JPH0199203A - Soft magnetic laminated layer film - Google Patents

Soft magnetic laminated layer film

Info

Publication number
JPH0199203A
JPH0199203A JP25628987A JP25628987A JPH0199203A JP H0199203 A JPH0199203 A JP H0199203A JP 25628987 A JP25628987 A JP 25628987A JP 25628987 A JP25628987 A JP 25628987A JP H0199203 A JPH0199203 A JP H0199203A
Authority
JP
Japan
Prior art keywords
iron
magnetic
soft magnetic
coercive force
metal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25628987A
Other languages
Japanese (ja)
Other versions
JP2692088B2 (en
Inventor
Kenji Katori
健二 香取
Masatoshi Hayakawa
正俊 早川
Kazuhiko Hayashi
和彦 林
Koichi Aso
阿蘇 興一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP62256289A priority Critical patent/JP2692088B2/en
Publication of JPH0199203A publication Critical patent/JPH0199203A/en
Application granted granted Critical
Publication of JP2692088B2 publication Critical patent/JP2692088B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To perform highly saturated magnetic flux density, low coercive force and high permeability by laminating iron containing small amount of additive element and metal having nonbody-centered cubic (nonbcc) structure. CONSTITUTION:A magnetic metal layer 2 containing as a main ingredient iron including 0.1-5 atomic % (0.1-15 atomic %, in case of C) of at least one of N, O and C, and a nonmagnetic metal layer 1 having a nonbcc structure are laminated. In order to reduce the coercive force of the iron, elements, such as Si, Al, Ta, B, Mg, Ca, etc., for generating stable nitride, oxide, carbide are added to the material of the layer 2 in a range of 0-7.5 atomic %. Thus, highly saturated magnetic flux density, low coercive force and high permeability are performed.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、軟磁性積層膜に関するものであり、特に高密
度記録に好適な性能を発揮する磁気ヘッド等の材料とし
て使用される軟磁性積層膜に関するもである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a soft magnetic laminated film, and in particular to a soft magnetic laminated film used as a material for magnetic heads etc. that exhibit performance suitable for high-density recording. It also concerns membranes.

〔発明の概要〕[Summary of the invention]

本発明は、磁気ヘッド等の材料として使用される軟磁性
積層膜において、N、 O,Cの少なくとも1種を0.
1〜5原子%(但し、Cの場合0.1〜15原子%)含
んだ鉄を主体とする磁性金属層と非体心立方構造を有す
る非磁性金属層とを積層することにより、高飽和磁束密
度、低保磁力、高透磁率を満足する軟磁性積層膜を提供
しようとするものである。
The present invention provides a soft magnetic laminated film used as a material for magnetic heads and the like, in which at least one of N, O, and C is added to 0.00%.
By laminating a magnetic metal layer mainly composed of iron containing 1 to 5 at% (0.1 to 15 at% in the case of C) and a nonmagnetic metal layer having a non-body-centered cubic structure, high saturation can be achieved. The present invention aims to provide a soft magnetic laminated film that satisfies magnetic flux density, low coercive force, and high magnetic permeability.

[従来の技術〕 従来、オーディオやビジュアルの分野において、記録信
号の高密度化や高品質化が要求されている。
[Prior Art] Hitherto, in the audio and visual fields, there has been a demand for higher density and higher quality recording signals.

この要求を満足するために、例えば鉄等の強磁性金属粉
末を磁性粉とする。所謂メタルテープや、強磁性金属材
料を真空薄膜形成技術によりベースフィルム上に直接被
着した。所謂蒸着テープ等、高保磁力を有する磁気記録
媒体が実用化されている。
In order to satisfy this requirement, for example, ferromagnetic metal powder such as iron is used as magnetic powder. A so-called metal tape or a ferromagnetic metal material was directly deposited on the base film using vacuum thin film formation technology. Magnetic recording media having high coercive force, such as so-called vapor-deposited tapes, have been put into practical use.

