JPH013143A - Method for producing 2-chloropropionaldehyde - Google Patents
Method for producing 2-chloropropionaldehydeInfo
- Publication number
- JPH013143A JPH013143A JP62-155587A JP15558787A JPH013143A JP H013143 A JPH013143 A JP H013143A JP 15558787 A JP15558787 A JP 15558787A JP H013143 A JPH013143 A JP H013143A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- reaction
- rhodium
- chloropropionaldehyde
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- UAARVZGODBESIF-UHFFFAOYSA-N 2-chloropropanal Chemical compound CC(Cl)C=O UAARVZGODBESIF-UHFFFAOYSA-N 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 33
- 239000002253 acid Substances 0.000 claims description 20
- 150000002903 organophosphorus compounds Chemical class 0.000 claims description 20
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 15
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 14
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 14
- 150000003284 rhodium compounds Chemical class 0.000 claims description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- 150000003863 ammonium salts Chemical class 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- -1 triazole compounds Chemical class 0.000 description 19
- 239000010948 rhodium Substances 0.000 description 14
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 11
- 229910052703 rhodium Inorganic materials 0.000 description 11
- 125000000217 alkyl group Chemical group 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 6
- 150000001735 carboxylic acids Chemical class 0.000 description 6
- 239000007810 chemical reaction solvent Substances 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 6
- 239000010941 cobalt Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- MNZAKDODWSQONA-UHFFFAOYSA-N 1-dibutylphosphorylbutane Chemical compound CCCCP(=O)(CCCC)CCCC MNZAKDODWSQONA-UHFFFAOYSA-N 0.000 description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 3
- GAWAYYRQGQZKCR-UHFFFAOYSA-N 2-chloropropionic acid Chemical compound CC(Cl)C(O)=O GAWAYYRQGQZKCR-UHFFFAOYSA-N 0.000 description 2
- CDOWNLMZVKJRSC-UHFFFAOYSA-N 2-hydroxyterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(O)=C1 CDOWNLMZVKJRSC-UHFFFAOYSA-N 0.000 description 2
- LULAYUGMBFYYEX-UHFFFAOYSA-N 3-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC(Cl)=C1 LULAYUGMBFYYEX-UHFFFAOYSA-N 0.000 description 2
- MNUOZFHYBCRUOD-UHFFFAOYSA-N 3-hydroxyphthalic acid Chemical compound OC(=O)C1=CC=CC(O)=C1C(O)=O MNUOZFHYBCRUOD-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical class [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 125000000000 cycloalkoxy group Chemical group 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000002780 morpholines Chemical class 0.000 description 2
- TXXHDPDFNKHHGW-UHFFFAOYSA-N muconic acid Chemical compound OC(=O)C=CC=CC(O)=O TXXHDPDFNKHHGW-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical class [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 150000003222 pyridines Chemical class 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 150000003248 quinolines Chemical class 0.000 description 2
- 229910003450 rhodium oxide Inorganic materials 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- FSYKKLYZXJSNPZ-UHFFFAOYSA-N sarcosine Chemical compound C[NH2+]CC([O-])=O FSYKKLYZXJSNPZ-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- MTCFGRXMJLQNBG-REOHCLBHSA-N (2S)-2-Amino-3-hydroxypropansäure Chemical compound OC[C@H](N)C(O)=O MTCFGRXMJLQNBG-REOHCLBHSA-N 0.000 description 1
- AFENDNXGAFYKQO-VKHMYHEASA-N (S)-2-hydroxybutyric acid Chemical compound CC[C@H](O)C(O)=O AFENDNXGAFYKQO-VKHMYHEASA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- RBNPOMFGQQGHHO-UHFFFAOYSA-N -2,3-Dihydroxypropanoic acid Natural products OCC(O)C(O)=O RBNPOMFGQQGHHO-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- UAXNXOMKCGKNCI-UHFFFAOYSA-N 1-diphenylphosphanylethyl(diphenyl)phosphane Chemical group C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 UAXNXOMKCGKNCI-UHFFFAOYSA-N 0.000 description 1
- BKYWPNROPGQIFZ-UHFFFAOYSA-N 2,4-dimethylbenzoic acid Chemical compound CC1=CC=C(C(O)=O)C(C)=C1 BKYWPNROPGQIFZ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 1
- NSTREUWFTAOOKS-UHFFFAOYSA-N 2-fluorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1F NSTREUWFTAOOKS-UHFFFAOYSA-N 0.000 description 1
- AIDLAEPHWROGFI-UHFFFAOYSA-N 2-methylbenzene-1,3-dicarboxylic acid Chemical compound CC1=C(C(O)=O)C=CC=C1C(O)=O AIDLAEPHWROGFI-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- QEYMMOKECZBKAC-UHFFFAOYSA-N 3-chloropropanoic acid Chemical compound OC(=O)CCCl QEYMMOKECZBKAC-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- XRHGYUZYPHTUJZ-UHFFFAOYSA-N 4-chlorobenzoic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1 XRHGYUZYPHTUJZ-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- AWQSAIIDOMEEOD-UHFFFAOYSA-N 5,5-Dimethyl-4-(3-oxobutyl)dihydro-2(3H)-furanone Chemical compound CC(=O)CCC1CC(=O)OC1(C)C AWQSAIIDOMEEOD-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
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- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
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- WJYIASZWHGOTOU-UHFFFAOYSA-N Heptylamine Chemical compound CCCCCCCN WJYIASZWHGOTOU-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
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- KZSNJWFQEVHDMF-BYPYZUCNSA-N L-valine Chemical compound CC(C)[C@H](N)C(O)=O KZSNJWFQEVHDMF-BYPYZUCNSA-N 0.000 description 1
