JP2000256814A - Manufacturing method of copper base alloy strip for terminal - Google Patents
Manufacturing method of copper base alloy strip for terminalInfo
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- JP2000256814A JP2000256814A JP11055597A JP5559799A JP2000256814A JP 2000256814 A JP2000256814 A JP 2000256814A JP 11055597 A JP11055597 A JP 11055597A JP 5559799 A JP5559799 A JP 5559799A JP 2000256814 A JP2000256814 A JP 2000256814A
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- temperature
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- rolling
- cold rolling
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Abstract
(57)【要約】
【課題】 強度、導電性、曲げ加工性および耐応力緩和
特性のいずれにも優れた端子用銅基合金条の製造方法を
提供する。
【解決手段】 (1)特定組成を有するCu−Ni−S
n−P系合金鋳塊を溶製する第1工程、(2)開始温度
を650〜900℃、終了温度を600〜750℃とし
て熱間圧延し急冷する第2工程、(3)冷間圧延し、次
に焼鈍温度を450〜600℃として中間焼鈍した後、
該冷間圧延および該中間焼鈍を繰り返して圧延率を85
%以上とする第3工程、(4)圧延率を50〜60%と
して仕上げ冷間圧延する第4工程、および(5)焼鈍温
度を250〜400℃として低温焼鈍する第5工程から
なる。(57) [Problem] To provide a method of manufacturing a copper-base alloy strip for a terminal which is excellent in all of strength, conductivity, bending workability and stress relaxation resistance. SOLUTION: (1) Cu-Ni-S having a specific composition
a first step of melting the n-P alloy ingot, (2) a second step of hot rolling and quenching at a starting temperature of 650 to 900 ° C. and an ending temperature of 600 to 750 ° C., (3) cold rolling Then, after the intermediate annealing at an annealing temperature of 450 to 600 ° C,
The cold rolling and the intermediate annealing are repeated to reduce the rolling rate to 85.
%, (4) a fourth step of finish cold rolling at a rolling ratio of 50 to 60%, and (5) a fifth step of low temperature annealing at an annealing temperature of 250 to 400 ° C.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、自動車のコネクタ
端子などに用いられる端子用銅基合金条の製造方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a copper base alloy strip for a terminal used for a connector terminal of an automobile or the like.
【0002】[0002]
【従来の技術】近年のエレクトロニクスの発達に伴い、
自動車のコネクタ端子などの端子は、より一層の高密度
化、小型化、軽量化、そして信頼性向上が求められるよ
うになってきている。また、エンジンの高性能化により
エンジンルーム内の温度が上昇するに伴い、エンジンル
ームに使用される端子も、より高信頼性および高耐熱性
が要求されるようになってきている。2. Description of the Related Art With the recent development of electronics,
2. Description of the Related Art Terminals such as connector terminals of automobiles are required to have higher density, smaller size, lighter weight, and higher reliability. In addition, as the temperature in the engine room rises due to the high performance of the engine, terminals used in the engine room are also required to have higher reliability and higher heat resistance.
【0003】自動車のコネクタ端子などの端子の信頼性
が向上するためには、具体的には、強度、ばね特性、導
電性、曲げ加工性、耐応力緩和特性、耐食性に優れるこ
とが必要である。In order to improve the reliability of a terminal such as a connector terminal of an automobile, specifically, it is necessary to have excellent strength, spring characteristics, conductivity, bending workability, stress relaxation resistance, and corrosion resistance. .
【0004】従来より、黄銅、リン青銅や、Cu−Ni
−Sn−P系合金などの銅基合金が端子に使用されてい
た。[0004] Conventionally, brass, phosphor bronze, Cu-Ni
Copper-based alloys such as -Sn-P-based alloys have been used for terminals.
【0005】しかし、端子用銅基合金として従来用いら
れてきた黄銅は、安価ではあるが、導電率が低く、例え
ばC2600で27%IACSであり、耐応力緩和特性
や耐食性にも問題があった。また、リン青銅は、強度は
優れているが、導電率が低く、例えばC5210で12
%IACS程度であり、耐応力緩和特性にも問題があ
り、さらに価格も高く経済的ではなかった。However, brass, which has been conventionally used as a copper base alloy for terminals, is inexpensive, but has low conductivity, for example, C2600 of 27% IACS, and has a problem in stress relaxation resistance and corrosion resistance. . Phosphor bronze has excellent strength but low electrical conductivity.
% IACS, there was a problem in the stress relaxation resistance, and the price was high and it was not economical.
【0006】Cu−Ni−Sn−P系合金は、これら二
種の合金の欠点を補うため開発されたものである。特公
平8−9745号公報には、Cu−Ni−Sn−P系合
金鋳塊を熱間圧延した後、冷間圧延と熱処理を繰り返し
て、端子用銅基合金条を製造する方法が記載されてい
る。[0006] Cu-Ni-Sn-P alloys have been developed to compensate for the disadvantages of these two alloys. JP-B-8-9745 describes a method of manufacturing a copper-base alloy strip for a terminal by hot rolling a Cu-Ni-Sn-P-based alloy ingot and then repeating cold rolling and heat treatment. ing.
【0007】しかしながら、このようにして製造され
た、例えばCu−1.0Ni−0.9Sn−0.05P
(数値は重量%)の銅基合金条は、強度・耐応力緩和特
性は優れているものの、導電率は38%IACSと低
く、曲げ加工性も十分とはいえない。However, for example, Cu-1.0Ni-0.9Sn-0.05P
Although the copper-base alloy strip (numerical value is% by weight) is excellent in strength and stress relaxation resistance, it has a low electrical conductivity of 38% IACS and does not have sufficient bending workability.
【0008】[0008]
【発明が解決しようとする課題】本発明は、上記事情に
鑑み、強度、導電性、曲げ加工性、耐応力緩和特性のい
ずれにも優れた端子用銅基合金条の製造方法を提供する
ことを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and provides a method of manufacturing a copper-base alloy strip for a terminal having excellent strength, conductivity, bending workability, and stress relaxation resistance. With the goal.
