JPH0221082B2 - - Google Patents

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Publication number
JPH0221082B2
JPH0221082B2 JP7292583A JP7292583A JPH0221082B2 JP H0221082 B2 JPH0221082 B2 JP H0221082B2 JP 7292583 A JP7292583 A JP 7292583A JP 7292583 A JP7292583 A JP 7292583A JP H0221082 B2 JPH0221082 B2 JP H0221082B2
Authority
JP
Japan
Prior art keywords
organic solvent
composition
film
coating
antimony
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7292583A
Other languages
Japanese (ja)
Other versions
JPS59198608A (en
Inventor
Akihiro Chuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP7292583A priority Critical patent/JPS59198608A/en
Publication of JPS59198608A publication Critical patent/JPS59198608A/en
Publication of JPH0221082B2 publication Critical patent/JPH0221082B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、ガラス板等の基体上に透明導電膜を
形成するための組成物に関する。 透明導電膜は、液晶表示素子やエレクトロルミ
ネツセンス等の透明電極、自動車・航空機・建物
等の窓ガラス用防霜、防曇膜として広く使用され
ている。 従来、酸化スズ、酸化スズ−酸化アンチモン又
は酸化インジウム−酸化スズからなる透明導電膜
が、真空蒸着法、スパツタリング、CVD法等に
よつて形成されているが、これらの方法はいずれ
も原料利用率が低く、また製造装置が高価である
ため量産には適しなかつた。そこで、原料利用率
が高くて、しかも簡単な装置により透明導電膜を
形成できる、量産に適した方法を開発する試みが
なされてきた。スズ化合物又はスズ化合物とアン
チモン化合物を適当な溶剤に溶かし、その溶液を
室温においてはけ塗り、浸漬、スプレー等の方法
で基体表面に塗り、その後その塗膜を焼成して透
明導電膜を形成する方法が注目されている。アン
チモンは膜の導電性を高めるために添加される。
例えば、米国特許明細書第2118795号には、塗布
液として塩化第2スズと塩酸を含有する水溶液を
用いる方法が記載されている。しかしこの方法
は、塗膜を焼成して導電膜を形成するのに600〜
750℃という高温が必要であること、そのために、
ガラス等の基体が損われることがあること、しか
も形成された膜の透光性が不充分であるなどの問
題を有していた。また、特開昭55−10466号には、
塗布液としてスズテトラアルコキシド(Sn
(OR)4)と少量のアンチモン化合物を含有する有
機溶媒溶液を用いる方法が記載されている。この
方法によると、透明性、膜の密着性、膜強度及び
導電性の点で良好な透明導電膜を形成できるが、
塗布液が不安定で保存寿命(ポツトライフ)が短
かいという実用上大きな欠点があつた。即ち、こ
の塗布液は、密閉した貯蔵容器に入れても高々30
日間程度で沈殿が発生するために使用不能にな
り、また塗布作業中に空気にさらすと次第に沈で
んを生成して塗布作業に支障をきたすなどの問題
があつた。 そこで、本発明の目的は、良好な特性を有する
導電膜を形成できる塗布用組成物であつて、しか
も安定性が高く、ポツトライフが長いために極め
て実用性の高い組成物を提供することにある。 本発明者らは、主成分のひとつであるスズ化合
物としてアルコキシスズクロライドを採用し、塗
布液の組成を調整することによりこの課題を解決
し得ることを見出した。 即ち、本発明は、式SnClx(OR)4-x〔ここで、
Rはアルキル基を表し、xは1〜3の整数であ
る〕で表されるスズ化合物と、アンチモン化合物
と、適当な有機溶剤と、水とからなる組成物であ
つて; スズ化合物の含有量が有機溶剤1当りSnO2
に換算して200gを超えず該組成物中のスズおよ
