JP2007232402A - 光学式ガス検知装置 - Google Patents
光学式ガス検知装置 Download PDFInfo
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- 230000003287 optical effect Effects 0.000 title claims abstract description 45
- 238000000825 ultraviolet detection Methods 0.000 claims abstract description 47
- 238000010521 absorption reaction Methods 0.000 claims abstract description 30
- 239000007789 gas Substances 0.000 claims description 82
- 238000001514 detection method Methods 0.000 claims description 59
- 239000010410 layer Substances 0.000 claims description 31
- 239000000853 adhesive Substances 0.000 claims description 14
- 230000001070 adhesive effect Effects 0.000 claims description 14
- 239000011247 coating layer Substances 0.000 claims description 9
- 229910010272 inorganic material Inorganic materials 0.000 claims description 9
- 239000011147 inorganic material Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000011241 protective layer Substances 0.000 claims description 8
- 230000003746 surface roughness Effects 0.000 claims description 8
- 238000005259 measurement Methods 0.000 claims description 6
- 239000003973 paint Substances 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000007769 metal material Substances 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 3
- 230000006866 deterioration Effects 0.000 description 8
- 230000035945 sensitivity Effects 0.000 description 7
- 239000011368 organic material Substances 0.000 description 6
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002861 polymer material Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910004541 SiN Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
- G01N21/5907—Densitometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/05—Flow-through cuvettes
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
【解決手段】光学式ガス検知装置100として、紫外線を放射する紫外線光源110と、紫外線を検出する紫外線検出素子120とを備え、紫外線光源110から紫外線検出素子120に到る紫外線の光路上に被測定ガスが導入され、被測定ガスによる紫外線の吸収度合いを紫外線検出素子120により検出して、被測定ガスの濃度を測定するようにした。
【選択図】図1
Description
(第1実施形態)
図1は、本発明の第1実施形態に係る光学式ガス検知装置の概略断面図である。図2は、波長選択フィルタと紫外線検出素子との積層構造を示す概略断面図である。図3は、ハウジングの断面構造であり、(a)は反射層を、(b)は反射層と保護層を設けた例を示す図である。
110・・・紫外線光源
120・・・紫外線検出素子
122・・・リファレンス用検出素子
130・・・波長選択フィルタ
133・・・リファレンス用フィルタ
140・・・ハウジング
142・・・反射層
143・・・保護層
150・・・接着剤
Claims (17)
- 紫外線を放射する紫外線光源と、
紫外線を検出する紫外線検出素子とを備え、
前記紫外線光源から前記紫外線検出素子に到る紫外線の光路上に被測定ガスが導入され、
前記被測定ガスによる紫外線の吸収度合いを前記紫外線検出素子により検出して、前記被測定ガスの濃度を測定することを特徴とする光学式ガス検知装置。 - 前記被測定ガスは、単原子からなる分子であることを特徴とする請求項1に記載の光学式ガス検知装置。
- 前記被測定ガスは、酸素及び水素の少なくとも一方であることを特徴とする請求項2に記載の光学式ガス検知装置。
- 前記紫外線光源は、所定波長域を含む紫外線を放射するものであり、
前記紫外線の光路上に配置され、所定波長の紫外線を選択的に透過する波長選択フィルタを備えることを特徴とする請求項1〜3いずれか1項に記載の光学式ガス検知装置。 - 前記波長選択フィルタは、前記紫外線検出素子上に積層され、接着剤を介して固定されていることを特徴とする請求項4に記載の光学式ガス検知装置。
- 前記接着剤は、無機系材料からなる接着剤であることを特徴とする請求項5に記載の光学式ガス検知装置。