【0009】[0009]
【課題を解決するための手段】本発明者は、上記目的を
達成すべく、前記課題について鋭意検討した結果、Cu
−Ni−Sn−P系合金の最適組成および最適製造条件
を選ぶことにより、優れた強度、導電性、曲げ加工性お
よび耐応力緩和特性が得られることを見出し本発明に到
達した。Means for Solving the Problems The present inventor has conducted intensive studies on the above-mentioned problems in order to achieve the above object.
The present inventors have found that excellent strength, conductivity, bending workability, and stress relaxation resistance can be obtained by selecting an optimum composition and an optimum manufacturing condition of a -Ni-Sn-P alloy.
【0010】すなわち、本発明の端子用銅基合金条の製
造方法は、次の(1)〜(5)に述べるような第1〜第
5工程からなる。That is, the method of manufacturing a copper-base alloy strip for a terminal according to the present invention comprises the following first to fifth steps as described in the following (1) to (5).
【0011】(1)第1工程では、重量%で、Ni:
0.2〜3.0%、Sn:0.5〜2.0%、P:0.
01〜1.0%を含有し、残部がCuと不可避不純物か
らなり、かつ該Ni%と該P%との比の値が20より小
さい合金鋳塊を溶製する。(1) In the first step, Ni:
0.2-3.0%, Sn: 0.5-2.0%, P: 0.
An alloy ingot containing 0.01 to 1.0%, the balance being Cu and unavoidable impurities, and having a ratio of Ni% to P% of less than 20 is produced.
【0012】(2)第2工程では、開始温度を650〜
900℃、終了温度を600〜750℃として熱間圧延
し急冷する。(2) In the second step, the starting temperature is set at 650 to
Hot rolling and rapid cooling are performed at 900 ° C. and an end temperature of 600 to 750 ° C.
【0013】(3)第3工程では、(a)冷間圧延し、
次に焼鈍温度を450〜600℃として中間焼鈍した
後、該冷間圧延および該中間焼鈍を繰り返して圧延率を
85%以上とする(複数回の冷間圧延・中間焼鈍)、ま
たは(b)圧延率を85%以上として冷間圧延した後、
焼鈍温度を450〜600℃として中間焼鈍する(1回
の冷間圧延・中間焼鈍)。(3) In the third step, (a) cold rolling is performed,
Next, after performing intermediate annealing at an annealing temperature of 450 to 600 ° C., the cold rolling and the intermediate annealing are repeated to reduce the rolling reduction to 85% or more (a plurality of times of cold rolling and intermediate annealing), or (b). After cold rolling with a rolling ratio of 85% or more,
Intermediate annealing is performed at an annealing temperature of 450 to 600 ° C. (one cold rolling / intermediate annealing).
【0014】(4)第4工程では、圧延率を50〜60
%として仕上げ冷間圧延する。(4) In the fourth step, the rolling reduction is 50-60.
% And finish cold rolling.
【0015】(5)第5工程では、焼鈍温度を250〜
400℃として低温焼鈍する。(5) In the fifth step, the annealing temperature is set at 250 to
Anneal at low temperature at 400 ° C.
【0016】本発明の製造方法における第2工程で得ら
れた熱間圧延物は、100μm以下の結晶粒径を有す
る。また、第3工程で得られた中間焼鈍物は、5μm以
下の再結晶粒径を有する。The hot rolled product obtained in the second step of the production method of the present invention has a crystal grain size of 100 μm or less. The intermediate annealed product obtained in the third step has a recrystallized grain size of 5 μm or less.
【0017】本発明方法によって製造された銅基合金条
は、重量%で、Ni:0.2〜3.0%、Sn:0.5
〜2.0%、P:0.01〜1.0%を含有し、残部が
Cuと不可避不純物からなり、かつ該Ni%と該P%と
の比の値が20より小さい組成を有し、Ni3 P化合物
がマトリックス中に均一微細に分散析出した組織を有
し、かつ引張強さ:550MPa以上、導電率:50%
IACS以上、最小曲げ半径比:1以下、および応力緩
和率:10%以下を実現する。The copper-base alloy strip produced by the method of the present invention is, in terms of% by weight, Ni: 0.2 to 3.0% and Sn: 0.5.
~ 2.0%, P: 0.01 ~ 1.0%, the balance is composed of Cu and unavoidable impurities, and the ratio of the Ni% to the P% is less than 20. , A structure in which Ni 3 P compound is uniformly and finely dispersed and precipitated in a matrix, and has a tensile strength of 550 MPa or more and a conductivity of 50%.
Achieve an IACS or more, a minimum bending radius ratio of 1 or less, and a stress relaxation rate of 10% or less.
【0018】[0018]
【発明の実施の形態】(1)合金元素 第1工程で銅基合金鋳塊を溶製する際に添加した合金元
素は、製造した合金条において次の作用効果を奏する。BEST MODE FOR CARRYING OUT THE INVENTION (1) Alloying elements The alloying elements added during the smelting of a copper-based alloy ingot in the first step have the following functions and effects in the manufactured alloy strip.
【0019】(a)Ni Niは、Cuマトリックス中に固溶して、強度、ばね特
性および耐応力緩和特性を向上させる。また、共存する
Pと形成したNi−P系金属間化合物(Ni3P)は、
マトリックス中に均一微細に分散析出して、導電性を向
上させ、強度、ばね特性および耐応力緩和特性をさらに
向上させる。(A) Ni Ni forms a solid solution in a Cu matrix to improve strength, spring characteristics and stress relaxation resistance. The Ni-P intermetallic compound (Ni 3 P) formed with coexisting P is
It is uniformly and finely dispersed and precipitated in the matrix to improve conductivity and further improve strength, spring characteristics and stress relaxation resistance.
【0020】上記Niの作用効果は、Ni組成が0.2
重量%未満では十分得ることができず、3.0重量%を
超えると飽和してしまう。従って、Ni組成は0.2重
量%以上が必要で、3.0重量%以下が好ましい。The effect of Ni is as follows.
If the amount is less than 30% by weight, it cannot be sufficiently obtained. Therefore, the Ni composition is required to be at least 0.2% by weight, and preferably at most 3.0% by weight.
【0021】(b)Sn Snは、Cuマトリックス中に固溶して、強度およびば
ね特性を向上させる。(B) Sn Sn forms a solid solution in a Cu matrix to improve strength and spring characteristics.
【0022】上記Snの作用効果は、Sn組成が0.5
重量%未満では十分得ることができず、Sn組成が2.
