JPH013024A - Method for manufacturing doped quartz glass - Google Patents

Method for manufacturing doped quartz glass

Info

Publication number
JPH013024A
JPH013024A JP62-158733A JP15873387A JPH013024A JP H013024 A JPH013024 A JP H013024A JP 15873387 A JP15873387 A JP 15873387A JP H013024 A JPH013024 A JP H013024A
Authority
JP
Japan
Prior art keywords
pores
glass
sol
close
gel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62-158733A
Other languages
Japanese (ja)
Other versions
JPS643024A (en
Inventor
悟 宮下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP15873387A priority Critical patent/JPS643024A/en
Priority claimed from JP15873387A external-priority patent/JPS643024A/en
Publication of JPH013024A publication Critical patent/JPH013024A/en
Publication of JPS643024A publication Critical patent/JPS643024A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は石英レーザーガラス、 ガラスフィルター、蛍
光ガラス管、光学レンズ等への応用可能な均質で大型の
ドープト石英ガラスの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing homogeneous, large-sized doped quartz glass that can be applied to quartz laser glass, glass filters, fluorescent glass tubes, optical lenses, and the like.

〔従来の技術〕[Conventional technology]

ドープト石英ガラスの製造方法としては、各種提察され
ているが、 次の3つの方法に大別できる。
Various methods have been proposed for producing doped silica glass, but they can be broadly classified into the following three methods.

(i)火焔酸化分解溶融法 (ii )スート混入ガラス化法 (iii )ゾルゲル法 〔発明が解決しようとする問題点〕 しかし従来の方法では、均質で大型のドープト石英ガラ
スは得られていない。
(i) Flame oxidative decomposition melting method (ii) Soot-containing vitrification method (iii) Sol-gel method [Problems to be solved by the invention] However, with the conventional methods, homogeneous and large-sized doped quartz glass has not been obtained.

火焔酸化分解溶融法は、脈理が発生するうえ、大型化が
難かしい。また原料やエネルギーの転換効率が極めて悪
く、特殊な装置を必要とするなど間凹点が多い。スート
混入ガラス化法は、ドーバントの添加量や分布の制御が
難かしく、均質なガラス体の製造は本質的に不可能であ
る。
The flame oxidation decomposition melting method generates striae and is difficult to scale up. Additionally, there are many drawbacks, such as extremely low conversion efficiency of raw materials and energy, and the need for special equipment. In the soot-containing vitrification method, it is difficult to control the amount and distribution of dopant added, and it is essentially impossible to produce a homogeneous glass body.

ゾルゲル法は常温、液体状鰐でドーパントの均質な添加
が可能であり、 理論的には最も優れたドープトガラス
の製造方法である。しかし従来法では気泡やクラックが
発生しやすく、大型化や高品質化は望めない。
The sol-gel method allows for the homogeneous addition of dopants in liquid form at room temperature, and is theoretically the best method for producing doped glass. However, with the conventional method, bubbles and cracks are likely to occur, and it is not possible to increase the size or improve the quality.

したがって得られたドープト石英ガラスは実用にほど遠
く、気泡−脈理・クラック等が発生しており、ガラス体
の均質性も定かではない断片的な形状に留まっていた。
Therefore, the obtained doped quartz glass was far from being of practical use, and had bubbles, striae, cracks, etc., and the homogeneity of the glass body remained in a fragmentary shape.

石英ガラスは熱加工が困難なうえ、均質性を保持する意
味でも目的形状の一発成型が好ましいが、これが可能な
方法は今までのところ実在しなかった。
Silica glass is difficult to thermally process, and it is preferable to mold it into the desired shape in one shot in order to maintain homogeneity, but to date there has been no method that allows this.

そこで本発明は石英レーザーガラス、ガラスフィルター
、蛍光ガラス管、光学レンズ等への応用可能な均質で大
型のドープト石英ガラス及びドープトガラスの容易な製
造方法を提供することを目的とするものである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for easily producing homogeneous, large-sized doped quartz glass and doped glass that can be applied to quartz laser glasses, glass filters, fluorescent glass tubes, optical lenses, and the like.