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- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 108010077895 Sarcosine Proteins 0.000 description 1
- MTCFGRXMJLQNBG-UHFFFAOYSA-N Serine Natural products OCC(N)C(O)=O MTCFGRXMJLQNBG-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- KZSNJWFQEVHDMF-UHFFFAOYSA-N Valine Natural products CC(C)C(N)C(O)=O KZSNJWFQEVHDMF-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- YOUGRGFIHBUKRS-UHFFFAOYSA-N benzyl(trimethyl)azanium Chemical compound C[N+](C)(C)CC1=CC=CC=C1 YOUGRGFIHBUKRS-UHFFFAOYSA-N 0.000 description 1
- 229940000635 beta-alanine Drugs 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- KDPAWGWELVVRCH-UHFFFAOYSA-N bromoacetic acid Chemical compound OC(=O)CBr KDPAWGWELVVRCH-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- GGRQQHADVSXBQN-FGSKAQBVSA-N carbon monoxide;(z)-4-hydroxypent-3-en-2-one;rhodium Chemical compound [Rh].[O+]#[C-].[O+]#[C-].C\C(O)=C\C(C)=O GGRQQHADVSXBQN-FGSKAQBVSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- PAFZNILMFXTMIY-UHFFFAOYSA-O cyclohexylammonium Chemical compound [NH3+]C1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-O 0.000 description 1
- WOWBFOBYOAGEEA-UHFFFAOYSA-N diafenthiuron Chemical compound CC(C)C1=C(NC(=S)NC(C)(C)C)C(C(C)C)=CC(OC=2C=CC=CC=2)=C1 WOWBFOBYOAGEEA-UHFFFAOYSA-N 0.000 description 1
- 239000002283 diesel fuel Substances 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-O diethylammonium Chemical compound CC[NH2+]CC HPNMFZURTQLUMO-UHFFFAOYSA-O 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-O dipropylazanium Chemical compound CCC[NH2+]CCC WEHWNAOGRSTTBQ-UHFFFAOYSA-O 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-O ethylaminium Chemical compound CC[NH3+] QUSNBJAOOMFDIB-UHFFFAOYSA-O 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229960003692 gamma aminobutyric acid Drugs 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-O isopropylaminium Chemical compound CC(C)[NH3+] JJWLVOIRVHMVIS-UHFFFAOYSA-O 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-O propan-1-aminium Chemical compound CCC[NH3+] WGYKZJWCGVVSQN-UHFFFAOYSA-O 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- YQUVCSBJEUQKSH-UHFFFAOYSA-N protochatechuic acid Natural products OC(=O)C1=CC=C(O)C(O)=C1 YQUVCSBJEUQKSH-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- SVOOVMQUISJERI-UHFFFAOYSA-K rhodium(3+);triacetate Chemical compound [Rh+3].CC([O-])=O.CC([O-])=O.CC([O-])=O SVOOVMQUISJERI-UHFFFAOYSA-K 0.000 description 1
- MMRXYMKDBFSWJR-UHFFFAOYSA-K rhodium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Rh+3] MMRXYMKDBFSWJR-UHFFFAOYSA-K 0.000 description 1
- KXAHUXSHRWNTOD-UHFFFAOYSA-K rhodium(3+);triiodide Chemical compound [Rh+3].[I-].[I-].[I-] KXAHUXSHRWNTOD-UHFFFAOYSA-K 0.000 description 1
- VXNYVYJABGOSBX-UHFFFAOYSA-N rhodium(3+);trinitrate Chemical compound [Rh+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VXNYVYJABGOSBX-UHFFFAOYSA-N 0.000 description 1
- YWFDDXXMOPZFFM-UHFFFAOYSA-H rhodium(3+);trisulfate Chemical compound [Rh+3].[Rh+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O YWFDDXXMOPZFFM-UHFFFAOYSA-H 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229940043230 sarcosine Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 235000004400 serine Nutrition 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229960001367 tartaric acid Drugs 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- KKFOMYPMTJLQGA-UHFFFAOYSA-N tribenzyl phosphite Chemical compound C=1C=CC=CC=1COP(OCC=1C=CC=CC=1)OCC1=CC=CC=C1 KKFOMYPMTJLQGA-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XTTGYFREQJCEML-UHFFFAOYSA-N tributyl phosphite Chemical compound CCCCOP(OCCCC)OCCCC XTTGYFREQJCEML-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- FICPQAZLPKLOLH-UHFFFAOYSA-N tricyclohexyl phosphite Chemical compound C1CCCCC1OP(OC1CCCCC1)OC1CCCCC1 FICPQAZLPKLOLH-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- SEACXNRNJAXIBM-UHFFFAOYSA-N triethyl(methyl)azanium Chemical compound CC[N+](C)(CC)CC SEACXNRNJAXIBM-UHFFFAOYSA-N 0.000 description 1
- AVBGNFCMKJOFIN-UHFFFAOYSA-N triethylammonium acetate Chemical compound CC(O)=O.CCN(CC)CC AVBGNFCMKJOFIN-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-O triethylammonium ion Chemical compound CC[NH+](CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-O 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- QOQNJVLFFRMJTQ-UHFFFAOYSA-N trioctyl phosphite Chemical compound CCCCCCCCOP(OCCCCCCCC)OCCCCCCCC QOQNJVLFFRMJTQ-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- QOPBTFMUVTXWFF-UHFFFAOYSA-N tripropyl phosphite Chemical compound CCCOP(OCCC)OCCC QOPBTFMUVTXWFF-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- 239000004474 valine Substances 0.000 description 1
- 235000014393 valine Nutrition 0.000 description 1
- WKOLLVMJNQIZCI-UHFFFAOYSA-N vanillic acid Chemical compound COC1=CC(C(O)=O)=CC=C1O WKOLLVMJNQIZCI-UHFFFAOYSA-N 0.000 description 1
- TUUBOHWZSQXCSW-UHFFFAOYSA-N vanillic acid Natural products COC1=CC(O)=CC(C(O)=O)=C1 TUUBOHWZSQXCSW-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、次の反応式 (1)
%式%(1)
に従った塩化ビニル、一酸化炭素および水素を原料とす
る2−クロロプロピオンアルデヒドの製造方法に関する
。Detailed Description of the Invention (Industrial Application Field) The present invention is directed to the production of 2-chloropropion produced from vinyl chloride, carbon monoxide and hydrogen according to the following reaction formula (1). This invention relates to a method for producing aldehydes.
2−クロロプロピオンアルデヒドは化学品および農医薬
等の有用な中間体として用いることかできる。2-Chloropropionaldehyde can be used as a useful intermediate for chemicals, agricultural medicines, etc.
