JPH01236264A - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JPH01236264A JPH01236264A JP6189488A JP6189488A JPH01236264A JP H01236264 A JPH01236264 A JP H01236264A JP 6189488 A JP6189488 A JP 6189488A JP 6189488 A JP6189488 A JP 6189488A JP H01236264 A JPH01236264 A JP H01236264A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- filler
- weight
- silica powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 21
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 21
- 239000000203 mixture Substances 0.000 title claims abstract description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000000945 filler Substances 0.000 claims abstract description 16
- 239000000843 powder Substances 0.000 claims abstract description 14
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 14
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 8
- 239000002245 particle Substances 0.000 claims abstract description 6
- 238000005476 soldering Methods 0.000 abstract description 8
- 229920003986 novolac Polymers 0.000 abstract description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract description 4
- 125000003700 epoxy group Chemical group 0.000 abstract description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 3
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 19
- 229910000679 solder Inorganic materials 0.000 description 12
- 239000012778 molding material Substances 0.000 description 8
- 238000007789 sealing Methods 0.000 description 7
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000005350 fused silica glass Substances 0.000 description 5
- 230000008642 heat stress Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- -1 alicyclic cyclohexane derivatives Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QEZIKGQWAWNWIR-UHFFFAOYSA-N antimony(3+) antimony(5+) oxygen(2-) Chemical compound [O--].[O--].[O--].[O--].[Sb+3].[Sb+5] QEZIKGQWAWNWIR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
Landscapes
- Sealing Material Composition (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、耐半田ストレス性に優れた、電子部品等の封
止用エポキシ樹脂組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an epoxy resin composition for sealing electronic parts and the like, which has excellent solder stress resistance.
従来、ダイオード、トランジスタ、集積回路等の電子部
品を熱硬化性樹脂で封止しているが、特に集積回路では
耐熱性、耐湿性に優れた0−タレゾールノボラックエポ
キシ樹脂をノボラック型フェノール樹脂で硬化させたエ
ポキシ樹脂が用いられている。Conventionally, electronic components such as diodes, transistors, and integrated circuits are sealed with thermosetting resins, but especially for integrated circuits, 0-talesol novolac epoxy resin, which has excellent heat resistance and moisture resistance, is used as a novolac type phenolic resin. A hardened epoxy resin is used.
ところが近年、集積回路の高集積化に伴いチップがだん
だん大型化し、かつパッケージは従来のDIPタイプか
ら表面実装化された小型、薄型のフラットパッケージ、
SOP、SOJ、PLCCに変わってきている。However, in recent years, as integrated circuits have become more highly integrated, chips have become larger and larger, and packages have changed from the conventional DIP type to surface-mounted small, thin flat packages.
It is changing to SOP, SOJ, and PLCC.
即ち大型チップを小型で薄いパッケージに封入すること
になり、応力によるクラック発生、これらのクラックに
よる耐湿性の低下等の問題が大きくクローズアップされ
てきている。That is, a large chip is encapsulated in a small and thin package, and problems such as the occurrence of cracks due to stress and a decrease in moisture resistance due to these cracks have been brought into focus.
特に半田づけの工程において急激に200°C以上の高
温にさらされることによりパッケージの割れや樹脂とチ
ップの剥離により耐湿性が劣化してしまうといった問題
点がでてきている。Particularly in the soldering process, rapid exposure to high temperatures of 200° C. or higher has led to problems such as cracking of the package and deterioration of moisture resistance due to peeling of the resin and chip.
これらの大型チップを封止するのに適した、信鯨性の高
い封止用樹脂組成物の開発が望まれてきている。一方、
パッケージの複雑形状化、成形金型の大型化による流動
性の向上も望まれてきている。It has been desired to develop a sealing resin composition with high reliability that is suitable for sealing these large chips. on the other hand,
It is also desired to improve fluidity by making packages more complex in shape and making molds larger.
本発明の目的とするところは、半田熱ストレスによるク
ランク発注をおさえ、耐湿性に優れた信頼性が高く、且
つ流動性に優れた封止用樹脂組成物を提供するにある。An object of the present invention is to provide a sealing resin composition that suppresses crank orders due to soldering heat stress, has excellent moisture resistance, is highly reliable, and has excellent fluidity.