〔問題点を解決するための手段〕[Means for solving problems]

本発明のドープト石英ガラスの製造方法は、少なくとも
アルキルシリケート、シリカ微粒子、オヨび金属元素を
含仔する化合物が原料であるゾル溶液をゲル化させる工
程、乾燥させてトライゲルを作成する工程、前記ドライ
ゲルを加熱して閉孔化させガラス体とする工程からなる
ゾルゲル法を用いたガラス体合成において、ドライゲル
の閉孔化を以下の3つの方法のいずれかを用いて行なう
ことを特徴とする。
The method for producing doped quartz glass of the present invention includes a step of gelling a sol solution made of a compound containing at least an alkyl silicate, silica fine particles, and a metal element, a step of drying to create a trigel, and a step of drying the dry gel. In glass body synthesis using the sol-gel method, which consists of a step of heating dry gel to close the pores to form a glass body, the pores of the dry gel are closed using one of the following three methods.

a)ヘリウム雰囲気で焼結し閉孔化させる。a) Sinter in a helium atmosphere to close the pores.

b)減圧下で焼結し、閉孔化させる。b) Sintering under reduced pressure to close the pores.

C)ヘリウム雰囲気にした後、減圧にして填結し閉孔化
させる。
C) After creating a helium atmosphere, the pressure is reduced to seal and close the pores.

〔作用〕[Effect]

ゾルゲル法を用いると、金属元素を高Q度かつ均一にド
ーピングできる。ゾルに金属イオンまたは金属化合物が
均質に分散した状口のままガラス化するためである。し
かし従来から知られているアルキルシリケートを加水分
解するだけのゾルゲル法では、産業上応用可能な大きさ
の塊状ガラス体は得られていない。
When the sol-gel method is used, metal elements can be doped uniformly with a high Q degree. This is because the metal ions or metal compounds are vitrified while remaining homogeneously dispersed in the sol. However, the conventionally known sol-gel method, which only hydrolyzes alkyl silicate, has not been able to produce bulk glass bodies of a size that is industrially applicable.

アルキルシリケートを酸性触媒を用いて加水分解した溶
液にシリカ微粒子を分散させると、乾燥や焼結で割れな
い多孔質のドライゲルを作製することができる。ゾルを
pH3〜6の範囲に調整すると、加水分解生成物である
テトラヒドロキシシランの重合速度が促進されて網目構
造を強化し、更に割れにくい強固な構造をとる。このド
ライゲルを1100°C以上に加熱すると透明なガラス
体となるが、焼結の途中で生成する閉孔に閉じ込められ
たガスが熱で膨張し、ガラス体に気泡として残留してし
まう。
When fine silica particles are dispersed in a solution obtained by hydrolyzing an alkyl silicate using an acidic catalyst, a porous dry gel that does not crack during drying or sintering can be produced. When the pH of the sol is adjusted to a range of 3 to 6, the polymerization rate of tetrahydroxysilane, which is a hydrolysis product, is accelerated, the network structure is strengthened, and a strong structure that is difficult to crack is formed. When this dry gel is heated to 1100° C. or higher, it becomes a transparent glass body, but the gas trapped in the closed pores generated during sintering expands due to the heat and remains in the glass body as bubbles.

そこで多孔質体であるドライゲルの閉孔化温度(500
°C〜1400℃)における焼結雰囲気が重要となる。
Therefore, the pore-closing temperature of the porous dry gel (500
The sintering atmosphere at a temperature of 1400°C to 1400°C is important.

 ヘリウムは石英ガラス中のガス透過率が8X10−’
  (cc@cm−” *sec、−’  ・atm−
’  ak−’)と酸素のexto−’’  (CC”
Cm””  ”5ec−” atm−’ ”k−’ )
や水素の、6X10−”  (cc@cm−’ 拳5e
c−’  satm−’ *に一’)に比べ極端に高(
、数百ミクロンの閉孔に閉じこめられても、ガスが周囲
に拡散し、閉孔は焼結により消失する。減圧下で閉孔化
させた場合、閉孔に閉じ込められる気体分子の絶対量が
少ないため、加熱しても膨張せずに消失へと向かう。−
度ヘリウム雰囲気にした後、減圧にして閉孔化させると
、閉孔にわずかに残存する気体がヘリウムであるため、
更に効果的である。
The gas permeability of helium in quartz glass is 8X10-'
(cc@cm-"*sec,-' ・atm-
'ak-') and oxygen exo-''(CC"
Cm"""5ec-"atm-'"k-')
and hydrogen, 6X10-"(cc@cm-' fist5e
c-'satm-' is extremely high (
Even if the gas is confined in closed pores of several hundred microns, the gas will diffuse to the surroundings and the closed pores will disappear by sintering. When the pores are closed under reduced pressure, the absolute amount of gas molecules trapped in the closed pores is small, so even when heated, they do not expand and tend to disappear. −
After creating a helium atmosphere, when the pressure is reduced to close the pores, a small amount of gas remaining in the closed pores is helium.
It is even more effective.

