JPH0217662A - Corrosion-resistant hermetic seal cover and manufacture thereof - Google Patents

Corrosion-resistant hermetic seal cover and manufacture thereof

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Publication number
JPH0217662A
JPH0217662A JP16677988A JP16677988A JPH0217662A JP H0217662 A JPH0217662 A JP H0217662A JP 16677988 A JP16677988 A JP 16677988A JP 16677988 A JP16677988 A JP 16677988A JP H0217662 A JPH0217662 A JP H0217662A
Authority
JP
Japan
Prior art keywords
nickel
corrosion
hermetic seal
layer
iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16677988A
Other languages
Japanese (ja)
Inventor
Hirooki Mori
森 博興
Masanobu Usami
宇佐美 應信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP16677988A priority Critical patent/JPH0217662A/en
Publication of JPH0217662A publication Critical patent/JPH0217662A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体装置のハーメチックシールに好適のシー
ルカバーの構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the structure of a seal cover suitable for a hermetic seal of a semiconductor device.

〔従来の技術〕[Conventional technology]

半導体素子のパフケージングの一種に第2図に示すよう
なセラミックパッケージがある。第2図においてセラミ
ック基板1は、中央部に半導体素子接合用のメタライズ
層を有する下層板と、リードパターンが形成され且つ中
央部に開口を有する中間板と、リードパターンの内側先
端が露出するような更に大きい開口を有する上層板の3
層が一体化された構造であり、長辺側部には上記リード
パターンの外側先端と導通するように複数の金属リード
2が接合され、上記上層板の開口周囲にはカバー取り付
は用のメタライズ層3が形成されている。メタライズ層
及びリードパターンは通常Mo−Mn系の導電ペースト
で形成され、これらとり−ド2には、金メッキが施され
ている。このような基板1を用いるパッケージは先ず半
導体素子4を基板1の中央窪みに接合し、該素子4上の
電極とリードパターンの内側先端を細いコネクター線(
図示せず)で結線した後、メタライズ層3の上に第2図
に示すようなシールリング5と金属性カバーを載せ、シ
ールリング5の融点以上に加熱し、後冷却してカバー6
を取り付ける諸工程からなる。このカバー6の取り付は
工程を一般にハーメチックシールと称し、シールリング
5には、半導体素子4の接合に用いるAu−3i合金ろ
うより低い融点を有するAu−3n合金ろう、Pb−3
n合金ろう等が用いられ、金属製(通常コバール類)カ
バー6の少なくともシーリング5が当接する周縁部には
ろう付は性の良好な金、ニッケルメッキ等のメッキから
なる被膜が施されているのが通常である。
One type of puff casing for semiconductor devices is a ceramic package as shown in FIG. In FIG. 2, the ceramic substrate 1 includes a lower plate having a metallized layer for bonding semiconductor elements in the center, an intermediate plate on which a lead pattern is formed and an opening in the center, and an inner edge of the lead pattern exposed. 3 of the upper plate with an even larger opening
It has a structure in which the layers are integrated, and a plurality of metal leads 2 are joined to the long sides so as to be electrically connected to the outer tips of the lead patterns, and a cover is not attached around the opening of the upper layer plate. A metallized layer 3 is formed. The metallized layer and the lead pattern are usually formed of Mo--Mn based conductive paste, and these leads 2 are plated with gold. In a package using such a substrate 1, the semiconductor element 4 is first bonded to the central recess of the substrate 1, and the electrodes on the element 4 and the inner tips of the lead patterns are connected to thin connector wires (
After connecting the wires (not shown), a seal ring 5 and a metal cover as shown in FIG.
It consists of various processes for attaching. The process of attaching the cover 6 is generally called a hermetic seal, and the seal ring 5 is made of an Au-3n alloy solder, which has a lower melting point than the Au-3i alloy solder used for bonding the semiconductor elements 4, and a Pb-3 alloy solder.
n-alloy brazing or the like is used, and at least the peripheral edge of the metal (usually Kovar type) cover 6 where the sealing 5 comes into contact is coated with a coating of gold, nickel plating, etc. that has good brazing properties. is normal.

