | |
| KR7601783A KR810001312B1 (ko) | 1975-07-28 | 1976-07-22 | 비결정 실리콘 활성영역을 갖는 반도체장치 |
| KR1019800002296A KR810001314B1 (ko) | 1975-07-28 | 1980-06-11 | 비결정 실리콘 활성영역을 갖는 반도체 장치 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1062510B true IT1062510B (it) | 1984-10-20 |
Family
ID=27482789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT25040/76A IT1062510B (it) | 1975-07-28 | 1976-07-05 | Dispositivo semiconduttore presentante una regione attiva di silicio amorfo |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS5216990A (it) |
| AU (1) | AU503228B2 (it) |
| CA (1) | CA1091361A (it) |
| DE (1) | DE2632987C3 (it) |
| FR (1) | FR2304180A1 (it) |
| GB (1) | GB1545897A (it) |
| HK (1) | HK49683A (it) |
| IT (1) | IT1062510B (it) |
| NL (1) | NL185884C (it) |
| SE (1) | SE407870B (it) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4196438A (en) | 1976-09-29 | 1980-04-01 | Rca Corporation | Article and device having an amorphous silicon containing a halogen and method of fabrication |
| EG13199A (en) * | 1977-03-28 | 1981-06-30 | Rca Corp | A photo volataic device having increased absorption efficiency |
| DE2715471A1 (de) * | 1977-04-06 | 1978-10-19 | Siemens Ag | Solarzelle |
| FR2394173A1 (fr) * | 1977-06-06 | 1979-01-05 | Thomson Csf | Procede de fabrication de dispositifs electroniques qui comportent une couche mince de silicium amorphe et dispositif electronique obtenu par un tel procede |
| US4117506A (en) * | 1977-07-28 | 1978-09-26 | Rca Corporation | Amorphous silicon photovoltaic device having an insulating layer |
| DE2746967C2 (de) * | 1977-10-19 | 1981-09-24 | Siemens AG, 1000 Berlin und 8000 München | Elektrofotographische Aufzeichnungstrommel |
| AU530905B2 (en) * | 1977-12-22 | 1983-08-04 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member |
| JPS54109762A (en) * | 1978-02-16 | 1979-08-28 | Sony Corp | Semiconductor device |
| US4226898A (en) * | 1978-03-16 | 1980-10-07 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process |
| DE2915859C2 (de) | 1978-04-20 | 1995-06-29 | Canon Kk | Fotoelektrische Wandlereinrichtung |
| DE2954732C2 (de) * | 1978-04-20 | 1996-06-27 | Canon Kk | Verfahren zur Herstellung eines photoelektrischen Wandlers und photoelektrischer Wandler |
| US4162505A (en) * | 1978-04-24 | 1979-07-24 | Rca Corporation | Inverted amorphous silicon solar cell utilizing cermet layers |
| US4167015A (en) * | 1978-04-24 | 1979-09-04 | Rca Corporation | Cermet layer for amorphous silicon solar cells |
| US4163677A (en) * | 1978-04-28 | 1979-08-07 | Rca Corporation | Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier |
| JPS54145537A (en) * | 1978-05-04 | 1979-11-13 | Canon Inc | Preparation of electrophotographic image forming material |
| JPS54150995A (en) * | 1978-05-19 | 1979-11-27 | Hitachi Ltd | Photo detector |
| JPS54109390A (en) * | 1978-05-22 | 1979-08-27 | Yamazaki Shunpei | Photovoltaic force generating semiconductor and method of fabricating same |
| JPS54160568A (en) * | 1978-06-09 | 1979-12-19 | Anelva Corp | Thin film forming equipment for discharge chemical reaction |
| JPS5511330A (en) * | 1978-07-08 | 1980-01-26 | Shunpei Yamazaki | Semiconductor device having continuous junction |
| US4166919A (en) * | 1978-09-25 | 1979-09-04 | Rca Corporation | Amorphous silicon solar cell allowing infrared transmission |
| JPS5821827B2 (ja) * | 1979-02-09 | 1983-05-04 | 三洋電機株式会社 | 光起電力装置 |
