JPH01203295A - Method for synthesizing diamond by vapor phase method - Google Patents
Method for synthesizing diamond by vapor phase methodInfo
- Publication number
- JPH01203295A JPH01203295A JP63026647A JP2664788A JPH01203295A JP H01203295 A JPH01203295 A JP H01203295A JP 63026647 A JP63026647 A JP 63026647A JP 2664788 A JP2664788 A JP 2664788A JP H01203295 A JPH01203295 A JP H01203295A
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- base material
- burner
- ejection ports
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 58
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 48
- 239000012808 vapor phase Substances 0.000 title claims abstract description 6
- 238000000034 method Methods 0.000 title claims description 19
- 230000002194 synthesizing effect Effects 0.000 title description 4
- 238000002485 combustion reaction Methods 0.000 claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 32
- 239000002994 raw material Substances 0.000 claims abstract description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 11
- 238000001556 precipitation Methods 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000001308 synthesis method Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 12
- 230000015572 biosynthetic process Effects 0.000 abstract description 11
- 238000003786 synthesis reaction Methods 0.000 abstract description 10
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 abstract description 8
- 239000001294 propane Substances 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 239000010937 tungsten Substances 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
- 239000001301 oxygen Substances 0.000 description 12
- 229910052760 oxygen Inorganic materials 0.000 description 12
- 239000007789 gas Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000005284 excitation Effects 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- -1 ethylene, propylene, butylene, acetylene Chemical group 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010891 electric arc Methods 0.000 description 4
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- 206010061218 Inflammation Diseases 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000004054 inflammatory process Effects 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- JSZOAYXJRCEYSX-UHFFFAOYSA-N 1-nitropropane Chemical compound CCC[N+]([O-])=O JSZOAYXJRCEYSX-UHFFFAOYSA-N 0.000 description 1
- VDOKWPVSGXHSNP-UHFFFAOYSA-N 2-methylprop-1-en-1-one Chemical compound CC(C)=C=O VDOKWPVSGXHSNP-UHFFFAOYSA-N 0.000 description 1
- RZGZTQYTDRQOEY-UHFFFAOYSA-N 2-phenylethenone Chemical compound O=C=CC1=CC=CC=C1 RZGZTQYTDRQOEY-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000001723 carbon free-radicals Chemical class 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- WASQWSOJHCZDFK-UHFFFAOYSA-N diketene Chemical compound C=C1CC(=O)O1 WASQWSOJHCZDFK-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- ALBYIUDWACNRRB-UHFFFAOYSA-N hexanamide Chemical compound CCCCCC(N)=O ALBYIUDWACNRRB-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- MEUKEBNAABNAEX-UHFFFAOYSA-N hydroperoxymethane Chemical compound COO MEUKEBNAABNAEX-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- CCGKOQOJPYTBIH-UHFFFAOYSA-N ketene group Chemical group C=C=O CCGKOQOJPYTBIH-UHFFFAOYSA-N 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- NLRKCXQQSUWLCH-UHFFFAOYSA-N nitrosobenzene Chemical compound O=NC1=CC=CC=C1 NLRKCXQQSUWLCH-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- JAMNHZBIQDNHMM-UHFFFAOYSA-N pivalonitrile Chemical compound CC(C)(C)C#N JAMNHZBIQDNHMM-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は耐摩耗性、耐蝕性、高熱伝導性、広域光学的透
明等の優れた特性を有し、研摩材、研削材、超硬工具材
、光学材用部材等に有用な膜状、薄片状板状、棒状のダ
イヤモンドの気相法合成方法に関する。[Detailed description of the invention] <Industrial application field> The present invention has excellent properties such as wear resistance, corrosion resistance, high thermal conductivity, and wide-area optical transparency, and can be used as an abrasive material, an abrasive material, and a cemented carbide tool. The present invention relates to a method for vapor phase synthesis of film-like, flaky-like, plate-like, and rod-like diamonds that are useful as materials, members for optical materials, and the like.
