JPH0176028U - - Google Patents
Info
- Publication number
- JPH0176028U JPH0176028U JP1987171476U JP17147687U JPH0176028U JP H0176028 U JPH0176028 U JP H0176028U JP 1987171476 U JP1987171476 U JP 1987171476U JP 17147687 U JP17147687 U JP 17147687U JP H0176028 U JPH0176028 U JP H0176028U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- generation chamber
- extraction window
- window
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005284 excitation Effects 0.000 claims description 2
- 238000000605 extraction Methods 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案装置のプラズマ投射直前の状態
を示す模式的縦断面図、第２図は同じくプラズマ
投射時の態様を示す模式的縦断面図、第３図は従
来装置の模式的縦断面図である。
１…プラズマ生成室、１ｂ…プラズマ引出窓、
２…導波管、３…反応室、４…励磁コイル、５…
シヤツタ、Ｓ…試料。
Fig. 1 is a schematic longitudinal sectional view showing the device of the present invention in a state immediately before plasma projection, Fig. 2 is a schematic longitudinal sectional view showing the state during plasma projection, and Fig. 3 is a schematic longitudinal sectional view of the conventional device. It is a diagram. 1... Plasma generation chamber, 1b... Plasma drawer window,
2... Waveguide, 3... Reaction chamber, 4... Excitation coil, 5...
Shyatsuta, S...sample.
Claims (1)
を生成させるプラズマ生成室と、該プラズマ生成
室で生成したプラズマをプラズマ引出窓を通じて
導入する試料室とを有するプラズマ装置において
、前記プラズマ引出窓はプラズマ引出窓と平行な
向きのプラズマ生成室の断面積と略等大に開口せ
しめられていることを特徴とするプラズマ装置。 ２ 前記プラズマ引出窓に面してこれを覆う開閉
シヤツタが設置されている実用新案登録請求の範
囲第１項記載のプラズマ装置。[Claims for Utility Model Registration] 1. A plasma device having a plasma generation chamber that generates plasma by electron cyclotron resonance excitation and a sample chamber that introduces the plasma generated in the plasma generation chamber through a plasma extraction window. A plasma device characterized in that the window has an opening approximately equal in size to the cross-sectional area of the plasma generation chamber in a direction parallel to the plasma extraction window. 2. The plasma device according to claim 1, wherein an opening/closing shutter facing and covering the plasma extraction window is installed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171476U JPH0176028U (en) | 1987-11-10 | 1987-11-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171476U JPH0176028U (en) | 1987-11-10 | 1987-11-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0176028U true JPH0176028U (en) | 1989-05-23 |
Family
ID=31463343
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987171476U Pending JPH0176028U (en) | 1987-11-10 | 1987-11-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0176028U (en) |
-
1987
- 1987-11-10 JP JP1987171476U patent/JPH0176028U/ja active Pending
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