びアンチモンの量をそれぞれSnO2およびSb2O3
として換算したときに、Sb2O3/(SnO2
Sb2O3)の重量比が0.01〜0.15の範囲にあり、ま
た水の量が有機溶剤の量の0.1〜10重量%であつ
て有機溶剤と完全に相溶する範囲内である透明導
電膜形成用組成物が提供される。 本発明において使用されるスズ化合物には、モ
ノアルコキシスズトリクロライド、ジアルコキシ
スズジクロライド、トリアルコキシスズモノクロ
ライドが含まれ、このときアルコキシ基は炭素原
子数1〜10のもの、例えばメチル、エチル、プロ
ピル、ブチル、ペンチル、ヘキシル、オクチル、
ノニル、デシルが好ましい。組成物中のスズ化合
物の濃度は形成される導電膜の所要の膜厚などに
応じて決められる。スズ化合物がSnO2換算で200
g/−溶剤を超えると十分に溶解しないので組
成物が均一とならないため、良好な導電膜を形成
することができない。スズ化合物の量の好ましい
範囲は、SnO2換算で有機溶剤1当り10〜100g
である。 本発明で使用されるアンチモン化合物は、形成
される膜の導電性を高める上で重要で、使用する
有機溶剤に可溶であればいずれでもよい。例え
ば、トリエトキシアンチモン、トリイソプロポキ
シアンチモン、ペンタエトキシアンチモンのよう
なアンチモンアルコキシ;酢酸アンチモンのよう
なアンチモルカルボキシレート;塩化アンチモ
ン、硝酸アンチモンのようなアンチモン塩類があ
げられる。中でも、トリエトキシアンチモン、ト
リイソプロポキシアンチモンが好ましい。組成物
中のアンチモン化合物の量は、前述したSb2O3
(SnO2+Sb2O3)の重量比が0.01〜0.15の範囲で
あり、好ましくは0.01〜0.10である。これによ
り、液晶表示素子やエレクトロルミネツセンス等
の透明電極、自動車等の窓ガラス用防霜・防曇膜
等の用途に求められるシート抵抗102〜5×105
Ω/□を有する透明導電膜を形成できる。前記の
重量比が0.01より小さくても、0.15より大きくて
も所望の導電性は得難い。 本発明に使用される有機溶剤としては、他の諸
成分を溶解することができ、基体に組成物を塗布
した後に容易に蒸発させて塗膜を乾燥できるもの
であれば使用できる。当業者は容易に適当な有機
溶剤を選択することができる。このような有機溶
剤には、例えば酢酸エチル、酢酸イソプロピル、
酢酸n−ブチル、酢酸イソアミル、プロピオン酸
エチルのようなカルボン酸エステル;メチルアル
コール、エチルアルコール、イソプロピルアルコ
ール、n−プロピルアルコール、ブチルアルコー
ルのようなアルコール;アセトン、メチルエチル
ケトン、メチルイソブチルケトンのようなケト
ン、並びにその他の脂肪族炭化水素、さらにシク
ロヘキサン、メチルシクロヘキサン、ベンゼン、
トルエン、キシレン、エチルベンゼンのような脂
環式又は芳香族炭化水素が含まれる。 本発明の組成物中の水の量は、前記有機溶剤の
量に対して0.1〜10重量%であつて、しかも有機
溶剤と完全に相溶する範囲である。0.1重量%未
満では形成される膜の強度が低いため好ましくな
い。水の量が有機溶剤の10重量%を超えると良好
な膜を得ることがきないため好ましくない。また
使用する有機溶剤の種類によつては水の量が有機
溶剤の10重量%以下であつても有機溶剤と完全に
相溶しない場合がある。この場合、組成物全体と
して均一性が失われ、得られる膜の特性も悪影響
を受けるのでよくない。 本発明の組成物の調製は、それぞれ所要量のス
ズ化合物、アンチモン化合物、有機溶剤及び水を
混合すればよい。 こうして得られた本発明の組成物は、安定性が
高く、保存寿命が長い。密閉容器に保存すると、
6ケ月以上まつたく変質せずに安定である。ま
た、塗布作業中に大気にさらされても、沈殿を生
成するとか、増粘するとかの変化はまつたく起ら
ない。したがつて、塗布作業を円滑に行うことが
できるし、良好な透明導電膜を安定して形成する
ことができる。 本発明の組成物により透明導電膜を形成するに
は、塗布液であるこの組成物を基体表面に適当な
方法で塗布し、塗膜を乾燥後、酸化性雰囲気にて
焼成すればよい。塗布液を基体に塗布するには、
浸漬、噴霧、スピンナー、はけ塗り等通常の方法
を利用できるが、特に浸漬法が好ましい。基体の
塗布膜の乾燥は、常温〜約150℃の温度で行なう。
例えば、常温に30分間放置後、100℃に15分間置
くことにより乾燥してもよい。乾燥の温度と時間
は多様選択できる。乾燥後の焼成は、通常空気中
でよいが、酸素雰囲気中で行なつて組成物の酸化
を促進してもよい。焼成温度は300℃以上が好ま
しく、基体の耐熱性に応じて適当な温度を選択す
る。300℃未満では完全な酸化物の膜が得難い。
