JPH0187542U

JPH0187542U -

Info

Publication number: JPH0187542U
Application number: JP18463287U
Authority: JP
Priority date: 1987-12-03
Filing date: 1987-12-03
Publication date: 1989-06-09

Description

[Brief explanation of the drawing]

図面はこの考案の一実施例を示すもので、第１
図は斜視図、第２図は半導体ウエハーを支持して
いる状態での要部側断面図、第３図は平面図、第
４図はプラズマ装置での使用状態の断面図である
。Ｗ……ウエハー、１……基台、２……天板、３
……入口支持枠、４……入口支持溝、５……奥部
支持枠、６……奥部支持溝、１０……プラズマ装
置、１１……エレベータ、１２……反応室。 The drawing shows one embodiment of this invention.
The figure is a perspective view, FIG. 2 is a sectional side view of the main part in a state where a semiconductor wafer is supported, FIG. 3 is a plan view, and FIG. 4 is a sectional view of the device in use in a plasma device. W...Wafer, 1...Base, 2...Top plate, 3
... Entrance support frame, 4... Entrance support groove, 5... Inner support frame, 6... Inner support groove, 10... Plasma device, 11... Elevator, 12... Reaction chamber.

補正昭６３．３．１図面の簡単な説明を次のように補正する。明細書中第１３頁第７行目に「断面図」である
とある後に、「、第５図は他の実施例における要
部側断面図」なる語句を挿入する。明細書中第１３頁第１０行目に「奥部支持溝、
」とある後に、「７……補助天板、」なる語句を
挿入する。Amendment 1986.3.1 The brief description of the drawing is amended as follows. In the seventh line of page 13 of the specification, after the phrase "cross-sectional view", the phrase "FIG. 5 is a side cross-sectional view of the main part of another embodiment" is inserted. In the 10th line of page 13 of the specification, it is stated that “inner support groove,
'', then insert the phrase ``7...auxiliary top plate''.

Claims

[Claims for Utility Model Registration] 1. A plate-shaped base placed on a lift base of an elevator in a vertical plasma device, parallel to this base, and capable of storing a predetermined number of semiconductor wafers. A top plate that forms the storage area together with the base, and a rod-shaped entrance support frame that is located on the left and right sides of the storage area entrance where wafers are inserted parallel to the base surface, and that is erected between the base and the top plate. It consists of a rod-shaped back support frame located at the back of the storage area and erected between the base and the top plate, and inside each of the entrance support frame and the back support frame, An entrance support groove and a deep support groove are respectively formed into which the peripheral edge of the wafer is fitted and supported, and the side edge of the base in the deep support groove is compared to the side edge of the base in the entrance support groove. , a wafer support device characterized in that the base is positioned offset. 2 The back support groove is wider than the entrance support groove, so that the edge on the side of the top plate in the back support groove is almost on the same level as the side edge on the side of the top plate in the entrance support groove. A wafer support according to claim 1 of the registered utility model, which is in a vertical position.