JP4105261B2 - 電子機器の作製方法 - Google Patents
電子機器の作製方法 Download PDFInfo
- Publication number
- JP4105261B2 JP4105261B2 JP24050597A JP24050597A JP4105261B2 JP 4105261 B2 JP4105261 B2 JP 4105261B2 JP 24050597 A JP24050597 A JP 24050597A JP 24050597 A JP24050597 A JP 24050597A JP 4105261 B2 JP4105261 B2 JP 4105261B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- interlayer insulating
- light absorber
- pixel
- pixel electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 239000010410 layer Substances 0.000 claims description 70
- 239000006096 absorbing agent Substances 0.000 claims description 69
- 239000011229 interlayer Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 13
- 239000004642 Polyimide Substances 0.000 claims description 12
- 229920001721 polyimide Polymers 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 239000000049 pigment Substances 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- 239000004593 Epoxy Substances 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims description 6
- 150000001408 amides Chemical class 0.000 claims description 6
- 238000001312 dry etching Methods 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 239000003575 carbonaceous material Substances 0.000 claims description 5
- 239000007769 metal material Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 description 79
- 239000004973 liquid crystal related substance Substances 0.000 description 40
- 238000005530 etching Methods 0.000 description 25
- 239000012212 insulator Substances 0.000 description 25
- 239000000758 substrate Substances 0.000 description 23
- 239000011159 matrix material Substances 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000004380 ashing Methods 0.000 description 8
- 238000000059 patterning Methods 0.000 description 7
- 239000005262 ferroelectric liquid crystals (FLCs) Substances 0.000 description 5
- 238000001020 plasma etching Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000011358 absorbing material Substances 0.000 description 2
- 239000010407 anodic oxide Substances 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- -1 phosphorus ions Chemical class 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24050597A JP4105261B2 (ja) | 1997-08-20 | 1997-08-20 | 電子機器の作製方法 |
| US09/134,547 US6757032B1 (en) | 1997-08-20 | 1998-08-17 | Electronic device and method for fabricating the same |
| US10/848,146 US7145613B2 (en) | 1997-08-20 | 2004-05-19 | Electronic device and method for fabricating the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24050597A JP4105261B2 (ja) | 1997-08-20 | 1997-08-20 | 電子機器の作製方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007127038A Division JP4057044B2 (ja) | 2007-05-11 | 2007-05-11 | 電子機器の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH1164890A JPH1164890A (ja) | 1999-03-05 |
| JPH1164890A5 JPH1164890A5 (2) | 2005-04-21 |
| JP4105261B2 true JP4105261B2 (ja) | 2008-06-25 |
Family
ID=17060525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24050597A Expired - Fee Related JP4105261B2 (ja) | 1997-08-20 | 1997-08-20 | 電子機器の作製方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US6757032B1 (2) |
| JP (1) | JP4105261B2 (2) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7821065B2 (en) * | 1999-03-02 | 2010-10-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising a thin film transistor comprising a semiconductor thin film and method of manufacturing the same |
| JP2001109404A (ja) * | 1999-10-01 | 2001-04-20 | Sanyo Electric Co Ltd | El表示装置 |
| JP2002006321A (ja) * | 2000-04-17 | 2002-01-09 | Seiko Epson Corp | 液晶装置、投射型表示装置及び電子機器 |