〈従来の技術〉
ダイヤモンドの合成法としては、超高圧高温条件下での
、鉄、ニッケル系等の触媒による合成法や爆薬法による
黒鉛の直接変換法か従来より実施されている。<Prior Art> Conventional methods for synthesizing diamond include a synthesis method using an iron or nickel catalyst under ultra-high pressure and high temperature conditions, and a direct conversion method of graphite using an explosive method.
近年低圧CVD法として、炭化水素又は窒素、酸素等を
含む有機化合物と水素との混合ガスを熱フィラメント、
マイクロ波プラズマ、高周波プラズマ、直流放電プラズ
マ、直流アーク放電等により励起状態としてダイヤモン
ドを合成する方法が開発されている。In recent years, as a low-pressure CVD method, a mixed gas of hydrogen and a hydrocarbon or an organic compound containing nitrogen, oxygen, etc. is heated through a hot filament.
Methods have been developed for synthesizing diamond in an excited state using microwave plasma, high-frequency plasma, DC discharge plasma, DC arc discharge, and the like.
本発明に係わる膜状、薄片状、板状又は棒状ダイヤモン
ドは、超高圧法の極めて特殊な条件下て大粒ダイヤモン
ド結晶を長時間かけて成長させたものからレーザーで切
出す方法が行われている。The film, flake, plate, or rod-shaped diamonds according to the present invention are produced by laser cutting from large diamond crystals grown over a long period of time under very special conditions using ultra-high pressure. .
又膜状物に関しては低圧CVD法による研究か行われて
いる段階である。Regarding film-like materials, research is currently being carried out using low-pressure CVD methods.
〈発明が解決しよう、とする課題〉
前記に記載した超高圧法は特殊な設備を必要とし、又膜
状、薄片状、板状、棒状のダイヤモンドの製造はまず大
粒ダイヤモンドを合成し、この大粒ダイヤモンドをレー
ザーて切出して製造されており、容易に、安価に、短時
間に製造するという実用的な要求に必ずしも応じるもの
とはいえない。又従来の前記CVD法に於ては、原料ガ
スをダイヤモンドが合成可能に励起するために特殊な装
置を必要とした。又いずれの励起源を用いてもダイヤモ
ンド析出面積の増大は困難であり、又、厚みをもった板
状、棒状物のダイヤモンドの製造は不可能であった。本
発明者らは従来法に比し、簡易な手段で、しかも大面積
の膜状、板状、棒状ダイヤモンドをも生成しつる気相合
成法を開発する目的で研究の結果、炭素を含む原料化合
物をダイヤモンド析出用基材の周囲より、燃焼炎が中心
に向うように燃焼させて不完全燃焼領域を形成すること
により目的を達成しうることを確認して本発明を完成し
た。<Problems to be solved by the invention> The ultra-high pressure method described above requires special equipment, and the production of membrane-, flake-, plate-, and rod-shaped diamonds requires first synthesizing large diamonds, and then They are manufactured by cutting diamonds with a laser, and cannot necessarily be said to meet the practical demands of easy, low-cost, and quick manufacturing. Further, in the conventional CVD method, a special device is required to excite the raw material gas so that diamond can be synthesized. Furthermore, no matter which excitation source is used, it is difficult to increase the area of diamond precipitation, and it has been impossible to produce thick plate-shaped or rod-shaped diamonds. The present inventors have conducted research to develop a gas-phase synthesis method that can produce film-like, plate-like, and rod-like diamonds with a large area using simple means compared to conventional methods. The present invention was completed after confirming that the object could be achieved by burning a compound from the periphery of the substrate for diamond precipitation so that the combustion flame directed toward the center to form an incomplete combustion region.
