JP4092753B2 - 走査型露光装置及び走査露光方法 - Google Patents

走査型露光装置及び走査露光方法 Download PDF

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Publication number: JP4092753B2
Authority: JP; Japan
Prior art keywords: scanning; projection optical; substrate; optical system; pattern
Prior art date: 1997-10-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP30938497A

Other languages

English (en)

Japanese (ja)

Other versions

JPH11125912A (ja

JPH11125912A5 (2

Inventor

雅一村上

正紀加藤

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-10-22

Filing date

1997-10-22

Publication date

2008-05-28

1997-10-22 Application filed by Nikon Corp filed Critical Nikon Corp

1997-10-22 Priority to JP30938497A priority Critical patent/JP4092753B2/ja

1999-05-11 Publication of JPH11125912A publication Critical patent/JPH11125912A/ja

2005-10-27 Publication of JPH11125912A5 publication Critical patent/JPH11125912A5/ja

2008-05-28 Application granted granted Critical

2008-05-28 Publication of JP4092753B2 publication Critical patent/JP4092753B2/ja

2017-10-22 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

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Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

JP30938497A 1997-10-22 1997-10-22 走査型露光装置及び走査露光方法 Expired - Lifetime JP4092753B2 (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP30938497A JP4092753B2 (ja)	1997-10-22	1997-10-22	走査型露光装置及び走査露光方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP30938497A JP4092753B2 (ja)	1997-10-22	1997-10-22	走査型露光装置及び走査露光方法

Publications (3)

Publication Number	Publication Date
JPH11125912A JPH11125912A (ja)	1999-05-11
JPH11125912A5 JPH11125912A5 (2)	2005-10-27
JP4092753B2 true JP4092753B2 (ja)	2008-05-28

Family

ID=17992366

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP30938497A Expired - Lifetime JP4092753B2 (ja)	1997-10-22	1997-10-22	走査型露光装置及び走査露光方法

Country Status (1)

Country	Link
JP (1)	JP4092753B2 (2)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6873400B2 (en)	2000-02-02	2005-03-29	Nikon Corporation	Scanning exposure method and system
JP4617616B2 (ja) *	2001-07-11	2011-01-26	株式会社ニコン	露光装置及び露光方法
KR100564216B1 (ko) *	2003-10-11	2006-03-28	엘지.필립스 엘시디 주식회사	액정표시장치용 노광장치 및 그것을 사용한 노광방법
JP4773160B2 (ja) *	2005-08-24	2011-09-14	株式会社ブイ・テクノロジー	露光装置
US7518705B2 (en) *	2006-09-14	2009-04-14	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
JP5825470B2 (ja) *	2011-05-16	2015-12-02	株式会社ブイ・テクノロジー	露光装置及び遮光板

1997
- 1997-10-22 JP JP30938497A patent/JP4092753B2/ja not_active Expired - Lifetime

Also Published As

Publication number	Publication date
JPH11125912A (ja)	1999-05-11

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