(従来の技術および発明が解決しようとする問題点)
塩化ビニル、一酸化炭素および水素を原料とする2−ク
ロロプロピオンアルデヒドの製造方法は公知で、例えば
、フランス特許第L397,779号やヘルヘチ力・キ
ミカ・7’クタ(HELVETICA CIIIMIC
AACTA)、48巻、第5号、1151頁〜1157
夏に示されている。これらの方法はいずれもコバルトカ
ルボニルを触媒として用い、例えば、前記フランス特許
第1,397,779号によれば、反応温度110℃2
反応圧力200気圧の条件下において、90分間反応を
行わせ、塩化ビニルの転化率57.4%、2−クロロプ
ロピオンアルデヒドの選択率86.2%の反応成績を得
ている。しかし、これらのコバルトカルボニルを触媒と
して用いる方法では、コバルト ・当りの触媒活
性は極めて低く、この為に、多量のコバルトカルボニル
と160〜200気圧という高い反応圧力を必要とする
上に、反応温度75〜]25℃のもとで90−1.20
分間にわたり反応を行わせる方法がとられている。目的
生成物である2−クロロプロピオンアルデヒドは熱的に
不安定な物質で、このような反応温度と反応時間のもと
ではかなりの割合が逐次反応で消費されて反応収率を低
めるためにこの方法は再現性に乏しく、さらにはこの逐
次反応または他の副反応により塩化水素が副生じ、これ
が反応器の材料を激しく腐食する上にコバルトカルボニ
ル触媒と反応して塩化コバルトとなるために触媒の再使
用にも支障をきたすという問題点を有している。(Prior Art and Problems to be Solved by the Invention) Methods for producing 2-chloropropionaldehyde using vinyl chloride, carbon monoxide and hydrogen as raw materials are known, for example, as described in French Patent No. L397,779 and Herhety's・KIMICA 7'KUTA (HELVETICA CIIIMIC
AACTA), Vol. 48, No. 5, pp. 1151-1157
Shown in summer. All of these methods use cobalt carbonyl as a catalyst, and for example, according to the above-mentioned French Patent No. 1,397,779, the reaction temperature is 110°C2.
The reaction was carried out for 90 minutes at a reaction pressure of 200 atm, and a conversion of vinyl chloride of 57.4% and a selectivity of 2-chloropropionaldehyde of 86.2% were obtained. However, in these methods using cobalt carbonyl as a catalyst, the catalytic activity per cobalt is extremely low, and for this reason, a large amount of cobalt carbonyl and a high reaction pressure of 160 to 200 atm are required, as well as a reaction temperature of 75 ~]90-1.20 at 25℃
A method is used in which the reaction is carried out over a period of minutes. The desired product, 2-chloropropionaldehyde, is a thermally unstable substance, and at such reaction temperatures and times, a considerable proportion of it is consumed in successive reactions, and this treatment is necessary to reduce the reaction yield. The process is not reproducible, and furthermore, this sequential reaction or other side reactions produce hydrogen chloride, which severely corrodes the reactor material and reacts with the cobalt carbonyl catalyst to form cobalt chloride, causing a loss of catalyst strength. It also has the problem of hindering reuse.
本発明者等は、これらの改良法として、特開昭61−1
26046号、特開昭62−10038号、特開昭62
−22738号及び特開昭62−96444号に示す様
に塩化ビニル、一酸化炭素および水素とを、ロジウム化
合物及び塩基の存在下に反応させる方法を見出している
。この方法によると、従来のコバルトカルボニル触媒を
用いる方法にくらべ、より低温・低圧下で反応が進行し
、かつ、充分な目的生成物への選択性が得られる。これ
らの方法では、水の存在下または不存在下において塩基
として一般式、P(R’R2R’)(ここにPは燐原子
を示し、R’ 、R2、R3はそれぞれアルキル基、ア
リール基、シクロアルキル基、アルコキシ基、アリール
オキシ基またはシクロアルコキシ基を示す)で表わされ
る化合物の少なくとも一種以、J二と、peaが4へ・
11の含窒素化合物との組合せが好ましく用いられる。The present inventors have developed a method for improving these methods using Japanese Patent Application Laid-Open No. 61-1
No. 26046, JP-A-62-10038, JP-A-62
As shown in No. 22738 and Japanese Unexamined Patent Publication No. 62-96444, a method was discovered in which vinyl chloride, carbon monoxide, and hydrogen are reacted in the presence of a rhodium compound and a base. According to this method, the reaction proceeds at a lower temperature and pressure than the conventional method using a cobalt carbonyl catalyst, and sufficient selectivity to the target product can be obtained. In these methods, in the presence or absence of water, a base of the general formula P(R'R2R') (where P represents a phosphorus atom, R', R2, and R3 are an alkyl group, an aryl group, at least one compound represented by a cycloalkyl group, an alkoxy group, an aryloxy group, or a cycloalkoxy group, J2 and pea become 4,
A combination with 11 nitrogen-containing compounds is preferably used.
これらpKaが4〜11の含窒素化合物の中でも、ピリ
ジン化合物、キノリン化合物、イミダゾール化合物、ト
リアゾール化合物及びモルフォリン化合物等が反応成績
等の面から特に好ましく用いられているが、これらの塩
基はいrれも比較的高価な化合物であるために工業的に
使用するにあたってはぞの損失量を最小限にずべく、例
えばこれらの回収装置等を設けること等を必要とする。Among these nitrogen-containing compounds having a pKa of 4 to 11, pyridine compounds, quinoline compounds, imidazole compounds, triazole compounds, and morpholine compounds are particularly preferably used from the viewpoint of reaction results. Since they are also relatively expensive compounds, it is necessary to install, for example, a recovery device for them in order to minimize the amount of loss when using them industrially.
また、これらはいずれも反応性に冨む化合物であるため
に長時間の使用に際し徐々にではあるが消耗していく。Furthermore, since these are all highly reactive compounds, they are gradually consumed during long-term use.
このため操作もこれらの損失を極力抑制するように行う
ことを必要とするが、この操作条件は必ずしも2−クロ
ロプロピオンアルデヒドの合成に有利な条件と一致しな
い。このため、これらの消耗および最適合成条件から若
干外れた所での反応は目的生成物である2−クロロプロ
ピオンアルデヒドの製造コストに少なからぬ影響を及ぼ
すという問題点を有している。また、ピリジン化合物、
キノリン化合物またはモルフォリン化合物等の中には比
較的沸点の低いものが多いが、これらは、反応生成物で
ある2−クロロプロピオンアルデヒドを蒸留によって反
応液等から分離する際に低沸点の2−クロロプロピオン
アルデヒドに少量ではあるが混入し、製品の2−クロロ
プロピオンアルデヒドの純度低下をきたすばかりでなく
、2−クロロプロピオンアルデヒドを酸化して2−クロ
ロプロピオン酸を製造する際の酸化反応を著しく阻害す
るという問題点をも有している。For this reason, it is necessary to carry out operations so as to suppress these losses as much as possible, but these operating conditions do not necessarily coincide with conditions favorable for the synthesis of 2-chloropropionaldehyde. For this reason, there is a problem in that the consumption of these and the reaction at a location slightly deviating from the optimum synthesis conditions have a considerable impact on the production cost of the target product, 2-chloropropionaldehyde. Also, pyridine compounds,
Many of the quinoline compounds and morpholine compounds have relatively low boiling points. Although it is a small amount, it is mixed into chloropropionaldehyde, which not only causes a decrease in the purity of the 2-chloropropionaldehyde product, but also significantly accelerates the oxidation reaction when 2-chloropropionaldehyde is oxidized to produce 2-chloropropionic acid. It also has the problem of being inhibited.