0重量%を超えると飽和してしまう。従って、Sn組成
は0.5重量%以上が必要で、2.0重量%以下が好ま
しい。The effect of Sn is as follows.
If it is less than 10% by weight, it cannot be obtained sufficiently, and the Sn composition is not more than 2.
If it exceeds 0% by weight, it will be saturated. Therefore, the Sn composition needs to be 0.5% by weight or more, and preferably 2.0% by weight or less.
【0023】(c)P Pは、Cuマトリックス中に固溶しているだけでなく、
分散析出するNi−P系金属間化合物(Ni3 P)を共
存するNiと形成する。これにより、強度、導電性、ば
ね特性および耐応力緩和特性を向上させる。なお、P
は、鋳塊溶製時に溶湯の脱酸剤として作用する。(C) PP is not only a solid solution in the Cu matrix,
Forming a Ni coexist Ni-P intermetallic compound dispersed precipitate (Ni 3 P). Thereby, strength, conductivity, spring characteristics and stress relaxation resistance are improved. Note that P
Acts as a deoxidizer for molten metal during ingot smelting.
【0024】上記Pの作用効果は、P組成が0.01重
量%未満では十分得ることができず、P組成が1.0重
量%を超えると飽和してしまう。従って、P組成は0.
01重量%以上が必要で、1.0重量%以下が好まし
い。The above-mentioned effects of P cannot be sufficiently obtained when the P composition is less than 0.01% by weight, and become saturated when the P composition exceeds 1.0% by weight. Therefore, the P composition is 0.
It is required to be at least 01% by weight, preferably at most 1.0% by weight.
【0025】(d)Ni重量%とP重量%との比の値 Ni−P系金属間化合物(Ni3 P)を十分に分散析出
させるために、Ni重量%とP重量%との比の値を20
より小さくする必要がある。この値が20以上になる
と、Ni−P系金属間化合物(Ni3 P)の析出量が非
常にわずかになってしまうために、導電性および耐応力
緩和特性を向上させることができない。(D) The value of the ratio of Ni weight% to P weight% In order to sufficiently disperse and precipitate the Ni-P intermetallic compound (Ni 3 P), the ratio of the Ni weight% to P weight% Value 20
Need to be smaller. When the value reaches 20 or more, for Ni-P intermetallic compound precipitated amount of (Ni 3 P) becomes extremely small, it can not be conductive and to improve the stress relaxation property.
【0026】(2)熱間圧延 (a)溶体化処理する、(b)熱間圧延後の結晶粒径を
100μm以下(通常は10μm以上)に調整するため
に、開始温度を650〜900℃、終了温度を600〜
750℃として熱間圧延する。ここで、溶体化処理は、
Ni、Pを十分固溶させる(後工程でNi3 P化合物と
して時効析出させる(後述))ためのものである。開始
温度が650℃未満では、圧延の進行に伴う温度降下の
ためにNi、Pの固溶が不十分となり易く、後工程で上
記時効析出効果(時効性)が充分得られない。一方、9
00℃より高い温度になると、その温度が融点近傍であ
るため熱間圧延自体が行えなくなる。また、終了温度が
600℃未満では、Ni、Pの固溶が不十分となる。一
方、750℃を超えると、曲げ加工性を充分向上させる
ことが不可能となってしまう。何故なら、結晶粒径を1
00μm以下に調整できず(結晶粒径が100μmを超
え)、後工程の冷間圧延・中間焼鈍後における(仕上げ
圧延に供する)再結晶粒径を5μm以下に調整すること
ができなくなるからである(後述の冷間圧延・中間焼鈍
参照)。(2) Hot rolling (a) Solution treatment, (b) In order to adjust the crystal grain size after hot rolling to 100 μm or less (usually 10 μm or more), the starting temperature is 650 to 900 ° C. , End temperature 600 ~
Hot rolling at 750 ° C. Here, the solution treatment is
This is for sufficiently dissolving Ni and P (age precipitation as a Ni 3 P compound in a later step (described later)). If the starting temperature is lower than 650 ° C., the solid solution of Ni and P tends to be insufficient due to a temperature drop accompanying the progress of rolling, and the above-mentioned aging precipitation effect (aging property) cannot be sufficiently obtained in a later step. On the other hand, 9
If the temperature is higher than 00 ° C., the temperature is close to the melting point, so that hot rolling itself cannot be performed. If the end temperature is lower than 600 ° C., the solid solution of Ni and P becomes insufficient. On the other hand, if it exceeds 750 ° C., it becomes impossible to sufficiently improve the bending workability. Because the crystal grain size is 1
This is because the grain size cannot be adjusted to 00 μm or less (crystal grain size exceeds 100 μm), and the recrystallized grain size (for finish rolling) after cold rolling and intermediate annealing in the subsequent process cannot be adjusted to 5 μm or less. (Refer to cold rolling / intermediate annealing described below).
【0027】(3)急冷 常温で単一相(過飽和状態)組織にするために、溶体化
処理した熱間圧延物を急冷する。この急冷は、通常行わ
れている水冷・空冷・油冷などにより行えばよい。(3) Quenching The solution-treated hot-rolled product is quenched in order to form a single-phase (supersaturated) structure at room temperature. This rapid cooling may be performed by water cooling, air cooling, oil cooling, or the like, which is usually performed.
