JPH02202005A - Soft magnetic thin film - Google Patents
Soft magnetic thin filmInfo
- Publication number
- JPH02202005A JPH02202005A JP2128989A JP2128989A JPH02202005A JP H02202005 A JPH02202005 A JP H02202005A JP 2128989 A JP2128989 A JP 2128989A JP 2128989 A JP2128989 A JP 2128989A JP H02202005 A JPH02202005 A JP H02202005A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- magnetic
- alloy
- metal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は軟磁性薄膜に関し、特に高密度記録に好適な性
能を発揮する磁気ヘッドのコア材料等として使用される
軟磁性薄膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a soft magnetic thin film, and more particularly to a soft magnetic thin film used as a core material of a magnetic head that exhibits performance suitable for high-density recording.
本発明は、磁気ヘッドのコア材料等として使用される軟
磁性薄膜において、磁性遷移金属層と、Zrおよび/ま
たはNbを主体とする層厚I〜6原子層の非磁性金属層
とを交互に積層することにより、保磁力の低減を可能と
するものである。The present invention provides a soft magnetic thin film used as a core material of a magnetic head, in which a magnetic transition metal layer and a non-magnetic metal layer mainly composed of Zr and/or Nb and having a thickness of I to 6 atomic layers are alternately arranged. By laminating them, it is possible to reduce the coercive force.
たとえばオーディオテープレコーダーやVTR(ビデオ
テープレコーダー)等の磁気記録再生装置においては、
記録信号の高密度化や高品質化が進行しており、鉄等の
強磁性金属粉末を磁性粉とするいわゆるメタルテープや
、強磁性金属材料を真空薄膜形成技術によりベースフィ
ルム上に直接被着したいわゆる蒸着テープ等が実用化さ
れている。For example, in magnetic recording and reproducing devices such as audio tape recorders and VTRs (video tape recorders),
Recording signals are becoming more dense and of higher quality, and so-called metal tapes, which use ferromagnetic metal powder such as iron as magnetic powder, and ferromagnetic metal materials are deposited directly onto base films using vacuum thin film formation technology. So-called vapor-deposited tapes and the like have been put into practical use.
ところで、このような高保磁力を有する磁気記録媒体の
特性を十分に活かして良好な記録再生を行うためには、
・磁気ヘッドのコア材料の特性として高い飽和磁束密度
と低い保磁力を有することが必要である。By the way, in order to make good use of the characteristics of a magnetic recording medium having such a high coercive force for good recording and reproduction, it is necessary to
- It is necessary for the core material of the magnetic head to have high saturation magnetic flux density and low coercive force.
このような要求に応える軟磁性材料として、これまでに
各種の材料が開発されており、これらは通常、バルク状
あるいは薄膜状で使用されている。Various materials have been developed to date as soft magnetic materials that meet these demands, and these are usually used in bulk or thin film form.
Co基アモルファス磁性合金薄膜はその一例である。こ
の合金薄膜は、たとえばセンダストのような結晶性軟磁
性薄膜に比べて保磁力が一桁以上小さい、透磁率が大き
い、比抵抗が大きいために周波数特性に優れる、耐蝕性
・耐摩耗性が極めて高い、組成と軟磁性の関係が厳密で
ないため設計状の自由度が大きい、−軸異方性を誘起さ
せやすいので磁化困難軸方向の透磁率を有効に利用する
ことができる等の種々の利点を有している。たとえば特
開昭59−88801号公報にはCo−Zr−Nb系ア
モルファス合金薄膜、日本応用磁気学会誌第12巻29
9〜304ページ(1988年)にはCo−Nb−Ta
−Zr系組成f:調窒化アモルファス合金膜が報告され
ている。A Co-based amorphous magnetic alloy thin film is one example. This alloy thin film has a coercive force that is more than an order of magnitude smaller than a crystalline soft magnetic thin film such as Sendust, has high magnetic permeability, has excellent frequency characteristics due to its large specific resistance, and has extremely high corrosion and wear resistance. The relationship between composition and soft magnetism is not strict, so there is a large degree of freedom in design. It is easy to induce -axis anisotropy, so magnetic permeability in the direction of the difficult-to-magnetize axis can be effectively used. have. For example, JP-A-59-88801 discloses a Co-Zr-Nb amorphous alloy thin film, Journal of the Japan Society of Applied Magnetics, Vol. 12, 29.
Co-Nb-Ta on pages 9-304 (1988)
-Zr-based composition f: A controlled nitrided amorphous alloy film has been reported.