本発明は電子部品等の封止用エポキシ樹脂組成物におい
て充填剤として平均粒径が5〜40μmであり見掛は密
度が0.1〜0.6 g / ccであり比表面積が5
〜1ord/gであり、かつ表面の一部又は全部をガラ
ス化した多孔質のシリカ粉末を10〜100重量%含む
充填剤を用いることを特徴とするエポキシ樹脂組成物に
関するものである。The present invention is a filler in an epoxy resin composition for sealing electronic parts, etc., which has an average particle size of 5 to 40 μm, an apparent density of 0.1 to 0.6 g/cc, and a specific surface area of 5.
The present invention relates to an epoxy resin composition characterized in that it uses a filler containing 10 to 100% by weight of porous silica powder whose surface is partially or entirely vitrified.
本発明のエポキシ樹脂組成物は従来の封止用樹脂組成物
に比べて非常に優れた耐半田熱ストレス性を有するとと
もに、多孔質のシリカ粉末を10〜100重量%含む充
填剤を用いるエポキシ樹脂組成物を改良し、更に流動性
を大巾に向上させたものである。The epoxy resin composition of the present invention has extremely superior solder heat stress resistance compared to conventional sealing resin compositions, and is an epoxy resin using a filler containing 10 to 100% by weight of porous silica powder. The composition has been improved and the fluidity has been greatly improved.
すなわち多孔質シリカの表面層のみをガラス化すること
により、内部の多孔質構造を残しつつ、表面状態を通常
の熔融シリカ粉末に近づけ、耐半田熱ストレス性を維持
しつつ流動性を向上させんとしたものである。In other words, by vitrifying only the surface layer of porous silica, the internal porous structure remains and the surface condition approaches that of normal fused silica powder, improving fluidity while maintaining soldering heat stress resistance. That is.
本発明に用いるエポキシ樹脂としては、その分子中にエ
ポキシ基をすくなくとも2個以上有する化合物であれば
分子構造、分子量などは特に制限はなく、一般に封止用
材料として使用されているものであり、例えばノボラッ
ク系エポキシ樹脂、ビスフェノール型の芳香族系、シク
ロヘキサン誘導体の脂環式系、更には多官能系、シリコ
ン変性樹脂系があげられ、これらのエポキシ樹脂は1種
又は2種以上混合して用いられる。The epoxy resin used in the present invention is not particularly limited in molecular structure or molecular weight as long as it is a compound having at least two or more epoxy groups in its molecule, and is generally used as a sealing material. Examples include novolac epoxy resins, bisphenol-type aromatic resins, alicyclic cyclohexane derivatives, polyfunctional resins, and silicone-modified resins. These epoxy resins can be used singly or in combination of two or more. It will be done.
又硬化剤としてはノボラック型フェノール樹脂系および
これらの変性樹脂であり、例えばフエノールノボラツク
、0−タレゾールノボラックの他アルキル変性したフェ
ノールノボラック樹脂等があげられ、これらは単独もし
くは2種以上混合して使用しても差し支えがない。Curing agents include novolak type phenolic resins and modified resins thereof, such as phenol novolak, 0-talesol novolak, and alkyl-modified phenol novolac resins, which may be used alone or in combination of two or more. There is no problem in using it.
エポキシ樹脂と硬化剤の配合比はエポキシ樹脂のエポキ
シ基と硬化剤の水酸基との当量比が0.5〜5の範囲内
に有ることが望ましい。As for the compounding ratio of the epoxy resin and the curing agent, it is desirable that the equivalent ratio of the epoxy groups of the epoxy resin to the hydroxyl groups of the curing agent be within the range of 0.5 to 5.
当量比が0.5未満又は5を越えたものは耐湿性、成形
作業性及び硬化物の電気特性が悪くなるので好ましくな
い。If the equivalent ratio is less than 0.5 or more than 5, the moisture resistance, molding workability and electrical properties of the cured product will deteriorate, which is not preferred.
本発明に使用される硬化促進剤はエポキシ基とフェノー
ル性水酸基との反応を促進するものであればよ(、一般
に封止用材料に使用されているものを広く使用すること
ができ、例えばジアザビシクロウンデセン(DBU)、
)リフヱニルホスフィン(TPP)、ジメチルベンジル
アミン(BDMA)や2メチルイミダゾール(2MZ)
等が単独もしくは2種以上混合して用いられる。The curing accelerator used in the present invention may be any one as long as it promotes the reaction between the epoxy group and the phenolic hydroxyl group. Zabishikuroundesen (DBU),
) Rivenylphosphine (TPP), dimethylbenzylamine (BDMA) and 2methylimidazole (2MZ)
etc. may be used alone or in combination of two or more.