【0028】(4)冷間圧延・中間焼鈍 上記急冷で得た熱間圧延物は通常、面削する。次に、冷
間圧延した後、焼鈍温度を450〜600℃として中間
焼鈍する。この冷間圧延・中間焼鈍は、1回で済ませて
もよいが、効率よく冷間圧延を行うために複数回行って
もよい。1回で済ませる場合は、圧延率を85%以上と
して冷間圧延した後、焼鈍温度を450〜600℃とし
て中間焼鈍する。また、複数回行う場合は、冷間圧延
し、次に焼鈍温度を450〜600℃として中間焼鈍し
た後、該冷間圧延および該中間焼鈍を繰り返して圧延率
を85%以上とする。このように冷間圧延率の圧延率を
85%以上とするのは、(a)熱間圧延で固溶したNi
とPからNi3 P化合物を時効析出させる、(b)5μ
m以下の再結晶粒径にするためである。時効析出するN
i3 P化合物の粒径は、NiとPの組成にもよるが20
nm以下で微細である。冷間圧延・中間焼鈍において再
結晶が充分進行しないか、再結晶粒径が5μmを超える
と、曲げ加工性を充分向上させることが不可能となって
しまう。(4) Cold Rolling / Intermediate Annealing The hot rolled material obtained by the above-mentioned rapid cooling is usually face-milled. Next, after cold rolling, intermediate annealing is performed at an annealing temperature of 450 to 600 ° C. This cold rolling / intermediate annealing may be performed only once, but may be performed a plurality of times in order to perform cold rolling efficiently. In the case of performing only once, cold rolling is performed at a rolling reduction of 85% or more, and then intermediate annealing is performed at an annealing temperature of 450 to 600 ° C. When performing a plurality of times, cold rolling is performed, then intermediate annealing is performed at an annealing temperature of 450 to 600 ° C., and then the cold rolling and the intermediate annealing are repeated to reduce the rolling ratio to 85% or more. The reason why the cold rolling reduction is 85% or more is that (a) Ni dissolved in hot rolling
Age precipitation of Ni 3 P compound from P and P, (b) 5μ
This is because the recrystallized grain size is not more than m. Aging precipitation N
Although the particle size of the i 3 P compound depends on the composition of Ni and P, it is 20
Fine at nm or less. If the recrystallization does not proceed sufficiently in the cold rolling / intermediate annealing or if the recrystallized grain size exceeds 5 μm, it becomes impossible to sufficiently improve the bending workability.
【0029】圧延率が85%未満では、熱間圧延後の結
晶粒径が100μm以下でも、後工程の仕上げ圧延に供
する再結晶粒径を5μm以下に調整することが難しくな
る。また、中間焼鈍温度が450℃未満では再結晶が充
分進行せず、一方600℃より高い温度になると再結晶
粒が5μmより粗大になってしまう。When the rolling reduction is less than 85%, even if the crystal grain size after hot rolling is 100 μm or less, it is difficult to adjust the recrystallized grain size to be subjected to the finish rolling in the subsequent step to 5 μm or less. If the intermediate annealing temperature is lower than 450 ° C., recrystallization does not proceed sufficiently, while if the temperature is higher than 600 ° C., the recrystallized grains become coarser than 5 μm.
【0030】(5)仕上げ冷間圧延 仕上げ冷間圧延の圧延率は、50〜60%とする。50
%未満では、強度および耐応力緩和特性が低下し、一
方、60%を超えると、曲げ加工性が低下する。(5) Finish Cold Rolling The rolling rate of the finish cold rolling is set to 50 to 60%. 50
%, The strength and the stress relaxation resistance are reduced. On the other hand, when it exceeds 60%, the bending workability is reduced.
【0031】(6)低温焼鈍 Ni3 P化合物を十分に析出させると同時に、再結晶を
進行させることなく歪取りを行って、十分な曲げ加工性
を与えるために行う。そのために、低温焼鈍温度を25
0〜400℃とする。250℃未満では、上記析出反応
が起こらず曲げ加工性が低下する。一方、400℃を超
えると、歪取りは行い得るが再結晶が進行してしまい、
強度および耐応力緩和特性が低下する。(6) Low-Temperature Annealing At the same time that the Ni 3 P compound is sufficiently precipitated, the strain is removed without causing the recrystallization to proceed, so that sufficient bending workability is provided. Therefore, the low-temperature annealing temperature is set to 25
0 to 400 ° C. If the temperature is lower than 250 ° C., the above-described precipitation reaction does not occur, and the bending workability is reduced. On the other hand, if the temperature exceeds 400 ° C., strain can be removed, but recrystallization proceeds,
Strength and stress relaxation resistance are reduced.
【0032】[0032]
【実施例】以下、実施例、比較例および従来例により、
本発明をさらに具体的に説明する。なお、これら実施例
および比較例における合金鋳塊組成を表1に記載し、ま
た主な製造条件を再記した。また、従来例における合金
条組成を表1に記載した。EXAMPLES Hereinafter, Examples, Comparative Examples and Conventional Examples will be described.
The present invention will be described more specifically. In addition, the composition of the alloy ingot in these Examples and Comparative Examples is described in Table 1, and the main production conditions are described again. Table 1 shows the composition of the alloy strip in the conventional example.
【0033】[実施例1、2] (1)合金鋳塊の溶製 Ni重量%とP重量%との比の値Ni/Pが異なる
(5.7(実施例1)、12.5(実施例2))2種組
成の合金鋳塊を大気溶解炉を用いて溶製した。[Examples 1 and 2] (1) Ingot production of alloy ingots The ratio Ni / P of Ni weight% and P weight% is different (5.7 (Example 1), 12.5 ( Example 2)) Ingots of two compositions were melted using an atmospheric melting furnace.
【0034】(2)熱間圧延・急冷 合金鋳塊を850℃で加熱し、厚さ15.0mmまで熱
間圧延した(熱間圧延終了温度:650℃)後、常温の
水中に浸漬して急冷した。(2) Hot Rolling / Quenching The alloy ingot was heated at 850 ° C., hot rolled to a thickness of 15.0 mm (hot rolling end temperature: 650 ° C.), and then immersed in water at room temperature. Quenched.
【0035】(3)冷間圧延・中間焼鈍 急冷した熱間圧延物の表面を面削して厚さ13.0mm
とした後、冷間圧延した。冷間圧延は、圧延率が95%
となるまで、600℃の中間焼鈍を間で行って繰り返し
た。最後の中間焼鈍で得られた条の再結晶粒径は、検鏡
の結果いずれの実施例も2.5μmであった(表1参
照)。(3) Cold Rolling / Intermediate Annealing The surface of the quenched hot rolled material is beveled to a thickness of 13.0 mm.
And then cold rolled. The cold rolling rate is 95%
The intermediate annealing at 600 ° C. was repeated between the steps until the above was reached. The recrystallized grain size of the strip obtained by the final intermediate annealing was 2.5 μm in all Examples as a result of microscopic examination (see Table 1).
【0036】(4)仕上げ冷間圧延 圧延率60%の仕上げ冷間圧延を行った。(4) Finish Cold Rolling Finish cold rolling at a rolling reduction of 60% was performed.