従来のハーメチックシールカバーは鉄系合金板の両面に
ニッケル板を被着しただけのものや、鉄系合金板に直接
にニッケルメッキを施し、次に金メッキを施したものが
知られているが、前者のニッケル板を被着しただけのも
のは、剪断面から腐食が進行し易いという欠点があり、
又後者のメッキだけのものはメッキ時に生じるピンホー
ルのために、金とニッケルの局部電極が形成され、鉄系
合金を腐食させる原因になり易いという欠点がある。鉄
系合金の腐食が進んでハーメチックシールカバーの上面
から下面まで貫通した場合気密性を失なうことになる。
Conventional hermetic seal covers are known to simply have nickel plates coated on both sides of an iron alloy plate, or those in which the iron alloy plate is directly nickel plated and then gold plated. The former type, which is simply coated with a nickel plate, has the disadvantage that corrosion tends to progress from the sheared surface.
In addition, the latter method, which only uses plating, has the disadvantage that local electrodes of gold and nickel are formed due to pinholes created during plating, which tends to cause corrosion of the iron-based alloy. If corrosion of the iron-based alloy progresses and penetrates the hermetic seal cover from the upper surface to the lower surface, airtightness will be lost.

気密性、封着性を失なうと使用環境中に存在する腐食性
ガスおよび湿度、温度差、気圧差等によって、半導体素
子への結露等の悪い影響を与える。
If the airtightness and sealing properties are lost, corrosive gases, humidity, temperature differences, pressure differences, etc. present in the usage environment will have adverse effects such as condensation on the semiconductor elements.

また、上記腐食により鉄系合金がカバーからパッケージ
内部に欠落し、半導体素子面に付着した場合は、短絡が
発生し半導体デバイスの信軌性を低下させるという致命
的欠陥があった。
Furthermore, if the iron-based alloy is missing from the cover into the package due to the above-mentioned corrosion and adheres to the surface of the semiconductor element, a short circuit will occur and the reliability of the semiconductor device will be reduced, which is a fatal defect.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明の目的は、上記欠点を解消し、耐腐食性を改善し
た信頼性の高いハーメチックシールカバーを提供するこ
とにある。
An object of the present invention is to provide a highly reliable hermetic seal cover that eliminates the above-mentioned drawbacks and has improved corrosion resistance.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するために本発明者らは、鉄系合金板の
両面にピンホールのないニッケルを被着し、これにニッ
ケルメッキ、次に金メッキを全面に施すことにより、耐
腐食性の良好なハーメチックシールカバーを得ることが
出来ることを見い出し本発明に到達したものである。
In order to achieve the above object, the present inventors deposited pinhole-free nickel on both sides of an iron-based alloy plate, and then applied nickel plating and then gold plating to the entire surface, thereby achieving good corrosion resistance. The present invention was achieved by discovering that it is possible to obtain a hermetic seal cover.

すなわち、本発明は、鉄系合金板の両面に圧延ニッケル
層が3ミクロン以上の厚さで被着され、該ニッケル層の
外側に順次ニッケルメッキ層と金メッキ層が設けられて
なる耐腐食性のハーメチックシールカバーであり、又こ
のハーメチックシールカバーの製法は鉄系合金板の両面
にニッケル層を被着せしめた後圧延処理し、該ニッケル
層の外側に先づ全面ニッケルメッキを、次いで全面金メ
ッキを施す点に特徴がある。
That is, the present invention provides a corrosion-resistant steel alloy sheet in which a rolled nickel layer with a thickness of 3 microns or more is deposited on both sides of an iron-based alloy plate, and a nickel plating layer and a gold plating layer are sequentially provided on the outside of the nickel layer. This is a hermetic seal cover, and the manufacturing method for this hermetic seal cover is to apply a nickel layer on both sides of an iron-based alloy plate, then roll it, and then first apply nickel plating to the outside of the nickel layer, and then apply gold plating to the entire surface. It is distinctive in the way it is applied.

〔作 用〕[For production]

従来の鉄系合金にニッケルメッキ、次に金メッキを全面
に施したものは、メッキの欠陥としてピンホールが発生
しており、ピンホールによって局部電極を生じ鉄系合金
を腐食させやすい。しかし、メッキと鉄系合金板の間に
、圧延したニッケル層が3μm以上あるとニッケルメッ
キと金メッキによって局部電極が発生してもニッケルメ
ッキより緻密である圧延ニッケル層があるためにピンホ
ールの影響が少なく鉄系合金の腐食を低減する事が出来
る。圧延したニッケル層が3μm未満の場合は、ニッケ
ルメッキよりも緻密な層となっているために従来の鉄系
合金にニッケルメッキ、次に金メッキを全面に施したも
のと比較すると鉄系合金の腐食を低減する効果を認める
事は出来るが、圧延したニッケル層が3μm以上のもの
と比較すると効果は少ない。
Conventional iron-based alloys in which nickel plating and then gold plating are applied to the entire surface have pinholes as defects in the plating, and the pinholes create local electrodes that easily corrode the iron-based alloy. However, if there is a rolled nickel layer of 3 μm or more between the plating and the iron-based alloy plate, even if local electrodes occur due to the nickel plating and gold plating, the effect of pinholes will be reduced because the rolled nickel layer is denser than the nickel plating. Corrosion of iron-based alloys can be reduced. If the rolled nickel layer is less than 3 μm, it is a denser layer than nickel plating, so corrosion of the iron alloy will occur compared to a conventional iron alloy with nickel plating and then gold plating on the entire surface. Although it is possible to recognize the effect of reducing the nickel layer, the effect is small compared to the case where the rolled nickel layer is 3 μm or more.