焼成に必要な時間は、約10秒ないし約1時間であ
り、焼成温度などに応じて決める。以上述べたよ
うな方法により、基体上に透明な導電膜を形成す
ることができる。この膜は、透光性、導電性、強
度、基体への密着性等の特性が良好である。 本発明の組成物を用いて透明導電膜が形成さる
基体は、該組成物が湿潤性(濡れ性)を示し、か
つ塗膜の焼成温度に耐えることができる材料であ
ればどんな材料からできているものでもよい。こ
のような材料としては、例えばソーダライムガラ
ス、ホウケイ酸ガラス、石英ガラス、石英、各種
光学ガラス、アルミナ等の無機材料のほかに、シ
リコーン樹脂、フツ素樹脂等の合成樹脂がある。 以下、実施例により本発明を具体的に説明する
が、これらの実施例は本発明の例示にすぎない。 実施例 1〜15 200mlフラスコ中で、種々のスズ化合物10gと
トリエトキシアンチモン0.5gとを、有機溶媒100
mlと表1に示す量の水とに溶かして塗布液を調製
した。この塗布液に、寸法25×75mmのソーダライ
ムガラスプレートであつた表面を良く洗浄したも
のを浸漬して引き上げ、常温で大気中に30分間放
置し、次いで100℃で15分間乾燥後500℃で30分間
加熱した。その結果、ガラスプレートの表面上に
無色透明な導電膜が得られた。膜の平均シート抵
抗を測定し、また透光性、膜強度及び基体への密
着性を調べた。結果も表1に示す。また、調製し
た塗布液の保存寿命を次のようにして測定した。 塗布液を密閉容器に入れ、1ケ月毎に上記の操
作を行い基板上に透明導電膜を形成させた後、膜
の平均シート抵抗、透光性、膜強度及び密着性の
測定を行い、最初の値と比較することにより安定
性を測定した。 この結果を表1にあわせ示す。
The present invention relates to a composition for forming a transparent conductive film on a substrate such as a glass plate. Transparent conductive films are widely used as transparent electrodes for liquid crystal display devices, electroluminescence devices, etc., and as anti-frost and anti-fog films for window glass of automobiles, aircraft, buildings, etc. Conventionally, transparent conductive films made of tin oxide, tin oxide-antimony oxide, or indium oxide-tin oxide have been formed by vacuum evaporation, sputtering, CVD, etc., but all of these methods have a low raw material utilization rate. It was not suitable for mass production because of its low yield and expensive manufacturing equipment. Therefore, attempts have been made to develop a method suitable for mass production that has a high raw material utilization rate and can form a transparent conductive film using a simple device. A tin compound or a tin compound and an antimony compound are dissolved in a suitable solvent, the solution is applied to the surface of the substrate by brushing, dipping, spraying, etc. at room temperature, and then the coating film is baked to form a transparent conductive film. The method is attracting attention. Antimony is added to increase the conductivity of the film.
