JP3992737B2 - 物理化学的汚染に対する物体保護用保存箱 - Google Patents

物理化学的汚染に対する物体保護用保存箱 Download PDF

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Publication number
JP3992737B2
JP3992737B2 JP51944397A JP51944397A JP3992737B2 JP 3992737 B2 JP3992737 B2 JP 3992737B2 JP 51944397 A JP51944397 A JP 51944397A JP 51944397 A JP51944397 A JP 51944397A JP 3992737 B2 JP3992737 B2 JP 3992737B2
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Japan
Prior art keywords
storage box
box
protective layer
contamination
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP51944397A
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English (en)
Japanese (ja)
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JPH10513313A (ja
Inventor
スピネリ，フィリップ
ドシュ，クロード
ロステン，ジャン−クリストフ
コレ，フランソワ
スィルヴァン スコット，ダポロニア
Original Assignee
コミツサリア タ レネルジー アトミーク
レール リキッド
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Publication of JPH10513313A publication Critical patent/JPH10513313A/ja
Application granted granted Critical
Publication of JP3992737B2 publication Critical patent/JP3992737B2/ja
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Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1902—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers specially adapted for a single substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1911—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by materials, roughness, coatings or the like
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/1379—Contains vapor or gas barrier, polymer derived from vinyl chloride or vinylidene chloride, or polymer containing a vinyl alcohol unit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/1379—Contains vapor or gas barrier, polymer derived from vinyl chloride or vinylidene chloride, or polymer containing a vinyl alcohol unit
    • Y10T428/1383—Vapor or gas barrier, polymer derived from vinyl chloride or vinylidene chloride, or polymer containing a vinyl alcohol unit is sandwiched between layers [continuous layer]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Packaging Frangible Articles (AREA)
  • Packages (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP51944397A 1995-11-20 1996-11-19 物理化学的汚染に対する物体保護用保存箱 Expired - Fee Related JP3992737B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9513720A FR2741328B1 (fr) 1995-11-20 1995-11-20 Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique
FR95/13720 1995-11-20
PCT/FR1996/001828 WO1997019464A1 (fr) 1995-11-20 1996-11-19 Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique

Publications (2)

Publication Number Publication Date
JPH10513313A JPH10513313A (ja) 1998-12-15
JP3992737B2 true JP3992737B2 (ja) 2007-10-17

Family

ID=9484721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51944397A Expired - Fee Related JP3992737B2 (ja) 1995-11-20 1996-11-19 物理化学的汚染に対する物体保護用保存箱

Country Status (8)

Country Link
US (1) US6214425B1 (fr)
EP (1) EP0804801B1 (fr)
JP (1) JP3992737B2 (fr)
KR (1) KR100452927B1 (fr)
AT (1) ATE232014T1 (fr)
DE (1) DE69626004T2 (fr)
FR (1) FR2741328B1 (fr)
WO (1) WO1997019464A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10054161C2 (de) * 2000-11-02 2003-05-28 Wacker Siltronic Halbleitermat Verpackung für Halbleiterscheiben und Verfahren zu ihrer Herstellung
JP2003107627A (ja) * 2001-09-26 2003-04-09 Fuji Photo Film Co Ltd 熱現像感光材料、及びその製造方法
US6825051B2 (en) * 2002-05-17 2004-11-30 Asm America, Inc. Plasma etch resistant coating and process
US6974781B2 (en) * 2003-10-20 2005-12-13 Asm International N.V. Reactor precoating for reduced stress and uniform CVD
FR2869451B1 (fr) * 2004-04-21 2006-07-21 Alcatel Sa Enveloppe de transport a protection par effet thermophorese
FR2869452B1 (fr) * 2004-04-21 2006-09-08 Alcatel Sa Dispositif pour le transport de substrats sous atmosphere controlee
JP2006001647A (ja) * 2004-05-18 2006-01-05 Sumitomo Electric Ind Ltd 容器、包装体、容器の製造方法、包装体の製造方法および化合物半導体基板
CN205854798U (zh) * 2016-08-05 2017-01-04 京东方科技集团股份有限公司 一种托盘及显示面板的包装装置
KR102080706B1 (ko) * 2017-11-24 2020-02-24 주성엔지니어링(주) 기판 이송용 트레이 및 그 제조방법
TWI757132B (zh) * 2021-03-26 2022-03-01 迅得機械股份有限公司 半導體物件容器儲存裝置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059928B2 (ja) * 1980-09-08 1985-12-27 信越化学工業株式会社 塩化ビニル系樹脂成形品の表面処理方法
DE3584188D1 (de) * 1984-05-11 1991-10-31 Terumo Corp Verfahren zur herstellung eines behaelters aus syntetischem harz.
JP2573480B2 (ja) * 1985-11-22 1997-01-22 東芝セラミックス 株式会社 半導体熱処理用治具
JP2700316B2 (ja) * 1987-06-10 1998-01-21 三菱電機株式会社 有機物質表面の改質方法
FR2631346B1 (fr) * 1988-05-11 1994-05-20 Air Liquide Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications
FR2673633B1 (fr) * 1991-03-06 1993-06-11 Air Liquide Revetement multicouche pour substrat polycarbonate.
FR2677773B1 (fr) * 1991-06-12 1994-04-29 Air Liquide Procede d'elaboration d'une structure optique et structure optique ainsi realisee.
US5255783A (en) * 1991-12-20 1993-10-26 Fluoroware, Inc. Evacuated wafer container
FR2697000B1 (fr) * 1992-10-16 1994-11-25 Commissariat Energie Atomique Boîte plate de confinement d'un objet plat sous atmosphère spéciale.

Also Published As

Publication number Publication date
US6214425B1 (en) 2001-04-10
DE69626004D1 (de) 2003-03-06
JPH10513313A (ja) 1998-12-15
DE69626004T2 (de) 2003-11-06
KR100452927B1 (ko) 2005-01-05
KR19980701533A (ko) 1998-05-15
EP0804801A1 (fr) 1997-11-05
ATE232014T1 (de) 2003-02-15
FR2741328B1 (fr) 1997-12-19
EP0804801B1 (fr) 2003-01-29
WO1997019464A1 (fr) 1997-05-29
FR2741328A1 (fr) 1997-05-23

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