しかしながら、従来報告されている薄膜状の軟磁性材料
は保磁力が概してバルク状の材料よりも高く、磁気特性
に未だ改善の余地がある。However, the thin film-like soft magnetic materials that have been reported so far generally have higher coercive force than bulk materials, and there is still room for improvement in magnetic properties.
そこで本発明は、薄膜状でも保磁力が十分に低い軟磁性
薄膜の提供を目的とする。Therefore, an object of the present invention is to provide a soft magnetic thin film having a sufficiently low coercive force even in the form of a thin film.
〔課題を解決するための手段〕
本発明者は上述の目的を達成するために検討を重ねた結
果、ある種の磁性遷移金属層と、Zrおよび/またはN
bを主体とする非磁性金属層とを交互に積層して人工格
子膜とすることにより、十分に低い保磁力が達成される
ことを見出し、本発明を完成するに至ったものである。[Means for Solving the Problems] As a result of repeated studies to achieve the above-mentioned object, the present inventors have found that a certain type of magnetic transition metal layer and Zr and/or N
The present inventors have discovered that a sufficiently low coercive force can be achieved by alternately laminating nonmagnetic metal layers mainly composed of B to form an artificial lattice film, and have completed the present invention.
すなわち本発明にかかる軟磁性薄膜は、磁性遷移金属層
と、Zrおよび/またはNbを主体とする層厚1〜6原
子層の非磁性金属層とが交互に積層されたことを特徴と
するものである。That is, the soft magnetic thin film according to the present invention is characterized in that magnetic transition metal layers and nonmagnetic metal layers mainly composed of Zr and/or Nb and having a thickness of 1 to 6 atomic layers are laminated alternately. It is.
上記磁性遷移金属層の材料としては、純Co。The material for the magnetic transition metal layer is pure Co.
Co−Fe系合金、Co−Ni系合金、Go−Fe−N
i系合金等が使用される0合金を使用する場合、これら
の組成におけるFe、Ni、あるいはFe!:Niの合
計の含有量は最大80原子%とすることが良好な軟磁気
特性を維持する観点から望ましい、磁性遷移金属層の層
厚は2〜40原子層とする。この層厚は、Coの原子間
距離あるいは上記合金の平均原子間距離を2.5人とす
ると5〜100人に等しい。Co-Fe alloy, Co-Ni alloy, Go-Fe-N
When using 0 alloys such as i-based alloys, Fe, Ni, or Fe! : The total Ni content is preferably 80 atomic % at most from the viewpoint of maintaining good soft magnetic properties, and the layer thickness of the magnetic transition metal layer is 2 to 40 atomic layers. This layer thickness is equal to 5 to 100 people, assuming that the interatomic distance of Co or the average interatomic distance of the above alloy is 2.5 people.
上記磁性遷移金属層には、耐蝕性や耐摩耗性を向上させ
る目的でさらに5原子%までの範囲でTi、V、Ta、
Cr、Mo、W、B、C,S i。In order to improve corrosion resistance and wear resistance, the magnetic transition metal layer further contains Ti, V, Ta, etc. up to 5 atomic %.
Cr, Mo, W, B, C, Si.
Aj!、Ge、Gaの少なくとも1種を添加しても良い
。Aj! , Ge, and Ga may be added.
一方の非磁性金属層の材料としては、純Zr。The material for one of the nonmagnetic metal layers is pure Zr.
純Nb、あるいはNb−Zr合金が使用される。Pure Nb or Nb-Zr alloy is used.
Nb−Zr合金の組成は特に限定されるものではないが
、0.10e以下の極めて低い保磁力を達成するために
はZrを70原子%以上含有していることが望ましい、
さらに、上記非磁性金属層にはHf等が添加されていて
も良い、非磁性金属層の層厚は1〜6人とする。この層
厚は、Nb、ZrあるいはNb−Zr合金の平均原子間
距離を2.5人とすると2.5〜15人に等しい、より
好ましい範囲は2〜3原子層(5〜7.5人)である、
ただし、この非磁性金属層の層厚は上記磁性遷移金属層
の1/2〜1/20とする。この範囲外では、保磁力が
増大する傾向がある。The composition of the Nb-Zr alloy is not particularly limited, but in order to achieve an extremely low coercive force of 0.10e or less, it is desirable to contain 70 atomic percent or more of Zr.
