JPH01152151A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH01152151A
JPH01152151A JP30965787A JP30965787A JPH01152151A JP H01152151 A JPH01152151 A JP H01152151A JP 30965787 A JP30965787 A JP 30965787A JP 30965787 A JP30965787 A JP 30965787A JP H01152151 A JPH01152151 A JP H01152151A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
filler
silica powder
sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30965787A
Other languages
Japanese (ja)
Other versions
JPH0588904B2 (en
Inventor
Koichi Tanaka
孝一 田中
Naoki Mogi
直樹 茂木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP30965787A priority Critical patent/JPH01152151A/en
Publication of JPH01152151A publication Critical patent/JPH01152151A/en
Publication of JPH0588904B2 publication Critical patent/JPH0588904B2/ja
Granted legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain a sealing epoxy resin composition being resistant to cracking by a stress of soldering heat and having excellent humidity resistance and high reliability, by using a filler containing porous silica powder. CONSTITUTION:This epoxy resin composition comprises an epoxy resin, a curing agent, a cure accelerator and a filler, wherein the filler contains 10-100wt.% silica powder having a means particle diameter of 5-40mu, an apparent density of 0.1-0.6g/cc and a specific surface area of 5-20m<2>/g. This composition is one very excellent in cracking resistance upon being subjected to a thermal stress due to an abrupt change in the temperature of soldering and good in humidity resistance, and it can give a product of a very high reliability when used for sealing, coating, insulation, etc., of an electronic or electrical component, especially, in a high-integration large-scale IC mounted on a surface mounting package.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、耐半田ストレス性に優れた、電子部品等の封
止用エポキシ樹脂組成物に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an epoxy resin composition for sealing electronic components and the like, which has excellent solder stress resistance.

(従来技術) 従来、ダイオード、トランジスタ、集積回路等の電子部
品を熱硬化性樹脂で封止しているが、特に集積回路では
耐熱性、耐湿性に優れたO−クレゾールノボラックエポ
キシ樹脂をノボラック型フェノール樹脂で硬化させたエ
ポキシ樹脂が用いられている。
(Prior art) Conventionally, electronic components such as diodes, transistors, and integrated circuits have been encapsulated with thermosetting resins. Especially for integrated circuits, O-cresol novolac epoxy resin, which has excellent heat resistance and moisture resistance, is used as a novolac type. Epoxy resin cured with phenolic resin is used.

ところが近年、集積回路の高集積化に伴いチップがだん
だん大型化し、かつパッケージは従来のDIPタイプか
ら表面実装化された小型、薄型のフラットパッケージ、
SOP、SOJ、PLCCに変わってきている。
However, in recent years, as integrated circuits have become more highly integrated, chips have become larger and larger, and packages have changed from the conventional DIP type to surface-mounted small, thin flat packages.
It is changing to SOP, SOJ, and PLCC.

即ち大型チップをコンパクトで薄いパッケージに封入す
ることになり、応力によるクラック発生、これらのクラ
ックによる耐湿性の低下等の問題が大きくクローズアッ
プされてきている。
That is, a large chip is enclosed in a compact and thin package, and problems such as the occurrence of cracks due to stress and a decrease in moisture resistance due to these cracks have been brought into focus.

特に半田づけの工程において急激に200℃以上の高温
にさらされることによりパッケージの割れや樹脂とチッ
プの剥離により耐湿性が劣化してしまうといった問題点
がでてきている。
In particular, problems have arisen in that moisture resistance deteriorates due to cracking of the package and peeling of the resin and chip due to sudden exposure to high temperatures of 200° C. or higher during the soldering process.

これらの大型チップを封止するのに適した、信頼性の高
い封止用樹脂酸物の開発が望まれてきている。
It has been desired to develop a highly reliable sealing resin acid suitable for sealing these large chips.

(発明の目的) 本発明の目的とするところは、半田熱ストレスによるク
ラック発生をおさえ、耐湿性に優れた信頼性の高い封止
用樹脂組成物を提供するにある。
(Objective of the Invention) An object of the present invention is to provide a highly reliable sealing resin composition that suppresses the occurrence of cracks due to solder heat stress, has excellent moisture resistance, and has excellent moisture resistance.

