JPH019152Y2 - - Google Patents
Info
- Publication number
- JPH019152Y2 JPH019152Y2 JP14734484U JP14734484U JPH019152Y2 JP H019152 Y2 JPH019152 Y2 JP H019152Y2 JP 14734484 U JP14734484 U JP 14734484U JP 14734484 U JP14734484 U JP 14734484U JP H019152 Y2 JPH019152 Y2 JP H019152Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mask
- holder
- front surface
- thick substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 40
- 238000004381 surface treatment Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 239000010409 thin film Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009760 electrical discharge machining Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000009191 jumping Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Description
【考案の詳細な説明】
（産業上の利用分野）
本考案は、レンズ等のカメラ用部品や円筒形の
部材等の厚味を有する基板の前面を蒸着その他の
表面処理手段により表面処理されることをマスク
で防ぎ、該基板の側面を表面処理する厚手基板の
マスク装置に関する。[Detailed description of the invention] (Industrial application field) The present invention is a method for surface-treating the front surface of a thick substrate such as a camera part such as a lens or a cylindrical member by vapor deposition or other surface treatment means. The present invention relates to a mask device for a thick substrate, which prevents this from occurring with a mask, and performs surface treatment on the side surface of the substrate.
（従来の技術）
従来例えば円筒形部材からなる基板を真空室内
で回転させ、該室内の蒸発源等の表面処理手段に
より該基板の表面に薄膜を形成することは行なわ
れており、また該基板の側面には薄膜を形成する
必要があるがその前面には薄膜を形成してはなら
ない場合、該前面をマスクで覆うことも行なわれ
ている。而して該基板が例えばカメラのレンズで
ある場合該基板の前面にマスクを接触させてはな
らず、そのため第１図示のようにマスクａを基板
ｂの前方に蒸発物質が飛び込まない0.1乃至0.3mm
程度の小さな間隔を存して設けている。(Prior Art) Conventionally, a substrate made of a cylindrical member, for example, is rotated in a vacuum chamber, and a thin film is formed on the surface of the substrate using a surface treatment means such as an evaporation source in the chamber. When it is necessary to form a thin film on the side surfaces of a substrate but not on the front surface, the front surface is sometimes covered with a mask. When the substrate is, for example, a camera lens, the mask must not be brought into contact with the front surface of the substrate, so that the mask a is placed in front of the substrate b at a distance of 0.1 to 0.3 to prevent evaporated substances from jumping into the front of the substrate b, as shown in the first diagram. mm
They are provided with some small spacing between them.
（考案が解決しようとする問題点）
前記マスクａは基板ｂの側面から側方へ離して
設けた細い脚片ｃにより基板ｂのホルダｄに取付
けられ、脚片ｃが基板ｂの側面に飛び込む蒸発物
質の妨げとなることを防止しているが、脚片ｃの
横方向の部分ｅは側面に接近しており、該部分ｅ
に近い箇所の側面には他の箇所よりも薄い薄膜が
形成され、側面全体が均一な薄膜にならない欠点
がある。(Problem to be solved by the invention) The mask a is attached to the holder d of the substrate b by means of thin leg pieces c provided laterally away from the side surface of the substrate b, and the leg pieces c jump into the side surface of the substrate b. However, the lateral portion e of the leg c is close to the side surface, and the portion e
There is a drawback that a thin film is formed on the side surface of the area near the area, which is thinner than other areas, and the thin film is not uniform over the entire side surface.
本考案はマスクの脚片により薄膜の形成が不均
一となることを防止することを目的とするもので
ある。 The purpose of the present invention is to prevent uneven formation of a thin film due to the legs of the mask.
