JP2003100604A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003100604A5 JP2003100604A5 JP2001291854A JP2001291854A JP2003100604A5 JP 2003100604 A5 JP2003100604 A5 JP 2003100604A5 JP 2001291854 A JP2001291854 A JP 2001291854A JP 2001291854 A JP2001291854 A JP 2001291854A JP 2003100604 A5 JP2003100604 A5 JP 2003100604A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001291854A JP5062933B2 (ja) | 2001-09-25 | 2001-09-25 | 露光装置、位置合わせ方法、プログラム、コンピュータ可読媒体、デバイスの製造方法 |
| US10/234,378 US7224459B2 (en) | 2001-09-25 | 2002-09-05 | Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001291854A JP5062933B2 (ja) | 2001-09-25 | 2001-09-25 | 露光装置、位置合わせ方法、プログラム、コンピュータ可読媒体、デバイスの製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011198858A Division JP5632810B2 (ja) | 2011-09-12 | 2011-09-12 | 露光装置、ショット補正パラメータの決定方法、プログラム、コンピュータ可読媒体、デバイス製造方法および位置合わせ装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003100604A JP2003100604A (ja) | 2003-04-04 |
| JP2003100604A5 true JP2003100604A5 (ja) | 2008-11-13 |
| JP5062933B2 JP5062933B2 (ja) | 2012-10-31 |
Family
ID=19113928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001291854A Expired - Fee Related JP5062933B2 (ja) | 2001-09-25 | 2001-09-25 | 露光装置、位置合わせ方法、プログラム、コンピュータ可読媒体、デバイスの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7224459B2 (ja) |
| JP (1) | JP5062933B2 (ja) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3913151B2 (ja) * | 2002-09-10 | 2007-05-09 | キヤノン株式会社 | 露光装置のパラメータの値を最適化する方法及びシステム、露光装置及び露光方法 |
| TW594434B (en) | 2003-04-30 | 2004-06-21 | Nanya Technology Corp | Exposure system and method |
| US7250237B2 (en) | 2003-12-23 | 2007-07-31 | Asml Netherlands B.V. | Optimized correction of wafer thermal deformations in a lithographic process |
| JP2006259715A (ja) * | 2005-02-21 | 2006-09-28 | Fuji Photo Film Co Ltd | 描画方法、描画装置、描画システムおよび補正方法 |
| US8411271B2 (en) * | 2005-12-28 | 2013-04-02 | Nikon Corporation | Pattern forming method, pattern forming apparatus, and device manufacturing method |
| KR100817092B1 (ko) | 2007-03-14 | 2008-03-26 | 삼성전자주식회사 | 중첩계측오차를 보정하기 위한 계측시스템 및 이를 이용한계측방법 |
| JP5632810B2 (ja) * | 2011-09-12 | 2014-11-26 | キヤノン株式会社 | 露光装置、ショット補正パラメータの決定方法、プログラム、コンピュータ可読媒体、デバイス製造方法および位置合わせ装置 |
| NL2009345A (en) | 2011-09-28 | 2013-04-02 | Asml Netherlands Bv | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods. |
| US9703214B2 (en) * | 2013-07-19 | 2017-07-11 | Canon Kabushiki Kaisha | Lithography apparatus, lithography method, and article manufacturing method |
| CN105043314B (zh) * | 2015-04-30 | 2017-11-21 | 东莞市神州视觉科技有限公司 | 一种用于锡膏检测精度检验的棱台参数测量方法和系统 |
| CN114690593B (zh) * | 2020-12-30 | 2024-06-11 | 科磊股份有限公司 | 一种制造集成电路的方法和系统 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4780617A (en) * | 1984-08-09 | 1988-10-25 | Nippon Kogaku K.K. | Method for successive alignment of chip patterns on a substrate |
| JPH07120621B2 (ja) * | 1989-05-08 | 1995-12-20 | キヤノン株式会社 | 位置合せ方法 |
| JP3245859B2 (ja) * | 1989-09-08 | 2002-01-15 | 株式会社日立製作所 | 半導体装置の製造装置 |
| JPH04107465A (ja) * | 1990-08-28 | 1992-04-08 | Fujitsu Ltd | 縮小投影露光方法 |
| US5561606A (en) * | 1991-08-30 | 1996-10-01 | Nikon Corporation | Method for aligning shot areas on a substrate |
| JP3348918B2 (ja) | 1993-01-21 | 2002-11-20 | 株式会社ニコン | 位置合わせ方法、該方法を用いた露光方法、及びデバイス製造方法 |
| US6278957B1 (en) * | 1993-01-21 | 2001-08-21 | Nikon Corporation | Alignment method and apparatus therefor |
| KR100377887B1 (ko) * | 1994-02-10 | 2003-06-18 | 가부시키가이샤 니콘 | 정렬방법 |
| JPH07335524A (ja) * | 1994-06-06 | 1995-12-22 | Canon Inc | 位置合わせ方法 |
| JPH09266164A (ja) | 1996-03-28 | 1997-10-07 | Canon Inc | 位置合わせ方法および装置 |
| JP3900562B2 (ja) * | 1996-10-18 | 2007-04-04 | ソニー株式会社 | 露光装置 |
| AU6000499A (en) * | 1998-09-30 | 2000-04-17 | Nikon Corporation | Alignment method and method for producing device using the alignment method |
| US20020042664A1 (en) * | 2000-05-31 | 2002-04-11 | Nikon Corporation | Evaluation method, position detection method, exposure method and device manufacturing method, and exposure apparatus |
| US6482713B2 (en) * | 2000-08-01 | 2002-11-19 | Texas Instruments Incorporated | Shot averaging for fine pattern alignment with minimal throughput loss |
-
2001
- 2001-09-25 JP JP2001291854A patent/JP5062933B2/ja not_active Expired - Fee Related
-
2002
- 2002-09-05 US US10/234,378 patent/US7224459B2/en not_active Expired - Lifetime