|
US1538246A
(en)
|
1923-08-14 |
1925-05-19 |
Western Electric Co |
Metallic composition
|
|
US1627961A
(en)
|
1926-07-23 |
1927-05-10 |
John W Farley |
Plate thimble for pipes
|
|
US2164924A
(en)
|
1937-06-11 |
1939-07-04 |
Du Pont |
Electroplating
|
|
US2987068A
(en)
*
|
1956-05-01 |
1961-06-06 |
Branson Instr |
Apparatus for ultrasonic cleaning
|
|
US3033710A
(en)
*
|
1957-03-12 |
1962-05-08 |
Branson Instr |
Method of surface cleaning using ultrasonic energy
|
|
US4069541A
(en)
|
1976-04-23 |
1978-01-24 |
U.S. Floor Systems, Inc. |
Cleaning method and apparatus
|
|
US4595419A
(en)
|
1982-12-27 |
1986-06-17 |
Proto-Power Corporation |
Ultrasonic decontamination robot
|
|
US4461651A
(en)
*
|
1983-02-08 |
1984-07-24 |
Foster Wheeler Limited |
Sonic cleaning device and method
|
|
US4768256A
(en)
|
1986-11-07 |
1988-09-06 |
Motoda Electronics Co., Ltd. |
Ultrasonic wiper
|
|
US4890567A
(en)
|
1987-12-01 |
1990-01-02 |
Caduff Edward A |
Robotic ultrasonic cleaning and spraying device for ships' hulls
|
|
DE69117127T2
(de)
|
1990-10-11 |
1996-11-07 |
Toda Koji |
Ultraschall-Zerstäuber
|
|
JPH05269449A
(ja)
*
|
1992-03-03 |
1993-10-19 |
Nec Corp |
超音波洗浄方法
|
|
JPH0679245A
(ja)
*
|
1992-09-01 |
1994-03-22 |
Ratsupu Master S F T Kk |
超音波洗浄装置及びその洗浄方法
|
|
JPH06262149A
(ja)
*
|
1993-03-15 |
1994-09-20 |
Satako Eng:Kk |
集束超音波によるクリーニング方法
|
|
JP2505143B2
(ja)
*
|
1993-08-31 |
1996-06-05 |
株式会社サタコエンジニヤリング |
集束超音波発生装置
|
|
US5531861A
(en)
|
1993-09-29 |
1996-07-02 |
Motorola, Inc. |
Chemical-mechanical-polishing pad cleaning process for use during the fabrication of semiconductor devices
|
|
US5534076A
(en)
*
|
1994-10-03 |
1996-07-09 |
Verteg, Inc. |
Megasonic cleaning system
|
|
DE19629705A1
(de)
|
1996-07-24 |
1998-01-29 |
Joachim Dr Scheerer |
Verfahren und Vorrichtung zur Reinigung von scheibenförmigen Gegenständen, insbesondere Wafern, mit Ultraschall und Wasser als Spülmedium
|
|
US6039059A
(en)
|
1996-09-30 |
2000-03-21 |
Verteq, Inc. |
Wafer cleaning system
|
|
DE19647482A1
(de)
*
|
1996-11-16 |
1998-06-18 |
Fidor Vermoegensverwaltung Gmb |
Ultraschall-Reinigungsvorrichtung
|
|
US6247525B1
(en)
|
1997-03-20 |
2001-06-19 |
Georgia Tech Research Corporation |
Vibration induced atomizers
|
|
JPH1187288A
(ja)
*
|
1997-09-05 |
1999-03-30 |
Advanced Display:Kk |
基板洗浄方法および該洗浄方法に用いられる洗浄装置
|
|
EP0976563A1
(en)
|
1998-07-31 |
2000-02-02 |
Eastman Kodak Company |
Non-contact ultrasonic cleaning of ink jet printhead cartridges
|
|
US6186004B1
(en)
|
1999-05-27 |
2001-02-13 |
The Regents Of The University Of California |
Apparatus and method for remote, noninvasive characterization of structures and fluids inside containers
|
|
US6662812B1
(en)
*
|
1999-07-24 |
2003-12-16 |
Allen David Hertz |
Method for acoustic and vibrational energy for assisted drying of solder stencils and electronic modules
|
|
US20050195985A1
(en)
|
1999-10-29 |
2005-09-08 |
American Technology Corporation |
Focused parametric array
|
|
DE60026160T2
(de)
|
1999-11-16 |
2006-11-16 |
The Procter & Gamble Company, Cincinnati |
Reinigungsverfahren welches ultraschallwellen verwendet
|
|
JP2002045807A
(ja)
|
2000-07-31 |
2002-02-12 |
Optrex Corp |
基板洗浄方法およびその装置
|
|
EP1216642A1
(en)
|
2000-12-22 |
2002-06-26 |
Nilfisk-Advance A/S |
A cleaning head for a surface cleaning apparatus
|
|
US6810807B2
(en)
|
2001-03-12 |
2004-11-02 |
Agfa Corporation |
Method and apparatus for cleaning coating materials from a substrate