- 前記波長選択フィルタは、金属膜を多層に積層してなる多層膜フィルタであることを特徴とする請求項4〜6いずれか1項に記載の光学式ガス検知装置。
- 前記被測定ガスとして、吸収波長の異なる複数のガスを測定対象とし、
それぞれの前記ガスに応じて、前記多層膜フィルタと前記紫外線検出素子が配置されていることを特徴とする請求項7に記載の光学式ガス検知装置。 - 前記多層膜フィルタとして、前記被測定ガスの吸収波長とは異なる波長の紫外線を透過するリファレンス用フィルタを含み、
前記紫外線検出素子として、前記リファレンス用フィルタを透過した紫外線を検出するリファレンス用検出素子を含むことを特徴とする請求項7又は請求項8に記載の光学式ガス検知装置。 - 前記波長選択フィルタは、透過波長を調整可能な可変式フィルタであることを特徴とする請求項4〜6いずれか1項に記載の光学式ガス検知装置。
- 前記紫外線光源から前記紫外線検出素子に到る紫外線の光路を内部空間に含むハウジングを備え、
前記ハウジング内の空間に、前記被測定ガスが導入されることを特徴とする請求項1〜10いずれか1項に記載の光学式ガス検知装置。 - 前記ハウジングの内壁面上に、紫外線の反射層が設けられていることを特徴とする請求項11に記載の光学式ガス検知装置。
- 前記反射層は、白色塗料による塗布層であることを特徴とする請求項12に記載の光学式ガス検知装置。
- 前記反射層は、金属材料によるコーティング層であることを特徴とする請求項12に記載の光学式ガス検知装置。
- 前記反射層の表面に、無機系材料からなり、前記反射層よりも紫外線透過率の高い保護層が設けられていることを特徴とする請求項12〜14いずれか1項に記載の光学式ガス検知装置。
- 前記ハウジング内壁面の表面粗さが、前記紫外線検出素子にて検出される紫外線の検出波長の3倍以下に調整されていることを特徴とする請求項11〜15いずれか1項に記載の光学式ガス検知装置。
- 前記ハウジング内壁面の表面粗さが、前記紫外線検出素子にて検出される紫外線の検出波長以下に調整されていることを特徴とする請求項16に記載の光学式ガス検知装置。
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006051177A JP2007232402A (ja) | 2006-02-27 | 2006-02-27 | 光学式ガス検知装置 |
| US11/640,873 US20070200067A1 (en) | 2006-02-27 | 2006-12-19 | Optical gas-detecting device |
| KR1020070013317A KR100866589B1 (ko) | 2006-02-27 | 2007-02-08 | 광학 가스 검출장치 |
| CNA2007100051944A CN101029865A (zh) | 2006-02-27 | 2007-02-15 | 光学气体检测装置 |
| DE102007008932A DE102007008932A1 (de) | 2006-02-27 | 2007-02-23 | Optische Gaserfassungsvorrichtung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006051177A JP2007232402A (ja) | 2006-02-27 | 2006-02-27 | 光学式ガス検知装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2007232402A true JP2007232402A (ja) | 2007-09-13 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006051177A Pending JP2007232402A (ja) | 2006-02-27 | 2006-02-27 | 光学式ガス検知装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20070200067A1 (ja) |
| JP (1) | JP2007232402A (ja) |
| KR (1) | KR100866589B1 (ja) |
| CN (1) | CN101029865A (ja) |
| DE (1) | DE102007008932A1 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011117884A (ja) * | 2009-12-07 | 2011-06-16 | Hioki Ee Corp | 分光測定器 |
| WO2013047799A1 (ja) * | 2011-09-30 | 2013-04-04 | 国立大学法人豊橋技術科学大学 | 物理・化学センサおよび物理・化学現象センシングデバイスならびにこれらの製造方法 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102235969B (zh) * | 2010-04-21 | 2013-05-01 | 中国科学院微电子研究所 | 多通道滤波阵列mems光谱式气敏传感器 |
| US8003945B1 (en) * | 2010-08-25 | 2011-08-23 | Jacob Y Wong | Intrinsically safe NDIR gas sensor in a can |
| EP2857811B1 (de) * | 2013-10-02 | 2015-09-23 | Sick Ag | Spektrometer zur Gasanalyse |
| CN106442955B (zh) * | 2016-11-09 | 2023-05-16 | 苏州一呼医疗科技有限公司 | 智能呼气分子诊断系统的反射式光学检测装置 |
| CN106596444A (zh) * | 2016-12-08 | 2017-04-26 | 哈尔滨工业大学 | 一种基于紫外宽带吸收光谱的氧气浓度测量系统及测量方法 |