閉孔化温度が低すぎると、閉孔内にH,Oや各種分解ガ
スが発生し、焼結雰囲気との混合ガスになる。原料シリ
カ微粒子の混合比や粒径を制御して、閉孔化温度をでき
るだけ高山にする必要がある。従来のアルキルシリケー
トを加水分解するだけのゾルゲル法では、焼結雰囲気を
制御しても発生ガスのため、必ず発泡が起こる。
If the pore-closing temperature is too low, H, O, and various decomposed gases are generated in the closed pores, and become a mixed gas with the sintering atmosphere. It is necessary to control the mixing ratio and particle size of the raw silica fine particles to make the pore-closing temperature as high as possible. In the conventional sol-gel method, which only hydrolyzes alkyl silicate, foaming always occurs due to generated gas even if the sintering atmosphere is controlled.

〔実施例1〕 エヂルシリケート、無水エタノール、水、アンモニア水
(29%)をモル比で1ニア、6:4:0.08の割合
になるように混合し約5時間撹拌した後、室温で数日間
熟成し、減圧濃縮することにより、分散性の良いシリカ
微粒子溶液を調製した。
[Example 1] Edyl silicate, absolute ethanol, water, and aqueous ammonia (29%) were mixed at a molar ratio of 1 nia, 6:4:0.08, stirred for about 5 hours, and then heated to room temperature. A fine silica particle solution with good dispersibility was prepared by aging the mixture for several days and concentrating it under reduced pressure.

次にエチル/リケードに重量比で1:1になるように0
.02規定の塩酸を加え、水冷しながら約2時間撹拌す
ることにより加水分解溶液を:A製しlこ。
Next, add 0 to ethyl/licade so that the weight ratio is 1:1.
.. A hydrolyzed solution was prepared by adding 02N hydrochloric acid and stirring for about 2 hours while cooling with water.

シリカ微粒子!8我のl) I−1値を2規定の塩酸を
用いて、15に調整した後、 加水分解溶液を混合し、
均質な溶液となるまで十分撹拌した。 その後、このw
i 液に、Ce / S i O* = 100 P 
pmとするように所定量のセリウムを塩化第一セリウ”
 76 ;夜の形で添加し、約1時間撹拌を続けた。こ
のi;;lt2のp +−を値を0.4規定のアンモニ
ア水を用いて50に調整し、約50分かけてゲル化させ
た。
Silica particles! 8.1) After adjusting the I-1 value to 15 using 2N hydrochloric acid, mix the hydrolysis solution,
Stir thoroughly until a homogeneous solution is obtained. After that, this lol
In the i liquid, Ce / S i O * = 100 P
Add a predetermined amount of cerium to cerium chloride to make pm.
76; Added overnight and continued stirring for about 1 hour. The value of p + - of this i;;lt2 was adjusted to 50 using 0.4N aqueous ammonia, and gelation was performed over about 50 minutes.

このゲル体をポリプロピレン製の乾燥容器(冊口早0.
3%程度)に移し入れ、約60°Cに保たれた恒温乾燥
機を用いて約2遇間で乾燥し、空気中に放置しても割れ
ない多孔質ゲル体を得た。
This gel body is dried in a polypropylene drying container.
3%) and dried in a constant temperature dryer kept at about 60°C for about 2 times to obtain a porous gel body that does not crack even when left in the air.

このゲル体を酸素/窒素雰囲気中で一旦1000C声で
加熱し、綜合反応の促進、脱水、脱件機物等の各種処理
を行った後、炉内をヘリウム雰囲気に変え、最高134
0°Cまで加熱してガラス化した。
This gel body is once heated at 1000C in an oxygen/nitrogen atmosphere, and after various treatments such as promotion of synthesis reaction, dehydration, and demolition, the inside of the furnace is changed to a helium atmosphere,
It was heated to 0°C and vitrified.

