JPH0173372U - - Google Patents
Info
- Publication number
- JPH0173372U JPH0173372U JP1987169403U JP16940387U JPH0173372U JP H0173372 U JPH0173372 U JP H0173372U JP 1987169403 U JP1987169403 U JP 1987169403U JP 16940387 U JP16940387 U JP 16940387U JP H0173372 U JPH0173372 U JP H0173372U
- Authority
- JP
- Japan
- Prior art keywords
- section
- silicon oxide
- immersion
- adjusting
- treatment liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007654 immersion Methods 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
第１図乃至第３図は本考案の一実施例にかかる
酸化珪素被膜の製造装置を表わす図であり、第１
図は模式的に示す側面図、第２図は模式的に示す
平面図、第３図は第２図の―矢視断面図、第
４図乃至第６図は従来の酸化珪素被膜の製造装置
の一例を表わす図であり、第４図は模式的に示す
側面図、第５図は模式的に示す平面図、第６図は
第５図の―矢視断面図である。
尚図面中、３は基材、４は浸漬部、６は処理液
調整部、１０は整流部である。
1 to 3 are diagrams showing a silicon oxide film manufacturing apparatus according to an embodiment of the present invention, and FIG.
The figure is a schematic side view, FIG. 2 is a schematic plan view, FIG. 3 is a sectional view taken in the direction of the - arrow in FIG. 2, and FIGS. 4 to 6 are conventional silicon oxide film manufacturing apparatuses. FIG. 4 is a schematic side view, FIG. 5 is a schematic plan view, and FIG. 6 is a sectional view taken along the arrow - in FIG. 5. In the drawing, 3 is a base material, 4 is an immersion section, 6 is a treatment liquid adjustment section, and 10 is a rectification section.
Claims (1)
するための浸漬部と、 前記浸漬部に流れ込む処理液の流れを整えるた
めに前記浸漬部に連なつて設けられた整流部と、 前記浸漬部から越流した処理液を調整するため
に前記浸漬部に連なつて設けられた処理液調整部
とを備える酸化珪素被膜の製造装置において、 前記浸漬部から越流する処理液の越流方向を３
方向若しくは４方向としたことを特徴とする酸化
珪素被膜の製造装置。[Claims for Utility Model Registration] An immersion section for immersing a substrate to form a silicon oxide film on the surface of the substrate, and a section connected to the immersion section for adjusting the flow of a treatment liquid flowing into the immersion section. A silicon oxide coating manufacturing apparatus comprising: a rectifying section provided; and a treatment liquid adjusting section connected to the immersion section for adjusting the treatment liquid overflowing from the immersion section; Set the overflow direction of the overflowing processing liquid to 3.
1. An apparatus for manufacturing a silicon oxide film, characterized in that it can be produced in one direction or in four directions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987169403U JPH0173372U (en) | 1987-11-05 | 1987-11-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987169403U JPH0173372U (en) | 1987-11-05 | 1987-11-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0173372U true JPH0173372U (en) | 1989-05-17 |
Family
ID=31459428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987169403U Pending JPH0173372U (en) | 1987-11-05 | 1987-11-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0173372U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008238035A (en) * | 2007-03-27 | 2008-10-09 | Seiko Epson Corp | Immersion coating apparatus and dip coating method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52146451A (en) * | 1976-06-01 | 1977-12-06 | Sumitomo Chem Co Ltd | Dipping apparatus |
| JPS5429348A (en) * | 1977-08-08 | 1979-03-05 | Nichicon Capacitor Ltd | Coating apparatus |
-
1987
- 1987-11-05 JP JP1987169403U patent/JPH0173372U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52146451A (en) * | 1976-06-01 | 1977-12-06 | Sumitomo Chem Co Ltd | Dipping apparatus |
| JPS5429348A (en) * | 1977-08-08 | 1979-03-05 | Nichicon Capacitor Ltd | Coating apparatus |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008238035A (en) * | 2007-03-27 | 2008-10-09 | Seiko Epson Corp | Immersion coating apparatus and dip coating method |
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