| IT201700035910A1 (it) * | 2017-03-31 | 2018-10-01 | St Microelectronics Srl | Dispositivo optoelettronico per la rilevazione selettiva di composti organici volatili e relativo procedimento di fabbricazione |
| KR102326927B1 (ko) * | 2017-04-28 | 2021-11-16 | 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 | 발광소자 및 이를 이용한 가스 센서 |
| CN112567216A (zh) * | 2018-06-14 | 2021-03-26 | ams国际有限公司 | 用于检测化学物质的集成的传感器模块 |
| KR102059532B1 (ko) | 2019-06-20 | 2019-12-27 | 주식회사 넷 | 공회전 차량 감시 시스템 |
| US20240361235A1 (en) * | 2022-02-09 | 2024-10-31 | Industry-University Cooperation Foundation Hanyang University Erica Campus | Complex gas sensor, manufacturing method thereof, and control method of complex gas sensor |
| KR102623012B1 (ko) * | 2023-10-17 | 2024-01-10 | 한국표준과학연구원 | 복수 채널 가스 검출 장치 및 이의 제조 방법 |
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| JPS6214769B2 (ja) * | 1975-05-16 | 1987-04-03 | Erubin Jitsuku Oputeiku Erekutoroniku | |
| JPH08313438A (ja) * | 1995-05-20 | 1996-11-29 | Horiba Ltd | 流体変調式紫外線ガス分析計 |
| JPH11230899A (ja) * | 1997-11-14 | 1999-08-27 | Ethicon Inc | 過酸化水素蒸気等の濃度測定装置および測定方法 |
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| JP2006053078A (ja) * | 2004-08-12 | 2006-02-23 | Nippon Telegr & Teleph Corp <Ntt> | 光学式検出用微小セルおよびその作製方法 |
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-
2006
- 2006-02-27 JP JP2006051177A patent/JP2007232402A/ja active Pending
- 2006-12-19 US US11/640,873 patent/US20070200067A1/en not_active Abandoned
-
2007
- 2007-02-08 KR KR1020070013317A patent/KR100866589B1/ko not_active Expired - Fee Related
- 2007-02-15 CN CNA2007100051944A patent/CN101029865A/zh active Pending
- 2007-02-23 DE DE102007008932A patent/DE102007008932A1/de not_active Ceased
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6214769B2 (ja) * | 1975-05-16 | 1987-04-03 | Erubin Jitsuku Oputeiku Erekutoroniku | |
| JPS544185A (en) * | 1977-06-10 | 1979-01-12 | Hewlett Packard Yokogawa | Oxygen concentration measuring device |
| JPH08313438A (ja) * | 1995-05-20 | 1996-11-29 | Horiba Ltd | 流体変調式紫外線ガス分析計 |
| JPH11230899A (ja) * | 1997-11-14 | 1999-08-27 | Ethicon Inc | 過酸化水素蒸気等の濃度測定装置および測定方法 |
| JP2004309296A (ja) * | 2003-04-07 | 2004-11-04 | Horiba Ltd | 吸光式分析計 |
| JP2006053078A (ja) * | 2004-08-12 | 2006-02-23 | Nippon Telegr & Teleph Corp <Ntt> | 光学式検出用微小セルおよびその作製方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011117884A (ja) * | 2009-12-07 | 2011-06-16 | Hioki Ee Corp | 分光測定器 |
| WO2013047799A1 (ja) * | 2011-09-30 | 2013-04-04 | 国立大学法人豊橋技術科学大学 | 物理・化学センサおよび物理・化学現象センシングデバイスならびにこれらの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070089052A (ko) | 2007-08-30 |
| CN101029865A (zh) | 2007-09-05 |
| US20070200067A1 (en) | 2007-08-30 |
| KR100866589B1 (ko) | 2008-11-03 |
| DE102007008932A1 (de) | 2007-09-06 |
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