JPH0167732U - - Google Patents

Info

Publication number
JPH0167732U
JPH0167732U JP1987162629U JP16262987U JPH0167732U JP H0167732 U JPH0167732 U JP H0167732U JP 1987162629 U JP1987162629 U JP 1987162629U JP 16262987 U JP16262987 U JP 16262987U JP H0167732 U JPH0167732 U JP H0167732U
Authority
JP
Japan
Prior art keywords
vertically arranged
semiconductor wafers
semiconductor
vacuum chamber
loading
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987162629U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987162629U priority Critical patent/JPH0167732U/ja
Publication of JPH0167732U publication Critical patent/JPH0167732U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図及び第２図は本考案に係る半導体製造装
置の一実施例を説明するためのもので、第１図は
ウエーハ搬入前の状態を示す断面図、第２図はウ
エーハ搬入後の状態を示す断面図である。第３図
及び第４図は縦型減圧ＣＶＤ装置の従来例を説明
するためのもので、第３図はウエーハ搬入前の状
態を示す断面図、第４図はウエーハ搬入後の状態
を示す断面図である。 ２……ウエーハロード・アンロード部、３……
炉芯管、１１……半導体ウエーハ、１３……真空
チヤンバ。

Claims (1)

    【実用新案登録請求の範囲】
  1. 複数の半導体ウエーハをその被処理面を略水平
    にして垂直方向に整列収納して熱処理する縦配置
    の炉芯管に、上記半導体ウエーハのロード・アン
    ロード用真空チヤンバを気密的に連設したことを
    特徴とする半導体製造装置。
JP1987162629U 1987-10-23 1987-10-23 Pending JPH0167732U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987162629U JPH0167732U (ja) 1987-10-23 1987-10-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987162629U JPH0167732U (ja) 1987-10-23 1987-10-23

Publications (1)

Publication Number Publication Date
JPH0167732U true JPH0167732U (ja) 1989-05-01

Family

ID=31446625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987162629U Pending JPH0167732U (ja) 1987-10-23 1987-10-23

Country Status (1)

Country Link
JP (1) JPH0167732U (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6112035A (ja) * 1984-06-27 1986-01-20 Nippon Telegr & Teleph Corp <Ntt> 半導体製造装置
JPS62293610A (ja) * 1986-06-12 1987-12-21 Furukawa Electric Co Ltd:The 半導体薄膜気相成長装置
JPS63166215A (ja) * 1986-12-27 1988-07-09 Furukawa Electric Co Ltd:The 半導体気相成長装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6112035A (ja) * 1984-06-27 1986-01-20 Nippon Telegr & Teleph Corp <Ntt> 半導体製造装置
JPS62293610A (ja) * 1986-06-12 1987-12-21 Furukawa Electric Co Ltd:The 半導体薄膜気相成長装置
JPS63166215A (ja) * 1986-12-27 1988-07-09 Furukawa Electric Co Ltd:The 半導体気相成長装置

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