【0037】(5)低温焼鈍 350℃で低温焼鈍を行って、板厚0.25mmの条材
を製造した。(5) Low-Temperature Annealing Low-temperature annealing was performed at 350 ° C. to produce a strip having a thickness of 0.25 mm.
【0038】(6)測定など 製造した条材について検鏡した。その結果、いずれの実
施例もNi3 P化合物が均一微細に分散析出していた。(6) Measurement, etc. The manufactured strip was inspected under a microscope. As a result, in each of the examples, the Ni 3 P compound was uniformly and finely dispersed and precipitated.
【0039】また、上記条材の引張強さおよび導電率を
測定するとともに、曲げ加工性および耐応力緩和特性を
調査した。得られた結果を表2に示す。The tensile strength and electrical conductivity of the strip were measured, and the bending workability and the stress relaxation resistance were examined. Table 2 shows the obtained results.
【0040】(a)引張強さおよび導電率 引張強さの測定はJIS H 2241に、導電率の測
定はJIS H 0505に準拠した。(A) Tensile Strength and Conductivity The tensile strength was measured according to JIS H 2241, and the conductivity was measured according to JIS H 0505.
【0041】 (b)曲げ加工性曲げ加工性は、90°W曲げ加工試験
で評価した。試験はCES−M0002−6に準拠し、
曲げ半径が0.1〜2.0mmの治具で90°W曲げ加
工し、中央山表面の状況を調べた。なお、曲げ軸は圧延
方向に対して平行方向(BadWay)とした。そし
て、割れおよびシワが発生しない最小曲げ半径Rを板厚
tで割った値、すなわち最小曲げ半径比R/tを求め
た。最小曲げ半径比R/tが小さいほど、曲げ加工性が
よい。(B) Bendability The bendability was evaluated by a 90 ° W bending test. The test complies with CES-M0002-6,
90 ° W bending was performed using a jig having a bending radius of 0.1 to 2.0 mm, and the state of the central mountain surface was examined. The bending axis was in a direction parallel to the rolling direction (BadWay). Then, a value obtained by dividing the minimum bending radius R at which cracks and wrinkles did not occur by the plate thickness t, that is, the minimum bending radius ratio R / t was obtained. The smaller the minimum bending radius ratio R / t, the better the bending workability.
【0042】(c)耐応力緩和特性 応力緩和試験では、試験片の中央部の応力が400MP
aとなるようにアーチ曲げを行い、150℃の温度で1
000時間保持した後、試験片の曲げぐせを治具を用い
て求めた。すなわち、次式により応力緩和率を算出し
た。なお、次式において、L0 は治具の長さ(mm)、
L1 は曲げぐせをつける前の試料端間の水平距離(m
m)、L2 は曲げぐせをつけた後の試料端間の水平距離
(mm)である。(C) Stress Relaxation Resistance In the stress relaxation test, the stress at the center of the test piece was 400MP.
a, and arched at 150 ° C.
After holding for 000 hours, the bending of the test piece was determined using a jig. That is, the stress relaxation rate was calculated by the following equation. In the following equation, L 0 is the length (mm) of the jig,
L 1 is the horizontal distance between the sample ends before attaching a bending habit (m
m), L 2 is a horizontal distance between the sample ends after wearing bending habit (mm).
【0043】[0043]
【数1】 (Equation 1)
【0044】[実施例3、4] (1)合金鋳塊の溶製 実施例1、2と同様に行った。[Examples 3 and 4] (1) Ingot smelting of alloy ingot The same procedure as in Examples 1 and 2 was carried out.
【0045】(2)熱間圧延・急冷 合金鋳塊を850℃で加熱し、厚さ5.0mmまで熱間
圧延した(熱間圧延終了温度:650℃)後、常温の水
中に浸漬して急冷した。(2) Hot Rolling / Quenching The alloy ingot was heated at 850 ° C., hot rolled to a thickness of 5.0 mm (hot rolling end temperature: 650 ° C.), and then immersed in water at room temperature. Quenched.
【0046】(3)冷間圧延・中間焼鈍 急冷した熱間圧延物の表面を面削して厚さ4.0mmと
した後、冷間圧延した。冷間圧延は、圧延率が85%と
なるまで、600℃の中間焼鈍を間で行って繰り返し
た。最後の中間焼鈍で得られた条の再結晶粒径は、検鏡
の結果いずれの実施例も5μmであった(表1参照)。(3) Cold Rolling / Intermediate Annealing The surface of the quenched hot rolled material was chamfered to a thickness of 4.0 mm and then cold rolled. Cold rolling was repeated with intermediate annealing at 600 ° C. until the rolling reduction reached 85%. The recrystallized grain size of the strip obtained by the final intermediate annealing was 5 μm in all Examples as a result of microscopic examination (see Table 1).
【0047】(4)仕上げ冷間圧延以降 実施例1と同様に行った。(4) After Finish Cold Rolling The same procedure as in Example 1 was performed.
【0048】製造した条材の検鏡では、いずれの実施例
もNi3 P化合物が均一微細に分散析出していた。その
他の結果を表2に示す。In the microscopy of the manufactured strips, the Ni 3 P compound was uniformly and finely dispersed and precipitated in all Examples. Other results are shown in Table 2.
【0049】[比較例1]Ni重量%とP重量%との比
の値Ni/Pが20.0の合金鋳塊を溶製した以外は、
実施例1と同様に試験した。[Comparative Example 1] Except that an alloy ingot with a Ni / P ratio of 20.0% Ni / P was melted, the value of the ratio of Ni weight% to P weight% was melted.
The test was performed in the same manner as in Example 1.
【0050】最後の中間焼鈍で得られた条の再結晶粒径
は、検鏡の結果2.5μmであった(表1参照)。ま
た、製造した条材の検鏡では、Ni3 P化合物が比較的
粗いものと微細なものとが混ざって不均一に分散析出し
ていた。その他の結果を表2に示す。The recrystallized grain size of the strip obtained by the final intermediate annealing was 2.5 μm by microscopic examination (see Table 1). In addition, the microscopic examination of the manufactured strip material showed that the Ni 3 P compound was relatively non-uniformly dispersed and precipitated because the relatively coarse and fine Ni 3 P compounds were mixed. Other results are shown in Table 2.