Further, the non-magnetic metal layer may be doped with Hf or the like, and the thickness of the non-magnetic metal layer is set to 1 to 6 layers. This layer thickness is equal to 2.5 to 15 atoms when the average interatomic distance of Nb, Zr or Nb-Zr alloy is 2.5 atoms, and a more preferable range is 2 to 3 atomic layers (5 to 7.5 atoms). ) is,
However, the thickness of this nonmagnetic metal layer is 1/2 to 1/20 that of the magnetic transition metal layer. Outside this range, the coercive force tends to increase.
本発明の軟磁性薄膜を作成するためには通常スパッタリ
ングが行われ、適当な基板の上に高周波マグネトロン・
スパッタリング、直流スパッタリング、イオンビーム・
スパッタリング等により上記磁性遷移金属層と非磁性金
属層とを交互に積層する。スパッタリング条件は一般的
なものが適用可能である。これら磁性遷移金属層と非磁
性金属層の積層数および軟磁性薄膜の全厚は特に限定さ
れるものではなく、所望の特性にしたがって適宜選択す
れば良い。また、耐蝕性や耐摩耗性を向上させるための
添加元素を使用する場合には、磁性遷移金属層を構成す
る材料と添加元素との合金をターゲットとして使用する
か、または磁性遷移金属層を構成する材料のターゲット
の上に添加元素のチップを置いてスパッタリングを行え
ば良い。In order to create the soft magnetic thin film of the present invention, sputtering is usually performed, and high-frequency magnetron irradiation is performed on a suitable substrate.
Sputtering, DC sputtering, ion beam
The magnetic transition metal layers and nonmagnetic metal layers are alternately laminated by sputtering or the like. General sputtering conditions can be applied. The number of stacked magnetic transition metal layers and nonmagnetic metal layers and the total thickness of the soft magnetic thin film are not particularly limited, and may be appropriately selected according to desired characteristics. In addition, when using additive elements to improve corrosion resistance or wear resistance, an alloy of the additive element and the material constituting the magnetic transition metal layer is used as a target, or the material constituting the magnetic transition metal layer is Sputtering can be performed by placing a chip of the additive element on a target of the material to be used.
本発明において形成される軟磁性薄膜は、以上の説明か
ら明らかなように人工格子構造を有するものである。こ
こで、上記磁性遷移金属層と非磁性金属層の界面は平坦
に形成されていることが理想的であるが、界面にやや乱
れを生じながらも全体としては一定の周期を保って組成
が変動する、いわゆる組成変調構造を有するものであっ
ても良い。As is clear from the above description, the soft magnetic thin film formed in the present invention has an artificial lattice structure. Ideally, the interface between the magnetic transition metal layer and the non-magnetic metal layer is formed flat, but even though the interface is slightly disturbed, the composition as a whole maintains a constant period and changes. It may have a so-called composition modulation structure.
また上記磁性遷移金属層と非磁性金属層のいずれか一方
もしくは両方に窒素が含有されていても良い。この場合
は、スパッタリングの際に雰囲気ガス中に窒素を1%以
下の割合で混合する。Further, nitrogen may be contained in either or both of the magnetic transition metal layer and the nonmagnetic metal layer. In this case, nitrogen is mixed into the atmospheric gas at a rate of 1% or less during sputtering.
さらに、軟磁性薄膜を形成するに先立ち、基板上に適当
な下地膜を設けても良い。Furthermore, prior to forming the soft magnetic thin film, a suitable base film may be provided on the substrate.
本発明では、従来のようなNb、Zr等を添加したCo
%アモルファス合金に代えて、Goを主体とする磁性遷
移金属層と、Zrおよび/またはNbを主体とする非磁
性金属層とを交互に積層した軟磁性薄膜を採用する。こ
れにより、飽和磁化を低下させることなく保磁力の一層
の低減が可能となる。In the present invention, Co is added with Nb, Zr, etc.
% Amorphous alloy is replaced with a soft magnetic thin film in which magnetic transition metal layers mainly composed of Go and nonmagnetic metal layers mainly composed of Zr and/or Nb are alternately laminated. This makes it possible to further reduce coercive force without reducing saturation magnetization.
以下、本発明の好適な実施例について図面を参照しなが
ら説明する。Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
実施例1
本実施例は、Co層を磁性遷移金属層とし、Zr層を非
磁性金属層とするC o / Z r系軟磁性薄膜の例
である。Example 1 This example is an example of a Co/Zr based soft magnetic thin film in which the Co layer is a magnetic transition metal layer and the Zr layer is a nonmagnetic metal layer.
上記Co / Z r系軟磁性薄膜は、以下のようにし
て作成した。The above-mentioned Co/Zr-based soft magnetic thin film was created as follows.
