JPH0377434U - - Google Patents
Info
- Publication number
- JPH0377434U JPH0377434U JP13804089U JP13804089U JPH0377434U JP H0377434 U JPH0377434 U JP H0377434U JP 13804089 U JP13804089 U JP 13804089U JP 13804089 U JP13804089 U JP 13804089U JP H0377434 U JPH0377434 U JP H0377434U
- Authority
- JP
- Japan
- Prior art keywords
- generation chamber
- plasma generation
- plasma
- small
- diameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005284 excitation Effects 0.000 claims description 2
- 230000005684 electric field Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図から第３図は、本考案によるＥＣＲプラ
ズマ装置を示すためのもので、第１図は全体構成
を示す断面図、第２図は小径プラズマ生成室を示
す拡大断面図、第３図は第２図の底面図、第４図
はイオン化室径の大小による成膜速度とマイクロ
波パワーの関係を示す特性図、第５図は従来のＥ
ＣＲプラズマ装置を示す断面図である。２……励
磁コイル、５……プラズマ生成室、Ｄ０……第１
内径、Ｄ１……第２内径、１１……試料、１６…
…試料室、２０……小径プラズマ生成室である。
Figures 1 to 3 are for showing the ECR plasma device according to the present invention. Figure 1 is a sectional view showing the overall configuration, Figure 2 is an enlarged sectional view showing a small diameter plasma generation chamber, and Figure 3 is an enlarged sectional view showing the small diameter plasma generation chamber. is a bottom view of Fig. 2, Fig. 4 is a characteristic diagram showing the relationship between film formation speed and microwave power depending on the size of the ionization chamber diameter, and Fig. 5 is a diagram of the conventional E
It is a sectional view showing a CR plasma device. 2... Excitation coil, 5... Plasma generation chamber, D 0 ... First
Inner diameter, D 1 ... Second inner diameter, 11... Sample, 16...
...sample chamber, 20...small diameter plasma generation chamber.
Claims (1)
クロ波による高周波電界と前記プラズマ生成室５
の周囲に配した励磁コイル２により形成される磁
界とを作用させてプラズマを発生させると共に、
前記プラズマを前記磁界により前記プラズマ生成
室５と連通した試料室１６に導出するようにした
ＥＣＲプラズマ装置において、 前記プラズマ生成室５内に設けられ前記プラズ
マ生成室５の第１内径Ｄ０よりも小径の第２内径
Ｄ１を有する小径プラズマ生成室２０を有し、こ
の小径プラズマ生成室２０により、前記プラズマ
生成室５の第１内径Ｄ０を実質的に小さくするよ
うにしたことを特徴とするＥＣＲプラズマ装置。 (2) 前記小径プラズマ生成室２０は、前記プラ
ズマ生成室５に着脱自在に設けられていることを
特徴とする請求項１記載のＥＣＲプラズマ装置。[Claims for Utility Model Registration] (1) High-frequency electric field generated by microwaves applied to the gas introduced into the plasma generation chamber 5 and said plasma generation chamber 5
generates plasma by interacting with the magnetic field formed by the excitation coil 2 arranged around the
In an ECR plasma apparatus in which the plasma is guided by the magnetic field to a sample chamber 16 communicating with the plasma generation chamber 5, the first inner diameter D of the plasma generation chamber 5 provided within the plasma generation chamber 5 is It is characterized by having a small-diameter plasma generation chamber 20 having a small second inner diameter D1 , and by this small-diameter plasma generation chamber 20, the first inner diameter D0 of the plasma generation chamber 5 is substantially reduced. ECR plasma device. (2) The ECR plasma apparatus according to claim 1, wherein the small-diameter plasma generation chamber 20 is detachably provided in the plasma generation chamber 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13804089U JPH0521873Y2 (en) | 1989-11-30 | 1989-11-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13804089U JPH0521873Y2 (en) | 1989-11-30 | 1989-11-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0377434U true JPH0377434U (en) | 1991-08-05 |
| JPH0521873Y2 JPH0521873Y2 (en) | 1993-06-04 |
Family
ID=31685170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13804089U Expired - Lifetime JPH0521873Y2 (en) | 1989-11-30 | 1989-11-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0521873Y2 (en) |
-
1989
- 1989-11-30 JP JP13804089U patent/JPH0521873Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0521873Y2 (en) | 1993-06-04 |