【0051】[比較例2、3] (1)合金鋳塊の溶製 実施例1、2と同様に行った。[Comparative Examples 2 and 3] (1) Ingot smelting of alloy ingot The same procedure as in Examples 1 and 2 was carried out.
【0052】(2)熱間圧延・急冷 合金鋳塊を850℃で加熱し、厚さ4.0mmまで熱間
圧延した(熱間圧延終了温度:650℃)後、常温の水
中に浸漬して急冷した。(2) Hot Rolling / Quenching The alloy ingot was heated at 850 ° C., hot rolled to a thickness of 4.0 mm (hot rolling end temperature: 650 ° C.), and then immersed in water at room temperature. Quenched.
【0053】(3)冷間圧延・中間焼鈍 急冷した熱間圧延物の表面を面削して厚さ3.0mmと
した後、冷間圧延した。冷間圧延は、圧延率が80%と
なるまで、600℃の中間焼鈍を間で行って繰り返し
た。最後の中間焼鈍で得られた条の再結晶粒径は、検鏡
の結果いずれの比較例も15μmであった(表1参
照)。(3) Cold Rolling / Intermediate Annealing The surface of the quenched hot rolled material was chamfered to a thickness of 3.0 mm and then cold rolled. Cold rolling was repeated with intermediate annealing at 600 ° C. until the rolling reduction reached 80%. The recrystallized grain size of the strip obtained by the final intermediate annealing was 15 μm in all comparative examples as a result of microscopic examination (see Table 1).
【0054】(4)仕上げ冷間圧延以降 実施例1と同様に行った。(4) Finish Cold Rolling and Later The same procedure as in Example 1 was performed.
【0055】製造した条材の検鏡では、いずれの比較例
もNi3 P化合物が均一微細に分散析出していた。その
他の結果を表2に示す。In the microscopy of the manufactured strip material, the Ni 3 P compound was uniformly and finely dispersed and precipitated in all the comparative examples. Other results are shown in Table 2.
【0056】[比較例4、5] (1)合金鋳塊の溶製 実施例1、2と同様に行った。[Comparative Examples 4 and 5] (1) Smelting of an alloy ingot The same procedure as in Examples 1 and 2 was carried out.
【0057】(2)熱間圧延・急冷 合金鋳塊を850℃で加熱し、厚さ11.0mmまで熱
間圧延した(熱間圧延終了温度:650℃)後、常温の
水中に浸漬して急冷した。(2) Hot Rolling / Quenching The ingot was heated at 850 ° C., hot rolled to a thickness of 11.0 mm (hot rolling end temperature: 650 ° C.), and then immersed in water at room temperature. Quenched.
【0058】(3)冷間圧延・中間焼鈍 急冷した熱間圧延物の表面を面削して厚さ9.0mmと
した後、冷間圧延した。冷間圧延は、圧延率が95%と
なるまで、600℃の中間焼鈍を間で行って繰り返し
た。最後の中間焼鈍で得られた条の再結晶粒径は、検鏡
の結果いずれの比較例も2.5μmであった(表1参
照)。(3) Cold Rolling / Intermediate Annealing The surface of the quenched hot rolled material was chamfered to a thickness of 9.0 mm and then cold rolled. Cold rolling was repeated with intermediate annealing at 600 ° C. until the rolling reduction reached 95%. The recrystallized grain size of the strip obtained by the final intermediate annealing was 2.5 μm in all comparative examples as a result of microscopic examination (see Table 1).
【0059】(4)仕上げ冷間圧延 圧延率45%の仕上げ冷間圧延を行った。(4) Finish Cold Rolling Finish cold rolling at a rolling reduction of 45% was performed.
【0060】(5)低温焼鈍以降 実施例1と同様に行った。(5) Low-Temperature Annealing The same operation as in Example 1 was performed.
【0061】製造した条材の検鏡では、いずれの比較例
もNi3 P化合物が均一微細に分散析出していた。その
他の結果を表2に示す。In the microscopy of the manufactured strip material, the Ni 3 P compound was uniformly and finely dispersed and precipitated in all the comparative examples. Other results are shown in Table 2.
【0062】[比較例6、7] (1)合金鋳塊の溶製 実施例1、2と同様に行った。[Comparative Examples 6 and 7] (1) Ingot smelting of alloy ingot The same procedure as in Examples 1 and 2 was carried out.
【0063】(2)熱間圧延・急冷 合金鋳塊を850℃で加熱し、厚さ22.0mmまで熱
間圧延した(熱間圧延終了温度:650℃)後、常温の
水中に浸漬して急冷した。(2) Hot Rolling / Quenching The alloy ingot was heated at 850 ° C., hot rolled to a thickness of 22.0 mm (hot rolling end temperature: 650 ° C.), and then immersed in water at room temperature. Quenched.
【0064】(3)冷間圧延・中間焼鈍 急冷した熱間圧延物の表面を面削して厚さ20.0mm
とした後、冷間圧延した。冷間圧延は、圧延率が95%
となるまで、600℃の中間焼鈍を間で行って繰り返し
た。最後の中間焼鈍で得られた条の再結晶粒径は、検鏡
の結果いずれの比較例も2.5μmであった(表1参
照)。(3) Cold Rolling / Intermediate Annealing The surface of the quenched hot-rolled material is beveled to a thickness of 20.0 mm.
And then cold rolled. The cold rolling rate is 95%
The intermediate annealing at 600 ° C. was repeated between the steps until the above was reached. The recrystallized grain size of the strip obtained by the final intermediate annealing was 2.5 μm in all comparative examples as a result of microscopic examination (see Table 1).
【0065】(4)仕上げ冷間圧延 圧延率75%の仕上げ冷間圧延を行った。(4) Finish Cold Rolling Finish cold rolling at a rolling reduction of 75% was performed.
【0066】(5)低温焼鈍以降 実施例1と同様に行った。(5) After Low-Temperature Annealing The same as in Example 1.
【0067】製造した条材の検鏡では、いずれの比較例
もNi3 P化合物が均一微細に分散析出していた。その
他の結果を表2に示す。In the microscopic examination of the manufactured strip material, the Ni 3 P compound was uniformly and finely dispersed and precipitated in all the comparative examples. Other results are shown in Table 2.