まず、直流スパッタリング装置のチャンバー内に100
mm径のCoおよびZrの各ターゲットを配置し、これ
らのターゲットと対向配置された回転基台に水冷ガラス
基板を載置した。この状態で、ガス圧5 xlO−”
Torrのアルゴン雰囲気中、スパッタリング速度1〜
10人にて直流スパッタリングを行い、00層とZr層
とをその層厚比を172〜8/1の範囲で変えなから全
厚が1μmとなるまで交互に積層し、種々のCo /
Z r系軟磁性薄膜を形成した。First, 100
Co and Zr targets each having a diameter of mm were placed, and a water-cooled glass substrate was placed on a rotating base that was placed facing these targets. In this state, the gas pressure is 5 xlO-”
In an argon atmosphere of Torr, sputtering speed 1~
Direct current sputtering was performed by 10 people, and the 00 layer and the Zr layer were alternately stacked at varying layer thickness ratios in the range of 172 to 8/1 until the total thickness was 1 μm.
A Zr-based soft magnetic thin film was formed.
第1図に、Co層とZr層の層厚比が271〜8/1で
あるC o / Z r系軟磁性薄膜について保磁力を
測定した結果を示す0図中、縦軸は保磁力(Oe)、横
軸は00層の層厚(人)をそれぞれ表す。また、線a1
はCo層とZr層の層厚比が271の場合。Figure 1 shows the results of measuring the coercive force of a Co/Zr-based soft magnetic thin film with a thickness ratio of 271 to 8/1 between the Co layer and the Zr layer, in which the vertical axis represents the coercive force ( Oe), and the horizontal axis represents the layer thickness (in people) of the 00 layer, respectively. Also, line a1
The case where the layer thickness ratio of the Co layer and the Zr layer is 271.
線a2は3/1の場合、線a、は4/1の場合、線a4
は6/1の場合、線a、は8/1の場合をそれぞれ表す
、この図によると、多くの場合は Co層の層厚に応じ
て極小値をとるような変化を示しているが、極小値をと
る時の値のZr層の層厚はいずれの場合も5人となって
いる。すなわち、これらの軟磁性積層膜はZr層の層厚
が2原子層に選ばれたときに最も低い保磁力を示すこと
がわかる。特にCo層を10人、Zr層を5人とした場
合には、第2図に示す磁化曲線からも明らかなように、
保磁力は0.080eと極めて優れた値となった。Line a2 is 3/1, line a is 4/1, line a4
indicates the case of 6/1, and line a indicates the case of 8/1.According to this figure, in most cases, it shows a change that takes a minimum value depending on the layer thickness of the Co layer, The thickness of the Zr layer at the minimum value is 5 people in all cases. That is, it can be seen that these soft magnetic laminated films exhibit the lowest coercive force when the thickness of the Zr layer is selected to be two atomic layers. In particular, when 10 people are in the Co layer and 5 people are in the Zr layer, as is clear from the magnetization curve shown in Figure 2,
The coercive force was an extremely excellent value of 0.080e.
第3図には、Co層とZr層の層厚比が1/4〜8/1
であるC o / Z r系軟磁性積層膜について飽和
磁化を測定した結果を示す0図中、縦軸は飽和磁化(G
auss) r横軸はCo層のJiyL(人)をそれぞ
れ表す。また線す1.はCo層とZr層の層厚比力1/
4(7)場合、線bt ハ1/2(7)場合、t/A
b 3 ハ1/1の場合、線b4は2/1の場合、線す
、は4/1の場合、線す、は6/1の場合、線す、は8
/1の場合をそれぞれ表す。Co層とZr層の層厚比が
1ノ4〜1/1の場合(線b+””bz)には、いずれ
も飽和磁化の値が低く、しかもその値は両層の層厚に依
存して変化する。これに対し、層厚比が271〜8/1
の場合(線b4〜by)には、いずれも飽和磁化の値が
高く、しかもその値は層厚比が一定であれば個々の層の
層厚にかかわらずほぼ一定であることがわかる。Figure 3 shows that the thickness ratio of the Co layer and Zr layer is 1/4 to 8/1.
In Figure 0, which shows the results of measuring the saturation magnetization of the C o / Z r -based soft magnetic laminated film, the vertical axis is the saturation magnetization (G
auss) r The horizontal axis represents JiyL (person) of the Co layer, respectively. Also line 1. is the layer thickness specific force of Co layer and Zr layer 1/
If 4(7), line bt If 1/2(7), t/A
b 3 In the case of C 1/1, the line b4 is 2/1, the line S is 4/1, the line S is 6/1, the line S is 8
/1 respectively. When the thickness ratio of the Co layer and the Zr layer is 1/4 to 1/1 (line b+""bz), the saturation magnetization value is low in both cases, and the value depends on the layer thickness of both layers. and change. On the other hand, the layer thickness ratio is 271 to 8/1.