|
|
US7306002B2
(en)
*
|
2003-01-04 |
2007-12-11 |
Yong Bae Kim |
System and method for wet cleaning a semiconductor wafer
|
|
US7238085B2
(en)
*
|
2003-06-06 |
2007-07-03 |
P.C.T. Systems, Inc. |
Method and apparatus to process substrates with megasonic energy
|
|
KR101364137B1
(ko)
*
|
2003-06-24 |
2014-02-17 |
램 리서치 아게 |
디스크상 기판의 습식처리 장치 및 방법
|
|
CA2563297A1
(en)
|
2004-04-05 |
2005-10-20 |
Electrolux Home Care Products, Ltd. |
Apparatus and method for cleaning surfaces
|
|
US20060027248A1
(en)
*
|
2004-08-09 |
2006-02-09 |
Applied Materials, Inc. |
Megasonic cleaning with minimized interference
|
|
JP2006262149A
(ja)
|
2005-03-17 |
2006-09-28 |
Hitachi Medical Corp |
超音波探触子及び超音波診断装置
|
|
JP2007165661A
(ja)
*
|
2005-12-14 |
2007-06-28 |
Dainippon Screen Mfg Co Ltd |
基板処理装置および基板処理方法
|
|
US7784478B2
(en)
|
2006-01-20 |
2010-08-31 |
Akrion Systems Llc |
Acoustic energy system, method and apparatus for processing flat articles
|
|
UA95486C2
(uk)
|
2006-07-07 |
2011-08-10 |
Форс Текнолоджи |
Спосіб та система для поліпшеного застосування високоінтенсивних акустичних хвиль
|
|
JP2008066401A
(ja)
*
|
2006-09-05 |
2008-03-21 |
Dainippon Screen Mfg Co Ltd |
基板処理装置および基板処理方法
|
|
KR100852396B1
(ko)
*
|
2006-10-20 |
2008-08-14 |
한국기계연구원 |
초음파를 이용한 세정장치
|
|
KR100800174B1
(ko)
*
|
2006-10-20 |
2008-02-01 |
한국기계연구원 |
메가소닉 세정모듈
|
|
US8327861B2
(en)
|
2006-12-19 |
2012-12-11 |
Lam Research Corporation |
Megasonic precision cleaning of semiconductor process equipment components and parts
|
|
TWI421933B
(zh)
*
|
2007-05-16 |
2014-01-01 |
蘭研究公司 |
板狀物件之超音波濕式處理的裝置與方法
|
|
JP5127036B2
(ja)
*
|
2007-10-15 |
2013-01-23 |
株式会社サワーコーポレーション |
超音波洗浄装置
|
|
JP2009130287A
(ja)
*
|
2007-11-27 |
2009-06-11 |
Toshiba Corp |
半導体装置の製造装置及び半導体装置の製造方法
|
|
CN102076435B
(zh)
|
2008-05-08 |
2015-07-22 |
卡维特斯私人有限公司 |
用于超声波清洗的方法和装置
|
|
US8217554B2
(en)
|
2008-05-28 |
2012-07-10 |
Fbs, Inc. |
Ultrasonic vibration system and method for removing/avoiding unwanted build-up on structures
|
|
US8585825B2
(en)
|
2008-10-30 |
2013-11-19 |
Lam Research Corporation |
Acoustic assisted single wafer wet clean for semiconductor wafer process
|
|
US20100258142A1
(en)
*
|
2009-04-14 |
2010-10-14 |
Mark Naoshi Kawaguchi |
Apparatus and method for using a viscoelastic cleaning material to remove particles on a substrate
|
|
US8828145B2
(en)
*
|
2009-03-10 |
2014-09-09 |
Lam Research Corporation |
Method of particle contaminant removal
|
|
DE102010028883A1
(de)
|
2010-05-11 |
2011-11-17 |
Dürr Ecoclean GmbH |
Prozessbehälter
|
|
GB201100290D0
(en)
|
2011-01-10 |
2011-02-23 |
Trevett David R M |
Clearing precipitation from windaows
|
|
JP5183777B2
(ja)
|
2011-07-12 |
2013-04-17 |
株式会社カイジョー |
超音波洗浄装置及び超音波洗浄方法
|
|
US8790467B2
(en)
|
2011-10-27 |
2014-07-29 |
The Boeing Company |
Vacuum steam cleaning apparatus and method
|
|
US9393579B2
(en)
|
2012-10-03 |
2016-07-19 |
The Boeing Company |
Cleaning apparatus and method of cleaning a contaminated surface
|
|
US20140096794A1
(en)
|
2012-10-04 |
2014-04-10 |
The Boeing Company |
Methods for Cleaning a Contaminated Surface
|
|
US9657570B2
(en)
*
|
2013-03-11 |
2017-05-23 |
United Technologies Corporation |
Pulse jet liquid gas cleaning system
|
|
US9192278B2
(en)
*
|
2013-09-30 |
2015-11-24 |
Elwha Llc |
Self-cleaning substrate
|
|
US10343193B2
(en)
|
2014-02-24 |
2019-07-09 |
The Boeing Company |
System and method for surface cleaning
|