本発明の課題は従来技術のこのような問題点を解決した
2−クロロプロピオンアルデヒドの製造方法を提供する
ことである。An object of the present invention is to provide a method for producing 2-chloropropionaldehyde that solves the problems of the prior art.
(問題点を解決するだめの手段および作用)本発明者等
は、これらの課題解決の為の詳細な研究を行った。その
結果、塩化ビニル、一酸化炭素及び水素とをロジウム化
合物および三価の有機燐化合物もしくは三価の有機燐化
合物のオキサイドの存在下に反応させて2−クロロプロ
ピオンアルデヒドを製造するにあたり、反応系に弱酸の
アンモニウム塩を共存させれば効率良く反応が進行する
上に先に述べたようなロジウム及び塩基よりなる触媒の
問題点が解決されることを見い出し本発明を完成するに
至った。(Means and effects for solving the problems) The present inventors conducted detailed research to solve these problems. As a result, when producing 2-chloropropionaldehyde by reacting vinyl chloride, carbon monoxide, and hydrogen in the presence of a rhodium compound and a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound, the reaction system The present inventors have discovered that if an ammonium salt of a weak acid is allowed to coexist with the reaction mixture, the reaction proceeds efficiently and the above-mentioned problems of the catalyst made of rhodium and a base can be solved, and the present invention has been completed.
即ち本発明は、ロジウム化合物および三価の有機燐化合
物または三価の有機燐化合物のオキサイドの存在下に、
塩化ビニル、一酸化炭素および水素を反応させて2−ク
ロロプロピオンアルデヒドを製造するにあたり、反応を
弱酸のアンモニウム塩の少なくとも一種の共存下に行う
ことを特徴とする2−クロロプロピオンアルデヒドの製
造方法である。That is, in the presence of a rhodium compound and a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound,
A method for producing 2-chloropropionaldehyde, which comprises reacting vinyl chloride, carbon monoxide and hydrogen to produce 2-chloropropionaldehyde in the presence of at least one ammonium salt of a weak acid. be.
本発明の方法において用いられる三価の有機燐化合物ま
たは三価の有機燐化合物のオキサイドは次のように例示
される。The trivalent organic phosphorus compound or the oxide of the trivalent organic phosphorus compound used in the method of the present invention is exemplified as follows.
即ち、三価の有機燐化合物としては、一般弐P (R’
R” R’ )(ここにPは燐原子を示し、R1、
R2、R:lはそれぞれ同一もしくは異種のアルキル、
アリール、シクロアルキル、アルコキシ、アリールオキ
シまたはシクロアルコキシ基を示す)で表わされる三価
の有機燐化合物が挙げられ、具体的には、トリメチルホ
スフィン、トリエチルホスフィン、トリプロピルホスフ
ィン、トリブチルホスフィン、トリオクチルホスフィン
、トリフェニルホスフィン、トリシクロヘキシルホスフ
ィン、トリヘンシルホスフィンなどのホスフィン類や、
トリメチルホスファイト、トリエチルホスファイト、ト
リプロピルホスファイト、トリブチルホスファイト、ト
リオクチルホスファイト、トリフェニルホスファイト、
トリシクロヘキシルホスフィント、トリベンジルホスフ
ァイトなどのホスファイト類が挙げられる。That is, as a trivalent organic phosphorus compound, general 2P (R'
R''R') (where P represents a phosphorus atom, R1,
R2, R:l are each the same or different alkyl,
Examples include trivalent organic phosphorus compounds represented by aryl, cycloalkyl, alkoxy, aryloxy, or cycloalkoxy groups, specifically trimethylphosphine, triethylphosphine, tripropylphosphine, tributylphosphine, and trioctylphosphine. , phosphines such as triphenylphosphine, tricyclohexylphosphine, trihensylphosphine,
Trimethyl phosphite, triethyl phosphite, tripropyl phosphite, tributyl phosphite, trioctyl phosphite, triphenyl phosphite,
Examples include phosphites such as tricyclohexyl phosphite and tribenzyl phosphite.
また、ホスフィン類の特殊なものとして、上記一般弐P
(R’ R2R’ )で表わされるもののほかに、ビ
スジフェニルホスフィノメタン、ビスジフェニルホスフ
ィノエタンなどのジホスフィン類や、架橋ポリスチレン
に結合したホスフィン類等も好ましく用いられる。In addition, as a special type of phosphine, the above general 2P
In addition to those represented by (R'R2R' ), diphosphines such as bisdiphenylphosphinomethane and bisdiphenylphosphinoethane, phosphines bonded to crosslinked polystyrene, and the like are also preferably used.
また、三価の有機燐化合物のオキサイドとしてはトリブ
チルホスフィンオキサイド、トリブチルホスフィンオキ
サイド、トリブチルホスフィンオキサイド等のアルキル
ホスフィンオキサイド、1〜リフエニルホスフインオキ
サイド、トリ1−リルホスフィンオキサイド等のアリー
ルホスフィンオキサイド、もしくはアルキル基とアリー
ル基とを合わせもつアルキルアリールホスフィンオキサ
イド等が例示される。またこのほか、トリエチルホスフ
ァイトオキサイド、トリブチルホスファイトオキサイド
、トリフェニルホスファイトオキサイド等のアルキルも
しくはアリールホスファイトオキサイド類や、アルキル
基とアリール基とを合わせもつアルキルアリールホスフ
ァイトオキサイド類等も用いることができる。さらには
、ビス−1,2−ジフェニルホスフィツメクンジオキサ
イドなどの多座ホスフィンのオキサイド等も用いること
ができる。Further, as the oxide of the trivalent organic phosphorus compound, tributylphosphine oxide, tributylphosphine oxide, alkylphosphine oxide such as tributylphosphine oxide, arylphosphine oxide such as 1-rifhenylphosphine oxide, tri-1-lylphosphine oxide, or Examples include alkylarylphosphine oxides having both an alkyl group and an aryl group. In addition, alkyl or aryl phosphite oxides such as triethyl phosphite oxide, tributyl phosphite oxide, triphenyl phosphite oxide, and alkylaryl phosphite oxides having both an alkyl group and an aryl group can also be used. can. Furthermore, polydentate phosphine oxides such as bis-1,2-diphenylphosphite tumecune dioxide and the like can also be used.