It can be seen that in all cases (lines b4 to by), the value of saturation magnetization is high, and the value is almost constant regardless of the layer thickness of each layer as long as the layer thickness ratio is constant.
実施例2
本実施例は、Co−Fe合金層を磁性遷移金属層とし、
Zr層を非磁性金属層とするCo−Fe/ Z r系軟
磁性薄膜の例である。Example 2 In this example, the Co-Fe alloy layer is a magnetic transition metal layer,
This is an example of a Co-Fe/Zr-based soft magnetic thin film in which the Zr layer is a nonmagnetic metal layer.
上記Co −F e / Z r系軟磁性薄膜は、実施
例1におけるCoターゲットの代わりにCo−Fe合金
ターゲットを使用し、実施例1に記載した方法と同様に
して作成した。ここで上記Co−Fe合金ターゲットと
しては、Co s。Fe、。、Cow。The above-mentioned Co-Fe/Zr-based soft magnetic thin film was created in the same manner as in Example 1, using a Co--Fe alloy target instead of the Co target in Example 1. Here, the Co--Fe alloy target is Cos. Fe,. ,Cow.
Fes。、Cow。Fey。(ただし、数字はいずれも
組成を原子%で表す、)の3種類の組成のものを使用し
た。このようにして、Co−Fe合金層とZr層とをそ
の層厚比を271〜8/1の範囲で変えなから全厚が1
μmとなるまで交互に積層し、種々のCo −F e
/ Z r系軟磁性薄膜を形成した。Fes. ,Cow. Fey. (However, all numbers represent compositions in atomic %.) Three types of compositions were used. In this way, since the layer thickness ratio of the Co-Fe alloy layer and the Zr layer is varied in the range of 271 to 8/1, the total thickness is 1.
By stacking layers alternately until the thickness of various Co
/Zr-based soft magnetic thin film was formed.
第4図に、これらのCo−Fe/Zr系軟磁性薄膜につ
いて保磁力を測定した結果を示す。図中、縦軸は保磁力
(Oe)、横軸はCo−Fe合金層の層厚(入)をそれ
ぞれ表す、丸印のプロット(線C1””C4)はGo−
Fe合金層の組成がC05oFe2゜である場合を表し
、線C1はCo−Fe合金層とZrJiの層厚比が2/
1の場合、線c、は4/1ノ場合、線C2は6/1の場
合、線C4は8/1の場合をそれぞれ表す、四角印のプ
ロット(線C2〜Ct)はCo−Fe合金層の組成がC
o5oFesoである場合を表し、線C3はCo−Fe
合金層とZr層の層厚比が1/2の場合、線C1は4/
1の場合、腺C1は6/1の場合をそれぞれ表す。三角
印のプロット(線CL CJ はCo−Fe合金層の組
成がCo、。FIG. 4 shows the results of measuring the coercive force of these Co--Fe/Zr-based soft magnetic thin films. In the figure, the vertical axis represents the coercive force (Oe), the horizontal axis represents the layer thickness (in) of the Co-Fe alloy layer, and the plots of circles (lines C1""C4) represent Go-
This represents the case where the composition of the Fe alloy layer is C05oFe2°, and the line C1 represents the case where the layer thickness ratio of the Co-Fe alloy layer and ZrJi is 2/
1, the line c represents the case of 4/1, the line C2 represents the case of 6/1, and the line C4 represents the case of 8/1.The square mark plot (lines C2 to Ct) represents the Co-Fe alloy. The composition of the layer is C
represents the case where o5oFeso, and line C3 is Co-Fe
When the layer thickness ratio of the alloy layer and the Zr layer is 1/2, the line C1 is 4/
1, gland C1 represents the case of 6/1, respectively. Plot of triangle marks (line CL CJ indicates that the composition of the Co-Fe alloy layer is Co).
Fe?oである場合を表し、iceはCo−Fe合金層
とZr層の層厚比が2/1の場合、線C9は4/1の場
合をそれぞれ表す。Fe? 0, ice represents the case where the layer thickness ratio of the Co--Fe alloy layer and the Zr layer is 2/1, and line C9 represents the case where the thickness ratio is 4/1.