ところで、上述のような高保磁力を有する磁気記録媒体
の特性を十分に活かして良好な記録再生を行うためには
、記録再生装置の磁気ヘッドのコア材料の特性として、
高飽和磁束密度と低保磁力さらに高透磁率を有すること
が必要である。
By the way, in order to perform good recording and reproducing by fully utilizing the characteristics of a magnetic recording medium having a high coercive force as described above, the characteristics of the core material of the magnetic head of a recording and reproducing device are as follows.
It is necessary to have high saturation magnetic flux density, low coercive force, and high magnetic permeability.

しかしながら、従来用いられていた磁気ヘッド材料とし
ては、例えばパーマロイやフェライト等があるが、これ
ら磁気ヘッド材料では磁束密度があまり高くないため、
高保磁力を有する磁気記録媒体の記録再生を十分に行う
ことができなかった。
However, conventionally used magnetic head materials include permalloy and ferrite, but these magnetic head materials do not have very high magnetic flux density, so
Recording and reproduction of magnetic recording media having high coercive force could not be performed satisfactorily.

そこで、より一層飽和磁束密度等の軟磁気特性を高めた
軟磁性材料として、例えばF e / Cuを積層した
材料(電子通信学会技術研究報告86−24:日立製作
所 日立研究所)やFe−3i/非晶質合金もしくはF
e−3i−Aj!を積層した材料(特公昭62−1.7
0008号公報)が提案されている。
Therefore, as soft magnetic materials with even higher soft magnetic properties such as saturation magnetic flux density, for example, Fe/Cu laminated materials (IEICE technical research report 86-24: Hitachi Research Institute, Hitachi, Ltd.) and Fe-3i are available. /Amorphous alloy or F
e-3i-Aj! Laminated material (Tokuko Sho 62-1.7
No. 0008) has been proposed.

また、窒化鉄等の微量にガスを含んだ鉄系の材料は、高
飽和磁束密度を達成することのできる材料として有望で
あり、これとセラミックスを積層した積層膜は高飽和磁
束密度、高保磁力、耐熱性を有する優れた軟磁性積層膜
として注目されてい〔発明が解決しようとする問題点〕 ところが、上述したF e / Cu積層膜やFe−3
i/非晶質合金もしくはFe−3i−Aj!積層膜は、
高飽和磁束密度、低保磁力さらに高透磁率をすべて満足
することはできず、所望される記録再生特性を満足する
材料としては充分とは言えない。
In addition, iron-based materials containing a small amount of gas, such as iron nitride, are promising as materials that can achieve high saturation magnetic flux density, and laminated films made by laminating this and ceramics have high saturation magnetic flux density and high coercive force. has attracted attention as an excellent soft magnetic laminated film with heat resistance [a problem to be solved by the invention].However, the above-mentioned Fe/Cu laminated film and Fe-3
i/amorphous alloy or Fe-3i-Aj! The laminated film is
It cannot satisfy all of the requirements of high saturation magnetic flux density, low coercive force, and high magnetic permeability, and cannot be said to be sufficient as a material that satisfies desired recording and reproducing characteristics.

また、微量にガスを含んだ鉄系の材料とセラミックスと
の積層膜からなる軟磁性材料は、磁気ヘッド作製の際に
行われるエツチングによるパターン形成の際に、セラミ
ックスを中間層として積層しているためエツチング特性
に欠けてしまい実用的でない。
In addition, a soft magnetic material consisting of a laminated film of an iron-based material containing a small amount of gas and ceramics is laminated with ceramics as an intermediate layer during pattern formation by etching performed when manufacturing a magnetic head. Therefore, it lacks etching properties and is not practical.