〈課題を解決するための1手段〉
本発明者らは低圧CVD法に関し、とくに励起手段につ
いて種々検討を重ねた結果、熱フィラメントては熱プラ
ズマ、マイクロ波ではマイクロ波プラズマ1、直流アー
ク放電ではアーク放電プラズマなど、すべてプラズマ状
態がダイヤモンド合成に大きく関与しているとの結論を
得、これより燃焼による燃焼炎もプラズマ状態であるこ
とにより、この燃焼炎を利用すれば従来法に比し容易に
ダイヤモンドを合成しつると判断し、さらにその燃焼炎
をダイヤモンド析出用基材に向けその周辺より生成させ
ることにより、生成ダイヤモンドのHさを等しく、均質
にしつると考え鋭意研究の結果本発明を完成した。<One Means for Solving the Problem> The present inventors have conducted various studies regarding the low-pressure CVD method, particularly regarding excitation means, and have found that thermal filament is a thermal plasma, microwave is a microwave plasma 1, and direct current arc discharge is a thermal plasma. It was concluded that the plasma state of all forms of diamond synthesis, including arc discharge plasma, plays a major role in diamond synthesis, and since the combustion flame caused by combustion is also in a plasma state, using this combustion flame is easier than using conventional methods. As a result of intensive research, we have developed the present invention, thinking that by directing the combustion flame toward the base material for diamond precipitation and generating it from the surrounding area, we can make the H of the generated diamond equal and homogeneous. completed.
即ち本発明は炭素を含むダイヤモンド析出用原料化合物
を環形周囲より中心に向けて放出しつ\不完全燃焼領域
を有するように燃焼させ、該不完全燃焼領域中、又は該
領域の近傍の非酸化性雰囲気中に、ダイヤモンド析出用
基材を設置し、基材温度をダイヤモンド析出温度に保持
することにより基材にダイヤモンドを連続的に析出させ
ることを特徴とする気相法ダイヤモンド合成法に関する
。That is, the present invention emits a carbon-containing raw material compound for diamond precipitation toward the center from the periphery of the annular shape, burns it so as to have an incomplete combustion region, and burns the non-oxidized material in or near the incomplete combustion region. The present invention relates to a vapor phase diamond synthesis method characterized in that diamond is continuously deposited on the substrate by placing a substrate for diamond precipitation in a neutral atmosphere and maintaining the temperature of the substrate at the diamond precipitation temperature.
なお本発明の方法により合成されるダイヤモンドにはダ
イヤモンド様炭素を含む。Note that the diamond synthesized by the method of the present invention contains diamond-like carbon.
まずダイヤモンド合成用原料ガスについて説明する。First, the raw material gas for diamond synthesis will be explained.
炭素源として次に示す各種の化合物が使用できる。Various compounds shown below can be used as carbon sources.
a)含水素化合物 悠廂炭化水素:メタン、エタン、プロパン、ブタン等。a) Hydrogen-containing compound Eternal hydrocarbons: methane, ethane, propane, butane, etc.
不飽和炭化水素:エチレン、プロピレン、ブチレン、ア
セチレン、アリレン等。Unsaturated hydrocarbons: ethylene, propylene, butylene, acetylene, arylene, etc.
芳香族炭化水素:ベンゼン、トルエン、キシレン、シク
ロヘキサン等。Aromatic hydrocarbons: benzene, toluene, xylene, cyclohexane, etc.
CHO化合物:メタノール、エタノール、プロパツール
、ブタノール等のアルコール類、ジメチルエーテル、ジ
エチルエーテル等のエーテル基含有化合物。CHO compound: alcohols such as methanol, ethanol, propatool, butanol, and ether group-containing compounds such as dimethyl ether and diethyl ether.
ケトン基を含むもの;アセトン、メチルエチルケトン、
ジエチルケトン、2.4−ベンタンジオン、アセトフェ
ノン、l’−プチロナフトン。Those containing ketone groups; acetone, methyl ethyl ketone,
Diethyl ketone, 2,4-bentanedione, acetophenone, l'-butylonaphthone.
エステル系:酢酸メチル、酢酸エチル、酢酸イソアミル
。Ester series: methyl acetate, ethyl acetate, isoamyl acetate.
