JP4106723B2 - 反射防止フィルタ用コーティング組成物 - Google Patents

反射防止フィルタ用コーティング組成物 Download PDF

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Publication number
JP4106723B2
JP4106723B2 JP01448998A JP1448998A JP4106723B2 JP 4106723 B2 JP4106723 B2 JP 4106723B2 JP 01448998 A JP01448998 A JP 01448998A JP 1448998 A JP1448998 A JP 1448998A JP 4106723 B2 JP4106723 B2 JP 4106723B2
Authority
JP
Japan
Prior art keywords
polymer
antireflection
fluoropolymer
fluorine
perfluoropolyether
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP01448998A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11209685A5 (fr
JPH11209685A (ja
Inventor
郁生 松倉
史子 野中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP01448998A priority Critical patent/JP4106723B2/ja
Publication of JPH11209685A publication Critical patent/JPH11209685A/ja
Publication of JPH11209685A5 publication Critical patent/JPH11209685A5/ja
Application granted granted Critical
Publication of JP4106723B2 publication Critical patent/JP4106723B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
JP01448998A 1998-01-27 1998-01-27 反射防止フィルタ用コーティング組成物 Expired - Fee Related JP4106723B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01448998A JP4106723B2 (ja) 1998-01-27 1998-01-27 反射防止フィルタ用コーティング組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01448998A JP4106723B2 (ja) 1998-01-27 1998-01-27 反射防止フィルタ用コーティング組成物

Publications (3)

Publication Number Publication Date
JPH11209685A JPH11209685A (ja) 1999-08-03
JPH11209685A5 JPH11209685A5 (fr) 2004-09-09
JP4106723B2 true JP4106723B2 (ja) 2008-06-25

Family

ID=11862474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01448998A Expired - Fee Related JP4106723B2 (ja) 1998-01-27 1998-01-27 反射防止フィルタ用コーティング組成物

Country Status (1)

Country Link
JP (1) JP4106723B2 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6421051B1 (en) 1998-06-18 2002-07-16 Spatial Corporation Multi-resolution geometry
DE60118965T2 (de) * 2000-08-29 2007-09-06 Daikin Industries, Ltd. Härtbares fluoropolymer, härtbare harzzusammensetzungen diese enthaltend und antireflexionsfilm
JP2004535486A (ja) * 2001-05-14 2004-11-25 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 紫外線および真空紫外線用途において有用なポリマー−液体組成物
US7129009B2 (en) 2002-05-14 2006-10-31 E. I. Du Pont De Nemours And Company Polymer-liquid compositions useful in ultraviolet and vacuum ultraviolet uses
JP4248347B2 (ja) 2003-09-03 2009-04-02 富士フイルム株式会社 皮膜形成用組成物、反射防止膜、偏光板、画像表示装置及び防汚性コーティング組成物及び防汚性物品
KR101141570B1 (ko) * 2003-12-03 2012-05-03 아사히 가라스 가부시키가이샤 펠리클 및 신규 함불소 중합체
ES2318573T3 (es) * 2004-11-02 2009-05-01 E.I. Du Pont De Nemours And Company Revestimientos de fluoropolimero que contienen telomeros.
JP2009091373A (ja) * 2006-01-26 2009-04-30 Asahi Glass Co Ltd 塗布液および塗膜形成方法
JP5981191B2 (ja) * 2012-03-28 2016-08-31 旭化成株式会社 ペリクル枠体
JP7006518B2 (ja) * 2018-06-13 2022-01-24 Ａｇｃ株式会社 加飾フィルムの製造方法、加飾フィルム付き３次元成形品の製造方法

Also Published As

Publication number Publication date
JPH11209685A (ja) 1999-08-03

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