（問題点を解決するための手段）
本考案では、蒸発源等の表面処理手段を有する
真空室内に設けた回転自在のホルダに、円筒形そ
の他の厚味を有する厚手基板を取付け、該厚手基
板の前面を該面の表面処理を防ぐマスクで覆うよ
うにしたものに於いて、該マスクに、厚手基板の
前面と逆方向に延び更に該基板の側面と間隔を存
して該ホルダ方向へと屈曲して延びる複数本の脚
片を設け、各脚片の先端を該ホルダに固定するよ
うにした。(Means for solving the problem) In the present invention, a thick substrate having a cylindrical shape or other thickness is attached to a rotatable holder provided in a vacuum chamber having surface treatment means such as an evaporation source, and the thick substrate is The front surface of the thick substrate is covered with a mask that prevents surface treatment of the surface, and the mask includes a mask that extends in a direction opposite to the front surface of the thick substrate and further extends toward the holder with a distance from the side surface of the substrate. A plurality of bent and extending leg pieces are provided, and the tip of each leg piece is fixed to the holder.
（作用）
該マスクは例えば一枚の板状のばね材から放電
加工により脚片と共に削り出し、簡単な型で該脚
片を折り曲げて形成され、該脚片の先端を厚手基
板を取付けたホルダに固定することにより該マス
クで該基板の前面を覆い、該ホルダと共にマスク
が回転される。而して該脚片は該基板の前面と逆
方向に延び更に該基板の側面と間隔を存して該ホ
ルダ方向へと屈曲して延びるので該基板の側面に
脚片が接近せず、表面処理手段から飛来する蒸着
物質が脚片に邪魔されることなく基板の側面に付
着することが出来る。(Function) The mask is formed by, for example, cutting out a piece of plate-shaped spring material together with the leg pieces by electrical discharge machining, and bending the leg piece with a simple mold. By fixing the mask to the holder, the mask covers the front surface of the substrate, and the mask is rotated together with the holder. The leg pieces extend in the opposite direction to the front surface of the substrate, and further bend and extend toward the holder with a distance from the side surface of the substrate, so that the leg piece does not approach the side surface of the substrate, and the surface The vapor deposition material flying from the processing means can be attached to the side surface of the substrate without being hindered by the leg pieces.
（実施例）
本考案の実施例を図面第２図及び第３図につき
説明すると、第２図に於いて１は蒸発源等の表面
処理手段２を有する真空室、３は該真空室１内に
横置きに設けた回転自在のホルダ、４は該ホルダ
３に取付けした円筒形その他の厚味を有する厚手
基板を示し、該基板４はホルダ３と共に回転され
その表面に表面処理手段２から飛来する物質を薄
膜状に形成する表面処理が施される。(Embodiment) An embodiment of the present invention will be explained with reference to FIGS. 2 and 3. In FIG. 4 is a cylindrical or other thick substrate attached to the holder 3, which is rotatable horizontally. A surface treatment is performed to form a thin film of a substance that acts on the surface.
而して該基板４がカメラのレンズのようにその
前面４ａには薄膜形成処理を施さず、しかも部材
を当接させることが出来ない場合、該前面４ａよ
りわずかの間隔を存してマスク６を設け、基板４
の側面４ｂにのみ表面処理が施される。該マスク
６は脚片７によりホルダ３に係着固定されるが、
該脚片７はマスク６と一体に例えば厚さ0.5mmの
板状のばね材を放電加工して複数本削り出し、適
当な型により屈曲して形成される。この場合該脚
片７は第２図に見られるようにその根部７ａを厚
手基板４の前面４ａと逆方向に伸ばし、更にその
中間部７ｂを該基板４の側面４ｂと間隔８を存し
てホルダ３方向へと屈曲して延びるように形成
し、懐部９を有する脚片７に形成される。 When the substrate 4 is like a camera lens, the front surface 4a of which is not subjected to a thin film formation process and a member cannot be brought into contact with the substrate 4, the mask 6 is placed at a slight distance from the front surface 4a. and the substrate 4
The surface treatment is applied only to the side surface 4b. The mask 6 is fixedly attached to the holder 3 by the leg pieces 7,
The leg pieces 7 are formed integrally with the mask 6 by cutting out a plurality of plate-shaped spring materials, for example, 0.5 mm thick by electrical discharge machining, and bending them using an appropriate mold. In this case, the leg piece 7 extends its root part 7a in the direction opposite to the front surface 4a of the thick substrate 4, as seen in FIG. The leg piece 7 is formed to extend in a bent direction toward the holder 3 and has a pocket portion 9 .