ケテン基を含むものニジメチルケテン、フェニルケテン
。Those containing ketene groups: dimethylketene, phenylketene.
アセチル基を含むもの:酢酸、無水酢酸、アセトフェノ
ン、ビアセチル。Containing acetyl groups: acetic acid, acetic anhydride, acetophenone, biacetyl.
アルデヒド基を含むもの:ホルムアルデヒド、アセトア
ルデヒド、プロピオンアルデヒド。Those containing aldehyde groups: formaldehyde, acetaldehyde, propionaldehyde.
メチレン基を含むもの二ケテン、ジアゾメタン。Diketene, diazomethane containing a methylene group.
メチル基を含むもの:t−ブチルパーオキサイド、メチ
ルヒドロパーオキサイド、過酢酸。Those containing a methyl group: t-butyl peroxide, methyl hydroperoxide, peracetic acid.
b)窒素含有化合物
第1アミン:メチルアミン、エチルアミン、ジメチルア
ミン、トリメチルアミン、イソプロピルアミン。b) Nitrogen-containing compounds primary amines: methylamine, ethylamine, dimethylamine, trimethylamine, isopropylamine.
ニトリル基を含むものニアセトニトリル、ベンゾニトリ
ル、アクリロニトリル、ピバロニトリル。Those containing nitrile groups: niacetonitrile, benzonitrile, acrylonitrile, pivalonitrile.
アミド基を含むもの:ヘキサンアミド、アセトアミド。Those containing amide groups: hexane amide, acetamide.
ニトロ基化合物:ニトロエタン、ニトロメタン、ニトロ
ソベンゼン、ニトロプロパン。Nitro group compounds: nitroethane, nitromethane, nitrosobenzene, nitropropane.
C)含酸素化合物 −酸化炭素 炭酸ガス。C) Oxygen-containing compounds - carbon oxide, carbon dioxide gas.
前述の化合物は一種又は二種以上を混合して用いること
ができる。The above-mentioned compounds can be used alone or in combination of two or more.
これらの炭素源化合物に水素、必要により酸素を混合し
含酸素又は非含酸素雰囲気中で燃焼させる。These carbon source compounds are mixed with hydrogen and, if necessary, oxygen, and then burned in an oxygen-containing or non-oxygen-containing atmosphere.
さらに炭素源として固体の炭素、黒鉛等を前記化合物と
水素、酸素の混合ガスの燃焼炎中で、気化、燃焼、水素
化等の反応を介して炭素源として用いることも可能であ
る。Furthermore, it is also possible to use solid carbon, graphite, etc. as a carbon source through reactions such as vaporization, combustion, and hydrogenation in a combustion flame of a mixed gas of the compound, hydrogen, and oxygen.
本発明においては前記のダイヤモンド合成用原料ガスを
不完全燃焼領域が存在するように燃焼させて燃焼炎を形
成させ、該不完全燃焼領域中又は長井の非酸化性でかつ
炎の近傍のダイヤモンド析出可能に励起された領域に、
ダイヤモンド析出成長面を常に存在させる事が必要であ
る。In the present invention, the raw material gas for diamond synthesis is combusted so that an incomplete combustion region exists to form a combustion flame, and Nagai's non-oxidizing diamond is precipitated in the incomplete combustion region or near the flame. In the excited region,
It is necessary to always have a diamond precipitation growth surface.
又、前記のダイヤモンド合成用原料ガスに酸素を添加し
、燃焼を酸素を含まない雰囲気、或は酸素を含む雰囲気
中でダイヤモンド析出状態に励起された不完全燃焼領域
を生成させる具体例としては、例えば前者についてはア
ルゴン等の雰囲気中での燃焼を、又後者の例としては大
気開放中の燃焼を例示できる。Further, a specific example of adding oxygen to the raw material gas for diamond synthesis to generate an incomplete combustion region excited to a diamond precipitation state in an oxygen-free atmosphere or an oxygen-containing atmosphere is as follows: For example, the former case can be exemplified by combustion in an atmosphere such as argon, and the latter case can be exemplified by combustion in open air.