こうして得られたガラス体は透明性の高い無色のガラス
体で、気泡や脈理や結晶化等もみられず良好なものであ
った。大型化については外径30cm厚さ5cm程度の
インゴットや外径5cm長さ1m程度のロンドは製造可
能であった。
The glass body thus obtained was a colorless glass body with high transparency, and was in good condition with no bubbles, striae, or crystallization. Regarding larger sizes, it was possible to produce ingots with an outer diameter of about 30 cm and a thickness of about 5 cm, and rondos with an outer diameter of about 5 cm and a length of about 1 m.

外径10cm厚さ3cmのインゴットの重罰を平行に鏡
面研冴し、10mm間隔の10ケ所で200nm〜5.
0μmの波長域につき透過率を測定したが、各所での差
異は認められなかった。熱歪及び屈折率の分布を測定し
たところ、均質性は5X10−’以下であった。化学分
析からほぼ仕込み組成量のCeが含有されていることも
確認できた。
An ingot with an outer diameter of 10 cm and a thickness of 3 cm was mirror-polished in parallel, and 200 nm to 5.
Transmittance was measured in the 0 μm wavelength range, but no difference was observed at each location. When the thermal strain and refractive index distribution were measured, the homogeneity was 5×10 −′ or less. It was also confirmed from chemical analysis that almost the same amount of Ce as the charged composition was contained.

このガラス体は200〜300nmの波長域で選択的紫
外線吸収特性を示すので、ガラスフィルターとして応用
できる。また。紫外光で励起すると、350〜550n
m波長域で発光が起こるため、チューブ形状のガラス体
を製造することにより蛍光管として応用できる。
Since this glass body exhibits selective ultraviolet absorption characteristics in the wavelength range of 200 to 300 nm, it can be applied as a glass filter. Also. When excited with ultraviolet light, 350-550n
Since light emission occurs in the m wavelength range, it can be applied as a fluorescent tube by manufacturing a tube-shaped glass body.

また、1 cmX f cmX3 cmのガラス体の両
端面を高精度平行平面研磨し、レーザー発振を試みたと
ころ、安定的に発振を行なうことが確認された。発振波
長は350〜550nmの範囲で可変であった。繰り返
し発振も十分可能であり、長時間の使用にも劣化はみら
れなかった。
Further, when both end faces of a glass body measuring 1 cm x f cm x 3 cm were polished into parallel planes with high accuracy and laser oscillation was attempted, stable oscillation was confirmed. The oscillation wavelength was variable in the range of 350-550 nm. Repeated oscillation was sufficient, and no deterioration was observed even after long-term use.

〔実施例2〕 エチルシリケートに重量比で1:1になるように0.0
2規定の塩酸を加え、 水冷しながら約2時間撹拌する
ことにより加水分解溶液を調製した。そこにM微粉末シ
リカ(Aerosil  OX −50)を、エチルシ
リケートに対しモル比で1:1になるように徐々に添加
し、充分に撹拌した。このゾルを20°Cに保ちながら
28kHzの超音波を2時間照射し、更に1500Gの
遠心力を10分間かけた後1μmのフィルターを通過さ
せた。
[Example 2] 0.0 to ethyl silicate at a weight ratio of 1:1
A hydrolysis solution was prepared by adding 2N hydrochloric acid and stirring for about 2 hours while cooling with water. M fine powder silica (Aerosil OX-50) was gradually added thereto at a molar ratio of 1:1 to ethyl silicate, and the mixture was thoroughly stirred. This sol was irradiated with 28 kHz ultrasonic waves for 2 hours while being kept at 20°C, and then subjected to a centrifugal force of 1500 G for 10 minutes, and then passed through a 1 μm filter.