又鉄系合金に圧延したニッケル層が両面に被着され、ハ
ーメチックシールカバーの形状に打ち抜き加工された鉄
系合金の上面、下面にはニッケル層があるが剪断面は鉄
系合金が露出し、この部分から腐食が進行する。しかし
、これにニッケルメッキ、次に金メッキを全面に施すこ
とによって剪断面の鉄系合金の露出を防止し、腐食を抑
制するものである。
In addition, a rolled nickel layer is applied to both sides of the iron-based alloy, and the iron-based alloy is punched into the shape of a hermetic seal cover.There are nickel layers on the top and bottom surfaces, but the iron-based alloy is exposed on the sheared surface. Corrosion progresses from this part. However, by applying nickel plating and then gold plating to the entire surface, exposure of the iron-based alloy on the sheared surface is prevented and corrosion is suppressed.

〔実施例〕〔Example〕

次に本発明を実施例により説明する。 Next, the present invention will be explained by examples.

0゜l mm厚のコバール板そのままの試料(1)、0
.1霞識厚、101m角のコバール板に直接ニッケルメ
ッキ(4μm厚)、次に金メッキ(2μm厚)を施した
試料(2)、0.1關厚コバール板の両面に0.01m
1厚のニッケル板を被着し10龍角に打ち抜いただけの
試料(3)、及び0.1 mm厚のコバール板の両面に
0.01 mm厚のニッケル板を被着し、圧延処理した
材料を10mm角に打ち抜き、バレルメッキによりニッ
ケルメッキ(4μm厚)、次に金メッキ(2μm厚)を
全面に施した本発明試料(4)を塩水噴霧試験機で5%
NaCl、室温で24時間の試験を行った。塩水噴霧試
験後、実体顕微鏡(倍率30倍)で腐食状態を観察した
結果を第1表に示す。
0゜mm thick Kovar plate sample (1), 0
.. Sample (2) in which a 101 m square Kovar plate with a thickness of 1 haze was directly plated with nickel (4 μm thick) and then gold plated (2 μm thick).
Sample (3) was prepared by simply applying a 1-thick nickel plate and punching out 10 dragon angles, and a 0.01-mm-thick nickel plate was applied to both sides of a 0.1-mm-thick Kovar plate and rolled. Sample (4) of the present invention, which was punched out into 10 mm squares, was barrel-plated with nickel plating (4 μm thick), and then gold plating (2 μm thick) on the entire surface, was tested at 5% using a salt spray tester.
A 24 hour test was conducted in NaCl at room temperature. Table 1 shows the results of observing the corrosion state using a stereoscopic microscope (30x magnification) after the salt spray test.

第1表に示される通り、コバール板そのままの試料(1
)は全面腐食が生じている。コバール板に直接にニッケ
ルメッキ、次いで金メッキを施した試料(2)は試料の
上面、下面に腐食がかなり発生しており、側面にも腐食
の発生が認められる。又コバール板にニッケル板を被着
しただけの試料(3)は打ち抜いた剪断面から腐食がか
なり進んでいる。本発明の試料(4)の上面、下面には
腐食は認められなかったが、側面(剪断面)には腐食が
わずかに認められた。
As shown in Table 1, the Kovar plate sample (1
) is completely corroded. Sample (2), in which the Kovar plate was directly nickel-plated and then gold-plated, had considerable corrosion on the top and bottom surfaces of the sample, and corrosion was also observed on the sides. In addition, sample (3), which was simply a nickel plate adhered to a Kovar plate, showed considerable corrosion from the punched sheared surface. No corrosion was observed on the top and bottom surfaces of sample (4) of the present invention, but slight corrosion was observed on the side surface (sheared surface).

