JP2002500351A - 容量式の真空測定セル - Google Patents

容量式の真空測定セル

Info

Publication number: JP2002500351A
Authority: JP; Japan
Prior art keywords: diaphragm; measuring cell; cell according; measuring; vacuum chamber
Prior art date: 1997-12-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP2000526788A

Other languages

English (en)

Japanese (ja)

Other versions

JP2002500351A5 (2

Inventor

ビョルクマン，ペル

オルッソン，ライ

Original Assignee

ユナキス・バルツェルス・アクチェンゲゼルシャフト

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-12-23

Filing date

1998-12-04

Publication date

2002-01-08

1998-12-04 Application filed by ユナキス・バルツェルス・アクチェンゲゼルシャフト filed Critical ユナキス・バルツェルス・アクチェンゲゼルシャフト

2002-01-08 Publication of JP2002500351A publication Critical patent/JP2002500351A/ja

2006-01-05 Publication of JP2002500351A5 publication Critical patent/JP2002500351A5/ja

Status Pending legal-status Critical Current

Links

238000000034 method Methods 0.000 claims description 35
229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 20
239000000463 material Substances 0.000 claims description 19
238000005259 measurement Methods 0.000 claims description 16
238000004519 manufacturing process Methods 0.000 claims description 14
239000002245 particle Substances 0.000 claims description 12
238000010438 heat treatment Methods 0.000 claims description 11
238000007789 sealing Methods 0.000 claims description 10
229910000679 solder Inorganic materials 0.000 claims description 10
238000005245 sintering Methods 0.000 claims description 8
238000003466 welding Methods 0.000 claims description 8
238000000576 coating method Methods 0.000 claims description 4
239000011248 coating agent Substances 0.000 claims description 3
239000002002 slurry Substances 0.000 claims description 3
238000005476 soldering Methods 0.000 claims description 3
238000004891 communication Methods 0.000 claims description 2
238000001816 cooling Methods 0.000 claims 2
238000005304 joining Methods 0.000 claims 2
230000003213 activating effect Effects 0.000 claims 1
239000012799 electrically-conductive coating Substances 0.000 claims 1
238000000465 moulding Methods 0.000 claims 1
239000000758 substrate Substances 0.000 claims 1
239000000919 ceramic Substances 0.000 abstract description 36
230000007797 corrosion Effects 0.000 abstract description 7
238000005260 corrosion Methods 0.000 abstract description 7
239000003566 sealing material Substances 0.000 description 12
238000012937 correction Methods 0.000 description 9
239000011521 glass Substances 0.000 description 9
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
239000010931 gold Substances 0.000 description 7
229910052737 gold Inorganic materials 0.000 description 7
238000010276 construction Methods 0.000 description 6
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
238000005520 cutting process Methods 0.000 description 5
229910052710 silicon Inorganic materials 0.000 description 5
239000010703 silicon Substances 0.000 description 5
238000013461 design Methods 0.000 description 4
229920001971 elastomer Polymers 0.000 description 4
239000000806 elastomer Substances 0.000 description 4
230000007774 longterm Effects 0.000 description 4
229910052751 metal Inorganic materials 0.000 description 4
239000002184 metal Substances 0.000 description 4
239000000203 mixture Substances 0.000 description 4
238000007650 screen-printing Methods 0.000 description 3
230000004913 activation Effects 0.000 description 2
239000003990 capacitor Substances 0.000 description 2
229910010293 ceramic material Inorganic materials 0.000 description 2
230000001419 dependent effect Effects 0.000 description 2
238000001035 drying Methods 0.000 description 2
238000009434 installation Methods 0.000 description 2
239000004033 plastic Substances 0.000 description 2
238000004544 sputter deposition Methods 0.000 description 2
238000000992 sputter etching Methods 0.000 description 2
238000012360 testing method Methods 0.000 description 2
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
239000000654 additive Substances 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
238000004026 adhesive bonding Methods 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Inorganic materials [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000011109 contamination Methods 0.000 description 1
230000002596 correlated effect Effects 0.000 description 1
230000000875 corresponding effect Effects 0.000 description 1
230000007547 defect Effects 0.000 description 1
238000009792 diffusion process Methods 0.000 description 1
238000005530 etching Methods 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
229910052731 fluorine Inorganic materials 0.000 description 1
239000011737 fluorine Substances 0.000 description 1
239000006260 foam Substances 0.000 description 1
238000009472 formulation Methods 0.000 description 1
230000004927 fusion Effects 0.000 description 1
239000006112 glass ceramic composition Substances 0.000 description 1
239000002241 glass-ceramic Substances 0.000 description 1
238000011068 loading method Methods 0.000 description 1
230000014759 maintenance of location Effects 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
229910000986 non-evaporable getter Inorganic materials 0.000 description 1
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
238000010422 painting Methods 0.000 description 1
230000002093 peripheral effect Effects 0.000 description 1
239000000049 pigment Substances 0.000 description 1
239000002985 plastic film Substances 0.000 description 1
238000003825 pressing Methods 0.000 description 1
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239000011253 protective coating Substances 0.000 description 1
239000000565 sealant Substances 0.000 description 1
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239000002210 silicon-based material Substances 0.000 description 1
229910052709 silver Inorganic materials 0.000 description 1
239000004332 silver Substances 0.000 description 1
238000005507 spraying Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
238000005496 tempering Methods 0.000 description 1
238000013519 translation Methods 0.000 description 1
238000001771 vacuum deposition Methods 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0075—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a ceramic diaphragm, e.g. alumina, fused quartz, glass
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49007—Indicating transducer
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49174—Assembling terminal to elongated conductor
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
- Y10T29/49224—Contact or terminal manufacturing with coating

