JPH01169247U - - Google Patents

Info

Publication number
JPH01169247U
JPH01169247U JP6634788U JP6634788U JPH01169247U JP H01169247 U JPH01169247 U JP H01169247U JP 6634788 U JP6634788 U JP 6634788U JP 6634788 U JP6634788 U JP 6634788U JP H01169247 U JPH01169247 U JP H01169247U
Authority
JP
Japan
Prior art keywords
cup
coating apparatus
wafer
lid body
resist coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6634788U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6634788U priority Critical patent/JPH01169247U/ja
Publication of JPH01169247U publication Critical patent/JPH01169247U/ja
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案に係るレジスト塗布装置を示す
断面図、第2図は従来のレジスト塗布装置を示す
断面図である。 1……カツプ、1a……開口部、2……チヤツ
ク、3……シリコンウエハ、3a……レジスト塗
布面、11……蓋体、12……温度調節機構。
FIG. 1 is a sectional view showing a resist coating apparatus according to the present invention, and FIG. 2 is a sectional view showing a conventional resist coating apparatus. DESCRIPTION OF SYMBOLS 1...Cup, 1a...Opening, 2...Chuck, 3...Silicon wafer, 3a...Resist coated surface, 11...Lid, 12...Temperature adjustment mechanism.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 上方に開口するカツプと、このカツプ内に回転自
在に設けられウエハを吸着保持するチヤツクとを
備えたレジスト塗布装置において、前記カツプの
開口部に温度調節機構によつて表面温度が可変す
る蓋体を設け、この蓋体に前記ウエハのレジスト
塗布面に対向する面を形成したことを特徴とする
レジスト塗布装置。
In a resist coating apparatus that includes a cup that opens upward and a chuck that is rotatably provided in the cup and that sucks and holds a wafer, a lid body whose surface temperature can be varied by a temperature control mechanism is provided at the opening of the cup. What is claimed is: 1. A resist coating apparatus, characterized in that the lid body is provided with a surface that faces the resist-coated surface of the wafer.
JP6634788U 1988-05-18 1988-05-18 Pending JPH01169247U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6634788U JPH01169247U (en) 1988-05-18 1988-05-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6634788U JPH01169247U (en) 1988-05-18 1988-05-18

Publications (1)

Publication Number Publication Date
JPH01169247U true JPH01169247U (en) 1989-11-29

Family

ID=31291754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6634788U Pending JPH01169247U (en) 1988-05-18 1988-05-18

Country Status (1)

Country Link
JP (1) JPH01169247U (en)

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