この試験の結果、コバール板の両面に被着したニッケル
層を圧延処理し、これに全面ニッケルメッキを、次いで
全面金メッキを施すことによって耐腐食性が大幅に向上
することが確認できた。
As a result of this test, it was confirmed that corrosion resistance was significantly improved by rolling the nickel layer deposited on both sides of the Kovar plate, and then applying nickel plating to the entire surface and then gold plating the entire surface.

〔発明の効果〕〔Effect of the invention〕

本発明によりハーメチックシールカバーの腐食が減少す
るため半導体デバイスの信頼性が大幅に向上して工業上
極めて有用である。
The present invention reduces corrosion of the hermetic seal cover, greatly improving the reliability of semiconductor devices, and is extremely useful industrially.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明によるハーメチックシールカバーの断面
図であり、第2図はセラミックパッケージの構造図であ
る。 1・・・セラミック基板、2・・・金属リード、3・・
・メタライズ層、4・・・半導体素子、5・・・シール
リング、6・・・ハーメチックシールカバー 7・・・
金メッキ層、8・・・ニッケルメッキ層、9・・・ニッ
ケル被着層、10・・・コバール材。 特許出願人  住友金属鉱山株式会社
FIG. 1 is a sectional view of a hermetic seal cover according to the present invention, and FIG. 2 is a structural view of a ceramic package. 1...Ceramic substrate, 2...Metal lead, 3...
- Metallized layer, 4... Semiconductor element, 5... Seal ring, 6... Hermetic seal cover 7...
Gold plating layer, 8... Nickel plating layer, 9... Nickel adhesion layer, 10... Kovar material. Patent applicant Sumitomo Metal Mining Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] (1)鉄系合金板の両面に圧延ニッケル層が3ミクロン
以上の厚さで被着され、該ニッケル層の外側に順次ニッ
ケルメッキ層と金メッキ層が設けられてなる耐腐食性ハ
ーメチックシールカバー。
(1) A corrosion-resistant hermetic seal cover in which a rolled nickel layer with a thickness of 3 microns or more is applied to both sides of an iron-based alloy plate, and a nickel plating layer and a gold plating layer are sequentially provided on the outside of the nickel layer.
(2)鉄系合金板の両面にニッケル層を被着せしめた後
圧延処理し、該ニッケル層の外側に先づ全面ニッケルメ
ッキを、次いで全面金メッキを施すことを特徴とする耐
腐食性ハーメチックシールカバーの製造方法。
(2) A corrosion-resistant hermetic seal characterized by applying a nickel layer to both sides of an iron-based alloy plate, rolling it, and first applying nickel plating to the outside of the nickel layer, and then applying gold plating to the entire surface. How to manufacture the cover.
JP16677988A 1988-07-06 1988-07-06 Corrosion-resistant hermetic seal cover and manufacture thereof Pending JPH0217662A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16677988A JPH0217662A (en) 1988-07-06 1988-07-06 Corrosion-resistant hermetic seal cover and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16677988A JPH0217662A (en) 1988-07-06 1988-07-06 Corrosion-resistant hermetic seal cover and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH0217662A true JPH0217662A (en) 1990-01-22

Family

ID=15837527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16677988A Pending JPH0217662A (en) 1988-07-06 1988-07-06 Corrosion-resistant hermetic seal cover and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH0217662A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296194A (en) * 1991-02-01 1994-03-22 Sanyo Electric Co., Ltd. Blood analyzing system
US5583379A (en) * 1993-09-03 1996-12-10 Ngk Spark Plug Co., Ltd. Outer lead for a semiconductor IC package having individually annealed plated layers
US7187060B2 (en) 2003-03-13 2007-03-06 Sanyo Electric Co., Ltd. Semiconductor device with shield
JP2010010617A (en) * 2008-06-30 2010-01-14 Kyocera Kinseki Corp Lid for electronic component

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296194A (en) * 1991-02-01 1994-03-22 Sanyo Electric Co., Ltd. Blood analyzing system
US5583379A (en) * 1993-09-03 1996-12-10 Ngk Spark Plug Co., Ltd. Outer lead for a semiconductor IC package having individually annealed plated layers
US5668060A (en) * 1993-09-03 1997-09-16 Ngk Spark Plug Co., Ltd. Outer lead for a semiconductor IC package and a method of fabricating the same
US7187060B2 (en) 2003-03-13 2007-03-06 Sanyo Electric Co., Ltd. Semiconductor device with shield
JP2010010617A (en) * 2008-06-30 2010-01-14 Kyocera Kinseki Corp Lid for electronic component

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