JPH01125534U - - Google Patents
Info
- Publication number
- JPH01125534U JPH01125534U JP2019988U JP2019988U JPH01125534U JP H01125534 U JPH01125534 U JP H01125534U JP 2019988 U JP2019988 U JP 2019988U JP 2019988 U JP2019988 U JP 2019988U JP H01125534 U JPH01125534 U JP H01125534U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- semiconductor devices
- room
- chemical solution
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 2
- 238000010992 reflux Methods 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims 7
- 239000004065 semiconductor Substances 0.000 claims 5
- 230000032258 transport Effects 0.000 claims 2
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 150000001340 alkali metals Chemical class 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 229910001385 heavy metal Inorganic materials 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Prevention Of Fouling (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は本実施例の要部の説明図、第２図は従
来例の説明図である。
Ａ……洗浄室、Ｂ……薬液室、２，３……シヤ
ワー、６……エレベーター、１０……シヤツター
、１２……冷却装置、１３……還流装置。
FIG. 1 is an explanatory diagram of main parts of this embodiment, and FIG. 2 is an explanatory diagram of a conventional example. A...washing room, B...chemical solution room, 2, 3...shower, 6...elevator, 10...shutter, 12...cooling device, 13...reflux device.
Claims (1)
属分の不純物を薬液槽に浸漬して除去する半導体
洗浄装置に於いて、洗浄室と薬液槽を配置した薬
液室を設け、洗浄室と薬液室をシヤツターにて区
分して密閉状態になる構造とし、洗浄室に洗浄の
ための純水シヤワーと半導体装置を搬入搬出する
ための昇降用のエレベーターを設け、シヤツター
開状態時には洗浄室と薬液室との間を移動でき半
導体装置を搬送する搬送装置を設け、更に薬液室
の上部に蒸発する薬液の冷却装置と還流装置を設
けた半導体洗浄装置。 In semiconductor cleaning equipment that removes heavy metal and alkali metal impurities by immersing them in a chemical tank during the manufacture of semiconductor devices, a cleaning chamber and a chemical tank are provided, and the cleaning chamber and the chemical tank are used as a shutter. The cleaning room is equipped with a pure water shower for cleaning and an elevator for lifting and lowering semiconductor devices, and when the shutter is open, the cleaning room and chemical solution room are separated. A semiconductor cleaning device that is provided with a transport device that is movable and that transports semiconductor devices, and is further provided with a cooling device and a reflux device for evaporating chemical solution in the upper part of a chemical solution chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019988U JPH01125534U (en) | 1988-02-18 | 1988-02-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019988U JPH01125534U (en) | 1988-02-18 | 1988-02-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01125534U true JPH01125534U (en) | 1989-08-28 |
Family
ID=31236358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019988U Pending JPH01125534U (en) | 1988-02-18 | 1988-02-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01125534U (en) |
-
1988
- 1988-02-18 JP JP2019988U patent/JPH01125534U/ja active Pending