JPH0165131U - - Google Patents
Info
- Publication number
- JPH0165131U JPH0165131U JP1987159872U JP15987287U JPH0165131U JP H0165131 U JPH0165131 U JP H0165131U JP 1987159872 U JP1987159872 U JP 1987159872U JP 15987287 U JP15987287 U JP 15987287U JP H0165131 U JPH0165131 U JP H0165131U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electrode
- lower electrode
- insulating material
- sample stand
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の一実施例であるプラズマ処理
装置用電極を示す縦断面図、第２図は従来のプラ
ズマ処理装置用電極を示す縦断面図である。
１……下電極、２……試料台、４……絶縁材、
５……ウエハ、６……絶縁物。
FIG. 1 is a longitudinal sectional view showing an electrode for a plasma processing apparatus which is an embodiment of the present invention, and FIG. 2 is a longitudinal sectional view showing a conventional electrode for a plasma processing apparatus. 1... Lower electrode, 2... Sample stage, 4... Insulating material,
5...Wafer, 6...Insulator.
Claims (1)
配置し、該試料をプラズマを利用して処理する装
置において、前記電極を、下電極と、該下電極上
面に配置され上面に前記試料を載置する試料台と
、前記下電極上面で該試料台の周囲に配置される
絶縁材と、該絶縁材と前記試料台との間の隙間部
に設けた空間に配置する絶縁物とから構成したこ
とを特徴とするプラズマ処理装置用電極。 In an apparatus that processes a sample using plasma by placing a sample on an electrode installed in a process chamber that is evacuated to a reduced pressure, the electrode is placed on a lower electrode and the sample is placed on the upper surface of the lower electrode. Consisting of a sample stand to be placed, an insulating material placed around the sample stand on the upper surface of the lower electrode, and an insulator placed in a space provided in a gap between the insulating material and the sample stand. An electrode for plasma processing equipment characterized by the following.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987159872U JPH0165131U (en) | 1987-10-21 | 1987-10-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987159872U JPH0165131U (en) | 1987-10-21 | 1987-10-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0165131U true JPH0165131U (en) | 1989-04-26 |
Family
ID=31441453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987159872U Pending JPH0165131U (en) | 1987-10-21 | 1987-10-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0165131U (en) |
-
1987
- 1987-10-21 JP JP1987159872U patent/JPH0165131U/ja active Pending
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