(発明の構成) 本発明は電子部品等の封止用エポキシ樹脂組成物におい
て充填剤として平均粒径が5〜40μmであり見掛は密
度が0.1〜0 、6 g/ccであり、かつ比表面積
が5〜20m27gである多孔質のシリカ粉末を充填剤
量の10〜100重量%のものを用いることを特徴とす
るエポキシ樹脂組成物に関するものである。
(Structure of the Invention) The present invention provides an epoxy resin composition for sealing electronic parts etc. as a filler having an average particle size of 5 to 40 μm and an apparent density of 0.1 to 0.6 g/cc, The present invention also relates to an epoxy resin composition characterized in that porous silica powder having a specific surface area of 5 to 20 m27 g is used in an amount of 10 to 100% by weight of the filler.

本発明のエポキシ樹脂組成物は従来の封止用樹脂組成物
に比べて非常に優れた耐半田熱ストレス性を有したもの
である。
The epoxy resin composition of the present invention has extremely superior soldering heat stress resistance compared to conventional sealing resin compositions.

本発明に用いるエポキシ樹脂としては、その分子中にエ
ポキシ基をすくなくとも2個以上有する化合物であれば
分子構造、分子量などは特に制限はなく、一般に封止用
材料として使用されているものであり、例えばノボラッ
ク系エポキシ樹脂、ビスフェノール型の芳香族系、シク
ロヘキサン誘導体の脂環式系、更には多官能系、シリコ
ン変性樹脂系があげられ、これらのエポキシ樹脂は1種
又は2種以上混合して用いられる。
The epoxy resin used in the present invention is not particularly limited in molecular structure or molecular weight as long as it is a compound having at least two or more epoxy groups in its molecule, and is generally used as a sealing material. Examples include novolac epoxy resins, bisphenol-type aromatic resins, alicyclic cyclohexane derivatives, polyfunctional resins, and silicone-modified resins. These epoxy resins can be used singly or in combination of two or more. It will be done.

又硬化剤としてはノボラック型フェノール樹脂系および
これらの変性樹脂であり、例えばフェノールノボラック
、0−クレゾールノボラックの他アルキル変性したフェ
ノールノボラック樹脂等があげられ、これらは単独もし
くは2種以上混合して使用しても差し支えがない。
Further, curing agents include novolak type phenolic resins and modified resins thereof, such as phenol novolak, 0-cresol novolak, and alkyl-modified phenol novolak resins, which may be used alone or in combination of two or more. There is no harm in doing so.

エポキシ樹脂と硬化剤の配合比はエポキシ樹脂のエポキ
シ基と硬化剤の水酸基との当量比が0.5〜5の範囲内
に有ることが望ましい。
As for the compounding ratio of the epoxy resin and the curing agent, it is desirable that the equivalent ratio of the epoxy groups of the epoxy resin to the hydroxyl groups of the curing agent be within the range of 0.5 to 5.

当量比が0.5未満又は5を越えたものは耐湿性、成形
作業性及び硬化物の電気特性が悪くなるので好ましくな
い。
If the equivalent ratio is less than 0.5 or more than 5, the moisture resistance, molding workability and electrical properties of the cured product will deteriorate, which is not preferred.

本発明に使用される硬化促進剤はエポキシ基とフェノー
ル性水酸基との反応を促進するものであれン ばよく、一般に封止用材料に使用されているものを広く
使用態ることができ、例えばジアザビシクロウンデセン
(DBU)、)リフェニルホスフィン(TPP)、ジメ
チルベンジルアミン(BDMA)や2メチルイミダゾー
ル(2MZ)等が単独もしくは2種以上混合して用いら
れる。
The curing accelerator used in the present invention may be any one that promotes the reaction between the epoxy group and the phenolic hydroxyl group, and a wide variety of those commonly used in sealing materials can be used, such as Diazabicycloundecene (DBU), triphenylphosphine (TPP), dimethylbenzylamine (BDMA), 2methylimidazole (2MZ), and the like are used alone or in combination of two or more.