そして本発明方法をおいては、燃焼炎を基材の周辺より
、基材に向けて生成させることに特徴がある。The method of the present invention is characterized in that the combustion flame is generated from the periphery of the base material toward the base material.
第1図は本発明方法を実施するための装置の一例であり
、第2図は第1−図A−A部分の断面である。FIG. 1 shows an example of an apparatus for carrying out the method of the present invention, and FIG. 2 is a cross section taken along the line A-A in FIG.
図面において、lは環形のバーナーで、ダイヤモンド析
出燃焼用原料供給管2、環形バーナー本体3、バーナー
噴出口4を有し、供給管2とバーナー噴出口が接続され
ている。In the drawings, reference numeral 1 denotes an annular burner, which has a raw material supply pipe 2 for diamond precipitation combustion, an annular burner main body 3, and a burner outlet 4, and the supply pipe 2 and the burner outlet are connected.
又5は基材で、水冷等の冷却手段を有する基材支持体6
に取付けられている。7はタングステン線フィラメント
である。Further, 5 is a base material, and a base material support 6 has a cooling means such as water cooling.
installed on. 7 is a tungsten wire filament.
第2図に示す8は燃焼炎である。析出燃焼用原料供給管
2より原料を供給し、バーナー噴出口より燃焼炎を生成
させる。燃焼炎は内炎と称すべき不完全燃焼領域9と、
外炎10とにより構成されている。8 shown in FIG. 2 is a combustion flame. A raw material is supplied from a raw material supply pipe 2 for precipitation combustion, and a combustion flame is generated from a burner jet port. The combustion flame has an incomplete combustion region 9 which should be called an inner flame,
It is composed of an outer flame 10.
なお7に例示されるタングステン線フィラメントは燃焼
炎のみでダイヤモンド生成状態への励起化が不充分の場
合の補助励起手段である。The tungsten wire filament exemplified in No. 7 is an auxiliary excitation means when the combustion flame alone is insufficient to excite the diamond-forming state.
第3図は本発明方法を実施するための装置の他の一例の
断面図であって、第1図の装置の基材5を、環状バーナ
ー1の中心位置にバーナーに対して縦方向に、上下動可
能に、かつ軸心な中心に回転可能に配設された基材棒1
5と、またタングステン線フィラメント7を、基材棒1
5をはさんで、配設されたタングステン線フィラメント
17.27としたものである。なお、タングステン線フ
ィラメントは図示のものに限るものでなく、基材棒の周
囲の一部又は全面に適宜もうけることがてきる。FIG. 3 is a sectional view of another example of an apparatus for carrying out the method of the present invention, in which the base material 5 of the apparatus of FIG. Base material rod 1 arranged to be movable up and down and rotatable around an axial center
5 and the tungsten wire filament 7 to the base rod 1.
A tungsten wire filament 17.27 is placed between the wires 5 and 5. Note that the tungsten wire filament is not limited to the one shown in the drawings, and may be provided on a part or the entire surface of the base rod as appropriate.
図において5.15で示されるダイヤモンド析出用基材
は通常低圧CVD法で用いられるものが使用できる。As the base material for diamond precipitation shown at 5.15 in the figure, those normally used in low pressure CVD methods can be used.
即ち、ダイヤモンド板、粒状物、Siウェハー、SiC
焼結体板1粒状物の外にW、WC,Mo 、超硬合金製
のもの等を基材支持体に固定して使用できる。That is, diamond plates, granules, Si wafers, SiC
In addition to the granular sintered body plate, a material made of W, WC, Mo, cemented carbide, etc. can be used by fixing it to a base material support.