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Ceramic Engineering (AREA)
Measuring Fluid Pressure (AREA)

JP2000526788A 1997-12-23 1998-12-04 容量式の真空測定セル Pending JP2002500351A (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
CH2950/97		1997-12-23
CH295097		1997-12-23
PCT/CH1998/000515 WO1999034184A1 (de)	1997-12-23	1998-12-04	Kapazitive vakuummesszelle

Related Child Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2008263935A Division JP4764468B2 (ja)	1997-12-23	2008-10-10	容量式の真空測定セルの製造方法および容量式の真空測定セルを用いた測定方法

Publications (2)

Publication Number	Publication Date
JP2002500351A true JP2002500351A (ja)	2002-01-08
JP2002500351A5 JP2002500351A5 (2)	2006-01-05

Family

ID=4245293

Family Applications (3)

Application Number	Title	Priority Date	Filing Date
JP2000526788A Pending JP2002500351A (ja)	1997-12-23	1998-12-04	容量式の真空測定セル
JP2000526787A Withdrawn JP2002500350A (ja)	1997-12-23	1998-12-11	セラミックス製圧力測定センサの製造方法
JP2008263935A Expired - Fee Related JP4764468B2 (ja)	1997-12-23	2008-10-10	容量式の真空測定セルの製造方法および容量式の真空測定セルを用いた測定方法

Family Applications After (2)

Application Number	Title	Priority Date	Filing Date
JP2000526787A Withdrawn JP2002500350A (ja)	1997-12-23	1998-12-11	セラミックス製圧力測定センサの製造方法
JP2008263935A Expired - Fee Related JP4764468B2 (ja)	1997-12-23	2008-10-10	容量式の真空測定セルの製造方法および容量式の真空測定セルを用いた測定方法

Country Status (7)

Country	Link
US (2)	US6591687B1 (2)
EP (2)	EP1070239B1 (2)
JP (3)	JP2002500351A (2)
KR (1)	KR100545928B1 (2)
CN (1)	CN1182378C (2)
DE (1)	DE59803948D1 (2)
WO (2)	WO1999034184A1 (2)

Cited By (7)

