JPH0229149U - - Google Patents

Info

Publication number
JPH0229149U
JPH0229149U JP10813088U JP10813088U JPH0229149U JP H0229149 U JPH0229149 U JP H0229149U JP 10813088 U JP10813088 U JP 10813088U JP 10813088 U JP10813088 U JP 10813088U JP H0229149 U JPH0229149 U JP H0229149U
Authority
JP
Japan
Prior art keywords
plasma generation
generation chamber
filament
anode
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10813088U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10813088U priority Critical patent/JPH0229149U/ja
Publication of JPH0229149U publication Critical patent/JPH0229149U/ja
Pending legal-status Critical Current

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Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案のイオン発生装置の一実施例を
示す構成図、第2図は従来例を示す構成図である
。 22……プラズマ発生室、23……フイラメン
ト、24……アノード、25……イオン引出し電
極、26……フイラメント電源、27……アノー
ド電源、28……イオン引出し電源、29……B
e―Cu、30……ガス導入手段。
FIG. 1 is a block diagram showing an embodiment of the ion generator of the present invention, and FIG. 2 is a block diagram showing a conventional example. 22...Plasma generation chamber, 23...Filament, 24...Anode, 25...Ion extraction electrode, 26...Filament power supply, 27...Anode power supply, 28...Ion extraction power supply, 29...B
e-Cu, 30...Gas introduction means.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] アノードとフイラメントからなるプラズマ発生
室と、このプラズマ発生室の近傍に配置されたイ
オン引出し電極と、前記プラズマ発生室にキヤリ
アガスを導入するためのガス導入手段とを備え、
前記アノード電極の前記フイラメントに対向する
側にイオン化すべき金属を形成したことを特徴と
するイオン発生装置。
comprising a plasma generation chamber consisting of an anode and a filament, an ion extraction electrode disposed near the plasma generation chamber, and a gas introduction means for introducing a carrier gas into the plasma generation chamber,
An ion generating device characterized in that a metal to be ionized is formed on a side of the anode electrode facing the filament.
JP10813088U 1988-08-17 1988-08-17 Pending JPH0229149U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10813088U JPH0229149U (en) 1988-08-17 1988-08-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10813088U JPH0229149U (en) 1988-08-17 1988-08-17

Publications (1)

Publication Number Publication Date
JPH0229149U true JPH0229149U (en) 1990-02-26

Family

ID=31343174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10813088U Pending JPH0229149U (en) 1988-08-17 1988-08-17

Country Status (1)

Country Link
JP (1) JPH0229149U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05225923A (en) * 1991-10-11 1993-09-03 Genus Inc Ion source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05225923A (en) * 1991-10-11 1993-09-03 Genus Inc Ion source

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