JP2015146043A5 - - Google Patents
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- Publication number
- JP2015146043A5 JP2015146043A5 JP2015092710A JP2015092710A JP2015146043A5 JP 2015146043 A5 JP2015146043 A5 JP 2015146043A5 JP 2015092710 A JP2015092710 A JP 2015092710A JP 2015092710 A JP2015092710 A JP 2015092710A JP 2015146043 A5 JP2015146043 A5 JP 2015146043A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- exposure
- substrate
- optical system
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 69
- 239000000758 substrate Substances 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 30
- 238000007654 immersion Methods 0.000 claims description 26
- 239000000126 substance Substances 0.000 claims description 17
- 238000001459 lithography Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 4
- 238000005259 measurement Methods 0.000 claims 3
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 2
- 239000001569 carbon dioxide Substances 0.000 claims 2
- 230000006866 deterioration Effects 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 238000002834 transmittance Methods 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015092710A JP6249179B2 (ja) | 2005-04-25 | 2015-04-30 | 露光方法及び露光装置、並びにデバイス製造方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005127025 | 2005-04-25 | ||
| JP2005127025 | 2005-04-25 | ||
| JP2005238373 | 2005-08-19 | ||
| JP2005238373 | 2005-08-19 | ||
| JP2015092710A JP6249179B2 (ja) | 2005-04-25 | 2015-04-30 | 露光方法及び露光装置、並びにデバイス製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013257558A Division JP5831825B2 (ja) | 2005-04-25 | 2013-12-13 | 露光装置及び液体供給方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015146043A JP2015146043A (ja) | 2015-08-13 |
| JP2015146043A5 true JP2015146043A5 (2) | 2016-06-23 |
| JP6249179B2 JP6249179B2 (ja) | 2017-12-20 |
Family
ID=37214802
Family Applications (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007514659A Expired - Fee Related JP5125505B2 (ja) | 2005-04-25 | 2006-04-21 | 露光方法及び露光装置、並びにデバイス製造方法 |
| JP2010173281A Expired - Fee Related JP5594646B2 (ja) | 2005-04-25 | 2010-08-02 | 露光装置及び露光装置の制御方法 |
| JP2012079177A Expired - Fee Related JP5594653B2 (ja) | 2005-04-25 | 2012-03-30 | 露光方法及び露光装置 |
| JP2013257558A Expired - Fee Related JP5831825B2 (ja) | 2005-04-25 | 2013-12-13 | 露光装置及び液体供給方法 |
| JP2015092710A Expired - Fee Related JP6249179B2 (ja) | 2005-04-25 | 2015-04-30 | 露光方法及び露光装置、並びにデバイス製造方法 |
Family Applications Before (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007514659A Expired - Fee Related JP5125505B2 (ja) | 2005-04-25 | 2006-04-21 | 露光方法及び露光装置、並びにデバイス製造方法 |
| JP2010173281A Expired - Fee Related JP5594646B2 (ja) | 2005-04-25 | 2010-08-02 | 露光装置及び露光装置の制御方法 |
| JP2012079177A Expired - Fee Related JP5594653B2 (ja) | 2005-04-25 | 2012-03-30 | 露光方法及び露光装置 |
| JP2013257558A Expired - Fee Related JP5831825B2 (ja) | 2005-04-25 | 2013-12-13 | 露光装置及び液体供給方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US8064039B2 (2) |
| EP (1) | EP1876635A4 (2) |
| JP (5) | JP5125505B2 (2) |
| KR (3) | KR101466533B1 (2) |
| WO (1) | WO2006115186A1 (2) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI409853B (zh) * | 2003-06-13 | 2013-09-21 | 尼康股份有限公司 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
| JP4295712B2 (ja) * | 2003-11-14 | 2009-07-15 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置及び装置製造方法 |
| KR101466533B1 (ko) * | 2005-04-25 | 2014-11-27 | 가부시키가이샤 니콘 | 노광 방법, 노광 장치 및 액체 공급 방법 |
| US20070085989A1 (en) * | 2005-06-21 | 2007-04-19 | Nikon Corporation | Exposure apparatus and exposure method, maintenance method, and device manufacturing method |
| JP2008042004A (ja) * | 2006-08-08 | 2008-02-21 | Tokyo Electron Ltd | パターン形成方法およびパターン形成装置 |
| NL1036009A1 (nl) * | 2007-10-05 | 2009-04-07 | Asml Netherlands Bv | An Immersion Lithography Apparatus. |
| US8451425B2 (en) * | 2007-12-28 | 2013-05-28 | Nikon Corporation | Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method |
| WO2010103822A1 (ja) * | 2009-03-10 | 2010-09-16 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
| NL2004242A (en) | 2009-04-13 | 2010-10-14 | Asml Netherlands Bv | Detector module, cooling arrangement and lithographic apparatus comprising a detector module. |
| NL2004322A (en) * | 2009-04-13 | 2010-10-14 | Asml Netherlands Bv | Cooling device, cooling arrangement and lithographic apparatus comprising a cooling arrangement. |
| WO2011155529A1 (ja) * | 2010-06-10 | 2011-12-15 | 株式会社ニコン | 計測部材、ステージ装置、露光装置、露光方法、及びデバイス製造方法 |
| NL2009899A (en) * | 2011-12-20 | 2013-06-24 | Asml Netherlands Bv | A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method. |
| CN106873312B (zh) * | 2012-05-22 | 2019-09-06 | Asml荷兰有限公司 | 传感器、光刻设备以及器件制造方法 |
| JP6206945B2 (ja) * | 2013-03-07 | 2017-10-04 | 株式会社ブイ・テクノロジー | 走査露光装置及び走査露光方法 |