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JP2005524848A (ja) *	2002-05-06	2005-08-18	ローズマウントインコーポレイテッド	気圧センサ
JP2006010537A (ja) *	2004-06-25	2006-01-12	Saginomiya Seisakusho Inc	薬液用圧力センサ
JP2008527386A (ja) *	2005-01-14	2008-07-24	エムケーエスインストルメンツインコーポレーテッド	流れを規定している構成体を持つ静電容量圧力センサ
JP2009505041A (ja) *	2005-08-12	2009-02-05	インフィコンゲゼルシャフトミットベシュレンクテルハフツング	光学式の干渉応用圧力センサ
JP2010509573A (ja) *	2006-11-13	2010-03-25	インフィコンゲゼルシャフトミットベシュレンクテルハフツング	真空隔膜測定セル、およびこのような測定セルを製造する方法
JP2015129684A (ja) *	2014-01-08	2015-07-16	株式会社アルバック	金属セラミック接合体、隔膜真空計、金属とセラミックとの接合方法、および、隔膜真空計の製造方法
JP2016504582A (ja) *	2012-12-24	2016-02-12	インフィコンゲゼルシャフトミットベシュレンクテルハフツング	測定セル構成を用いて真空圧を測定するための方法および装置

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EP1040333B1 (de) *	1997-12-23	2002-07-03	Unaxis Balzers Aktiengesellschaft	Membrane für eine kapazitive vakuummesszelle
DE10212947C1 (de) *	2002-03-22	2003-09-18	Nord Micro Ag & Co Ohg	Drucksensor, insbesondere zur kapazitiven Bestimmung des Absolutdrucks
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CN102103030B (zh) *	2009-12-16	2013-04-24	中国石油天然气股份有限公司	嵌入式隔热管真空度在线测试装置及测试方法
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GB2543984B (en) *	2011-08-18	2017-07-19	Oxsensis Ltd	Pressure sensor element with cap
US8640546B2 (en) *	2011-09-12	2014-02-04	Del Monte Corporation	Sensor for high pressure processing of articles
US9194760B2 (en) *	2013-03-14	2015-11-24	Dwyer Instruments, Inc.	Capacitive pressure sensor with reduced parasitic capacitance
JP6058450B2 (ja) *	2013-03-29	2017-01-11	株式会社アルバック	金属セラミック接合体、隔膜真空計、金属とセラミックとの接合方法、および、隔膜真空計の製造方法
CN103234692A (zh) *	2013-04-17	2013-08-07	上海祖发实业有限公司	一种传感型真空度测量装置
WO2015070906A1 (de)	2013-11-14	2015-05-21	Inficon Gmbh	Verfahren zur verarbeitung eines messsignals einer druckmesszelle sowie eine messzellenanordnung
WO2016180455A1 (de)	2015-05-08	2016-11-17	Inficon ag	Verfahren zur verarbeitung eines messsignals einer druckmesszelle sowie eine messzellenanordnung
CN106257254B (zh) *	2015-06-22	2020-03-20	意法半导体股份有限公司	生成具有降低的环境温度依赖性的换能信号的压力传感器及其制造方法
CN108700479A (zh)	2016-02-25	2018-10-23	英福康股份公司	具有多电极的电容式真空测量元件
CN107843772A (zh) *	2016-09-19	2018-03-27	中国科学院微电子研究所	一种灵敏度倍增真空规管组
CN107843385A (zh) *	2016-09-19	2018-03-27	中国科学院微电子研究所	一种三氧化二铝薄膜真空规管
DE102018114300A1 (de)	2018-06-14	2019-12-19	Endress+Hauser SE+Co. KG	Druckmesseinrichtung und Verfahren zu deren Herstellung
CN109813490B (zh) *	2018-12-20	2020-12-08	兰州空间技术物理研究所	一种mems电容式真空规及其制作方法
CN110702301B (zh) *	2019-11-19	2024-11-01	川北真空科技(北京)有限公司	一种薄膜真空计
US12287254B2 (en)	2020-02-18	2025-04-29	Inficon ag	Method for determining a pressure in a pressure measurement cell and a measurement cell assembly
JP7444628B2 (ja) *	2020-02-19	2024-03-06	アズビル株式会社	圧力センサ
CN111664968A (zh) *	2020-07-15	2020-09-15	襄阳臻芯传感科技有限公司	一种陶瓷电容式压力传感器的制作方法
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CN114486062B (zh) *	2022-03-31	2022-07-15	季华实验室	一种消除薄膜应力的电容薄膜真空计
CN114754916B (zh)	2022-05-11	2024-01-09	北京七星华创流量计有限公司	压力传感器及其制造方法
CN115165163A (zh) *	2022-09-06	2022-10-11	昆山灵科传感技术有限公司	压力感测结构及其制作方法、压力传感器及其制作方法
DE102024131361A1 (de) *	2024-10-28	2026-04-30	Endress+Hauser SE+Co. KG	System aus einer Druckmesszelle und einem Verschlusskörper