本発明に用いられる充填剤としては、平均粒径が5〜4
0μmであり、見掛は密度が0.1〜0.6g/ccで
あり、かつ比表面積が5〜20m2/gである多孔質シ
リカ粉末を、使用する充填剤量の10〜100重量%の
範囲で使用する。
The filler used in the present invention has an average particle size of 5 to 4
Porous silica powder having a diameter of 0 μm, an apparent density of 0.1 to 0.6 g/cc, and a specific surface area of 5 to 20 m2/g is used in an amount of 10 to 100% by weight of the amount of filler used. Use within range.

多孔質シリカ粉末は、その平均粒径が5μm未満、又は
40μmを越えると流動性が低下し、いずれの場合も好
ましくない。
If the average particle size of the porous silica powder is less than 5 μm or more than 40 μm, the fluidity will decrease, and either case is not preferable.

又見掛は密度が0 、6 g/ccを越えると半田熱ス
トレスによるクラックが発生し易くなり、耐湿性が低下
してしまい好ましくない。
Moreover, if the apparent density exceeds 0.6 g/cc, cracks are likely to occur due to soldering heat stress, and moisture resistance will decrease, which is undesirable.

さらに比表面積が5 m2/g未満であると半田づけ工
程でクラックが発生し易く、耐湿性が低下してしまう。
Furthermore, if the specific surface area is less than 5 m2/g, cracks are likely to occur during the soldering process, resulting in a decrease in moisture resistance.

又20m2/g以上となれば流動性がいちぢるしく低下
してしまい好ましくない。
Moreover, if it exceeds 20 m2/g, the fluidity will drop significantly, which is not preferable.

さらに多孔質シリカ粉末が、使用充填剤の量の10重量
%以下であれば半田づけ工程でクラックが発生しやすく
なり、耐湿性が低下し、その目的とする特性が得なれな
い。
Furthermore, if the porous silica powder is less than 10% by weight of the amount of filler used, cracks are likely to occur during the soldering process, moisture resistance is reduced, and the desired characteristics cannot be obtained.

これらの充填剤は全体として樹脂組成物の50〜90重
量%配合する事が望ましい。その配合量が50%未満で
あれば耐熱性、機械的特性および耐湿性が劣り、90%
以上であれば流動性が低下し、成形性が悪くなり実用に
は適さない。
It is desirable that these fillers be blended in an amount of 50 to 90% by weight of the resin composition as a whole. If the amount is less than 50%, heat resistance, mechanical properties and moisture resistance will be poor;
If it is more than that, the fluidity will decrease and the moldability will deteriorate, making it unsuitable for practical use.

又、多孔質シリカ粉末以外の充填剤としては通常のシリ
カ粉末やアルミナ等があげられ、とくに熔融シリカ粉末
が好ましい。
In addition, examples of fillers other than porous silica powder include ordinary silica powder and alumina, with fused silica powder being particularly preferred.

本発明の封止用エポキシ樹脂組成物はエポキシ樹脂、硬
化剤、硬化促進剤及び多孔質シリカ粉末充填剤を必須成
分とするが、これ以外に必要に応じてシランカップリン
グ剤、ブロム化エポキシ樹脂、三酸化アンチモン、ヘキ
サブロムベンゼン等の難燃剤、カーボンブラック、ベン
ガラ等の着色剤、天然ワックス、合成ワックス等の離型
剤及びシリコンオイル、ゴム等の低応力添加剤等の種々
の添加剤を適宜配合しても差し支え゛がない。
The epoxy resin composition for sealing of the present invention contains an epoxy resin, a curing agent, a curing accelerator, and a porous silica powder filler as essential components. , flame retardants such as antimony trioxide and hexabromobenzene, colorants such as carbon black and red iron, mold release agents such as natural wax and synthetic wax, and low stress additives such as silicone oil and rubber. There is no problem in appropriately blending them.

又、本発明の封止用エポキシ樹脂組成物を成形材料とし
て製造するには、エポキシ樹脂、硬化剤、硬化促進剤、
充填剤、その他の添加剤をミキサー等にようて十分に均
一に混合した後、さらに熱ロールまたはニーダ−等で熔
融混練し、冷却後粉砕して成形材料とすることができる
。これらの成形材料は電子部品あるいは電気部品の封止
、被覆、絶縁等に適用することができる。
In addition, in order to produce the epoxy resin composition for sealing of the present invention as a molding material, an epoxy resin, a curing agent, a curing accelerator,
After the filler and other additives are thoroughly and uniformly mixed in a mixer or the like, the mixture is further melted and kneaded in a hot roll or kneader, cooled, and then pulverized to obtain a molding material. These molding materials can be applied to sealing, covering, insulating, etc. electronic or electrical components.

