JP3812015B2 - 露光装置、位置検出装置 - Google Patents

露光装置、位置検出装置 Download PDF

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Publication number
JP3812015B2
JP3812015B2 JP30111496A JP30111496A JP3812015B2 JP 3812015 B2 JP3812015 B2 JP 3812015B2 JP 30111496 A JP30111496 A JP 30111496A JP 30111496 A JP30111496 A JP 30111496A JP 3812015 B2 JP3812015 B2 JP 3812015B2
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Japan
Prior art keywords
light
photosensitive substrate
optical system
light receiving
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP30111496A
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English (en)
Japanese (ja)
Other versions
JPH10135117A5 (2
JPH10135117A (ja
Inventor
正洋 根井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP30111496A priority Critical patent/JP3812015B2/ja
Publication of JPH10135117A publication Critical patent/JPH10135117A/ja
Publication of JPH10135117A5 publication Critical patent/JPH10135117A5/ja
Application granted granted Critical
Publication of JP3812015B2 publication Critical patent/JP3812015B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP30111496A 1996-10-25 1996-10-25 露光装置、位置検出装置 Expired - Fee Related JP3812015B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30111496A JP3812015B2 (ja) 1996-10-25 1996-10-25 露光装置、位置検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30111496A JP3812015B2 (ja) 1996-10-25 1996-10-25 露光装置、位置検出装置

Publications (3)

Publication Number Publication Date
JPH10135117A JPH10135117A (ja) 1998-05-22
JPH10135117A5 JPH10135117A5 (2) 2004-10-21
JP3812015B2 true JP3812015B2 (ja) 2006-08-23

Family

ID=17893014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30111496A Expired - Fee Related JP3812015B2 (ja) 1996-10-25 1996-10-25 露光装置、位置検出装置

Country Status (1)

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JP (1) JP3812015B2 (2)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008030664A1 (de) * 2008-07-01 2010-01-21 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit Bestimmung von Abbildungsfehlern
JP5346985B2 (ja) 2011-05-10 2013-11-20 キヤノン株式会社 計測装置、露光装置、デバイスの製造方法及び計測方法

Also Published As

Publication number Publication date
JPH10135117A (ja) 1998-05-22

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