また、本発明の方法における弱酸のアンモニウム塩とは
、カルボン酸、硼酸または炭酸等のような弱酸と、アン
モニア又はアミンの塩、又はこれらの弱酸の第4級アン
モニウム塩を意味する。Furthermore, the ammonium salt of a weak acid in the method of the present invention means a salt of a weak acid such as carboxylic acid, boric acid, carbonic acid, etc., and ammonia or an amine, or a quaternary ammonium salt of these weak acids.
これらの弱酸は次のように例示される。即ち、カルボン
酸の例として、具体的には蟻酸、酢酸、プロピオン酸、
酪酸、イソ酪酸、ヘプタン酸、アクリル酸、メタアクリ
ル酸、クロトン酸、蓚酸、マロン酸、メチルマロン酸、
コハク酸、アジピン酸、マレイン酸、フマル酸、ムコン
酸、1,2.3−プロパントリカルボン酸等の脂肪族飽
和又は不飽和モノまたはポリカルボン酸及び安息香酸、
トルイル酸、0−エチル安息香酸、2.4−ジメチル安
息香酸、フタル酸、イソフタル酸、テレフタル酸、5−
メチルイソフタル酸、トリメリット酸、l・リメシン酸
、ピロメリット酸、メリット酸等の芳香族−価または多
価カルボン酸等が挙げられる。また、これらのカルボン
酸のアルキル基またはアリール基にハロゲン、アミノ基
、水酸基等の置換基のついたカルボン酸類も好ましく、
これらの例としてはモノクロロ酢酸、2−クロロプロピ
オン酸、3−クロロプロピオン酸、モノブロモ酢酸、0
−クロロ安息香酸、m−クロロ安息香酸、p−クロロ安
息香酸、O−フルオロ安息香酸等のハロゲン置換カルボ
ン酸類、グリシン、サルコシン、アラニン、β−アラニ
ン、4−アミノ酪酸、バリン、セリン、アスパラギン酸
、グルタミン酸等のアミノ酸類、グリコール酸、乳酸、
2−ヒドロキシ酪酸、グリセリン酸、リンゴ酸、酒石酸
、クエン酸、p−ヒドロキシ安息香酸、サリチル酸、2
.4−ジヒドロキシ安息香酸、3−ヒドロキシフタル酸
、ヒドロキシテレフタル酸等のヒドロキシカルボン酸類
等がある。このほか、フェニル酢酸、ピルビン酸、アセ
ト酢酸、アニス酸、バニリン酸、0−ニトロ安息香酸、
桂皮酸等の前記以外の置換基のついたカルボン酸も好ま
しい例として挙げられる。Examples of these weak acids are as follows. Specifically, examples of carboxylic acids include formic acid, acetic acid, propionic acid,
Butyric acid, isobutyric acid, heptanoic acid, acrylic acid, methacrylic acid, crotonic acid, oxalic acid, malonic acid, methylmalonic acid,
aliphatic saturated or unsaturated mono- or polycarboxylic acids such as succinic acid, adipic acid, maleic acid, fumaric acid, muconic acid, 1,2,3-propanetricarboxylic acid and benzoic acid;
Toluic acid, 0-ethylbenzoic acid, 2,4-dimethylbenzoic acid, phthalic acid, isophthalic acid, terephthalic acid, 5-
Examples include aromatic or polyhydric carboxylic acids such as methyl isophthalic acid, trimellitic acid, l-rimesic acid, pyromellitic acid, and mellitic acid. Further, carboxylic acids in which a substituent such as a halogen, an amino group, or a hydroxyl group is attached to the alkyl group or aryl group of these carboxylic acids are also preferable.
Examples of these are monochloroacetic acid, 2-chloropropionic acid, 3-chloropropionic acid, monobromoacetic acid, 0
-Halogen-substituted carboxylic acids such as chlorobenzoic acid, m-chlorobenzoic acid, p-chlorobenzoic acid, O-fluorobenzoic acid, glycine, sarcosine, alanine, β-alanine, 4-aminobutyric acid, valine, serine, aspartic acid , amino acids such as glutamic acid, glycolic acid, lactic acid,
2-hydroxybutyric acid, glyceric acid, malic acid, tartaric acid, citric acid, p-hydroxybenzoic acid, salicylic acid, 2
.. Examples include hydroxycarboxylic acids such as 4-dihydroxybenzoic acid, 3-hydroxyphthalic acid, and hydroxyterephthalic acid. In addition, phenylacetic acid, pyruvic acid, acetoacetic acid, anisic acid, vanillic acid, 0-nitrobenzoic acid,
Preferred examples include carboxylic acids with substituents other than those mentioned above, such as cinnamic acid.
−4、弱酸のアンモニウム塩を構成するアンモニウムカ
チオンは次に示す一般式、
(R’R”R3R’N )”
(ここに、R1、R2、R3及びR4はそれぞれ水素、
または同一または異なるアルキル基、シクロアルキル基
、アルキルアリール基またはヒドロキシアルキル基を意
味する)で表わされるアンモニウムカチオンが好ましく
用いられ、具体的にはアンモニウムカチオンのほかに、
メチルアンモニウム、エチルアンモニウム、プロピルア
ンモニウム、イソプロビルアンモニうム、ヘプチルアン
モニウム、シクロヘキシルアンモニウム又はベンジルア
ンモニウムカチオン等の一級アンモニウムカチオン、ジ
メチルアンモニウム、ジエチルアンモニウム、ジプロピ
ルアンモニウム又はジブチルアンモニウムカチオン等の
二級アンモニウムカチオン、トリメチルアンモニウム、
トリエチルアンモニウム、トリプロピルアンモニウム、
トリイソプロピルアンモニウム又はトリブチルアンモニ
ウムカチオン等の三級アンモニウムカチオン及びテトラ
メチルアンモニウム、テトラエチルアンモニウム、テト
ラプロピルアンモニウム、メチルトリエチルアンモニウ
ム、ベンジルトリメチルアンモニウム又はヘプチルトリ
エチルアンモニウムカチオン等の四級アンモニウムカチ
オン等が例示される。-4, the ammonium cation constituting the ammonium salt of a weak acid has the following general formula: (R'R"R3R'N)" (where R1, R2, R3 and R4 are each hydrogen,
or the same or different alkyl group, cycloalkyl group, alkylaryl group or hydroxyalkyl group), and specifically, in addition to ammonium cations, ammonium cations represented by:
Primary ammonium cations such as methylammonium, ethylammonium, propylammonium, isopropylammonium, heptylammonium, cyclohexylammonium or benzylammonium cations, secondary ammonium cations such as dimethylammonium, diethylammonium, dipropylammonium or dibutylammonium cations, trimethylammonium,
triethylammonium, tripropylammonium,
Examples include tertiary ammonium cations such as triisopropylammonium or tributylammonium cations, and quaternary ammonium cations such as tetramethylammonium, tetraethylammonium, tetrapropylammonium, methyltriethylammonium, benzyltrimethylammonium or heptyltriethylammonium cations.