そこで、本発明は上述の問題点を解決するために提案さ
れたものであって、高飽和磁束密度、低保磁力、高透磁
率を同時に満足し、加工適性にも優れた軟磁性積層膜を
提供することを目的とするものである。
Therefore, the present invention was proposed to solve the above-mentioned problems, and provides a soft magnetic laminated film that simultaneously satisfies high saturation magnetic flux density, low coercive force, and high magnetic permeability, and has excellent processability. The purpose is to provide

〔問題点を解決するための手段〕[Means for solving problems]

本発明に係る軟磁性積層膜は、上述の目的を達成するた
めに提案されたものであり、N、O,Cの少なくとも1
種を0.1〜5原子%(但し、Cの場合0.1〜15原
子%)含んだ鉄を主体とする磁性金属層と非体心立方構
造(以下非bcc構造と称する。)を有する非磁性金属
層とを積層したことを特徴とするものである。
The soft magnetic laminated film according to the present invention has been proposed to achieve the above-mentioned object, and contains at least one of N, O, and C.
It has a magnetic metal layer mainly composed of iron containing 0.1 to 5 atomic % of seeds (0.1 to 15 atomic % in the case of C) and a non-body-centered cubic structure (hereinafter referred to as non-BCC structure). It is characterized by laminating a non-magnetic metal layer.

なお、上述の組成範囲は軟磁気特性の観点から設定され
たものであり、この組成範囲外では軟磁気特性が劣化し
てしまう。
Note that the above-mentioned composition range is set from the viewpoint of soft magnetic properties, and outside this composition range, the soft magnetic properties deteriorate.

上記磁性金属層を構成する鉄に添加したN、O。N and O added to iron constituting the magnetic metal layer.

Cの少なくとも1種は、鉄の保磁力を低下させるために
添加したものである。また、さらに鉄の保磁力を低下さ
せる目的でO〜7.5原子%の範囲内でSi、八l、 
Ta、 B、 Mg、 Ca、 Sr、 Ba。
At least one type of C is added to reduce the coercive force of iron. In addition, in order to further reduce the coercive force of iron, Si, 8L,
Ta, B, Mg, Ca, Sr, Ba.

Mn、Zr、Nb、Ti、Mo、V、W、Hf。Mn, Zr, Nb, Ti, Mo, V, W, Hf.

Ga、Ga、  Or、Co、Ni等の安定な窒化物、
酸化物、炭化物を生成する元素を軟磁性積層膜を構成す
る材料として添加してもよい。
Stable nitrides such as Ga, Ga, Or, Co, Ni,
Elements that generate oxides and carbides may be added as materials constituting the soft magnetic laminated film.

上記鉄を主体とする磁性金属層と積層する非磁性金属層
はその結晶が非bcc構造を有するものであることが必
要である。なお、上記非bcc構造とは、すなわち面心
立方構造(fcc構造)。
It is necessary that the crystal of the non-magnetic metal layer laminated with the above-mentioned iron-based magnetic metal layer has a non-BCC structure. Note that the above-mentioned non-BCC structure is a face-centered cubic structure (FCC structure).

六方最密充填構造(hcp構造)、アモルファス等を示
している。磁性金属層と積層する非磁性金属層を非bc
c構造としたのは、磁性金属層として積層される鉄の結
晶がbcc構造であるため、両者を積層した際に互いの
界面が混ざりあってしまうことを防止することからであ
り、非beeとbccとを積層することによって良好な
界面が維持されることを考慮している。
It shows a hexagonal close-packed structure (hcp structure), amorphous, etc. Non-magnetic metal layer laminated with magnetic metal layer
The reason why the C structure was adopted was that since the iron crystals laminated as the magnetic metal layer have a BCC structure, this prevents their interfaces from mixing when the two are laminated. It is considered that a good interface can be maintained by laminating BCC and BCC.

上述のように鉄からなる磁性金属層と非bcc構造の非
磁性金属層とを積層する際の層厚は各々50人〜1μm
及び3人〜500人の間である。
As mentioned above, the layer thickness when laminating the magnetic metal layer made of iron and the non-magnetic metal layer with a non-BCC structure is 50 to 1 μm.
and between 3 and 500 people.

