JPH11125912A5 - - Google Patents
Info
- Publication number
- JPH11125912A5 JPH11125912A5 JP1997309384A JP30938497A JPH11125912A5 JP H11125912 A5 JPH11125912 A5 JP H11125912A5 JP 1997309384 A JP1997309384 A JP 1997309384A JP 30938497 A JP30938497 A JP 30938497A JP H11125912 A5 JPH11125912 A5 JP H11125912A5
- Authority
- JP
- Japan
- Prior art keywords
- scanning direction
- scanning
- substrate
- optical systems
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30938497A JP4092753B2 (ja) | 1997-10-22 | 1997-10-22 | 走査型露光装置及び走査露光方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30938497A JP4092753B2 (ja) | 1997-10-22 | 1997-10-22 | 走査型露光装置及び走査露光方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11125912A JPH11125912A (ja) | 1999-05-11 |
| JPH11125912A5 true JPH11125912A5 (2) | 2005-10-27 |
| JP4092753B2 JP4092753B2 (ja) | 2008-05-28 |
Family
ID=17992366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30938497A Expired - Lifetime JP4092753B2 (ja) | 1997-10-22 | 1997-10-22 | 走査型露光装置及び走査露光方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4092753B2 (2) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6873400B2 (en) | 2000-02-02 | 2005-03-29 | Nikon Corporation | Scanning exposure method and system |
| JP4617616B2 (ja) * | 2001-07-11 | 2011-01-26 | 株式会社ニコン | 露光装置及び露光方法 |
| KR100564216B1 (ko) * | 2003-10-11 | 2006-03-28 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 노광장치 및 그것을 사용한 노광방법 |
| JP4773160B2 (ja) * | 2005-08-24 | 2011-09-14 | 株式会社ブイ・テクノロジー | 露光装置 |
| US7518705B2 (en) * | 2006-09-14 | 2009-04-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP5825470B2 (ja) * | 2011-05-16 | 2015-12-02 | 株式会社ブイ・テクノロジー | 露光装置及び遮光板 |
-
1997
- 1997-10-22 JP JP30938497A patent/JP4092753B2/ja not_active Expired - Lifetime
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