JPH0189953U - - Google Patents
Info
- Publication number
- JPH0189953U JPH0189953U JP18621587U JP18621587U JPH0189953U JP H0189953 U JPH0189953 U JP H0189953U JP 18621587 U JP18621587 U JP 18621587U JP 18621587 U JP18621587 U JP 18621587U JP H0189953 U JPH0189953 U JP H0189953U
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- evaporation source
- support plate
- coil
- alumina material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
Description
第1図は本考案の実施例による蒸発源の断面図
、第2図は従来例の蒸発源の平面図及び第3図は
第2図における―線方向の断面図で第1図と
同様な図である。
なお図において、19……電気抵抗体。
FIG. 1 is a sectional view of an evaporation source according to an embodiment of the present invention, FIG. 2 is a plan view of a conventional evaporation source, and FIG. 3 is a sectional view in the - line direction in FIG. It is a diagram. In the figure, 19...electric resistor.
Claims (1)
熱用コイルを巻装し、該コイルに高周波の電流を
通電させることにより各前記るつぼ内の金属を誘
導加熱により融解して蒸発させるようにした蒸発
源において、各前記るつぼの下方に補助加熱源を
配設し、各前記るつぼの温度を検出し、この検出
に基いて前記補助加熱源の発生熱量を制御するこ
とにより各前記るつぼの温度をほゞ等しくしたこ
とを特徴とする蒸発源。 (2) 前記補助加熱源は電気抵抗体であつて、該
抵抗体は前記るつぼの下方で前記るつぼを支持す
るための第1支持板の下方に配設されている前記
第1項に記載の蒸発源。 (3) 前記第1支持板はアルミナ材で成る前記第
2項に記載の蒸発源。 (4) 前記電気抵抗体はアルミナ材で成る第2の
支持板で支持されている前記第3項に記載の蒸発
源。 (5) 前記電気抵抗体は線状又はコイル状であつ
て、この径より大きいアルミナ材で成るスペーサ
部材が前記第1と第2の支持板との間に介在され
ている前記第4項に記載の蒸発源。[Claims for Utility Model Registration] (1) A high-frequency induction heating coil is commonly wound around the outer periphery of a plurality of crucibles, and the metal in each crucible is heated by induction by passing a high-frequency current through the coil. In the evaporation source configured to melt and evaporate, an auxiliary heating source is disposed below each crucible, the temperature of each crucible is detected, and the amount of heat generated by the auxiliary heating source is controlled based on this detection. An evaporation source characterized in that the temperature of each of the crucibles is made substantially equal. (2) The auxiliary heating source is an electric resistor, and the resistor is disposed below the crucible and below the first support plate for supporting the crucible. Evaporation source. (3) The evaporation source according to item 2, wherein the first support plate is made of alumina material. (4) The evaporation source according to item 3, wherein the electric resistor is supported by a second support plate made of alumina material. (5) The electric resistor is in the form of a wire or a coil, and a spacer member made of alumina material having a diameter larger than this is interposed between the first and second support plates. Evaporation sources listed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987186215U JPH047182Y2 (en) | 1987-12-07 | 1987-12-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987186215U JPH047182Y2 (en) | 1987-12-07 | 1987-12-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0189953U true JPH0189953U (en) | 1989-06-13 |
| JPH047182Y2 JPH047182Y2 (en) | 1992-02-26 |
Family
ID=31477454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987186215U Expired JPH047182Y2 (en) | 1987-12-07 | 1987-12-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH047182Y2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5725734U (en) * | 1980-07-18 | 1982-02-10 | ||
| JPS5943875A (en) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | Evaporation source and its using method |
| JPS60255971A (en) * | 1984-05-30 | 1985-12-17 | Mitsubishi Electric Corp | Thin film forming equipment |
-
1987
- 1987-12-07 JP JP1987186215U patent/JPH047182Y2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5725734U (en) * | 1980-07-18 | 1982-02-10 | ||
| JPS5943875A (en) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | Evaporation source and its using method |
| JPS60255971A (en) * | 1984-05-30 | 1985-12-17 | Mitsubishi Electric Corp | Thin film forming equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH047182Y2 (en) | 1992-02-26 |
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