このように磁性金属層側の層厚を厚(するのは高飽和磁
束密度を達成する観点からである。すなわち、飽和密度
は磁性金属層の占める体積によって支配されるものであ
るため、飽和磁束密度に影響を与える磁性金属層の厚み
を厚くするのである。
The reason for increasing the layer thickness on the magnetic metal layer side in this way is to achieve a high saturation magnetic flux density.In other words, since the saturation density is controlled by the volume occupied by the magnetic metal layer, the saturation magnetic flux The thickness of the magnetic metal layer, which affects density, is increased.

上記非bcc構造の非磁性金属層材料としては、Cu、
Ag、Zn、Pd、Au、Pt、Rh、I r等が挙げ
られる。
The non-magnetic metal layer material of the non-bcc structure includes Cu,
Examples include Ag, Zn, Pd, Au, Pt, Rh, and Ir.

これらの軟磁性薄膜を作製するためには、通常スパッタ
リングが行われ、高周波マグネトロン・スパッタリング
、直流スパッタリング、対向ターゲット・スパッタリン
グ、イオンビーム・スパッタリング等の種々の方式が適
用可能であり、通常の条件で行うことができる。なお、
N、O,Cを鉄に添加する場合にはN及びOは各々窒素
ガス及び酸素ガス雰囲気中でスパッタ操作を行えばよく
、またCはメタンガス雰囲気中でスパッタ操作を行うこ
とによって鉄中に導入することができる。
In order to fabricate these soft magnetic thin films, sputtering is usually performed, and various methods such as high frequency magnetron sputtering, direct current sputtering, facing target sputtering, and ion beam sputtering can be applied, and under normal conditions. It can be carried out. In addition,
When adding N, O, and C to iron, N and O can be introduced into the iron by performing a sputtering operation in a nitrogen gas atmosphere and an oxygen gas atmosphere, respectively, and C can be introduced into the iron by performing a sputtering operation in a methane gas atmosphere. can do.

また、上述の保磁力低下元素を添加する場合には、添加
する元素と鉄との合金をターゲットとして使用するか、
または鉄ターゲツト上に添加する元素のチップを置いて
スパッタリングを行えばよい。
In addition, when adding the above-mentioned coercive force reducing element, use an alloy of the added element and iron as a target, or
Alternatively, sputtering may be performed by placing a chip of the element to be added on an iron target.

〔作用〕[Effect]

N、O,Cの少なくとも1種を微量に含有した鉄と非b
cc構造を有する金属とを積層することにより高飽和磁
束密度、低保磁力、高透磁率を実現することが可能であ
る。
Iron containing trace amounts of at least one of N, O, and C
By laminating metals having a cc structure, it is possible to achieve high saturation magnetic flux density, low coercive force, and high magnetic permeability.

また、微量の添加元素を含有した鉄と、積層する非bc
c構造の金属とを積層するので、両者の界面が混ざり合
うことがなく優れた磁気特性が得られる。
In addition, iron containing trace amounts of additive elements and non-BC laminated
Since it is laminated with a c-structure metal, excellent magnetic properties can be obtained without mixing at the interface between the two.

さらに、本発明の軟磁性積層膜は、セラミックのような
耐熱性を有した材料を用いていないため耐熱性には劣る
もののエツチング性に優れているため加工性に優れる。
Furthermore, the soft magnetic laminated film of the present invention does not use a heat-resistant material such as ceramic, so although it has poor heat resistance, it has excellent etching properties and is therefore excellent in processability.

〔実施例〕〔Example〕

以下、本発明の好適な実施例について図面を参考にして
説明する。
Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

1旌炎上 本実施例は、鉄中に添加元素としてアルミニウムを使用
しこれを窒素ガスで窒化した合金と、非bee構造の金
属として銅を用い、これらを積層した軟磁性積層膜の例
である。
This example is an example of a soft magnetic laminated film made by laminating an alloy in which aluminum is used as an additive element in iron and nitrided with nitrogen gas, and copper is used as a metal with a non-bee structure. .