この図をみると、いずれの軟磁性薄膜も極小値のある変
化を示している。極小値をとるときのZr層の層厚(原
子層数)は、Co−Fe合金層の組成がCow。Fe、
。である場合は5人(2原子層) 、C05oFeso
およびCo3aFetoである場合は5〜7.5人(2
〜3原子層)である、一部の例外を除いてこれら極小値
の多くは0.50e未満の領域に分布しており、実用上
極めて好適な軟磁性薄膜を構成することがわかる。Looking at this figure, all soft magnetic thin films show changes with a certain minimum value. The layer thickness (number of atomic layers) of the Zr layer when it takes a minimum value is when the composition of the Co-Fe alloy layer is Cow. Fe,
. If 5 people (2 atomic layers), C05oFeso
and 5 to 7.5 people (2
With some exceptions, most of these minimum values are distributed in the region of less than 0.50e, which indicates that the soft magnetic thin film is extremely suitable for practical use.
第5図には、・これらのCo −F e / Z r系
軟磁性薄膜について飽和磁化層を測定した結果を示す。FIG. 5 shows the results of measuring the saturation magnetization layer of these Co--Fe/Zr-based soft magnetic thin films.
図中、丸印のプロット(線d+−d4)はCo−Fe合
金層の組成がCo、。Fe、。である場合を表し、線d
1はCo−Fe合金層とZr層の層厚比が271の場合
、線d2は4/1の場合、線d、は6/1の場合、s#
t a 4は8/lの場合をそれぞれ表す。四角印のプ
ロット (線d、〜ds)はCo−Fe合金層の組成が
Cos。Fes。である場合を表し、さらに線d、はC
o−Fe合金層とZr層の層厚比が172の場合、線d
6は4/1の場合、線d、は6/1の場合、aSは8/
1の場合をそれぞれ表す。三角印のプロット(線d9.
d+o)はCo−Fe合金層の組成がCo、。Fet。In the figure, the circle plot (line d+-d4) indicates that the composition of the Co--Fe alloy layer is Co. Fe,. represents the case where the line d
1 is when the layer thickness ratio of the Co-Fe alloy layer and Zr layer is 271, line d2 is 4/1, line d is 6/1, s#
t a 4 represents the case of 8/l. The square plots (lines d, ~ds) indicate that the composition of the Co-Fe alloy layer is Cos. Fes. , and the line d is C
When the layer thickness ratio between the o-Fe alloy layer and the Zr layer is 172, the line d
6 is 4/1, line d is 6/1, aS is 8/
1 case is shown respectively. Triangle plot (line d9.
d+o), the composition of the Co-Fe alloy layer is Co. Fet.
である場合を表し、さらに線d、はCo−Fe合金層と
Zr層の層厚比が271の場合、線d1゜は4/1の場
合をそれぞれ表す。The line d represents the case where the thickness ratio of the Co--Fe alloy layer and the Zr layer is 271, and the line d1° represents the case where the thickness ratio is 4/1.
この図より、飽和磁化の大きさはCo−Fe合金層の組
成にかかわらずZr層との層厚比が大きくなるにしたが
って増大する傾向があり、またその値は層厚比が一定で
あれば個々の層の層厚にかかわらずほぼ一定であること
がわかる。From this figure, the magnitude of saturation magnetization tends to increase as the layer thickness ratio with the Zr layer increases, regardless of the composition of the Co-Fe alloy layer, and its value increases as long as the layer thickness ratio is constant. It can be seen that it is almost constant regardless of the layer thickness of each individual layer.
実施例3
本実施例は、Co層を磁性遷移金属層とし、Nb層を非
磁性金属層とするC o / N b系軟磁性薄膜の例
である。Example 3 This example is an example of a Co/Nb based soft magnetic thin film in which the Co layer is a magnetic transition metal layer and the Nb layer is a nonmagnetic metal layer.
上記Co / N b系軟磁性薄膜は、実施例1におけ
るZrターゲットの代わりにNbターゲットを使用し、
実施例1に記載した方法と同様にして作成した。全厚は
1μmである。The above Co/Nb-based soft magnetic thin film uses a Nb target instead of the Zr target in Example 1,
It was prepared in the same manner as described in Example 1. The total thickness is 1 μm.
ここで、Co層を15人、Nb層を7.5人(3原子層
)とした場合(すなわち層厚比2/1)の磁化曲線を第
6図(A)に示す。図中、縦軸方向は磁束密度(相対目
盛)、横軸方向は磁場の強さを表す。Here, FIG. 6A shows the magnetization curve when the Co layer has 15 layers and the Nb layer has 7.5 layers (3 atomic layers) (that is, layer thickness ratio 2/1). In the figure, the vertical axis direction represents the magnetic flux density (relative scale), and the horizontal axis direction represents the strength of the magnetic field.