本発明に用いられる充填剤としては、平均粒径が5〜4
0μmであり、見掛は密度が0.1〜0.6 g/ c
cで、かつ比表面積が5〜10r+f/gであり、表面
の一部又は全部をガラス化した多孔質シリカ粉末であり
、使用する充填剤量の10〜100重量%の範囲で使用
する。The filler used in the present invention has an average particle size of 5 to 4
0 μm, and the apparent density is 0.1 to 0.6 g/c
It is a porous silica powder with a specific surface area of c and a specific surface area of 5 to 10 r+f/g, with part or all of the surface vitrified, and is used in an amount of 10 to 100% by weight of the amount of filler used.
表面をガラス化した多孔質シリカ粉末は、その平均粒径
が5μm未満、又は40 pmを越えると流動性の向上
が得られず、いずれの場合も好ましくない、特に好まし
くは10〜30μ謡であれば良い、又見掛は密度が0.
6 g / ccを越えると半田熱ストレスによるクラ
ックが発生し易くなり、耐湿性が低下してしまい好まし
くない。Porous silica powder with a vitrified surface cannot improve fluidity if its average particle size is less than 5 μm or exceeds 40 pm, which is undesirable in either case, and particularly preferably from 10 to 30 μm. It's fine, and the apparent density is 0.
If it exceeds 6 g/cc, cracks are likely to occur due to soldering heat stress, and moisture resistance decreases, which is undesirable.
さらに比表面積が5n′?/g未満であると半田づけ工
程でクランクが発生し易く、耐湿性が低下してしまう、
又10mm2/g以上となれば流動性の向上が得られず
好ましくない。Furthermore, the specific surface area is 5n'? If it is less than /g, cranks are likely to occur during the soldering process and moisture resistance will decrease.
Moreover, if it exceeds 10 mm2/g, no improvement in fluidity can be obtained, which is not preferable.
さらに多孔質シリカ粉末が、使用充填剤の量の10重量
%以下であれば半田づけ工程でクランクが発生しやすく
なり、耐湿性が低下し、その目的とする特性が得られな
い。Further, if the porous silica powder is less than 10% by weight of the amount of filler used, cranking is likely to occur during the soldering process, moisture resistance is reduced, and the desired characteristics cannot be obtained.
これらの充填剤は全体として樹脂組成物の50〜90重
量%配合する事が望ましい、その配合量が50%未満で
あれば耐熱性、機械的特性および■湿性が劣り、90%
以上であれば流動性が低下し、成形性が悪くなり実用に
は適さない。It is desirable that these fillers be blended in an amount of 50 to 90% by weight of the resin composition as a whole.If the blending amount is less than 50%, heat resistance, mechanical properties, and humidity will be poor;
If it is more than that, the fluidity will decrease and the moldability will deteriorate, making it unsuitable for practical use.
又、多孔質シリカ粉末以外の充填剤としては通常のシリ
カ粉末やアルミナ等があげられ、とくに熔融シリカ粉末
が好ましい。In addition, examples of fillers other than porous silica powder include ordinary silica powder and alumina, with fused silica powder being particularly preferred.
本発明の対土用エポキシ樹脂組成物はエポキシ樹脂、硬
化剤、硬化促進剤及び多孔質シリカ粉末を含む充填剤を
必須成分と、するが、これ以外に必要に応じてシランカ
ップリング剤、ブロム化エポキシ樹脂、二酸化アンチモ
ン、ヘキサブロムベンゼン等の難燃剤、カーボンブラッ
ク、ベンガラ等の着色剤、天然ワックス、合成ワ・ンク
ス等の離型剤及びシリコンオイル、ゴム等の低応力添加
剤等の種々の添加剤を適宜配合しても差し支えがない。The epoxy resin composition for soil use of the present invention has an epoxy resin, a curing agent, a curing accelerator, and a filler containing porous silica powder as essential components, but in addition to these, if necessary, a silane coupling agent, a bromine, etc. Flame retardants such as chemically modified epoxy resins, antimony dioxide and hexabromobenzene, colorants such as carbon black and red iron, mold release agents such as natural waxes and synthetic waxes, and low stress additives such as silicone oil and rubber. There is no problem in adding appropriate additives.