| JPS5511397A (en) * | 1979-06-05 | 1980-01-26 | Shunpei Yamazaki | Semiconductor device with continuous connection and its production method |
| JPS5650035A (en) * | 1979-09-28 | 1981-05-07 | Sony Corp | Target of image pick-up tube |
| JPS56132653A (en) * | 1980-03-21 | 1981-10-17 | Seiko Epson Corp | Electronic desk top calculator with amorphous solar cell |
| JPS56133883A (en) * | 1980-03-24 | 1981-10-20 | Seisan Gijutsu Shinko Kyokai | Photoelectric transducer |
| JPS56138962A (en) * | 1980-03-31 | 1981-10-29 | Canon Inc | Photoelectric converter |
| US4400409A (en) | 1980-05-19 | 1983-08-23 | Energy Conversion Devices, Inc. | Method of making p-doped silicon films |
| JPS5721876A (en) * | 1980-07-14 | 1982-02-04 | Canon Inc | Photosensor |
| JPS5756036A (en) * | 1980-09-20 | 1982-04-03 | Mitsubishi Electric Corp | Plasma chemical vapor phase reactor |
| JPS57108782A (en) * | 1980-12-26 | 1982-07-06 | Seiko Epson Corp | Detecting element of radiant rays |
| JPS57134218A (en) * | 1981-02-13 | 1982-08-19 | Riken Corp | Manufacture of coupling main body |
| JPS5787275A (en) * | 1981-09-12 | 1982-05-31 | Canon Inc | Information processor |
| JPS5898915A (ja) * | 1981-12-09 | 1983-06-13 | Konishiroku Photo Ind Co Ltd | アモルフアスシリコン半導体装置 |
| JPS57184257A (en) * | 1982-04-26 | 1982-11-12 | Shunpei Yamazaki | Photoelectric converter |
| JPS59197127A (ja) * | 1984-03-16 | 1984-11-08 | Shunpei Yamazaki | 半導体装置作製方法 |
| JPS6197863U (it) * | 1985-12-05 | 1986-06-23 | ||
| JPH05121339A (ja) * | 1992-03-26 | 1993-05-18 | Semiconductor Energy Lab Co Ltd | 被膜作製装置 |
| JPH0653137A (ja) * | 1992-07-31 | 1994-02-25 | Canon Inc | 水素化アモルファスシリコン膜の形成方法 |
| JPH0794431A (ja) * | 1993-04-23 | 1995-04-07 | Canon Inc | アモルファス半導体用基板、該基板を有するアモルファス半導体基板、及び該アモルファス半導体基板の製造方法 |
| JPH06326024A (ja) * | 1993-05-10 | 1994-11-25 | Canon Inc | 半導体基板の製造方法及び非晶質堆積膜の形成方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3462311A (en) * | 1966-05-20 | 1969-08-19 | Globe Union Inc | Semiconductor device having improved resistance to radiation damage |
| US4064521A (en) * | 1975-07-28 | 1977-12-20 | Rca Corporation | Semiconductor device having a body of amorphous silicon |
-
1976
- 1976-07-05 IT IT25040/76A patent/IT1062510B/it active
- 1976-07-05 AU AU15558/76A patent/AU503228B2/en not_active Expired
- 1976-07-06 GB GB28052/76A patent/GB1545897A/en not_active Expired
- 1976-07-08 CA CA256,565A patent/CA1091361A/en not_active Expired
- 1976-07-08 NL NL7607571A patent/NL185884C/xx not_active IP Right Cessation
- 1976-07-21 SE SE7608314A patent/SE407870B/xx not_active IP Right Cessation
- 1976-07-22 DE DE2632987A patent/DE2632987C3/de not_active Expired - Lifetime
- 1976-07-26 FR FR7622688A patent/FR2304180A1/fr active Granted
- 1976-07-27 JP JP51090124A patent/JPS5216990A/ja active Granted
-
1983
- 1983-11-03 HK HK496/83A patent/HK49683A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AU503228B2 (en) | 1979-08-30 |
| NL185884B (nl) | 1990-03-01 |
| JPS5216990A (en) | 1977-02-08 |
| SE7608314L (sv) | 1977-01-29 |
| HK49683A (en) | 1983-11-11 |
| GB1545897A (en) | 1979-05-16 |
| SE407870B (sv) | 1979-04-23 |
| DE2632987C3 (de) | 1993-12-02 |
| NL185884C (nl) | 1996-01-23 |
| JPS5337718B2 (it) | 1978-10-11 |
| DE2632987C2 (de) | 1987-02-12 |
| DE2632987A1 (de) | 1977-02-10 |
| FR2304180A1 (fr) | 1976-10-08 |
| FR2304180B1 (it) | 1982-07-30 |
| CA1091361A (en) | 1980-12-09 |
| AU1555876A (en) | 1978-01-12 |
| NL7607571A (nl) | 1977-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19950729 |