これらの弱酸のアンモニウム塩は予め調製した塩を用い
ることが好ましい。しかし、場合によっては反応系内に
おいてこれらの弱酸のアンモニウム塩が形成されるべく
、例えば弱酸とアンモニアあるいはアミンを別個に添加
したり、または弱酸とテトラメチルアンモニウムハイド
ロオキサイド等のアンモニウムハイドロオキサイド類と
を別個に添加して用いることも可能である。It is preferable to use previously prepared ammonium salts of these weak acids. However, in some cases, ammonium salts of these weak acids are formed in the reaction system, for example by adding the weak acid and ammonia or amine separately, or by combining the weak acid and ammonium hydroxides such as tetramethylammonium hydroxide. It is also possible to use them by adding them separately.
本発明の方法において用いられるロジウム化合物として
は、ロジウムの酸化物、鉱酸塩、有機酸塩またはロジウ
ム錯化合物などがある。これらの各種ロジウム化合物の
中でも、特にハロゲンを含まないロジウム化合物が好ま
しい。これらの例としては酸化ロジウム、硝酸ロジウム
、硫酸ロジウ=11−
ム、酢酸ロジウム、トリアセチルアセトナートロジウム
、ジカルボニルアセチルアセトナートロジウム、ドデカ
カルボニルテトラロジウム、ヘキサデカカルボニルへキ
サロジウム等が挙げられ、また、ロジウム錯化合物とし
てはこれらのほかに、ロジウムと塩基とで錯化合物を形
成したものも更に好ましく用いられる。該塩基としては
、本発明の方法において好ましく用いられる三価の有機
燐化合物又は三価の有機燐化合物のオキサイド等の塩基
であっても良いが、他の塩基でも良い。これらの例とし
ては、例えば、ヒドリドカルボニルトリストリフェニル
ホスフィンロジウム
(ljhH(CO)(PPh+)3) 、ニトロシルト
リストリフェニルホスフィンロジウム(Rh(NO)(
PPh+)+ ) 、η−シクロペンタジェニルビスト
リフェニルホスフィンロジウム(Rh(C5H5)(P
Ph3)! )等が挙げられる。又、塩化ロジウム、臭
化ロジウム、沃化ロジウムまたはジクロロテトラカルボ
ニルジロジウム等のハロゲン含有ロジウム化合物を用い
、反応系内にこれらのハロゲン原子に対し当量以上のア
ルカリ性化合物、例えば、水酸化ナトリウム、水酸化カ
リウム、炭酸カリウム、トリメチルアミン、トリエチル
アミン等を加えることも、ハロゲンを含有しないロジウ
ム化合物を反応系内において生成させる手段として用い
ることができる。Examples of the rhodium compound used in the method of the present invention include rhodium oxides, mineral acid salts, organic acid salts, and rhodium complex compounds. Among these various rhodium compounds, halogen-free rhodium compounds are particularly preferred. Examples of these include rhodium oxide, rhodium nitrate, rhodium sulfate, rhodium acetate, rhodium triacetylacetonate, rhodium dicarbonylacetylacetonate, dodecacarbonyl tetrarhodium, hexadecacarbonyl hexalhodium, etc. In addition to these rhodium complex compounds, complex compounds formed by rhodium and a base are also preferably used. The base may be a base such as a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound preferably used in the method of the present invention, but other bases may also be used. Examples of these include, for example, hydridocarbonyltristriphenylphosphine rhodium (ljhH(CO)(PPh+)3), nitrosyltristriphenylphosphine rhodium (Rh(NO)(
PPh+)+ ), η-cyclopentadienylbistriphenylphosphine rhodium (Rh(C5H5)(P
Ph3)! ) etc. Furthermore, using a halogen-containing rhodium compound such as rhodium chloride, rhodium bromide, rhodium iodide, or dichlorotetracarbonyl dirhodium, an alkaline compound such as sodium hydroxide or water in an amount equivalent to or more than the halogen atom is added to the reaction system. Addition of potassium oxide, potassium carbonate, trimethylamine, triethylamine, etc. can also be used as a means for producing a halogen-free rhodium compound in the reaction system.
本発明の方法では、前記ロジウム化合物は、反応系内の
液相1リツトルあたりロジウム原子として、0.000
1〜1000 ミリグラム原子、好ましくは0.001
〜100 ミリグラム原子の範囲に相当する量で使用さ
れる。また、本発明の方法で使用される前記三価の有機
燐化合物又は三価の有機燐化合物のオキサイド等の塩基
は、それぞれロジウム1グラム原子に対し0.1〜50
0モル、好ましくは0.5〜100モルの範囲で使用さ
れる。In the method of the present invention, the rhodium compound contains 0.000 rhodium atoms per liter of liquid phase in the reaction system.
1-1000 milligram atoms, preferably 0.001
It is used in amounts corresponding to a range of ~100 milligram atoms. Further, the base such as the trivalent organic phosphorus compound or the oxide of the trivalent organic phosphorus compound used in the method of the present invention is 0.1 to 50% per gram atom of rhodium, respectively.
It is used in an amount of 0 mol, preferably 0.5 to 100 mol.
また、本発明の方法で用いる前記弱酸のアンモニウム塩
は、ロジウム1グラム原子あたり0.1〜200モル、
特に1〜30モルの範囲で使用することが好ましい。Further, the ammonium salt of the weak acid used in the method of the present invention may have an amount of 0.1 to 200 mol per gram atom of rhodium,
In particular, it is preferable to use it in a range of 1 to 30 mol.
