JP2014055802A - 膜厚測定装置および膜厚測定方法 - Google Patents

膜厚測定装置および膜厚測定方法 Download PDF

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Publication number
JP2014055802A
JP2014055802A JP2012199683A JP2012199683A JP2014055802A JP 2014055802 A JP2014055802 A JP 2014055802A JP 2012199683 A JP2012199683 A JP 2012199683A JP 2012199683 A JP2012199683 A JP 2012199683A JP 2014055802 A JP2014055802 A JP 2014055802A
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JP
Japan
Prior art keywords
head
measurement
measuring
height direction
product substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012199683A
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English (en)
Japanese (ja)
Inventor
Hidekazu Sakagami
英和 坂上
Tokumi Harada
徳実 原田
Chiaki Yamawaki
千明 山脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
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Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP2012199683A priority Critical patent/JP2014055802A/ja
Priority to PCT/JP2013/072582 priority patent/WO2014041990A1/fr
Publication of JP2014055802A publication Critical patent/JP2014055802A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP2012199683A 2012-09-11 2012-09-11 膜厚測定装置および膜厚測定方法 Pending JP2014055802A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012199683A JP2014055802A (ja) 2012-09-11 2012-09-11 膜厚測定装置および膜厚測定方法
PCT/JP2013/072582 WO2014041990A1 (fr) 2012-09-11 2013-08-23 Dispositif de mesure d'épaisseur de film et procédé de mesure d'épaisseur de film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012199683A JP2014055802A (ja) 2012-09-11 2012-09-11 膜厚測定装置および膜厚測定方法

Publications (1)

Publication Number Publication Date
JP2014055802A true JP2014055802A (ja) 2014-03-27

Family

ID=50278112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012199683A Pending JP2014055802A (ja) 2012-09-11 2012-09-11 膜厚測定装置および膜厚測定方法

Country Status (2)

Country Link
JP (1) JP2014055802A (fr)
WO (1) WO2014041990A1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2594578B2 (ja) * 1987-10-23 1997-03-26 ファナック株式会社 非接触ならい制御装置
JP2004017198A (ja) * 2002-06-14 2004-01-22 Mitsutoyo Corp パートプログラム生成装置、パートプログラム生成方法及びパートプログラム生成用プログラム
IL180482A0 (en) * 2007-01-01 2007-06-03 Jordan Valley Semiconductors Inspection of small features using x - ray fluorescence
WO2009093341A1 (fr) * 2008-01-21 2009-07-30 Toppan Printing Co., Ltd. Procédé et appareil de recherche
JP2009288016A (ja) * 2008-05-28 2009-12-10 National Institute Of Advanced Industrial & Technology 蛍光ｘ線分析装置及びそれを用いた半導体装置の評価システム

Also Published As

Publication number Publication date
WO2014041990A1 (fr) 2014-03-20

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