ダイヤモンドが析出する領域は、燃焼炎中の酸素不足の
領域である。酸素過剰領域は、高熱で例えダイヤモンド
が形成されても、過剰の酸素によりco、 co、とな
り消失する。即ち、ダイヤモンド析出領域は酸素不足で
あり比較的低温である。そしてこの領域においては原料
ガスより炭化水素ラジカルや炭素ラジカル(活性種)の
生成の条件に励起することが必要である。本発明方法に
おいて炎の温度は300〜3000’Cダイヤモンド析
出用基材の温度は300℃〜1400’Cの範囲におく
ことが好ましい。The areas where diamonds precipitate are the oxygen-deficient areas in the combustion flame. In the oxygen-excessive region, even if diamond is formed under high heat, the excess oxygen turns into co, co, and disappears. That is, the diamond precipitation region is oxygen deficient and relatively low temperature. In this region, it is necessary to excite the raw material gas to conditions that produce hydrocarbon radicals and carbon radicals (active species). In the method of the present invention, the temperature of the flame is preferably 300-3000'C and the temperature of the substrate for diamond precipitation is preferably 300-1400'C.
そしてこの状態では励起が不充分の場合、補助加熱源と
して1通電加熱による発熱体、高周波誘導加熱、レーザ
ー光による加熱方式、赤外線加熱、アーク放電による加
熱等が用いられる。If the excitation is insufficient in this state, a heating element using single current heating, high frequency induction heating, a heating method using laser light, infrared heating, heating using arc discharge, etc. are used as an auxiliary heating source.
具体的には加熱領域温度は800°C以上、望ましくは
1000℃以上、基材温度は300℃以上1400℃以
下に保持すれば良い。Specifically, the heating region temperature may be maintained at 800°C or higher, preferably 1000°C or higher, and the substrate temperature may be maintained at 300°C or higher and 1400°C or lower.
炎を形成させる圧力は0.001気圧〜1000気圧の
範囲で選択てきるか、0.01気圧〜50気圧が好まし
い。とくに常圧(1気圧)での合成は大気開放で実施可
能を示すものであり、実用的価値が大である。The pressure at which the flame is formed can be selected from 0.001 atm to 1000 atm, preferably from 0.01 atm to 50 atm. In particular, synthesis at normal pressure (1 atm) can be carried out in the open to the atmosphere, and is of great practical value.
なお基材支持体を回転可能にしておけば、ダイヤモンド
の基材への析出か不均一の場合、回転することにより容
易に均一化することができる。又基材支持体を上下に移
動可能とすることにより燃焼炎の最適ダイヤモンド析出
位置に常に基材を調整することが容易である。したがっ
て、例えばダイヤモンドの生成に応じて基材を上下方向
に移動することもできる。Note that if the base material support is made rotatable, if the diamond is not deposited uniformly on the base material, it can be easily made uniform by rotating it. Furthermore, by making the base material support vertically movable, it is easy to always adjust the base material to the optimal diamond deposition position of the combustion flame. Thus, for example, the substrate can also be moved in the vertical direction depending on the formation of diamonds.
又、補助加熱体は必ずしも、基材の上方に限らず、基材
の下方におくこともできる。Furthermore, the auxiliary heating element is not necessarily placed above the base material, but can also be placed below the base material.
又水力法は他の気相法CVD方法に比較し、ダイヤモン
ド析出領域を長時間安定に保ち易い。又ダ、イヤモント
成長速度も1〜2 g m / hr以上てあり、マイ
クロ波励起、高周波励起、DCプラズマ励起等によるダ
イヤモンド合成法よりは成長ダイヤモンドへの容器等か
らの汚染度合か低い。Furthermore, compared to other vapor phase CVD methods, the hydraulic method can easily keep the diamond precipitation region stable for a long period of time. In addition, the diamond growth rate is 1 to 2 gm/hr or more, and the degree of contamination of the grown diamond from the container etc. is lower than in diamond synthesis methods using microwave excitation, high frequency excitation, DC plasma excitation, etc.