その後このゾル中にNd/S to、=1%となるよう
に所定量のネオジムを塩化ネオジウムの形で添加し、更
にネオジムの15倍モルのアルミニウムを硝配アルミニ
ウムの形で添加し、約1時間撹拌を続けた。このゾルの
pH値を0.4MK定のアンモニア水を用いて4.5に
調整し、約2時間かけてゲル化させた。
Thereafter, a predetermined amount of neodymium in the form of neodymium chloride was added to this sol so that Nd/S to = 1%, and aluminum in the form of aluminum nitrate was added in an amount 15 times the mole of neodymium to give a solution of about 1%. Stirring was continued for an hour. The pH value of this sol was adjusted to 4.5 using 0.4 MK aqueous ammonia, and the sol was gelated over about 2 hours.

開口率0.3%程度の乾燥容器に、このゲル体を移し入
れ、約60°Cに保たれた恒温乾燥機を用いて約21!
!間で乾燥し、空2中に放置しても割れない多孔質なド
ライゲルを得た。
Transfer this gel body to a drying container with an opening ratio of about 0.3%, and dry it using a constant temperature dryer kept at about 60°C.
! A porous dry gel that does not crack even when left in the air was obtained.

この多孔質体を酸素/窒素雰囲気中で一旦1000°C
まで加熱し、縮合反応の促進、脱水、脱を機物等の各種
処理を行なった。真空炉を用いて減圧度をITorr以
下に保ちながら、最高1400°Cまで加熱してガラス
化させた。
This porous body was heated to 1000°C in an oxygen/nitrogen atmosphere.
Various treatments such as acceleration of the condensation reaction, dehydration, and dehydration were performed. It was heated to a maximum of 1400° C. and vitrified using a vacuum furnace while maintaining the degree of reduced pressure below ITorr.

こうして得られたネオジム及びアルミニウム含佇石英ガ
ラスは、 透明性の高い青色のガラス体で、気泡や脈理
や結晶化等もみられず良好なものであった。外径6mm
長さ75mmのガラスロッドの両端面を高精度平行平面
研出し、He−Neレーザーを照射したところ、散乱に
よる減衰はYAGと同程度であった。レーザー発振を試
みたところ、安定的に発振を行なうことが確認された。
The thus obtained neodymium- and aluminum-containing quartz glass was a highly transparent blue glass body, and was in good condition with no bubbles, striae, or crystallization. Outer diameter 6mm
When both end faces of a glass rod with a length of 75 mm were polished into parallel planes with high precision and irradiated with a He-Ne laser, the attenuation due to scattering was comparable to that of YAG. When laser oscillation was attempted, stable oscillation was confirmed.

発振波長は、1.06μmであり、長時間の使用にも劣
化はみられなかった。
The oscillation wavelength was 1.06 μm, and no deterioration was observed even after long-term use.

外径3 Cm s長さ20cmのガラス体をYAGレー
ザーの増幅器として用いたところ、効果的な増幅が測定
され、YAGレーザーのアンプ材としての応用も可能と
なった。
When a glass body with an outer diameter of 3 cm and a length of 20 cm was used as an amplifier for a YAG laser, effective amplification was measured, making it possible to apply it as an amplifier material for a YAG laser.

〔実施例3〕 実施例1と同様の方法により、所定量(Eu/S r 
O! =0.08%)にユウロピウムを61酸ユウロピ
ウムの形で添加したゾル溶液を調製し、同様の手順によ
りゲル化、乾燥を行なった。
[Example 3] A predetermined amount (Eu/S r
O! A sol solution was prepared by adding europium (=0.08%) in the form of europium 61 acid, and gelation and drying were performed using the same procedure.

得られたドライゲルを酸素/窒素雰囲気で一旦850°
Cまで加熱した。真空炉を用いて850°Cまで加熱し
、ITorr以下の減圧にした後ヘリウムガスを流入し
て、大気圧にもどし、更にITorr以下の減圧にした
。以後この減圧度を保ちなから、最高1350°Cまで
加熱してガラス化させた。
The obtained dry gel was heated at 850° in an oxygen/nitrogen atmosphere.
Heated to C. After heating to 850° C. using a vacuum furnace and reducing the pressure to ITorr or less, helium gas was introduced to return the pressure to atmospheric pressure, and the pressure was further reduced to ITorr or less. Thereafter, without maintaining this degree of reduced pressure, it was heated to a maximum of 1350°C to vitrify it.