本発明の方法においては、反応溶媒を用いなくとも反応
は進行するが、通常は反応溶媒の存在下に反応を行わせ
る。反応溶媒としては、反応に悪影響を及ぼさないもの
であればいずれも用いることが可能である。このような
溶媒として特に好ましいのは炭化水素類である。より具
体的には、ヘキサン、ヘプタン、オクタン、ノナン、デ
カン等の飽和炭化水素や、ベンゼン、トルエン、キシレ
ン等の芳香族炭化水素などが好ましく用いられ、また、
炭化水素類の混合物として工業的に得られるリグロイン
、ケロシン、軽油、ディーゼル油等もこれらの例に含ま
れる。このほか、ジプロピルエーテル、ジブチルエーテ
ルなどのエーテル類、ジイソブチルケトン、ホロンなど
のケトン類、酪酸ブチル、安息香酸ブチルなどのエステ
ル類なども好ましい溶媒の例として挙げられる。In the method of the present invention, the reaction proceeds without using a reaction solvent, but the reaction is usually carried out in the presence of a reaction solvent. Any reaction solvent can be used as long as it does not adversely affect the reaction. Hydrocarbons are particularly preferred as such solvents. More specifically, saturated hydrocarbons such as hexane, heptane, octane, nonane, and decane, and aromatic hydrocarbons such as benzene, toluene, and xylene are preferably used, and
These examples also include ligroin, kerosene, light oil, diesel oil, etc. which are obtained industrially as mixtures of hydrocarbons. In addition, examples of preferred solvents include ethers such as dipropyl ether and dibutyl ether, ketones such as diisobutyl ketone and holon, and esters such as butyl butyrate and butyl benzoate.
本発明の方法においては、反応系内に水を共存させる方
法が更に好ましく行われる。このような方法をとること
により触媒活性は更に向上する。In the method of the present invention, a method in which water is allowed to coexist in the reaction system is more preferably carried out. By adopting such a method, the catalytic activity is further improved.
本発明の方法において反応時に存在させる水の量につい
ては特に制限はないが、極端に少量の場合にはその効果
は小さくなり、また、極端に多量用いても反応成績はあ
る程度以上は上がらない。通常、水の量は原料として反
応器へ供給する塩化ビニルに対して重量比で0.01以
上、1000以下の範囲が好ましい。特に、0.1〜1
00の範囲が更に好ましく用いられる。In the method of the present invention, there is no particular restriction on the amount of water present during the reaction, but if it is used in an extremely small amount, the effect will be small, and even if it is used in an extremely large amount, the reaction results will not improve beyond a certain level. Usually, the amount of water is preferably in the range of 0.01 or more and 1000 or less in terms of weight ratio to the vinyl chloride supplied to the reactor as a raw material. In particular, 0.1 to 1
A range of 00 is more preferably used.
本発明の方法は、通常、反応温度10〜150℃1反応
圧力10〜300Kg/cMゲージの範囲、好ましくは
30〜150Kg/aflゲージの範囲で行われる。反
応温度は生成する2−クロロプロピオンアルデヒドの熱
安定性の面から低温はど好ましく、このため、20〜8
0℃が特に好ましい温度範囲である。また、原料の一酸
化炭素および水素の混合モル比は、通常10〜0.1の
範囲であり、好ましくは4〜0.2の範囲である。一酸
化炭素および水素は前記の組成比で両成分を含有する混
合ガスであればよく、水性ガスや、水性ガスにメタン、
窒素などの反応に不活性なガス、または二酸化炭素など
が含有されたものが用いられる。もう一方の原料である
塩化ビニルは、ガス状、液状、あるいは反応に用いる溶
媒に溶解した溶液の形で使用される。本発明の方法は、
回分法、半回分法、連続法のいずれの方法によっても実
施できる。例えば、回分法の場合の例としては、ロジウ
ム化合物、三価の有機燐化合物または三価の有機燐化合
物のオキサイド、弱酸のアンモニウム塩、および必要に
応じて反応溶媒および水を仕込んだオートクレーブに、
塩化ビニルをガス、液、あるいは溶液状で加え、これに
一酸化炭素および水素を含有するガスを所定の圧力まで
導入し、好ましくは撹拌下で加温することにより反応は
進行する。また、連続法の場合の例としては、ロジウム
化合物、三価の有機燐化合物または三価の有機燐化合物
のオキサイド、弱酸のアンモニウム塩、および必要に応
じて反応溶媒および水と、原料の塩化ビニル、一酸化炭
素および水素とを、耐圧の反応器の一方に連続的に供給
し、反応温度下、撹拌条件下に、他方から反応混合物と
、未反応塩化ビニル、一酸化炭素および水素とを連続的
に抜出すことにより反応が行われる。連続法の場合、弱
酸のアンモニウム塩は固体状では反応器への連続供給に
困難を伴うために、反応溶媒又は水に溶解させた形で供
給するか、又は、先に述べたように弱酸とアンモニア、
アミンもしくはアンモニウムハイドロオキサイド等を別
個に供給することが好ましい。The method of the present invention is usually carried out at a reaction temperature of 10 to 150° C. and a reaction pressure of 10 to 300 Kg/cM gauge, preferably 30 to 150 Kg/afl gauge. The reaction temperature is preferably low from the viewpoint of thermal stability of the 2-chloropropionaldehyde produced;
0°C is a particularly preferred temperature range. Further, the mixing molar ratio of raw materials carbon monoxide and hydrogen is usually in the range of 10 to 0.1, preferably in the range of 4 to 0.2. Carbon monoxide and hydrogen may be a mixed gas containing both components in the above-mentioned composition ratio, such as water gas, water gas and methane, etc.
A gas containing inert gas such as nitrogen or carbon dioxide is used. The other raw material, vinyl chloride, is used in the form of a gas, liquid, or solution dissolved in the solvent used for the reaction. The method of the present invention includes:
It can be carried out by any of the batch method, semi-batch method, and continuous method. For example, in the case of a batch method, an autoclave containing a rhodium compound, a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorus compound, an ammonium salt of a weak acid, and, if necessary, a reaction solvent and water,
The reaction proceeds by adding vinyl chloride in the form of a gas, liquid, or solution, introducing a gas containing carbon monoxide and hydrogen to a predetermined pressure, and heating, preferably with stirring. In addition, examples of continuous methods include rhodium compounds, trivalent organic phosphorus compounds or oxides of trivalent organic phosphorus compounds, ammonium salts of weak acids, and if necessary, reaction solvents and water, and the raw material vinyl chloride. , carbon monoxide and hydrogen are continuously supplied to one side of the pressure-resistant reactor, and the reaction mixture, unreacted vinyl chloride, carbon monoxide and hydrogen are continuously fed from the other side under stirring conditions at the reaction temperature. The reaction is carried out by withdrawing the sample. In the case of a continuous process, since it is difficult to continuously supply the ammonium salt of a weak acid to the reactor in solid form, it is supplied in the form dissolved in the reaction solvent or water, or as mentioned above, it is difficult to continuously supply the ammonium salt to the reactor. ammonia,
It is preferable to feed the amine or ammonium hydroxide etc. separately.
