JPH0220328U - - Google Patents
Info
- Publication number
- JPH0220328U JPH0220328U JP9815188U JP9815188U JPH0220328U JP H0220328 U JPH0220328 U JP H0220328U JP 9815188 U JP9815188 U JP 9815188U JP 9815188 U JP9815188 U JP 9815188U JP H0220328 U JPH0220328 U JP H0220328U
- Authority
- JP
- Japan
- Prior art keywords
- inert gas
- semiconductor wafers
- heat
- evacuation chamber
- preliminary evacuation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011261 inert gas Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 claims 3
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
Description
第１図は本考案の一実施例を示す縦断面図、第
２図は従来例の熱処理装置を示す縦断面図である
。
１……炉芯管、２……ヒータ、３……ガス、４
……不活性ガス源、５……半導体ウエーハ、６…
…ウエーハボート、７……真空ポンプ、８……排
気バルブ、９……不活性ガス導入バルブ、１０ａ
，１０ｂ……扉、１２……ロードロツク、１３…
…排気ダクト配管バルブ、１４……排気ダクト、
１５……圧力ゲージ。
FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention, and FIG. 2 is a longitudinal sectional view showing a conventional heat treatment apparatus. 1... Furnace core tube, 2... Heater, 3... Gas, 4
...Inert gas source, 5...Semiconductor wafer, 6...
...Wafer boat, 7...Vacuum pump, 8...Exhaust valve, 9...Inert gas introduction valve, 10a
, 10b...Door, 12...Loadlock, 13...
...Exhaust duct piping valve, 14...Exhaust duct,
15...Pressure gauge.
Claims (1)
おいて、半導体ウエハの熱処理用炉芯管の開口部
に連結され、真空排気される予備真空排気室と、
該予備真空排気室内に不活性ガスを導入しその内
部を不活性ガス雰囲気に置換する不活性ガス源と
を有することを特徴とする半導体ウエーハの熱処
理装置。 In an apparatus for heat-treating semiconductor wafers at atmospheric pressure, a preliminary evacuation chamber is connected to an opening of a furnace core tube for heat-treating semiconductor wafers and is evacuated;
A heat processing apparatus for semiconductor wafers, comprising: an inert gas source for introducing an inert gas into the preliminary evacuation chamber and replacing the inside with an inert gas atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9815188U JPH0220328U (en) | 1988-07-25 | 1988-07-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9815188U JPH0220328U (en) | 1988-07-25 | 1988-07-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0220328U true JPH0220328U (en) | 1990-02-09 |
Family
ID=31324158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9815188U Pending JPH0220328U (en) | 1988-07-25 | 1988-07-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0220328U (en) |
-
1988
- 1988-07-25 JP JP9815188U patent/JPH0220328U/ja active Pending
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