〈作 用〉
炭素含有原料化合物から燃焼炎中で酸素との反応て分解
解離を行い、ラジカル化した活性種から例えばC,C2
、CIl、CH,、CI′13などかダイヤモンド相を
形成して析出するものと推定される。<Function> The carbon-containing raw material compound is decomposed and dissociated by reaction with oxygen in a combustion flame, and the radicalized active species are converted into C, C2, etc.
, CIl, CH, , CI'13, etc. are presumed to form a diamond phase and precipitate.
又水素原子、酸素原子も形成され、ダイヤモンド析出反
応に関与しているものと思われる。Furthermore, hydrogen atoms and oxygen atoms are also formed and are thought to be involved in the diamond precipitation reaction.
〈発明の効果〉
均質でかつ膜厚の大きいダイヤモンドを極めて容易に、
又複雑な装置を用いずCVD法により製造できるので、
実用的価値は大きい。<Effects of the invention> It is extremely easy to produce diamonds that are homogeneous and have a large thickness.
In addition, it can be manufactured using the CVD method without using complicated equipment.
It has great practical value.
〈実 施 例)
実施例 l
ノズル穴か直径4mmの同上に10個円形に配着された
第1図に示される環形バーナーの中心部よりノズル上方
10mmに7111mの角Siウェハー基材をSuS製
回転支持台に取付け、補助加熱体として直径0.:I
ll13φのタングステン線をフィラメントをノズル上
方7 mm、ウェハー面より下3II11の位置に固定
した。バーナーのガス導入口に822500 G(:/
分、プロパン37.5 CG/分(プロパン/水素比2
.5Voβ%)の混合ガスを送りノズルより大気中に燃
焼炎を生成させ、さらにタングステン線を通電加熱21
00℃に保持した。<Example) Example 1 A 7111 m square Si wafer substrate made of SuS is placed 10 mm above the nozzle from the center of the annular burner shown in Fig. 1, which has 10 pieces arranged in a circle on the same nozzle hole with a diameter of 4 mm. It is installed on a rotating support stand and used as an auxiliary heating element with a diameter of 0. :I
A filament of a tungsten wire of 113φ was fixed at a position 7 mm above the nozzle and 3II11 below the wafer surface. 822500 G (:/
min, propane 37.5 CG/min (propane/hydrogen ratio 2
.. A mixed gas of 5Voβ%) is sent through a nozzle to generate a combustion flame in the atmosphere, and then a tungsten wire is heated with electricity 21
The temperature was maintained at 00°C.
基材ホルダーを6 rpmで回転させ、毎時j5 g
mの速さて上部に引上げ°た。Rotate the substrate holder at 6 rpm and j5 g per hour.
It was pulled up to the top at a speed of m.
この状態で8時間合成を行った。Synthesis was carried out in this state for 8 hours.
その結果Siウェハー上に厚さ約82gmの結晶性の高
い層か得られた。その表面下に数gmの結晶粒を光学顕
微鏡により観察できた。又ラマン分光スペクトルて13
33cm−’にダイヤモンドによる鋭いピークと155
0cm−’付近に非常にブロードなi−カーボンによる
ピークを認めた。As a result, a highly crystalline layer with a thickness of about 82 gm was obtained on the Si wafer. Crystal grains of several gm could be observed under the surface using an optical microscope. Also, Raman spectroscopy spectrum 13
A sharp peak due to diamond at 33 cm-' and 155
A very broad peak due to i-carbon was observed near 0 cm-'.
実施例 2
実施例1とまったく同様な装置を用いて、112250
0cc/分、エタノール50CC/分(エタノール/水
素比2 voj!$)を導入する以外同じ条件を用いて
10時間連続合成を行った。Example 2 Using exactly the same equipment as in Example 1, 112250
Continuous synthesis was carried out for 10 hours using the same conditions except for introducing 0 cc/min of ethanol and 50 cc/min of ethanol (ethanol/hydrogen ratio 2 voj!$).