先ず、銅ターゲツトとFe、、AIl、合金ターゲット
を調整した。これを窒素濃度2.5モル%のアルゴン+
窒素ガスからなるスパッタガス雰囲気中で、ガス圧3 
mTorr、出力300Wのスパッタ条件下で高周波マ
グネトロン・スパッタリングを行い、第1図に示すよう
に、非bcc構造を有する非磁性金属層(1)(この例
では銅膜)と鉄を主体とする磁性金属層(2)〔この例
ではアルミニウム含有窒化鉄膜: F eqb、sA 
lzN+、sc数値は原子%)〕よりなる軟磁性積層膜
を作製した。なお、上記銅膜の膜厚は8人、アルミニウ
ム含有窒化鉄膜の膜厚は100人で積層膜の総厚は1.
1μmである。
First, a copper target, Fe, Al, and alloy targets were prepared. Argon with a nitrogen concentration of 2.5 mol% +
In a sputtering gas atmosphere consisting of nitrogen gas, the gas pressure is 3.
High-frequency magnetron sputtering was performed under sputtering conditions of mTorr and output of 300 W, and as shown in Figure 1, a non-magnetic metal layer (1) (copper film in this example) having a non-BCC structure and a magnetic material mainly composed of iron were formed. Metal layer (2) [in this example, aluminum-containing iron nitride film: F eqb, sA
lzN+, sc value is atomic %)] was produced. The thickness of the copper film is 8, and the thickness of the aluminum-containing iron nitride film is 100, and the total thickness of the laminated film is 1.
It is 1 μm.

ここで、本実施例で採用した高周波マグネトロンスパッ
タリングの条件は、上述の条件に制限されるものではな
く、例えば窒素含量を0.1〜5重量%の範囲で、また
ガス圧を1.0〜5mTorrの範囲で変化させても差
支えない、これらの条件は得られる窒化鉄の組成に影響
を及ぼすので、所望の軟磁気特性に応じて適宜選択すれ
ばよい。
Here, the conditions of high frequency magnetron sputtering adopted in this example are not limited to the above-mentioned conditions, and for example, the nitrogen content is in the range of 0.1 to 5% by weight, and the gas pressure is in the range of 1.0 to 5%. These conditions may be varied within a range of 5 mTorr, but since these conditions affect the composition of the obtained iron nitride, they may be appropriately selected depending on the desired soft magnetic properties.

また、スパッタリング方法も上記高周波マグネトロン・
スパッタリングに限定されるものではない。例えば、直
流スパッタリング、対向ターゲット・スパッタリング、
イオンビーム・スパッタリング等も使用可能であり、や
はり窒素−アルゴン雰囲気中で窒素含有量0.1〜5原
子%の条件で行われる。このときのガス圧を例示すると
、直流スパッタリングの場合1.0〜5 mTorr、
対向ターゲット・スパッタリングの場合0.2〜5 m
Torrsイオンビーム・スパッタリングの場合0.1
〜1.0mTorr程度である。
In addition, the sputtering method is also based on the high frequency magnetron mentioned above.
It is not limited to sputtering. For example, DC sputtering, facing target sputtering,
Ion beam sputtering or the like can also be used, and is also carried out in a nitrogen-argon atmosphere with a nitrogen content of 0.1 to 5 at.%. For example, the gas pressure at this time is 1.0 to 5 mTorr in the case of DC sputtering;
0.2 to 5 m for facing target sputtering
0.1 for Torrs ion beam sputtering
~1.0 mTorr.

