JPH0176033U - - Google Patents
Info
- Publication number
- JPH0176033U JPH0176033U JP1987171303U JP17130387U JPH0176033U JP H0176033 U JPH0176033 U JP H0176033U JP 1987171303 U JP1987171303 U JP 1987171303U JP 17130387 U JP17130387 U JP 17130387U JP H0176033 U JPH0176033 U JP H0176033U
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- plasma
- magnetic field
- respect
- etching apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は、本考案の一実施例のプラズマエツチ
ング装置の要部縦断面図である。
１０…陰極、２０…陽極、３０…処理室、４０
…高周波電源、５０…永久磁石、５２…モータ、
６０…試料。
FIG. 1 is a longitudinal sectional view of a main part of a plasma etching apparatus according to an embodiment of the present invention. 10... Cathode, 20... Anode, 30... Processing chamber, 40
...High frequency power supply, 50...Permanent magnet, 52...Motor,
60...Sample.
Claims (1)
内でエツチングガスを磁場が付与された放電によ
りプラズマ化し該プラズマを利用して前記陰極に
設置された試料をエツチングする装置において、
前記陽極の前記陰極の反対側で前記試料面に対し
て傾斜する面内で磁場発生手段を回動可能に設け
たことを特徴とするプラズマエツチング装置。 ２ 前記試料面に対する前記傾斜面の角度を調節
可能とした実用新案登録請求の範囲第１項記載の
プラズマエツチング装置。[Claims for Utility Model Registration] 1. Etching gas is turned into plasma by a discharge applied with a magnetic field in a processing chamber having a cathode and an anode facing each other in parallel, and the plasma is used to etch a sample placed on the cathode. In a device that
A plasma etching apparatus characterized in that a magnetic field generating means is provided rotatably in a plane inclined with respect to the sample surface on the opposite side of the anode to the cathode. 2. The plasma etching apparatus according to claim 1, wherein the angle of the inclined surface with respect to the sample surface is adjustable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171303U JPH0176033U (en) | 1987-11-11 | 1987-11-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171303U JPH0176033U (en) | 1987-11-11 | 1987-11-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0176033U true JPH0176033U (en) | 1989-05-23 |
Family
ID=31463015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987171303U Pending JPH0176033U (en) | 1987-11-11 | 1987-11-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0176033U (en) |
-
1987
- 1987-11-11 JP JP1987171303U patent/JPH0176033U/ja active Pending