その結果厚さ約141 JLmの結晶性の良い実施例1
と同様な表面形態の厚膜を顕微鏡観察により確認した。As a result, Example 1 with good crystallinity with a thickness of approximately 141 JLm
A thick film with a similar surface morphology was confirmed by microscopic observation.
又、ラマン分光ても同様なスペクトルを得た。A similar spectrum was also obtained by Raman spectroscopy.
第1図は本発明を実施するための装置の一例、第2図は
第1図におけるA−A部分の断面図、第3図は本発明を
実施するための装置の他の一例の断面図である。
図において、lは環形バーナー、2はダイヤモンド析出
燃焼用原料供給管、3は環形バーナー本体、4はバーナ
ー噴出口、5.15は基材、6は基材支持台、7.17
.27はタングステン線フィラメント、8は燃焼炎、9
は内炎、1oは外炎。
第1図
第2図
第3図Fig. 1 is an example of an apparatus for carrying out the present invention, Fig. 2 is a sectional view taken along the line A-A in Fig. 1, and Fig. 3 is a sectional view of another example of the apparatus for carrying out the invention. It is. In the figure, l is an annular burner, 2 is a raw material supply pipe for diamond precipitation combustion, 3 is an annular burner main body, 4 is a burner outlet, 5.15 is a base material, 6 is a base material support, 7.17
.. 27 is a tungsten wire filament, 8 is a combustion flame, 9
is internal inflammation, and 1o is external inflammation. Figure 1 Figure 2 Figure 3
Claims (1)
域を有するように燃焼させ、 該不完全燃焼領域中、又は該領域の近傍の非酸化性雰囲
気中に、ダイヤモンド析出用基材を設置し、基材温度を
ダイヤモンド析出温度に保持することにより、基材上に
ダイヤモンドを連続的に析出させることを特徴とする気
相法ダイヤモンドの合成法。[Scope of Claims] A raw material compound for diamond precipitation containing carbon is combusted so as to be emitted from the periphery of the annular shape toward the center so as to have an incomplete combustion region, and in or near the incomplete combustion region. A vapor phase method diamond characterized in that diamond is continuously deposited on the base material by installing a base material for diamond precipitation in a non-oxidizing atmosphere and maintaining the base material temperature at the diamond precipitation temperature. synthesis method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63026647A JPH01203295A (en) | 1988-02-09 | 1988-02-09 | Method for synthesizing diamond by vapor phase method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63026647A JPH01203295A (en) | 1988-02-09 | 1988-02-09 | Method for synthesizing diamond by vapor phase method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01203295A true JPH01203295A (en) | 1989-08-16 |
Family
ID=12199236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63026647A Pending JPH01203295A (en) | 1988-02-09 | 1988-02-09 | Method for synthesizing diamond by vapor phase method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01203295A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5186973A (en) * | 1990-09-13 | 1993-02-16 | Diamonex, Incorporated | HFCVD method for producing thick, adherent and coherent polycrystalline diamonds films |
| WO1993012273A1 (en) * | 1991-12-18 | 1993-06-24 | Kabushiki Kaisha Kobe Seiko Sho | Synthesis of diamond by combustion method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61271167A (en) * | 1985-05-25 | 1986-12-01 | Toyota Motor Corp | Steering wheel core material made of fiber reinforced resin and manufacture thereof |
-
1988
- 1988-02-09 JP JP63026647A patent/JPH01203295A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61271167A (en) * | 1985-05-25 | 1986-12-01 | Toyota Motor Corp | Steering wheel core material made of fiber reinforced resin and manufacture thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5186973A (en) * | 1990-09-13 | 1993-02-16 | Diamonex, Incorporated | HFCVD method for producing thick, adherent and coherent polycrystalline diamonds films |
| WO1993012273A1 (en) * | 1991-12-18 | 1993-06-24 | Kabushiki Kaisha Kobe Seiko Sho | Synthesis of diamond by combustion method |
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