| US10060475B2 (en) * | 2014-12-24 | 2018-08-28 | Teradyne, Inc. | Braking system |
| JP6070784B2 (ja) * | 2015-07-14 | 2017-02-01 | 株式会社ニコン | 液体供給装置、露光装置、液体供給方法、及びデバイス製造方法 |
| WO2019073718A1 (ja) * | 2017-10-13 | 2019-04-18 | 富士フイルム株式会社 | 透過フィルター及び液浸露光装置 |
| US10652441B1 (en) * | 2019-05-10 | 2020-05-12 | The Boeing Company | Systems and methods for protecting imaging devices against high-radiant-flux light |
| US12242204B2 (en) * | 2019-11-14 | 2025-03-04 | Asml Netherlands B.V. | Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate |
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| US4346164A (en) | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
| JPS57117238A (en) | 1981-01-14 | 1982-07-21 | Nippon Kogaku Kk <Nikon> | Exposing and baking device for manufacturing integrated circuit with illuminometer |
| JPS57153433A (en) | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
| JPS58202448A (ja) | 1982-05-21 | 1983-11-25 | Hitachi Ltd | 露光装置 |
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| DD221563A1 (de) | 1983-09-14 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur |
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| US5175124A (en) * | 1991-03-25 | 1992-12-29 | Motorola, Inc. | Process for fabricating a semiconductor device using re-ionized rinse water |
| JPH04305915A (ja) | 1991-04-02 | 1992-10-28 | Nikon Corp | 密着型露光装置 |
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| JPH0562877A (ja) | 1991-09-02 | 1993-03-12 | Yasuko Shinohara | 光によるｌｓｉ製造縮小投影露光装置の光学系 |
| JPH06124873A (ja) | 1992-10-09 | 1994-05-06 | Canon Inc | 液浸式投影露光装置 |
| JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
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| JP2001188356A (ja) * | 1999-12-28 | 2001-07-10 | Asahi Kasei Corp | 感光性エラストマー組成物の現像剤及びそれを用いた製版方法 |
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| KR20180089562A (ko) | 2003-04-10 | 2018-08-08 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템 |
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| KR101162128B1 (ko) * | 2004-06-09 | 2012-07-03 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| JP2006019585A (ja) * | 2004-07-02 | 2006-01-19 | Advanced Lcd Technologies Development Center Co Ltd | 露光装置およびその方法ならびに基板処理装置 |
| JP4551704B2 (ja) * | 2004-07-08 | 2010-09-29 | 富士フイルム株式会社 | 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法 |
| JP2006024819A (ja) * | 2004-07-09 | 2006-01-26 | Renesas Technology Corp | 液浸露光装置、及び電子デバイスの製造方法 |
| US7026441B2 (en) * | 2004-08-12 | 2006-04-11 | Intel Corporation | Thermoresponsive sensor comprising a polymer solution |
| US7041989B1 (en) * | 2004-10-22 | 2006-05-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7623218B2 (en) * | 2004-11-24 | 2009-11-24 | Carl Zeiss Smt Ag | Method of manufacturing a miniaturized device |
| JP2006173340A (ja) * | 2004-12-15 | 2006-06-29 | Jsr Corp | 露光装置、及び露光方法 |
| US7528931B2 (en) * | 2004-12-20 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4488890B2 (ja) | 2004-12-27 | 2010-06-23 | 株式会社東芝 | レジストパターン形成方法及び半導体装置の製造方法 |
| US7450217B2 (en) * | 2005-01-12 | 2008-11-11 | Asml Netherlands B.V. | Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| JP5162254B2 (ja) | 2005-02-10 | 2013-03-13 | エーエスエムエル ネザーランズ ビー．ブイ． | 液浸リソグラフィシステム及びデバイス製造方法 |
| CN100425330C (zh) * | 2005-03-31 | 2008-10-15 | 鸿富锦精密工业（深圳）有限公司 | 光催化增强装置 |
| KR101466533B1 (ko) * | 2005-04-25 | 2014-11-27 | 가부시키가이샤 니콘 | 노광 방법, 노광 장치 및 액체 공급 방법 |
| US7420188B2 (en) * | 2005-10-14 | 2008-09-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Exposure method and apparatus for immersion lithography |
-
2006
- 2006-04-21 KR KR1020137021972A patent/KR101466533B1/ko not_active Expired - Fee Related
- 2006-04-21 KR KR1020137000873A patent/KR101344142B1/ko not_active Expired - Fee Related
- 2006-04-21 WO PCT/JP2006/308385 patent/WO2006115186A1/ja not_active Ceased
- 2006-04-21 JP JP2007514659A patent/JP5125505B2/ja not_active Expired - Fee Related
- 2006-04-21 KR KR1020077002004A patent/KR101396620B1/ko not_active Expired - Fee Related
- 2006-04-21 EP EP06732193A patent/EP1876635A4/en not_active Withdrawn
- 2006-12-19 US US11/640,842 patent/US8064039B2/en not_active Expired - Fee Related
-
2010
- 2010-08-02 JP JP2010173281A patent/JP5594646B2/ja not_active Expired - Fee Related
-
2011
- 2011-10-12 US US13/317,169 patent/US9335639B2/en not_active Expired - Fee Related
-
2012
- 2012-03-30 JP JP2012079177A patent/JP5594653B2/ja not_active Expired - Fee Related
-
2013
- 2013-12-13 JP JP2013257558A patent/JP5831825B2/ja not_active Expired - Fee Related
-
2015
- 2015-04-30 JP JP2015092710A patent/JP6249179B2/ja not_active Expired - Fee Related
-
2016
- 2016-05-03 US US15/145,561 patent/US9618854B2/en not_active Expired - Fee Related
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