保磁力は0.40eと極めて小さいことがわかった。It was found that the coercive force was extremely small at 0.40e.
また、Co層を10人、Nb層を2.5人(1原子層)
とした場合(すなわち層厚比4/1)の磁化曲線を第6
図(B)に示す。このCo / N b系軟磁性薄膜で
は0.250eと極めて小さい保磁力が達成された。Also, 10 people for the Co layer and 2.5 people for the Nb layer (1 atomic layer)
(i.e., layer thickness ratio 4/1), the magnetization curve is
Shown in Figure (B). This Co/Nb-based soft magnetic thin film achieved an extremely small coercive force of 0.250e.
実施例4
本実施例は、00層を磁性遷移金属層とし、Nb−Zr
合金層を非磁性金属層とするCo/Nb−Zr系軟磁性
薄膜の例である。Example 4 In this example, the 00 layer is a magnetic transition metal layer, and the Nb-Zr
This is an example of a Co/Nb-Zr based soft magnetic thin film in which the alloy layer is a non-magnetic metal layer.
上記Co / N b −Z r系軟磁性薄膜は、実施
例1におけるZrターゲットの代わりにN b s。Z
r@。The Co/Nb-Zr-based soft magnetic thin film is NbS instead of the Zr target in Example 1. Z
r@.
の組成を有するNb−Zr合金ターゲットを使用し、実
施例1に記載した方法と同様にして作成した。全厚は1
μmである。It was produced in the same manner as described in Example 1 using a Nb-Zr alloy target having a composition of Total thickness is 1
It is μm.
ここで、Co層を20人、Nb−Zr合金層を5人(3
原子層)とした場合(すなわち層厚比4/1)の磁化曲
線を第7図に示す、保磁力は0.750eと良好である
ことがわかった。Here, 20 people were responsible for the Co layer, and 5 people (3
Figure 7 shows the magnetization curve in the case of atomic layer) (ie, layer thickness ratio of 4/1), and it was found that the coercive force was 0.750e, which was good.
以上の説明からも明らかなように、本発明を適用すれば
、高い飽和磁束密度を維持したまま極めて低い保磁力を
達成することが可能となる。特に磁性遷移金属層と非磁
性金属層の組成および層厚が適切に選択された場合には
、従来のGo基アモルファス合金磁性薄膜では達成でき
なかった0、10e以下の保磁力も得られ、高密度記録
に好適な磁気ヘッドの提供が可能となる。As is clear from the above description, by applying the present invention, it is possible to achieve an extremely low coercive force while maintaining a high saturation magnetic flux density. In particular, if the composition and layer thickness of the magnetic transition metal layer and non-magnetic metal layer are appropriately selected, a coercive force of 0.10e or less, which could not be achieved with conventional Go-based amorphous alloy magnetic thin films, can be obtained, and high A magnetic head suitable for density recording can be provided.
第1図はCo / Z r系軟磁性薄膜の保磁力と層厚
比の関係を示す特性図である。第2図はCo/Z「系軟
磁性薄膜の一例にかかる磁化曲線である。
第3図は同じ< Co / Z r系軟磁性薄膜の飽和
磁化と層厚比の関係を示す特性図である。第4図はCo
−F e / Z r系軟磁性薄膜の保磁力と層厚比
の関係を示す特性図である。第5図はCo−Fe/Zr
系軟磁性1111!の飽和磁化と層厚比の関係を示す特
性図である。第6図<A)はCo / N b系軟磁性
薄膜の一例にかかる磁化曲線、第6図(B)は同じ<C
o/Nb系軟磁性II!の他の例にかかる磁化曲線をそ
れぞれ表す、第7図はCo / N b−Zr系軟磁性
薄膜の一例にかかる磁化曲線である。
特許出願人 ソニー株式会社
代理人 弁理士 小 池 見
間 田村榮−
同 佐藤 勝
Co11の1厚 (λン
第1図
第3図
第2図
手続争甫正書(自発) 7.補正の内容平成
1年5月12日 (1)明細書第5頁第16行目に「
1〜6人」とあ特許庁長官 吉 1)文 毅 殿
る記載を「1〜6原子層」と補正
する。
■、事件の表示
平成1年特許願第2
2、発明の名称
軟磁性薄膜
3、補正をする者
289号
以
4゜FIG. 1 is a characteristic diagram showing the relationship between coercive force and layer thickness ratio of a Co/Zr based soft magnetic thin film. Figure 2 is a magnetization curve for an example of a Co/Z soft magnetic thin film. Figure 3 is a characteristic diagram showing the relationship between saturation magnetization and layer thickness ratio of the same Co/Zr soft magnetic thin film. .Figure 4 shows Co
FIG. 2 is a characteristic diagram showing the relationship between coercive force and layer thickness ratio of a −Fe/Zr-based soft magnetic thin film. Figure 5 shows Co-Fe/Zr
System soft magnetism 1111! FIG. 3 is a characteristic diagram showing the relationship between saturation magnetization and layer thickness ratio. Figure 6 <A) shows the magnetization curve for an example of a Co/Nb soft magnetic thin film, and Figure 6 (B) shows the same <C