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- 1998-12-04 EP EP98956750A patent/EP1070239B1/de not_active Expired - Lifetime
- 1998-12-04 CN CNB988126168A patent/CN1182378C/zh not_active Expired - Fee Related
- 1998-12-04 JP JP2000526788A patent/JP2002500351A/ja active Pending
- 1998-12-04 KR KR1020007006868A patent/KR100545928B1/ko not_active Expired - Fee Related
- 1998-12-04 DE DE59803948T patent/DE59803948D1/de not_active Expired - Lifetime
- 1998-12-11 WO PCT/CH1998/000532 patent/WO1999034183A1/de not_active Ceased
- 1998-12-11 JP JP2000526787A patent/JP2002500350A/ja not_active Withdrawn
- 1998-12-11 EP EP98958136A patent/EP1042657A1/de not_active Withdrawn
- 1998-12-22 US US09/219,090 patent/US6591687B1/en not_active Expired - Lifetime
2003
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2008
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JP2005524848A (ja) *	2002-05-06	2005-08-18	ローズマウントインコーポレイテッド	気圧センサ
JP2006010537A (ja) *	2004-06-25	2006-01-12	Saginomiya Seisakusho Inc	薬液用圧力センサ
JP2008527386A (ja) *	2005-01-14	2008-07-24	エムケーエスインストルメンツインコーポレーテッド	流れを規定している構成体を持つ静電容量圧力センサ
JP2009505041A (ja) *	2005-08-12	2009-02-05	インフィコンゲゼルシャフトミットベシュレンクテルハフツング	光学式の干渉応用圧力センサ
JP2010509573A (ja) *	2006-11-13	2010-03-25	インフィコンゲゼルシャフトミットベシュレンクテルハフツング	真空隔膜測定セル、およびこのような測定セルを製造する方法
JP2016504582A (ja) *	2012-12-24	2016-02-12	インフィコンゲゼルシャフトミットベシュレンクテルハフツング	測定セル構成を用いて真空圧を測定するための方法および装置
JP2015129684A (ja) *	2014-01-08	2015-07-16	株式会社アルバック	金属セラミック接合体、隔膜真空計、金属とセラミックとの接合方法、および、隔膜真空計の製造方法
WO2015105148A1 (ja) *	2014-01-08	2015-07-16	株式会社アルバック	金属セラミック接合体、隔膜真空計、金属とセラミックとの接合方法、および、隔膜真空計の製造方法

Also Published As

Publication number	Publication date
EP1070239B1 (de)	2002-04-24
US7140085B2 (en)	2006-11-28
EP1042657A1 (de)	2000-10-11
US20040012942A1 (en)	2004-01-22
CN1182378C (zh)	2004-12-29
KR100545928B1 (ko)	2006-01-25
WO1999034184A1 (de)	1999-07-08
DE59803948D1 (de)	2002-05-29
US6591687B1 (en)	2003-07-15
JP2002500350A (ja)	2002-01-08
WO1999034183A1 (de)	1999-07-08
JP2009008693A (ja)	2009-01-15
EP1070239A1 (de)	2001-01-24
CN1283267A (zh)	2001-02-07
KR20010033399A (ko)	2001-04-25
JP4764468B2 (ja)	2011-09-07
HK1033975A1 (en)	2001-10-05

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