又、本発明の対土用エポキシ樹脂組成物を成形材料とし
て製造するには、エポキシ樹脂、硬化剤、硬化促進剤、
充填剤、その他の添加剤をミキサー等によって十分に均
一に混合した後、さらに熱ロールまたはニーダ−等で熔
融混練し、冷却後粉砕して成形材料とすることができる
。これらの成形材料は電子部品あるいは電子部品の封止
、被覆、絶縁等に適用することができる。In addition, in order to produce the epoxy resin composition for soil use of the present invention as a molding material, an epoxy resin, a curing agent, a curing accelerator,
After the filler and other additives are thoroughly and uniformly mixed using a mixer or the like, the mixture can be further melt-kneaded using a heated roll or kneader, cooled, and then ground to obtain a molding material. These molding materials can be applied to electronic parts or for sealing, covering, insulating, etc. of electronic parts.
本発明のエポキシ樹脂組成物は半田づけ工程による急激
な温度変化による熱ストレスを受けたときの耐クラツク
性に非常に優れ、耐湿性の良い組成物であり、電子、電
子部品の対土用、被覆用、絶縁用等に用いた場合、特に
表面実装パッケージに搭載された高集積大型チップIC
において信頼性が非常に高い製品を得ることができる。The epoxy resin composition of the present invention has excellent crack resistance when subjected to heat stress due to rapid temperature changes during the soldering process, and has good moisture resistance. When used for coating, insulation, etc., especially for highly integrated large chip ICs mounted on surface mount packages.
It is possible to obtain products with extremely high reliability.
実施例1
0−タレゾールノボラックエポキシ樹脂(軟化点65℃
、エポキシ当量200)100重量部
フェノールノボラック樹脂 56重貴重ブロム
化ビスフェノールAエポキシ樹脂(Br含存量46%、
当1360) 15重量部トリフェニルホスフ
ィン 1重量部三酸化アンチモン粉末
10重量部カルナバワックス
2重量部カーボンブラック
2重量部熔融シリカ粉末 400重量
部表面ガラス化多孔質シリカ
(平均粒径15μ論、見掛は密度
0、3 g / cc、比表面積6ポ/g 50重量部
T−グリシドメトキシシラン 3重量部をヘン
シェルミキサーで常温で混合し、70〜100°Cで2
軸ロールにより混練し、冷却後粉砕し成形材料とした。Example 1 0-talesol novolac epoxy resin (softening point 65°C
, epoxy equivalent 200) 100 parts by weight phenol novolac resin 56 heavy precious brominated bisphenol A epoxy resin (Br content 46%,
1360) 15 parts by weight triphenylphosphine 1 part by weight antimony trioxide powder
10 parts by weight carnauba wax
2 parts by weight carbon black
2 parts by weight Fused silica powder 400 parts by weight Surface vitrified porous silica (average particle size 15μ theory, apparent density 0.3 g/cc, specific surface area 6 po/g 50 parts by weight T-glycidomethoxysilane 3 parts by weight 1 part at room temperature with a Henschel mixer, and 2 parts at 70-100°C.
The mixture was kneaded using an axial roll, cooled, and then ground to obtain a molding material.
得られた成形材料をタブレット化し、低圧トランスファ
ー成形機にて175°C,70kg/eta。The obtained molding material was made into tablets and heated at 175°C and 70 kg/eta using a low-pressure transfer molding machine.
120秒の条件で半田クランク試験用として6×6mの
チップを52pパツケージに封止し、又半田耐湿性試験
用として3×6鵬のチップを16pSOPパツケージに
封止した。A 6×6m chip was sealed in a 52p package for a solder crank test under conditions of 120 seconds, and a 3×6m chip was sealed in a 16p SOP package for a solder moisture resistance test.
封止したテスト用素子について175°C,8時間ポス
トキュアー後、下記の半田クラック試験及び半田耐湿性
試験をおこなった。After post-curing the sealed test device at 175° C. for 8 hours, the following solder crack test and solder moisture resistance test were conducted.
半田クラック試験:封止したテスト用素子を85℃、8
5%RHの環境下で2411rおよび48Hr処理し、
その後260°Cの半田槽に10秒間浸漬後顕微鏡で外
部クラックを観察した。Solder crack test: sealed test element at 85℃, 8
2411r and 48Hr treatment under 5% RH environment,
Thereafter, it was immersed in a solder bath at 260°C for 10 seconds, and external cracks were observed using a microscope.