大施班1 本実施例は、鉄中に添加元素としてアルミニウムを使用
しこれを窒素ガスで窒化した合金と、非bcc構造の金
属として銀を用い、これらを積層した軟磁性積層膜の例
である。
Large implementation group 1 This example is an example of a soft magnetic laminated film made by laminating an alloy in which aluminum is used as an additive element in iron and nitrided with nitrogen gas, and silver is used as a metal with a non-BCC structure. be.

先ず、銀ターゲットとFeqsA52合金ターゲットを
調整した。これを窒素濃度2.5モル%のアルゴン+窒
素ガスからなるスパッタガス雰囲気中で、ガス圧3 m
Torrb出力300Wのスパッタ条件下で高周波マグ
ネトロン・スパッタリングを行い、第1図に示す軟磁性
積層膜と同様の積層構造を有し、銀膜とアルミニウム含
有窒化鉄膜(Fewi、5A1x N+、s  (数値
は原子%)〕よりなる軟磁性積層膜を作製した。なお、
上記銀膜の膜厚は8人、アルミニウム含有窒化鉄膜の膜
厚は100人で積層膜の総厚は1.1μmである。
First, a silver target and a FeqsA52 alloy target were prepared. This was carried out at a gas pressure of 3 m in a sputtering gas atmosphere consisting of argon + nitrogen gas with a nitrogen concentration of 2.5 mol%.
High-frequency magnetron sputtering was performed under sputtering conditions with a Torrb output of 300 W, and a silver film and an aluminum-containing iron nitride film (Fewi, 5A1x N+, s (numerical value A soft magnetic laminated film consisting of
The thickness of the silver film was 8, and the thickness of the aluminum-containing iron nitride film was 100, and the total thickness of the laminated film was 1.1 μm.

大隻拠1 本実施例は、鉄を窒素ガスで窒化したものと、非bcc
構造の金属として銅を積層した軟磁性積層膜の例である
Large ship base 1 This example uses iron nitrided with nitrogen gas and non-BCC
This is an example of a soft magnetic laminated film in which copper is laminated as a structural metal.

本実施例は、鉄中に添加元素として窒素を使用し、積層
する非bcc構造の金属として銅を使用した軟磁性積層
膜の例である。
This example is an example of a soft magnetic laminated film in which nitrogen is used as an additive element in iron and copper is used as a laminated non-BCC structure metal.

先ず、銅ターゲツトとFsターゲットを調整した。これ
を窒素濃度2.5モル%のアルゴン+窒素ガスからなる
スパッタガス雰囲気中で、ガス圧3m Torr、出力
300Wのスパッタ条件下で高周波マグネトロン・スパ
ンクリングを行い、第1図に示す軟磁性積層膜と同様の
積層構造を有し、銅膜とアルミニウム含有窒化鉄膜CF
eq。、、N、、、数値は原子%)〕よりなる軟磁性積
層膜を作製した。
First, the copper target and Fs target were adjusted. In a sputtering gas atmosphere consisting of argon + nitrogen gas with a nitrogen concentration of 2.5 mol%, high-frequency magnetron spanking was performed under sputtering conditions of a gas pressure of 3 m Torr and an output of 300 W, resulting in a soft magnetic lamination as shown in Figure 1. It has a laminated structure similar to the CF film, with a copper film and an aluminum-containing iron nitride film.
eq. , , N, (values are in atomic %)] was fabricated.

なお、上記銅膜の膜厚は8人、窒化鉄膜の膜厚は100
人で積層膜の総厚は1.1μmである。
The thickness of the copper film was 8, and the thickness of the iron nitride film was 100.
The total thickness of the human laminated film is 1.1 μm.

上較拠土 本比較例は、鉄中に添加元素としてアルミニウムを使用
しこれを窒素ガスで窒化した合金からなる軟磁性薄膜の
例である。
The above comparative example is an example of a soft magnetic thin film made of an alloy in which aluminum is used as an additive element in iron and is nitrided with nitrogen gas.

先ず、FeQ8Aβ2合金ターゲットを調整した。First, a FeQ8Aβ2 alloy target was prepared.