該基板４の表面処理に際してホルダ３がマスク
６と共に回転し、表面処理手段２からの蒸着物質
は基板４の前面４ａがマスク６で覆われているの
で側面４ｂにのみ薄膜状に付着するが該マスク６
の脚片７はマスク６から該前面４ａから逆方向に
延び側面４ｂの接近しないので蒸着物質が脚片７
により妨げられて不均一に側面４ｂに付着するこ
とがない。 During the surface treatment of the substrate 4, the holder 3 rotates together with the mask 6, and since the front surface 4a of the substrate 4 is covered with the mask 6, the evaporation substance from the surface treatment means 2 adheres in the form of a thin film only to the side surface 4b. mask 6
The leg pieces 7 of the mask 6 extend in the opposite direction from the front face 4a and the side faces 4b do not come close to each other, so that the evaporated material does not reach the leg pieces 7.
It will not be prevented from adhering non-uniformly to the side surface 4b.
該マスク６と脚片７を別部材で形成し、第４図
示のように溶接等により重合するようにしてもよ
い。 The mask 6 and the leg pieces 7 may be formed as separate members and then overlapped by welding or the like as shown in the fourth figure.
（考案の効果）
このように本考案によるときは、マスクの脚片
を厚手基板の前面と逆方向に延ばし、更に該基板
の側面と間隔を存して基板のホルダ方向へと延び
る構成とし開部を形成したので、表面処理される
基板の側面に脚片が接近せず側面が不均一に処理
されることがない等の効果がある。(Effect of the invention) As described above, according to the invention, the legs of the mask extend in the direction opposite to the front surface of the thick substrate, and further extend toward the holder of the substrate at a distance from the side surface of the substrate. Since the portions are formed, the legs do not come close to the side surfaces of the substrate to be surface-treated, and the side surfaces are prevented from being unevenly processed.
第１図は従来例の截断側面図、第２図は本考案
の実施例の截断側面図、第３図はその要部の正面
図、第４図は本考案の他の実施例の截断側面図で
ある。
１……真空室、２……表面処理手段、３……ホ
ルダ、４……厚手基板、４ａ……前面、４ｂ……
側面、６……マスク、７……脚片。
Fig. 1 is a cut-away side view of the conventional example, Fig. 2 is a cut-away side view of the embodiment of the present invention, Fig. 3 is a front view of its main parts, and Fig. 4 is a cut-away side view of another embodiment of the present invention. It is a diagram. 1... Vacuum chamber, 2... Surface treatment means, 3... Holder, 4... Thick substrate, 4a... Front, 4b...
Side, 6...mask, 7...leg piece.
Claims (1)
けた回転自在のホルダーに、円筒形その他の厚味
を有する厚手基板を取付け、該厚手基板の前面を
該面の表面処理を防ぐマスクで覆うようにしたも
のに於いて、該マスクに、厚手基板の前面と逆方
向に延び更に該基板の側面と間隔を存して該ホル
ダ方向へと屈曲して延びる複数本の脚片を設け、
各脚片の先端を該ホルダに固定して成る厚手基板
のマスク装置。 A cylindrical or other thick substrate is attached to a rotatable holder provided in a vacuum chamber equipped with surface treatment means such as an evaporation source, and the front surface of the thick substrate is covered with a mask to prevent surface treatment of the surface. , the mask is provided with a plurality of legs extending in a direction opposite to the front surface of the thick substrate and further bent and extending toward the holder with a distance from the side surface of the substrate,
A thick substrate mask device in which the tip of each leg piece is fixed to the holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14734484U JPH019152Y2 (en) | 1984-10-01 | 1984-10-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14734484U JPH019152Y2 (en) | 1984-10-01 | 1984-10-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6163831U JPS6163831U (en) | 1986-04-30 |
| JPH019152Y2 true JPH019152Y2 (en) | 1989-03-13 |
Family
ID=30705573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14734484U Expired JPH019152Y2 (en) | 1984-10-01 | 1984-10-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH019152Y2 (en) |
-
1984
- 1984-10-01 JP JP14734484U patent/JPH019152Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6163831U (en) | 1986-04-30 |
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