こうして得られたユウロピウム含有石英ガラスは、30
0〜400nmの波長域で】1択的紫外線吸収特性を示
し、ガラス体各所における吸収特性の差異は認められな
かった。気泡等の存在しない均質なガラス体であり、屈
折率分布もlXl0−6以下と良好なことからガラスフ
ィルターとして応用できる。
The europium-containing quartz glass thus obtained was 30
It exhibited selective ultraviolet absorption characteristics in the wavelength range of 0 to 400 nm, and no difference in absorption characteristics was observed between different parts of the glass body. It is a homogeneous glass body without bubbles, etc., and has a good refractive index distribution of 1X10-6 or less, so it can be applied as a glass filter.

〔実施例4〕 実施例1と同様の方法により、所定fl (T i /
SiO+=2%)のチタンをテトラプロポキシチタンの
形で添加したゾル溶液を調整し、同様の手順によりゲル
化、乾燥、800℃までの加熱を行なった。得られた多
孔質体を真空炉で、減圧度を0、ITorr以下に保ち
ながら、最高1350°Cまで加熱してガラス化させた
[Example 4] A predetermined fl (T i /
A sol solution to which titanium (SiO+ = 2%) was added in the form of tetrapropoxytitanium was prepared and gelled, dried, and heated to 800° C. using the same procedure. The obtained porous body was heated to a maximum of 1350° C. in a vacuum furnace to vitrify it while maintaining the degree of vacuum at 0 and I Torr or less.

外径10cm厚さ3cmのチタン含有石英ガラスの両面
を平行に鏡面研磨し、熱歪及び屈折率の分布を測定した
ところ、均質性は5X10−’以下であった。熱膨張係
数を0〜1200°Cの範囲で測定したが、各所での差
は認められなかった。
Both surfaces of a titanium-containing quartz glass having an outer diameter of 10 cm and a thickness of 3 cm were mirror-polished in parallel, and the thermal strain and refractive index distribution were measured, and the homogeneity was 5×10 −′ or less. The thermal expansion coefficient was measured in the range of 0 to 1200°C, but no difference was observed at each location.

気泡、脈理結晶等が存在せず、信頼性の高い光学レンズ
材への応用が可能である。
There are no bubbles, striae crystals, etc., and it can be applied to highly reliable optical lens materials.

また、テトラプロポキシチタンのかわりに、チクニア超
微粒子の形で添加したチタン含を石英ガラスの均質性も
非常に高く、同様の測定で6X10−1という値を示し
た。
Furthermore, the homogeneity of the silica glass containing titanium added in the form of ultrafine particles of Chikunia instead of tetrapropoxytitanium was very high, and the same measurement showed a value of 6×10 −1 .

〔実施例5〕 実施例2と同様の方法により、所定量(Cr/SiO,
=0.1%)のクロムを硝酸第ニクロムの形で添加した
ゾル溶液を調整し、同様の手順によりゲル化、乾燥、1
ooo℃までの加熱を行なった。得られた多孔質体を1
000°Cで0.ITorr以下の減圧にした後、ヘリ
ウムガスを流入して大気圧にもどし、更にITorr以
下の減圧にした。以後この減圧度を保ちながら、最高1
350℃まで加熱してガラス化させた。
[Example 5] A predetermined amount (Cr/SiO,
A sol solution containing chromium (=0.1%) in the form of dichromic nitrate was prepared, gelled, dried, and 1% by the same procedure.
Heating was performed to ooo°C. The obtained porous body is
0.000°C After reducing the pressure to ITorr or less, helium gas was introduced to return the pressure to atmospheric pressure, and the pressure was further reduced to ITorr or less. From then on, while maintaining this degree of decompression, the maximum
It was heated to 350°C to vitrify it.

こうして得られたクロム含有石英ガラスは、緑色を呈し
ているが透明度が高く、気泡等の内在異物のない均質の
ものであった、外径6mm長さ75mmのガラスロッド
の両端面を高精度平行平面研出し、レーザー発振を試み
たところ安定的に発振を行なうことが確認された。 発
振波長は600〜850nmの範囲で可変であり、長時
間の使用にも劣化はみられなかった。
The chromium-containing quartz glass thus obtained was green in color, highly transparent, and homogeneous with no internal foreign substances such as air bubbles.Both end surfaces of a glass rod with an outer diameter of 6 mm and a length of 75 mm were precisely parallelized. After polishing the surface and attempting laser oscillation, stable oscillation was confirmed. The oscillation wavelength was variable in the range of 600 to 850 nm, and no deterioration was observed even after long-term use.