半田耐湿性試験:封止したテスト用素子を85゛C18
5%R)lの環境下で72Hr処理し、その後260°
Cの半田槽に10秒間浸漬後プレッシャークツカー試験
(125°C,100%RH)を行い回路のオープン不
良を測定した。Solder moisture resistance test: sealed test element at 85°C18
Treated for 72 hours in an environment of 5%R)l, then heated at 260°
After being immersed in a solder bath of C for 10 seconds, a pressure puller test (125°C, 100% RH) was conducted to measure open circuit defects.
試験結果を第1表に示す。The test results are shown in Table 1.
実施例2〜4
第1表の処方に従って配合し、実施例1と同様にして成
形材料を得て、この成形材料で試験用の封止したものを
得た。この成形材料を用いて実施例1と同様にテスト用
素子を封止して半田クランク試験及び半田耐湿性試験を
行った。Examples 2 to 4 Molding materials were obtained in the same manner as in Example 1 by blending according to the formulations in Table 1, and sealed products for testing were obtained with this molding material. Using this molding material, a test element was sealed in the same manner as in Example 1, and a solder crank test and a solder moisture resistance test were conducted.
試験結果を第1表に示す。The test results are shown in Table 1.
比較例1
実施例1において充填剤をすべて熔融シリカとした以外
はすべて実施例1と同様にし試験を行った結果を第1表
に示す。Comparative Example 1 Table 1 shows the results of a test conducted in the same manner as in Example 1 except that all the fillers were replaced with fused silica.
比較例2
実施例4の充填剤を総て熔融シリカとし、あとは実施例
4と同様にし、試験を行った結果を第1表に示す。Comparative Example 2 A test was conducted in the same manner as in Example 4 except that all the fillers in Example 4 were fused silica. Table 1 shows the results.
比較例3
実施例20表面ガラス化多孔質シリカを総てガラス化し
ていない多孔質シリカとし、あとは実施例2と同様にし
、試験を行った結果を第1表に示す。Comparative Example 3 Example 20 All of the surface vitrified porous silica was replaced with non-vitrified porous silica, and the rest was carried out in the same manner as in Example 2. Table 1 shows the results of the test.
Claims (1)
らなるエポキシ樹脂組成物において、平均粒径が5〜4
0μm、見掛け密度が0.1〜0.6g/cc、比表面
積が5〜10mm^2/gであり、かつ表面の一部又は
全部をガラス化した多孔質シリカ粉末を10〜100重
量%含む充填剤を用いることを特徴とするエポキシ樹脂
組成物。(1) In an epoxy resin composition consisting of an epoxy resin, a curing agent, a curing accelerator, and a filler, the average particle size is 5 to 4.
0 μm, an apparent density of 0.1 to 0.6 g/cc, a specific surface area of 5 to 10 mm^2/g, and contains 10 to 100% by weight of porous silica powder whose surface is partially or entirely vitrified. An epoxy resin composition characterized by using a filler.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6189488A JPH07107123B2 (en) | 1988-03-17 | 1988-03-17 | Epoxy resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6189488A JPH07107123B2 (en) | 1988-03-17 | 1988-03-17 | Epoxy resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01236264A true JPH01236264A (en) | 1989-09-21 |
| JPH07107123B2 JPH07107123B2 (en) | 1995-11-15 |
Family
ID=13184306
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6189488A Expired - Fee Related JPH07107123B2 (en) | 1988-03-17 | 1988-03-17 | Epoxy resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07107123B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6495270B1 (en) | 1998-02-19 | 2002-12-17 | Hitachi Chemical Company, Ltd. | Compounds, hardening accelerator, resin composition, and electronic part device |
| JP2005290191A (en) * | 2004-03-31 | 2005-10-20 | Tdk Corp | Resin composition, electronic part, coil body and inductor |
| JP2007119547A (en) * | 2005-10-26 | 2007-05-17 | Yoshikawa Kogyo Co Ltd | Epoxy resin composition, hollow package for semiconductor device and semiconductor part device |
-
1988
- 1988-03-17 JP JP6189488A patent/JPH07107123B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6495270B1 (en) | 1998-02-19 | 2002-12-17 | Hitachi Chemical Company, Ltd. | Compounds, hardening accelerator, resin composition, and electronic part device |
| JP2005290191A (en) * | 2004-03-31 | 2005-10-20 | Tdk Corp | Resin composition, electronic part, coil body and inductor |
| JP2007119547A (en) * | 2005-10-26 | 2007-05-17 | Yoshikawa Kogyo Co Ltd | Epoxy resin composition, hollow package for semiconductor device and semiconductor part device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07107123B2 (en) | 1995-11-15 |
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| LAPS | Cancellation because of no payment of annual fees |