【0068】[比較例8、9] (1)合金鋳塊の溶製〜仕上げ冷間圧延 実施例1、2と同様に行った。Comparative Examples 8 and 9 (1) Smelting of Alloy Ingot to Finish Cold Rolling The same procedure as in Examples 1 and 2 was carried out.
【0069】最後の中間焼鈍で得られた条の再結晶粒径
は、検鏡の結果いずれの比較例も2.5μmであった
(表1参照)。The recrystallized grain size of the strip obtained by the final intermediate annealing was 2.5 μm in all the comparative examples as a result of microscopic examination (see Table 1).
【0070】(2)低温焼鈍 200℃で低温焼鈍を行って、板厚0.25mmの条材
を製造した。(2) Low-Temperature Annealing Low-temperature annealing was performed at 200 ° C. to produce a strip having a thickness of 0.25 mm.
【0071】(3)測定など 実施例1と同様に行った。(3) Measurement, etc. The measurement was performed in the same manner as in Example 1.
【0072】製造した条材の検鏡では、いずれの比較例
もNi3 P化合物が均一微細に分散析出していた。その
他の結果を表2に示す。In the microscopic examination of the manufactured strip material, the Ni 3 P compound was uniformly and finely dispersed and precipitated in all the comparative examples. Other results are shown in Table 2.
【0073】[比較例10、11]450℃で低温焼鈍
を行って、板厚0.25mmの条材を製造した以外は、
比較例8、9と同様に行った。[Comparative Examples 10 and 11] Except that low-temperature annealing was performed at 450 ° C to produce a 0.25 mm-thick strip.
It carried out like Comparative Examples 8 and 9.
【0074】最後の中間焼鈍で得られた条の再結晶粒径
は、検鏡の結果いずれの比較例も2.5μmであった
(表1参照)。製造した条材の検鏡では、いずれの比較
例もNi3 P化合物が均一微細に分散析出していた。そ
の他の結果を表2に示す。The recrystallized grain size of the strip obtained by the final intermediate annealing was 2.5 μm in all comparative examples as a result of microscopic examination (see Table 1). In the microscopy of the manufactured strip material, the Ni 3 P compound was uniformly and finely dispersed and precipitated in all the comparative examples. Other results are shown in Table 2.
【0075】[従来例1、2]市販端子用リン青銅条
(従来例1)および市販端子用黄銅条(従来例2)につ
いて、実施例1と同様の測定などを行った(検鏡を除
く)。得られた結果を表2に示す。[Conventional Examples 1 and 2] The same measurements as in Example 1 were performed on phosphor bronze strips for commercial terminals (Conventional Example 1) and brass strips for commercial terminals (Conventional Example 2) (excluding the microscope). ). Table 2 shows the obtained results.
【0076】[0076]
【表1】 [Table 1]
【0077】[0077]
【表2】 [Table 2]
【0078】以上の結果から、実施例1〜4の合金条は
いずれも、引張強さが550MPa以上、導電率が50
%IACS以上、最小曲げ半径比が1以下、そして応力
緩和率が10%以下であり、いずれの特性にも優れてい
ることが分かる。From the above results, all of the alloy strips of Examples 1 to 4 have a tensile strength of 550 MPa or more and a conductivity of 50 or more.
% IACS or more, the minimum bending radius ratio is 1 or less, and the stress relaxation rate is 10% or less, indicating that all the characteristics are excellent.
【0079】これに対して、比較例および従来例の合金
条は、次の(1)〜(7)で述べるように、引張強さ、
導電率、最小曲げ半径比および応力緩和率のうちの少な
くとも一つが、実施例1〜4が満足する上記領域から外
れて劣っている。On the other hand, as described in the following (1) to (7), the alloy strips of the comparative example and the conventional example have a tensile strength,
At least one of the electrical conductivity, the minimum bending radius ratio, and the stress relaxation rate is inferior outside the above-mentioned regions satisfying Examples 1 to 4.
【0080】(1)Ni/Pが20の比較例1の合金条
は、導電率および応力緩和率が劣る。(1) The alloy strip of Comparative Example 1 having a Ni / P of 20 is inferior in conductivity and stress relaxation rate.
【0081】(2)冷間圧延・中間焼鈍における圧延率
が少なく、再結晶粒径が大きい比較例2、3の合金条
は、最小曲げ半径比が劣る。また、導電率も劣ってい
る。(2) The alloy strips of Comparative Examples 2 and 3 having a small rolling reduction in cold rolling and intermediate annealing and having a large recrystallized grain size are inferior in the minimum bending radius ratio. Also, the conductivity is inferior.
【0082】(3)仕上げ冷間圧延における圧延率が少
ない比較例4、5の合金条は、引張強さおよび応力緩和
率が劣る。また、導電率も劣っている。(3) The alloy strips of Comparative Examples 4 and 5 having a small rolling reduction in the finish cold rolling are inferior in tensile strength and stress relaxation rate. Also, the conductivity is inferior.
【0083】(4)仕上げ冷間圧延における圧延率が多
い比較例6、7の合金条は、最小曲げ半径比が劣る。(4) The alloy strips of Comparative Examples 6 and 7, which have a high rolling reduction in finish cold rolling, are inferior in the minimum bending radius ratio.
【0084】(5)低温焼鈍における焼鈍温度が低い比
較例8、9の合金条は、最小曲げ半径比が劣る。また、
応力緩和率も劣っている。(5) The alloy strips of Comparative Examples 8 and 9 having low annealing temperatures in low-temperature annealing are inferior in the minimum bending radius ratio. Also,
The stress relaxation rate is also poor.
【0085】(6)低温焼鈍における焼鈍温度が高い比
較例10、11の合金条は、引張強さおよび応力緩和率
が劣る。(6) The alloy strips of Comparative Examples 10 and 11 having high annealing temperatures in low-temperature annealing are inferior in tensile strength and stress relaxation rate.
【0086】(7)従来例1の合金(リン青銅)条およ
び従来例2の合金(黄銅)条はいずれも、導電率および
応力緩和率が劣る。(7) Both the alloy (phosphor bronze) strip of Conventional Example 1 and the alloy (brass) strip of Conventional Example 2 are inferior in conductivity and stress relaxation rate.