| JP4896318B2 (ja) * | 2001-09-10 | 2012-03-14 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| KR100552975B1 (ko) * | 2003-11-22 | 2006-02-15 | 삼성에스디아이 주식회사 | 능동 매트릭스 유기전계발광표시장치 및 그의 제조방법 |
| KR20060083247A (ko) * | 2005-01-14 | 2006-07-20 | 삼성전자주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
| JP4805587B2 (ja) * | 2005-02-24 | 2011-11-02 | エーユー オプトロニクス コーポレイション | 液晶表示装置とその製造方法 |
| JP4552780B2 (ja) * | 2005-07-04 | 2010-09-29 | エプソンイメージングデバイス株式会社 | 電気光学装置及び電子機器 |
| JP5151782B2 (ja) * | 2008-08-04 | 2013-02-27 | コニカミノルタホールディングス株式会社 | Tftアレイ基板の製造方法 |
| JP2010249935A (ja) | 2009-04-13 | 2010-11-04 | Sony Corp | 表示装置 |
| JP5262973B2 (ja) * | 2009-05-11 | 2013-08-14 | セイコーエプソン株式会社 | 電気光学装置及び電子機器 |
| KR102057299B1 (ko) * | 2009-07-31 | 2019-12-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 디바이스 및 그 형성 방법 |
| JP2012220507A (ja) * | 2011-04-04 | 2012-11-12 | Jvc Kenwood Corp | 液晶表示装置及びその製造方法 |
| KR101860861B1 (ko) * | 2011-06-13 | 2018-05-25 | 삼성디스플레이 주식회사 | 배선의 제조방법, 박막트랜지스터의 제조방법 및 평판표시장치의 제조방법 |
| JP6099891B2 (ja) * | 2012-07-03 | 2017-03-22 | キヤノン株式会社 | ドライエッチング方法 |
| CN105572960A (zh) * | 2016-03-02 | 2016-05-11 | 京东方科技集团股份有限公司 | 显示基板、液晶面板、显示装置及显示基板的制作方法 |
| CN121568837A (zh) | 2023-07-27 | 2026-02-24 | 强生视力健公司 | 监督式机器学习固化系统 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3428044A (en) * | 1965-10-15 | 1969-02-18 | Kimberly Clark Co | Coated catamenial tampon |
| US3595236A (en) * | 1969-03-17 | 1971-07-27 | Kimberly Clark Co | Coating to aid tampon insertion and tampons coated therewith |
| US3976075A (en) * | 1975-02-24 | 1976-08-24 | Personal Products Company | Tampon blank with reduced sloughing properties |
| JP2594983B2 (ja) * | 1987-11-10 | 1997-03-26 | カシオ計算機株式会社 | 薄膜トランジスタの製造方法 |
| US5403300A (en) * | 1989-03-31 | 1995-04-04 | Smith & Nephew P.L.C. | Tampons |
| DE3940640A1 (de) * | 1989-12-08 | 1991-06-20 | Nokia Unterhaltungselektronik | Verfahren zum herstellen einer substratplatte fuer eine fluessigkristallzelle mit schwarzmatrixbereichen |
| JPH0444008A (ja) * | 1990-06-12 | 1992-02-13 | Matsushita Electric Ind Co Ltd | 液晶素子の製造方法 |
| JPH07294958A (ja) * | 1994-04-26 | 1995-11-10 | Seiko Instr Inc | 光弁用半導体装置およびその製造方法 |
| JPH08122761A (ja) * | 1994-10-20 | 1996-05-17 | Fujitsu Ltd | 液晶表示素子とその製造方法 |
| US6424388B1 (en) * | 1995-04-28 | 2002-07-23 | International Business Machines Corporation | Reflective spatial light modulator array |
| JPH08327990A (ja) * | 1995-05-29 | 1996-12-13 | Optrex Corp | 液晶表示素子用電極基板およびその製造方法 |
| JPH09105953A (ja) * | 1995-10-12 | 1997-04-22 | Semiconductor Energy Lab Co Ltd | 液晶表示装置 |
| JP3332773B2 (ja) * | 1996-03-15 | 2002-10-07 | シャープ株式会社 | アクティブマトリクス基板およびアクティブマトリクス基板の製造方法 |
| JPH09281508A (ja) * | 1996-04-12 | 1997-10-31 | Semiconductor Energy Lab Co Ltd | 液晶表示装置およびその作製方法 |
| JP3587426B2 (ja) * | 1996-09-25 | 2004-11-10 | シャープ株式会社 | 液晶表示装置及びその製造方法 |
| CN1148600C (zh) | 1996-11-26 | 2004-05-05 | 三星电子株式会社 | 薄膜晶体管基片及其制造方法 |
| JP3856889B2 (ja) | 1997-02-06 | 2006-12-13 | 株式会社半導体エネルギー研究所 | 反射型表示装置および電子デバイス |
| US6163055A (en) | 1997-03-24 | 2000-12-19 | Semiconductor Energy Laboratory Co., Ltd | Semiconductor device and manufacturing method thereof |
| US6330047B1 (en) | 1997-07-28 | 2001-12-11 | Sharp Kabushiki Kaisha | Liquid crystal display device and method for fabricating the same |
-
1997
- 1997-08-20 JP JP24050597A patent/JP4105261B2/ja not_active Expired - Fee Related
-
1998
- 1998-08-17 US US09/134,547 patent/US6757032B1/en not_active Expired - Fee Related
-
2004
- 2004-05-19 US US10/848,146 patent/US7145613B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US7145613B2 (en) | 2006-12-05 |
| US20040214359A1 (en) | 2004-10-28 |
| JPH1164890A (ja) | 1999-03-05 |
| US6757032B1 (en) | 2004-06-29 |
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