JPH0183432U - - Google Patents
Info
- Publication number
- JPH0183432U JPH0183432U JP1987178704U JP17870487U JPH0183432U JP H0183432 U JPH0183432 U JP H0183432U JP 1987178704 U JP1987178704 U JP 1987178704U JP 17870487 U JP17870487 U JP 17870487U JP H0183432 U JPH0183432 U JP H0183432U
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- chamber
- valve
- heating plate
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
第１図は本考案に係る原料気化供給制御装置の
縦断面図、第２図は同水平断面図、第３図は従来
の原料気化供給制御装置の縦断面図である。
１１…恒温槽、１２…ヒーテイングプレート、
１３…上室、１４…下室、１７，２６…ヒータ、
２０…質量流量計、２０ａ，２１ａ…通路形成部
材、２１…バルブ、２２…原料ガス供給配管、２
４…原料容器。
FIG. 1 is a longitudinal sectional view of a raw material vaporization and supply control device according to the present invention, FIG. 2 is a horizontal sectional view thereof, and FIG. 3 is a longitudinal sectional view of a conventional raw material vaporization and supply control device. 11... constant temperature bath, 12... heating plate,
13... Upper chamber, 14... Lower chamber, 17, 26... Heater,
20... Mass flowmeter, 20a, 21a... Passage forming member, 21... Valve, 22... Raw material gas supply piping, 2
4... Raw material container.
Claims (1)
た原料を質量流量計及びバルブ、並びにそれらを
接続する原料ガス供給配管を介して送出するよう
にした原料気化供給制御装置において、 恒温槽内をヒータ内蔵のヒーテイングプレート
により上下の室に分割し、 上室内において、温度制御されるヒーテイング
プレート上に質量流量計及びバルブの通路形成部
材を密着して取付けると共に、それらを接続する
原料ガス供給配管を所要の高さに配設し、 下室内に、内部の原料温度を一定に保持するよ
うに制御された原料容器を配設した、 ことを特徴とする原料気化供給制御装置。[Claim for Utility Model Registration] Raw material vaporization and supply control that heats and vaporizes the raw material contained in a raw material container and sends the vaporized raw material through a mass flow meter, a valve, and a raw material gas supply pipe that connects them. In the device, the inside of the constant temperature chamber is divided into upper and lower chambers by a heating plate with a built-in heater, and in the upper chamber, the mass flow meter and the passage forming member of the valve are closely mounted on the temperature-controlled heating plate. A raw material vaporization system characterized in that a raw material gas supply pipe connecting these is arranged at a required height, and a raw material container that is controlled to keep the internal raw material temperature constant is arranged in the lower chamber. Supply control device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17870487U JPH055941Y2 (en) | 1987-11-24 | 1987-11-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17870487U JPH055941Y2 (en) | 1987-11-24 | 1987-11-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0183432U true JPH0183432U (en) | 1989-06-02 |
| JPH055941Y2 JPH055941Y2 (en) | 1993-02-16 |
Family
ID=31470311
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17870487U Expired - Lifetime JPH055941Y2 (en) | 1987-11-24 | 1987-11-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH055941Y2 (en) |
-
1987
- 1987-11-24 JP JP17870487U patent/JPH055941Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH055941Y2 (en) | 1993-02-16 |
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