30cmX30cmX1cm程度の大型化は難かしくな
いため、スラブ型レーザーガラスへの応用も可能である
Since it is not difficult to increase the size to about 30 cm x 30 cm x 1 cm, application to slab type laser glass is also possible.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明によれば、少なくともアルキル
シリケート、シリカ微粒子、および金属元素を含有する
化合物が原料であるゾル’60をゲル化させる工程、乾
燥させてドライゲルを作成する工程、前記ドライゲルを
加熱して閉孔化させガラス体とする工程からなるゾルゲ
ル法を用いたガラス体合成において、ドライゲルの閉孔
化を以下の方法のいずれかを用いて行なうことにより、
石英レーザーガラス、ガラスフィルター、蛍光ガラス管
、光学レンズ等への応用が可能な、均質で大型のドープ
ト石英ガラスの容易な製造方法が提供できた。
As described above, according to the present invention, there is a step of gelling Sol '60, which is made of a compound containing at least an alkyl silicate, silica fine particles, and a metal element, a step of drying to create a dry gel, and a step of drying the dry gel. In glass body synthesis using the sol-gel method, which consists of a step of heating and closing the pores to form a glass body, by closing the pores of the dry gel using one of the following methods,
An easy method for producing homogeneous, large-sized doped quartz glass, which can be applied to quartz laser glass, glass filters, fluorescent glass tubes, optical lenses, etc., has been provided.

a)ヘリウム雰囲気で焼結し、閉孔化させる。a) Sinter in a helium atmosphere to close the pores.

b)減圧下で焼結し、閉孔化させる。b) Sintering under reduced pressure to close the pores.

C)ヘリウム雰囲気にした後、減圧にして焼結し閉孔化
させる。
C) After creating a helium atmosphere, the pressure is reduced to sinter and close the pores.

以  上 出願人 セイコーエプソン株式会社that's all Applicant: Seiko Epson Corporation

Claims (1)

【特許請求の範囲】 少なくともアルキルシリケート、シリカ微粒子、および
金属元素を含有する化合物が原料であるゾル溶液をゲル
化させる工程、乾燥させてドライゲルを作成する工程、
前記ドライゲルを加熱して閉孔化させガラス体とする工
程からなるゾルゲル法を用いたガラス体合成において、
ドライゲルの閉孔化を以下の3つの方法のいずれかを用
いて行なうことを特徴とするドープト石英ガラスの製造
方法。 a)ヘリウム雰囲気で焼結し閉孔化させる。 b)減圧下で焼結し、閉孔化させる。 c)ヘリウム雰囲気にした後、減圧にして焼結し閉孔化
させる。
[Claims] A step of gelling a sol solution made of a compound containing at least an alkyl silicate, silica fine particles, and a metal element, and a step of drying to create a dry gel.
In glass body synthesis using a sol-gel method consisting of a step of heating the dry gel to close the pores to form a glass body,
A method for producing doped quartz glass, characterized in that the pores of the dry gel are closed using one of the following three methods. a) Sinter in a helium atmosphere to close the pores. b) Sintering under reduced pressure to close the pores. c) After creating a helium atmosphere, the pressure is reduced to sinter and close the pores.
JP15873387A 1987-06-25 1987-06-25 Production of doped quartz glass Pending JPS643024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15873387A JPS643024A (en) 1987-06-25 1987-06-25 Production of doped quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15873387A JPS643024A (en) 1987-06-25 1987-06-25 Production of doped quartz glass

Publications (2)

Publication Number Publication Date
JPH013024A true JPH013024A (en) 1989-01-06
JPS643024A JPS643024A (en) 1989-01-06

Family

ID=15678142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15873387A Pending JPS643024A (en) 1987-06-25 1987-06-25 Production of doped quartz glass

Country Status (1)

Country Link
JP (1) JPS643024A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03159923A (en) * 1989-11-13 1991-07-09 Nichia Chem Sangyo Kk Production of quartz glass
AU653411B2 (en) * 1991-07-19 1994-09-29 Sumitomo Electric Industries, Ltd. Method for producing glass preform for optical fiber

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