JPH0197549U - - Google Patents
Info
- Publication number
- JPH0197549U JPH0197549U JP19497587U JP19497587U JPH0197549U JP H0197549 U JPH0197549 U JP H0197549U JP 19497587 U JP19497587 U JP 19497587U JP 19497587 U JP19497587 U JP 19497587U JP H0197549 U JPH0197549 U JP H0197549U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- excitation coils
- excitation
- sample chamber
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- Drying Of Semiconductors (AREA)
Description
第１図は本考案装置の縦断面図、第２図は本考
案装置と従来装置との比較試験に用いたプラズマ
装置の縦断面図、第３図は試料上におけるフアラ
デーカツプ設置点を示す平面図、第４図は比較試
験結果を示すグラフ、第５図は従来装置の横断面
図である。
１…プラズマ生成室、２…導波管、３…反応室
、４…励磁コイル、Ｓ…試料。
Figure 1 is a vertical cross-sectional view of the device of the present invention, Figure 2 is a vertical cross-sectional view of a plasma device used in a comparative test between the device of the present invention and a conventional device, and Figure 3 is a plan view showing the Faraday cup installation point on the sample. , FIG. 4 is a graph showing the comparative test results, and FIG. 5 is a cross-sectional view of the conventional device. 1... Plasma generation chamber, 2... Waveguide, 3... Reaction chamber, 4... Excitation coil, S... Sample.
Claims (1)
した電子サイクロトロン共鳴励起によりプラズマ
を生成する一対のプラズマ生成室を、試料室の両
側壁の相対向する位置に夫々励磁用コイルを相互
に同心に位置させた状態でプラズマ引出窓を介し
て連設し、また前記励磁用コイルの同極を相対向
する向きにして前記試料室内の試料周縁にカスプ
磁場を形成せしめるようにしたことを特徴とする
プラズマ装置。 A pair of plasma generation chambers are equipped with excitation coils on the outer periphery and generate plasma through electron cyclotron resonance excitation using microwaves, and the excitation coils are placed concentrically at opposite positions on both sides of the sample chamber. The plasma is characterized in that the excitation coils are connected to each other via a plasma draw-out window, and the same poles of the excitation coils are oriented to face each other to form a cusp magnetic field around the sample periphery in the sample chamber. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19497587U JPH0197549U (en) | 1987-12-22 | 1987-12-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19497587U JPH0197549U (en) | 1987-12-22 | 1987-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0197549U true JPH0197549U (en) | 1989-06-29 |
Family
ID=31485674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19497587U Pending JPH0197549U (en) | 1987-12-22 | 1987-12-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0197549U (en) |
-
1987
- 1987-12-22 JP JP19497587U patent/JPH0197549U/ja active Pending