(実施例)
以下、実施例により本発明の方法を更に具体的に説明す
る。(Example) Hereinafter, the method of the present invention will be explained in more detail with reference to Examples.
実施例1
撹拌装置を備えた内容積100dのステンレス製オート
クレーブの内部を窒素ガスで置換した後、ヘキサデカカ
ルボニルへキサロジウム36■(Rh0.2ミリグラム
原子)とトリフェニルホスフィン157■(0,6ミリ
モル)、トリエチルアミン酢酸塩483mg (3ミリ
モル)および水20gを入れ、これに塩化ビニル1.8
8 g (30ミリモル)を含む塩化ヒニルのトルエン
溶液20戚を加えた。このオートクレーブに、一酸化炭
素および水素のモル比が1:2の混合ガスを室温で圧力
が120 Kg/c[IYゲージになるまで圧入した後
に55℃まで昇温し、30分間反応させた。オートクレ
ーブを室温まで冷却してから未反応の原料混合ガスをガ
スサンプリング用袋に捕集した後オートクレーブを開け
、触媒、溶媒及び反応生成物を含む反応混合液を取り出
した。ガスおよび液をガスクロマトグラフィーで定量し
た結果、塩化ビニルの転化率は24.5%であり、2−
クロロプロピオンアルデヒドの生成量は6.1ミリモル
(転化した塩化ビニル基準の選択率は83.0%)であ
った。Example 1 After purging the inside of a stainless steel autoclave with an internal volume of 100 d and equipped with a stirring device with nitrogen gas, 36 mm of hexadecacarbonyl hexalodium (0.2 milligram atoms of Rh) and 157 mm of triphenylphosphine (0.6 mmol) were added. ), 483 mg (3 mmol) of triethylamine acetate and 20 g of water were added, and 1.8 g of vinyl chloride was added to the solution.
A solution of 20 g (30 mmol) of hinyl chloride in toluene was added. A mixed gas of carbon monoxide and hydrogen having a molar ratio of 1:2 was pressurized into this autoclave at room temperature until the pressure reached 120 Kg/c (IY gauge), and then the temperature was raised to 55° C. and reacted for 30 minutes. After the autoclave was cooled to room temperature and unreacted raw material mixed gas was collected in a gas sampling bag, the autoclave was opened and the reaction mixture containing the catalyst, solvent, and reaction product was taken out. As a result of quantifying the gas and liquid by gas chromatography, the conversion rate of vinyl chloride was 24.5%, and 2-
The amount of chloropropionaldehyde produced was 6.1 mmol (selectivity based on converted vinyl chloride was 83.0%).
実施例2〜5
実施例1の方法において反応温度、反応圧力、一酸化炭
素と水素のモル比および反応時間を変えて反応を行わせ
た。結果を表1に示す。Examples 2 to 5 Reactions were conducted in the method of Example 1 by changing the reaction temperature, reaction pressure, molar ratio of carbon monoxide to hydrogen, and reaction time. The results are shown in Table 1.
= 19一
実施例6〜9
実施例1の方法において、反応温度を45℃とし、ロジ
ウム化合物、三価の有機燐化合物または三価の有機燐化
合物のオキサイド及び弱酸のアンモニウム塩の種類を変
えて反応を行わせた。ロジウム化合物の量はいずれもロ
ジウムが0.2ミリグラム原子となるような量とした。= 19-Examples 6 to 9 In the method of Example 1, the reaction temperature was 45 ° C., and the types of rhodium compound, trivalent organic phosphorus compound or trivalent organic phosphorus compound oxide, and ammonium salt of a weak acid were changed. The reaction was allowed to take place. The amount of rhodium compound was set to 0.2 milligram atom of rhodium in each case.
結果を表2に示す。The results are shown in Table 2.
(以下余白)
実施例10
実施例1において、水の不存在以外は同じ方法で反応を
行わせた。(Left below) Example 10 The reaction was carried out in the same manner as in Example 1 except for the absence of water.
分析の結果、塩化ビニルの転化率8.1%、2−クロロ
プロピオンアルデヒドの選択率80.2%の反応成績を
得た。As a result of the analysis, reaction results were obtained with a conversion rate of vinyl chloride of 8.1% and a selectivity of 2-chloropropionaldehyde of 80.2%.
(発明の効果)
本発明により、塩化ビニル、一酸化炭素および水素を原
料として、低温・低圧下において高収率で2−クロロプ
ロピオンアルデヒドを製造することができる。特に、本
発明の方法により、従来法の様に塩基の回収や2−クロ
ロプロピオンアルデヒド中に混入する塩基の除去のため
の装置を必要としたり、塩基の損失を極力抑制する条件
を選んだりすることなく、簡素な装置を用いて安定して
長時間にわたり反応を進行させることが可能となる。(Effects of the Invention) According to the present invention, 2-chloropropionaldehyde can be produced in high yield at low temperature and low pressure using vinyl chloride, carbon monoxide, and hydrogen as raw materials. In particular, unlike conventional methods, the method of the present invention does not require equipment for recovering the base or removing the base mixed in 2-chloropropionaldehyde, and conditions must be selected to minimize the loss of base. It becomes possible to proceed with the reaction stably over a long period of time using a simple device.
特許出願人 三井東圧化学株式会社Patent applicant Mitsui Toatsu Chemical Co., Ltd.
Claims (3)
三価の有機燐化合物のオキサイドの存在下に、塩化ビニ
ル、一酸化炭素および水素を反応させて2−クロロプロ
ピオンアルデヒドを製造するにあたり、反応を弱酸のア
ンモニウム塩の少なくとも一種の共存下に行うことを特
徴とする2−クロロプロピオンアルデヒドの製造方法。(1) In producing 2-chloropropionaldehyde by reacting vinyl chloride, carbon monoxide, and hydrogen in the presence of a rhodium compound and a trivalent organic phosphorus compound or an oxide of a trivalent organic phosphorous compound, the reaction is carried out. 1. A method for producing 2-chloropropionaldehyde, which is carried out in the coexistence of at least one ammonium salt of a weak acid.
載の方法。(2) The method according to claim 1, wherein the reaction is carried out in the presence of water.
範囲第1項ないし第2項記載の方法。(3) The method according to claim 1 or 2, wherein the reaction is carried out at a temperature in the range of 20 to 80°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-155587A JPH013143A (en) | 1987-06-24 | Method for producing 2-chloropropionaldehyde |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-155587A JPH013143A (en) | 1987-06-24 | Method for producing 2-chloropropionaldehyde |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS643143A JPS643143A (en) | 1989-01-06 |
| JPH013143A true JPH013143A (en) | 1989-01-06 |
Family
ID=
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