JP2007504678A5 - - Google Patents

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Publication number
JP2007504678A5
JP2007504678A5 JP2006529950A JP2006529950A JP2007504678A5 JP 2007504678 A5 JP2007504678 A5 JP 2007504678A5 JP 2006529950 A JP2006529950 A JP 2006529950A JP 2006529950 A JP2006529950 A JP 2006529950A JP 2007504678 A5 JP2007504678 A5 JP 2007504678A5
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Japan
Prior art keywords
projection
imaging
immersion liquid
photosensitive layer
exposure apparatus
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JP2006529950A
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Japanese (ja)
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JP2007504678A (ja
JP4602336B2 (ja
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Priority claimed from DE10324477A external-priority patent/DE10324477A1/de
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Publication of JP2007504678A publication Critical patent/JP2007504678A/ja
Publication of JP2007504678A5 publication Critical patent/JP2007504678A5/ja
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Publication of JP4602336B2 publication Critical patent/JP4602336B2/ja
Anticipated expiration legal-status Critical
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JP2006529950A 2003-05-30 2004-05-28 マイクロリソグラフィ用投影露光システム Expired - Fee Related JP4602336B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10324477A DE10324477A1 (de) 2003-05-30 2003-05-30 Mikrolithographische Projektionsbelichtungsanlage
PCT/EP2004/005816 WO2004107048A2 (de) 2003-05-30 2004-05-28 Mikrolithographische projektionsbelichtungsanlage

Publications (3)

Publication Number Publication Date
JP2007504678A JP2007504678A (ja) 2007-03-01
JP2007504678A5 true JP2007504678A5 (2) 2007-07-19
JP4602336B2 JP4602336B2 (ja) 2010-12-22

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JP2006529950A Expired - Fee Related JP4602336B2 (ja) 2003-05-30 2004-05-28 マイクロリソグラフィ用投影露光システム

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US (5) US7532306B2 (2)
JP (1) JP4602336B2 (2)
KR (1) KR101050287B1 (2)
DE (1) DE10324477A1 (2)
WO (1) WO2004107048A2 (2)

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