【0087】[0087]
【発明の効果】本発明の端子用銅基合金条の製造方法に
よれば、強度、導電性、曲げ加工性および耐応力緩和特
性のすべてに優れた、従って自動車などの端子用に用い
て極めて好適な銅基合金条を提供することができる。According to the method for producing a copper-base alloy strip for a terminal of the present invention, strength, conductivity, bending workability and stress relaxation resistance are all excellent. Suitable copper-based alloy strips can be provided.
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C22F 1/00 661 C22F 1/00 661A 683 683 685 685 691 691B 693 693A 694 694A H01R 13/03 H01R 13/03 A Continuation of the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) C22F 1/00 661 C22F 1/00 661A 683 683 685 685 691 691B 693 693A 694 694A H01R 13/03 H01R 13/03 A
Claims (5)
%、Sn:0.5〜2.0%、P:0.01〜1.0%
を含有し、残部がCuと不可避不純物からなり、かつ該
Ni%と該P%との比の値が20より小さい合金鋳塊を
溶製する第1工程、(2)開始温度を650〜900
℃、終了温度を600〜750℃として熱間圧延し急冷
する第2工程、(3)冷間圧延し、次に焼鈍温度を45
0〜600℃として中間焼鈍した後、該冷間圧延および
該中間焼鈍を繰り返して圧延率を85%以上とする第3
工程、(4)圧延率を50〜60%として仕上げ冷間圧
延する第4工程、および(5)焼鈍温度を250〜40
0℃として低温焼鈍する第5工程からなる端子用銅基合
金条の製造方法。(1) Ni: 0.2 to 3.0% by weight.
%, Sn: 0.5 to 2.0%, P: 0.01 to 1.0%
, The balance consisting of Cu and inevitable impurities, and the ratio of the Ni% to the P% is less than 20, the first step of melting the ingot, (2) the starting temperature is 650 to 900
C., the end temperature is 600 to 750 ° C., the second step of hot rolling and quenching, (3) cold rolling and then annealing at 45 ° C.
After the intermediate annealing at 0 to 600 ° C., the cold rolling and the intermediate annealing are repeated to reduce the rolling reduction to 85% or more.
Step (4), a fourth step of finish cold rolling with a reduction ratio of 50 to 60%, and (5) an annealing temperature of 250 to 40.
A method for producing a copper-base alloy strip for a terminal, comprising a fifth step of performing low-temperature annealing at 0 ° C.
%、Sn:0.5〜2.0%、P:0.01〜1.0%
を含有し、残部がCuと不可避不純物からなり、かつ該
Ni%と該P%との比の値が20より小さい合金鋳塊を
溶製する第1工程、(2)開始温度を650〜900
℃、終了温度を600〜750℃として熱間圧延し急冷
する第2工程、(3)圧延率を85%以上として冷間圧
延した後、焼鈍温度を450〜600℃として中間焼鈍
する第3工程、(4)圧延率を50〜60%として仕上
げ冷間圧延する第4工程、および(5)焼鈍温度を25
0〜400℃として低温焼鈍する第5工程からなる端子
用銅基合金条の製造方法。2. (1) Ni: 0.2 to 3.0% by weight.
%, Sn: 0.5 to 2.0%, P: 0.01 to 1.0%
, The balance consisting of Cu and inevitable impurities, and the ratio of the Ni% to the P% is less than 20, the first step of melting the ingot, (2) the starting temperature is 650 to 900
C., a second step in which hot rolling is performed at an end temperature of 600 to 750 ° C. and quenching is performed. (4) the fourth step of finish cold rolling with a reduction ratio of 50 to 60%, and (5) an annealing temperature of 25.
A method for producing a copper-base alloy strip for a terminal, comprising a fifth step of performing low-temperature annealing at 0 to 400 ° C.
0μm以下の結晶粒径を有する請求項1または2に記載
の端子用銅基合金条の製造方法。3. The hot-rolled product obtained in the second step is 10
The method for producing a copper-based alloy strip for a terminal according to claim 1 or 2, having a crystal grain size of 0 µm or less.
m以下の再結晶粒径を有する請求項1または2に記載の
端子用銅基合金条の製造方法。4. The intermediate annealed product obtained in the third step is 5 μm.
The method for producing a copper-base alloy strip for a terminal according to claim 1 or 2, which has a recrystallized grain size of not more than m.
i:0.2〜3.0%、Sn:0.5〜2.0%、P:
0.01〜1.0%を含有し、残部がCuと不可避不純
物からなり、かつ該Ni%と該P%との比の値が20よ
り小さい組成を有し、Ni3 P化合物がマトリックス中
に均一微細に分散析出した組織を有し、かつ引張強さが
550MPa以上、導電率が50%IACS以上、最小
曲げ半径比が1以下、および応力緩和率が10%以下で
ある請求項1〜4のいずれかに記載の端子用銅基合金条
の製造方法。5. The manufactured copper-base alloy strip has a weight percentage of N
i: 0.2 to 3.0%, Sn: 0.5 to 2.0%, P:
Containing 0.01% to 1.0% the remainder being Cu and unavoidable impurities, and the value of the ratio of the said Ni% and said P% has a less than 20 composition, Ni 3 P compound in the matrix A microstructure having a uniform and finely dispersed and precipitated structure, a tensile strength of 550 MPa or more, a conductivity of 50% IACS or more, a minimum bending radius ratio of 1 or less, and a stress relaxation rate of 10% or less. 5. The method for producing a copper-based alloy strip for a terminal according to any one of 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11055597A JP2000256814A (en) | 1999-03-03 | 1999-03-03 | Manufacturing method of copper base alloy strip for terminal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11055597A JP2000256814A (en) | 1999-03-03 | 1999-03-03 | Manufacturing method of copper base alloy strip for terminal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000256814A true JP2000256814A (en) | 2000-09-19 |
Family
ID=13003193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11055597A Pending JP2000256814A (en) | 1999-03-03 | 1999-03-03 | Manufacturing method of copper base alloy strip for terminal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000256814A (en) |
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| WO2002053790A1 (en) * | 2000-12-28 | 2002-07-11 | Nippon Mining & Metals Co., Ltd. | High strength copper alloy excellent in bendability and method for producing the same and terminal and connector using the same |
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