(発明の効果) 本発明のエポキシ樹脂組成物は半田づけ工程による急激
な温度変化による熱ストレスを受けたときの耐クラツク
性に非常に優れ、耐湿性の良い組成物であり、電子、電
気部品の封止用、被覆用、絶縁用等に用いた場合、特に
表面実装パッケージに搭載された高集積大型チップIC
において信頼性が非常に高い製品を得ることができる。
(Effects of the Invention) The epoxy resin composition of the present invention has excellent crack resistance when subjected to heat stress due to sudden temperature changes during the soldering process, and is a composition with good moisture resistance. When used for sealing, coating, insulation, etc., especially for highly integrated large chip ICs mounted on surface mount packages.
It is possible to obtain products with extremely high reliability.

(実施例) 実施例1 0−クレゾールノボラックエポキシ樹脂(軟化点65℃
、エポキシ当量200)100重量部 フェノールノボラック樹脂   50重量部トリフェニ
ルホスフィン     1重量部三酸化アンチモン粉末
     18重量部カルナバワックス       
 2重量部カーボンブラック        2重量部
熔融シリカ粉末       328重量部多孔質シリ
カ粉末   (平均粒径15μm、見掛は密度0 、3
 B7cc、比表面積7 m2/g)43重量部 γ−グリシドメトキシシラン   3重量部をリボンブ
レンダーで常温で混合し、70〜100℃で2軸ロール
により混練し、冷却後粉砕し成形材料とした。
(Example) Example 1 0-cresol novolac epoxy resin (softening point 65°C
, epoxy equivalent 200) 100 parts by weight Phenol novolac resin 50 parts by weight Triphenylphosphine 1 part by weight Antimony trioxide powder 18 parts by weight Carnauba wax
2 parts by weight carbon black 2 parts by weight fused silica powder 328 parts by weight porous silica powder (average particle size 15 μm, apparent density 0,3
B7cc, specific surface area 7 m2/g) 43 parts by weight 3 parts by weight of γ-glycidomethoxysilane were mixed at room temperature with a ribbon blender, kneaded with a twin-screw roll at 70 to 100°C, and after cooling, pulverized to obtain a molding material. .

得られた成形材料をタブレット化し、低圧トランスファ
ー成形機にて175°C170kg/cm2.120秒
の条件で半田クラック試験用として6X6mmのチップ
を52pパツケージに封止し、又半田耐湿性試験用とし
て3X6mmのチップを16pSOPパツケージに封止
しな。
The obtained molding material was made into tablets, and a 6x6mm chip was sealed in a 52p package for a solder crack test using a low-pressure transfer molding machine at 175°C, 170kg/cm, and 2.120 seconds, and a 3x6mm chip was sealed for a solder moisture resistance test. encapsulate the chip in a 16p SOP package.

封止したテスト用素子について下記の半田クラック試験
及び半田耐湿性試験をおこなった。
The following solder crack test and solder moisture resistance test were conducted on the sealed test device.

半田クラック試験:封止したテスト用素子を85℃、8
51RHの環境下で24tlrおよび48Hr処理し、
その後260℃の半田槽に10秒間浸漬後顕微鏡で外部
クラックを観察した。
Solder crack test: sealed test element at 85℃, 8
24tlr and 48Hr treatment under 51RH environment,
Thereafter, it was immersed in a solder bath at 260° C. for 10 seconds, and external cracks were observed using a microscope.

半田耐湿性試験:封止したテスト用素子を85°C18
5%RHの環境下で72Hr処理し、その後260℃の
半田槽に10秒間浸浸漬後レッシャークツカー試験(1
25℃、100$R)りを行い回路のオープン不良を測
定した。
Solder moisture resistance test: sealed test element at 85°C18
Processed for 72 hours in an environment of 5% RH, then immersed in a solder bath at 260°C for 10 seconds, and then subjected to Rescher-Kutsker test (1).
25° C. and 100 $R) to measure open defects in the circuit.

