JPH11265848A5 - - Google Patents

Info

Publication number
JPH11265848A5
JPH11265848A5 JP1998362248A JP36224898A JPH11265848A5 JP H11265848 A5 JPH11265848 A5 JP H11265848A5 JP 1998362248 A JP1998362248 A JP 1998362248A JP 36224898 A JP36224898 A JP 36224898A JP H11265848 A5 JPH11265848 A5 JP H11265848A5
Authority
JP
Japan
Prior art keywords
exposure apparatus
projection exposure
reticle
objective lenses
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998362248A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11265848A (ja
Filing date
Publication date
Priority claimed from DE19757074A external-priority patent/DE19757074A1/de
Application filed filed Critical
Publication of JPH11265848A publication Critical patent/JPH11265848A/ja
Publication of JPH11265848A5 publication Critical patent/JPH11265848A5/ja
Pending legal-status Critical Current

Links

JP10362248A 1997-12-20 1998-12-21 投影露光装置及び露光方法 Pending JPH11265848A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19757074.7 1997-12-20
DE19757074A DE19757074A1 (de) 1997-12-20 1997-12-20 Projektionsbelichtungsanlage und Belichtungsverfahren

Publications (2)

Publication Number Publication Date
JPH11265848A JPH11265848A (ja) 1999-09-28
JPH11265848A5 true JPH11265848A5 (2) 2006-02-16

Family

ID=7852873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10362248A Pending JPH11265848A (ja) 1997-12-20 1998-12-21 投影露光装置及び露光方法

Country Status (6)

Country Link
US (1) US6512573B2 (2)
EP (1) EP0926556A3 (2)
JP (1) JPH11265848A (2)
KR (1) KR100588005B1 (2)
DE (1) DE19757074A1 (2)
TW (1) TW512257B (2)

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TWI432914B (zh) * 2007-01-04 2014-04-01 尼康股份有限公司 投影光學裝置、投影曝光裝置、曝光方法、以及元件製造方法
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
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US8917378B2 (en) 2007-12-20 2014-12-23 Nikon Corporation Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area
JP5470707B2 (ja) 2008-01-17 2014-04-16 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP5335397B2 (ja) * 2008-02-15 2013-11-06 キヤノン株式会社 露光装置
US8253923B1 (en) 2008-09-23 2012-08-28 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US9405203B2 (en) 2008-09-23 2016-08-02 Applied Materials, Inc. Pixel blending for multiple charged-particle beam lithography
US8670106B2 (en) 2008-09-23 2014-03-11 Pinebrook Imaging, Inc. Optical imaging writer system
US9025136B2 (en) * 2008-09-23 2015-05-05 Applied Materials, Inc. System and method for manufacturing three dimensional integrated circuits
US9507271B1 (en) * 2008-12-17 2016-11-29 Applied Materials, Inc. System and method for manufacturing multiple light emitting diodes in parallel
JPWO2011129369A1 (ja) * 2010-04-13 2013-07-18 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
JP5704535B2 (ja) * 2011-04-05 2015-04-22 株式会社ブイ・テクノロジー マイクロレンズアレイを使用した露光装置
US8957512B2 (en) 2012-06-19 2015-02-17 Xilinx, Inc. Oversized interposer
US8869088B1 (en) 2012-06-27 2014-10-21 Xilinx, Inc. Oversized interposer formed from a multi-pattern region mask
US9026872B2 (en) 2012-08-16 2015-05-05 Xilinx, Inc. Flexible sized die for use in multi-die integrated circuit
US9547034B2 (en) 2013-07-03 2017-01-17 Xilinx, Inc. Monolithic integrated circuit die having modular die regions stitched together
CN104570610B (zh) * 2013-10-11 2017-02-15 上海微电子装备有限公司 投影曝光装置
US9915869B1 (en) 2014-07-01 2018-03-13 Xilinx, Inc. Single mask set used for interposer fabrication of multiple products
US10712671B2 (en) 2016-05-19 2020-07-14 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US10295911B2 (en) 2016-05-19 2019-05-21 Nikon Corporation Extreme ultraviolet lithography system that utilizes pattern stitching
US11067900B2 (en) 2016-05-19 2021-07-20 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US10527956B2 (en) 2017-03-24 2020-01-07 Nikon Corporation Temperature controlled heat transfer frame for pellicle
CN113050381B (zh) * 2019-12-27 2022-04-26 上海微电子装备（集团）股份有限公司 一种拼接物镜的剂量控制装置、方法和曝光设备
WO2023282214A1 (ja) * 2021-07-05 2023-01-12 株式会社ニコン 空間光変調ユニットおよび露光装置

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