o/Nb-based soft magnetic II! FIG. 7 shows magnetization curves for an example of a Co/Nb-Zr based soft magnetic thin film. Patent Applicant Sony Corporation Representative Patent Attorney Koike Mima Sakae Tamura - Masaru Sato Co11 No. 1 Atsushi (λn Figure 1 Figure 3 Figure 2 Procedural Litigation Manual (Spontaneous) 7. Contents of Amendment Heisei May 12, 1 year (1) On page 5, line 16 of the specification, “
1 to 6 people” Yoshi, Commissioner of the Japan Patent Office 1) Moon Takeshi
The description will be corrected to "1 to 6 atomic layers." ■, Indication of the case, 1999 Patent Application No. 2 2, Name of the invention, Soft magnetic thin film 3, Amended party No. 289 et seq. 4゜
Claims (1)
する層厚1〜6原子層の非磁性金属層とが交互に積層さ
れたことを特徴とする軟磁性薄膜。A soft magnetic thin film characterized in that magnetic transition metal layers and nonmagnetic metal layers mainly composed of Zr and/or Nb and having a thickness of 1 to 6 atomic layers are laminated alternately.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2128989A JPH02202005A (en) | 1989-01-31 | 1989-01-31 | Soft magnetic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2128989A JPH02202005A (en) | 1989-01-31 | 1989-01-31 | Soft magnetic thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02202005A true JPH02202005A (en) | 1990-08-10 |
Family
ID=12050977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2128989A Pending JPH02202005A (en) | 1989-01-31 | 1989-01-31 | Soft magnetic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02202005A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004055784A1 (en) * | 2002-12-18 | 2004-07-01 | Fujitsu Limited | Magnetic thin film and magnetic head using the same |
-
1989
- 1989-01-31 JP JP2128989A patent/JPH02202005A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004055784A1 (en) * | 2002-12-18 | 2004-07-01 | Fujitsu Limited | Magnetic thin film and magnetic head using the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4743491A (en) | Perpendicular magnetic recording medium and fabrication method therefor | |
| Kohmoto | Recent development of thin film materials for magnetic heads | |
| CA1315612C (en) | Perpendicular magnetic storage medium | |
| US20020064689A1 (en) | Magnetic recording medium and magnetic recording apparatus | |
| JP2698814B2 (en) | Soft magnetic thin film | |
| England et al. | Magnetic and structural characterization of copper/cobalt multilayers | |
| JP2508489B2 (en) | Soft magnetic thin film | |
| JPH06168822A (en) | Vertical magnetized film, multilayer film for vertical magnetizing and manufacture of vertical magnetizing film | |
| JPH0199203A (en) | Soft magnetic laminated layer film | |
| JPH02202005A (en) | Soft magnetic thin film | |
| JPS60132305A (en) | Iron-nitrogen based laminated magnetic film and magnetic head using the same | |
| EP0438687A1 (en) | Iron/iron nitride multilayer films | |
| JPS63211141A (en) | Magneto-optical recording medium | |
| JPS6313256B2 (en) | ||
| JP2979557B2 (en) | Soft magnetic film | |
| JPH0315245B2 (en) | ||
| JPH01143312A (en) | Amorphous soft magnetic laminated film | |
| JP2752199B2 (en) | Magnetic head | |
| JPH0337724B2 (en) | ||
| JPS63126208A (en) | Texture-modulated magnetically-soft laminated film | |
| JPH0483313A (en) | Soft magnetic thin film and magnetic head | |
| JPH0256724B2 (en) | ||
| JPH05226151A (en) | Soft magnetic alloy film to be used for magnetic head and having high saturation flux density and high heat resistance and magnetic head | |
| JPH05109040A (en) | Perpendicular magnetic recording medium | |
| JPH10229012A (en) | Manufacture of magnetic recording medium |