JPH02122068U - - Google Patents

Info

Publication number
JPH02122068U
JPH02122068U JP3238189U JP3238189U JPH02122068U JP H02122068 U JPH02122068 U JP H02122068U JP 3238189 U JP3238189 U JP 3238189U JP 3238189 U JP3238189 U JP 3238189U JP H02122068 U JPH02122068 U JP H02122068U
Authority
JP
Japan
Prior art keywords
semiconductor wafer
setting table
wafer setting
processing liquid
serves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3238189U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3238189U priority Critical patent/JPH02122068U/ja
Publication of JPH02122068U publication Critical patent/JPH02122068U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案の一実施例の半導体製造装置
の断面図、第2図はその効果を説明する半導体ウ
エーハ位置とバンプ電極高さの関係図である。第
3図は従来の噴流式メツキ装置の断面図、第4図
はその解決すべき課題について説明するための半
導体ウエーハ位置とバンプ電極高さの関係図であ
る。 11……半導体ウエーハセツト台、12……半
導体ウエーハ、14……処理液(メツキ液)噴射
ノズル、15……処理液(メツキ液)。
FIG. 1 is a cross-sectional view of a semiconductor manufacturing apparatus according to an embodiment of this invention, and FIG. 2 is a diagram showing the relationship between the semiconductor wafer position and bump electrode height to explain the effect thereof. FIG. 3 is a sectional view of a conventional jet plating apparatus, and FIG. 4 is a diagram showing the relationship between the position of a semiconductor wafer and the height of bump electrodes to explain the problem to be solved. 11... Semiconductor wafer setting table, 12... Semiconductor wafer, 14... Processing liquid (plating liquid) injection nozzle, 15... Processing liquid (plating liquid).

Claims (1)

【実用新案登録請求の範囲】 一方の電極を兼ねる半導体ウエーハセツト台と
、 前記半導体ウエーハセツト台の上方に配置され
た他方の電極を兼ねる処理液噴射ノズルと、 前記半導体ウエーハセツト台と処理液噴射ノズ
ル間に接続される電源とを備えたことを特徴とす
る半導体製造装置。
[Claims for Utility Model Registration] A semiconductor wafer setting table that also serves as one electrode, a processing liquid injection nozzle that is arranged above the semiconductor wafer setting table and that also serves as the other electrode, and the semiconductor wafer setting table and the processing liquid injection A semiconductor manufacturing device comprising: a power source connected between nozzles.
JP3238189U 1989-03-22 1989-03-22 Pending JPH02122068U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3238189U JPH02122068U (en) 1989-03-22 1989-03-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3238189U JPH02122068U (en) 1989-03-22 1989-03-22

Publications (1)

Publication Number Publication Date
JPH02122068U true JPH02122068U (en) 1990-10-04

Family

ID=31258837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3238189U Pending JPH02122068U (en) 1989-03-22 1989-03-22

Country Status (1)

Country Link
JP (1) JPH02122068U (en)

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