試験結果を第1表に示す。The test results are shown in Table 1.

実施例2〜4 第1表の処方に従って配合し、実施例1と同様にして成
形材料を得て、この成形材料で試験用の封止したものを
得た。この成形材料を用いて実施例1と同様にテスト用
素子を封止して半田クラ・ンク試験及び半田耐湿性試験
を行った。
Examples 2 to 4 Molding materials were obtained in the same manner as in Example 1 by blending according to the formulations in Table 1, and sealed products for testing were obtained with this molding material. Using this molding material, a test element was sealed in the same manner as in Example 1, and a solder crank test and a solder moisture resistance test were conducted.

試験結果を第1表に示す。The test results are shown in Table 1.

比較例1 実施例1において充填剤をすべて熔融シリカとした以外
はすべて実施例1と同様にし試験を行った結果を第1表
に示す。
Comparative Example 1 Table 1 shows the results of a test conducted in the same manner as in Example 1 except that all the fillers were replaced with fused silica.

比較例2 実施例4の充填剤を総て熔融シリカとし、あとは実施例
4と同様にし、試験を行った結果を第1表に示す。
Comparative Example 2 A test was conducted in the same manner as in Example 4 except that all the fillers in Example 4 were fused silica. Table 1 shows the results.

Claims (1)

【特許請求の範囲】[Claims] エポキシ樹脂、硬化剤、硬化促進剤及び充填剤からなる
エポキシ樹脂組成物において、平均粒径が5〜40μm
、見掛け密度が0.1〜0.6g/ccであり、かつ比
表面積が5〜20m^2/gである多孔質のシリカ粉末
を10〜100重量%含む充填剤を用いることを特徴と
するエポキシ樹脂組成物。
In an epoxy resin composition consisting of an epoxy resin, a curing agent, a curing accelerator, and a filler, the average particle size is 5 to 40 μm.
, characterized by using a filler containing 10 to 100% by weight of porous silica powder having an apparent density of 0.1 to 0.6 g/cc and a specific surface area of 5 to 20 m^2/g. Epoxy resin composition.
JP30965787A 1987-12-09 1987-12-09 Epoxy resin composition Granted JPH01152151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30965787A JPH01152151A (en) 1987-12-09 1987-12-09 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30965787A JPH01152151A (en) 1987-12-09 1987-12-09 Epoxy resin composition

Publications (2)

Publication Number Publication Date
JPH01152151A true JPH01152151A (en) 1989-06-14
JPH0588904B2 JPH0588904B2 (en) 1993-12-24

Family

ID=17995693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30965787A Granted JPH01152151A (en) 1987-12-09 1987-12-09 Epoxy resin composition

Country Status (1)

Country Link
JP (1) JPH01152151A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01268711A (en) * 1988-04-20 1989-10-26 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor
JP2002363384A (en) * 2001-06-13 2002-12-18 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
US6525160B1 (en) * 1999-06-17 2003-02-25 Arakawa Chemical Industries Ltd. Epoxy resin composition and process for producing silane-modified epoxy resin
JP2007119547A (en) * 2005-10-26 2007-05-17 Yoshikawa Kogyo Co Ltd Epoxy resin composition, hollow package for semiconductor device and semiconductor part device
DE112007002983T5 (en) 2006-12-06 2009-10-08 Nok Corp. Seal and sealing system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01268711A (en) * 1988-04-20 1989-10-26 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor
US6525160B1 (en) * 1999-06-17 2003-02-25 Arakawa Chemical Industries Ltd. Epoxy resin composition and process for producing silane-modified epoxy resin
JP2002363384A (en) * 2001-06-13 2002-12-18 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2007119547A (en) * 2005-10-26 2007-05-17 Yoshikawa Kogyo Co Ltd Epoxy resin composition, hollow package for semiconductor device and semiconductor part device
DE112007002983T5 (en) 2006-12-06 2009-10-08 Nok Corp. Seal and sealing system

Also Published As

Publication number Publication date
JPH0588904B2 (en) 1993-12-24

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