これを窒素濃度2.5モル%のアルゴン+チッソガスか
らなるスパッタガス雰囲気中で、ガス圧3mTorr、
出力300Wのスパッタ条件下で高周波マグネトロン・
スパッタリングを行い、アルミニウム含有窒化鉄膜(F
 eqh、5A1z N+、s  (数値は原子%)〕
のサンプル軟磁性薄膜を作製した。なお、上記アルミニ
ウム含有窒化鉄膜の膜厚は100人で積層膜の総厚は1
μmである。
This was carried out in a sputtering gas atmosphere consisting of argon + nitrogen gas with a nitrogen concentration of 2.5 mol%, at a gas pressure of 3 mTorr,
High frequency magnetron under sputtering conditions with an output of 300W.
Sputtering is performed to form an aluminum-containing iron nitride film (F
eqh, 5A1z N+, s (values are atomic %)]
A sample soft magnetic thin film was prepared. The thickness of the aluminum-containing iron nitride film is 100, and the total thickness of the laminated film is 1.
It is μm.

上述のように作製した各サンプル軟磁性積層膜を550
℃で1時間アニールを行った後、保磁力と飽和磁束密度
を測定した。その結果を第1表に示す。
Each sample soft magnetic laminated film produced as described above was
After annealing at ℃ for 1 hour, coercive force and saturation magnetic flux density were measured. The results are shown in Table 1.

第1表 第1表より明らかなように、実施例で示す鉄に添加元素
を含有したものは低保磁力を達成することができた。ま
た、所定の添加金属を鉄に添加して合金とすることによ
りさらに保磁力は低下し、非常に良好な保磁力となった
。これに対して比較例で示す軟磁性積層膜は飽和磁束密
度は高いものの保磁力が高く所望する軟磁気特性は得ら
れなかった。
As is clear from Table 1, the iron containing additive elements shown in Examples was able to achieve a low coercive force. Furthermore, by adding a predetermined additive metal to iron to form an alloy, the coercive force was further reduced, resulting in a very good coercive force. On the other hand, although the soft magnetic laminated film shown in the comparative example had a high saturation magnetic flux density, it had a high coercive force and could not obtain the desired soft magnetic properties.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように、本発明の軟磁性積層膜
は、添加元素を微量含んだ鉄と非bcc構造の金属とを
積層しているので、高飽和磁束密度、低保磁力、高透磁
率が達成できる。
As is clear from the above explanation, the soft magnetic laminated film of the present invention has high saturation magnetic flux density, low coercive force, and high permeability because iron containing a small amount of additive elements and metal with a non-BCC structure are laminated. Magnetic properties can be achieved.

また、セラミック等の材料を積層していないため、耐熱
性には劣るがエツチング性は非常に良好で加工性に優れ
た軟磁性積層膜となる。
In addition, since no material such as ceramic is laminated, the soft magnetic laminated film is inferior in heat resistance but has very good etching properties and excellent workability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明を適用した軟磁性積層膜の一構成例を示
す要部拡大断面図である。 1・・・非bee構造を有する非磁性金属層2・・・鉄
を主体とする磁性金属層 特許出願人   ソニー株式会社 代理人  弁理士  小泡  晃 同   山村 栗− 同    佐H勝
FIG. 1 is an enlarged sectional view of essential parts showing an example of the structure of a soft magnetic laminated film to which the present invention is applied. 1...Non-magnetic metal layer having a non-bee structure 2...Magnetic metal layer mainly composed of iron Patent applicant Sony Corporation representative Patent attorney Kodo Koba Kuri Yamamura Masaru SaH

Claims (1)

【特許請求の範囲】[Claims]  N,O,Cの少なくとも1種を0.1〜5原子%(但
し、Cの場合0.1〜15原子%)含んだ鉄を主体とす
る磁性金属層と非体心立方構造を有する非磁性金属層と
を積層したことを特徴とする軟磁性積層膜。
A magnetic metal layer mainly composed of iron containing at least one of N, O, and C at 0.1 to 5 atomic % (0.1 to 15 atomic % in the case of C) and a non-body-centered cubic structure. A soft magnetic laminated film characterized by laminating a magnetic metal layer.
JP62256289A 1987-10-13 1987-10-13 Soft magnetic laminated film Expired - Fee Related JP2692088B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62256289A JP2692088B2 (en) 1987-10-13 1987-10-13 Soft magnetic laminated film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62256289A JP2692088B2 (en) 1987-10-13 1987-10-13 Soft magnetic laminated film

Publications (2)

Publication Number Publication Date
JPH0199203A true JPH0199203A (en) 1989-04-18
JP2692088B2 JP2692088B2 (en) 1997-12-17

Family

ID=17290586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62256289A Expired - Fee Related JP2692088B2 (en) 1987-10-13 1987-10-13 Soft magnetic laminated film

Country Status (1)

Country Link
JP (1) JP2692088B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03110809A (en) * 1989-09-26 1991-05-10 Matsushita Electric Ind Co Ltd Soft magnetic thin film and magnetic head using the same
JPH03120339A (en) * 1989-09-29 1991-05-22 Victor Co Of Japan Ltd Magnetic alloy
EP0435325A3 (en) * 1989-12-29 1991-07-31 Sony Corporation Fe-n-based soft magnetic thin films and magnetic heads using such films
JPH03239312A (en) * 1990-02-16 1991-10-24 Victor Co Of Japan Ltd Magnetic alloy
JPH03250707A (en) * 1990-02-28 1991-11-08 Victor Co Of Japan Ltd Magnetic alloy
JPH03250706A (en) * 1990-02-28 1991-11-08 Victor Co Of Japan Ltd Magnetic alloy
US6902826B1 (en) 2000-08-18 2005-06-07 International Business Machines Corporation High moment films with sub-monolayer nanolaminations retaining magnetic anisotropy after hard axis annealing
JP4531331B2 (en) * 2000-05-31 2010-08-25 高橋 研 Magnetic thin film, manufacturing method thereof, evaluation method thereof, magnetic head using the same, magnetic recording apparatus and magnetic device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63254709A (en) * 1987-04-13 1988-10-21 Hitachi Ltd Laminated magnetic thin film and magnetic head using the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63254709A (en) * 1987-04-13 1988-10-21 Hitachi Ltd Laminated magnetic thin film and magnetic head using the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03110809A (en) * 1989-09-26 1991-05-10 Matsushita Electric Ind Co Ltd Soft magnetic thin film and magnetic head using the same
JPH03120339A (en) * 1989-09-29 1991-05-22 Victor Co Of Japan Ltd Magnetic alloy
EP0435325A3 (en) * 1989-12-29 1991-07-31 Sony Corporation Fe-n-based soft magnetic thin films and magnetic heads using such films
US5182690A (en) * 1989-12-29 1993-01-26 Sony Corporation Fe-n-based soft magnetic thin films and magnetic heads using such films
JPH03239312A (en) * 1990-02-16 1991-10-24 Victor Co Of Japan Ltd Magnetic alloy
JPH03250707A (en) * 1990-02-28 1991-11-08 Victor Co Of Japan Ltd Magnetic alloy
JPH03250706A (en) * 1990-02-28 1991-11-08 Victor Co Of Japan Ltd Magnetic alloy
JP4531331B2 (en) * 2000-05-31 2010-08-25 高橋 研 Magnetic thin film, manufacturing method thereof, evaluation method thereof, magnetic head using the same, magnetic recording apparatus and magnetic device
US6902826B1 (en) 2000-08-18 2005-06-07 International Business Machines Corporation High moment films with sub-monolayer nanolaminations retaining magnetic anisotropy after hard axis annealing

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