For example, US Pat. No. 2,118,795 describes a method using an aqueous solution containing stannic chloride and hydrochloric acid as a coating liquid. However, this method requires 600~
The high temperature of 750℃ is necessary, and for that reason,
There have been problems in that the substrate such as glass may be damaged and the formed film has insufficient light transmittance. Also, in JP-A No. 55-10466,
Tin tetraalkoxide (Sn
A method using an organic solvent solution containing (OR) 4 ) and a small amount of an antimony compound is described. According to this method, a transparent conductive film with good transparency, film adhesion, film strength, and conductivity can be formed.
It had a major practical drawback: the coating solution was unstable and the pot life was short. That is, this coating solution can be stored for at most 30 minutes even when placed in a sealed storage container.
It becomes unusable because precipitation occurs within a few days, and if it is exposed to air during coating, it gradually produces precipitation, which hinders coating operations. SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a coating composition that can form a conductive film having good properties, and is highly stable and has a long pot life, making it highly practical. . The present inventors have found that this problem can be solved by using alkoxytin chloride as a tin compound, which is one of the main components, and adjusting the composition of the coating liquid. That is, the present invention provides the formula SnClx(OR) 4-x [where,
R represents an alkyl group, x is an integer of 1 to 3], an antimony compound, a suitable organic solvent, and water; content of the tin compound; is SnO 2 per organic solvent
The amount of tin and antimony in the composition does not exceed 200 g in terms of SnO 2 and Sb 2 O 3 respectively.
When converted as Sb 2 O 3 / (SnO 2 +
A transparent conductive film in which the weight ratio of Sb 2 O 3 ) is in the range of 0.01 to 0.15, and the amount of water is 0.1 to 10% by weight of the amount of organic solvent, and is completely compatible with the organic solvent. A forming composition is provided. The tin compounds used in the present invention include monoalkoxytin trichloride, dialkoxytin dichloride, trialkoxytin monochloride, where the alkoxy group has 1 to 10 carbon atoms, such as methyl, ethyl, propyl, butyl, pentyl, hexyl, octyl,
Nonyl and decyl are preferred. The concentration of the tin compound in the composition is determined depending on the required thickness of the conductive film to be formed. Tin compound is 200 in terms of SnO2
If it exceeds g/- of the solvent, it will not dissolve sufficiently and the composition will not be uniform, making it impossible to form a good conductive film. The preferred range of the amount of the tin compound is 10 to 100 g per organic solvent in terms of SnO 2
It is. The antimony compound used in the present invention is important in increasing the conductivity of the formed film, and any antimony compound may be used as long as it is soluble in the organic solvent used. Examples include antimony alkoxy such as triethoxyantimony, triisopropoxyantimony, and pentaethoxyantimony; antimol carboxylates such as antimony acetate; and antimony salts such as antimony chloride and antimony nitrate. Among these, triethoxyantimony and triisopropoxyantimony are preferred. The amount of antimony compound in the composition is determined by the amount of Sb 2 O 3 /
The weight ratio of (SnO 2 +Sb 2 O 3 ) is in the range of 0.01 to 0.15, preferably 0.01 to 0.10. As a result, sheet resistance of 10 2 to 5 × 10 5 is required for applications such as transparent electrodes for liquid crystal display devices and electroluminescence, and anti-frost and anti-fog films for window glass of automobiles, etc.
A transparent conductive film having Ω/□ can be formed. Even if the weight ratio is smaller than 0.01 or larger than 0.15, it is difficult to obtain the desired electrical conductivity. As the organic solvent used in the present invention, any organic solvent can be used as long as it can dissolve other components and can easily evaporate and dry the coating film after coating the composition on the substrate. A person skilled in the art can easily select a suitable organic solvent. Such organic solvents include, for example, ethyl acetate, isopropyl acetate,
Carboxylic acid esters such as n-butyl acetate, isoamyl acetate, ethyl propionate; alcohols such as methyl alcohol, ethyl alcohol, isopropyl alcohol, n-propyl alcohol, butyl alcohol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone , and other aliphatic hydrocarbons, as well as cyclohexane, methylcyclohexane, benzene,
Included are cycloaliphatic or aromatic hydrocarbons such as toluene, xylene, and ethylbenzene. The amount of water in the composition of the present invention is 0.1 to 10% by weight based on the amount of the organic solvent, and is in a range that is completely compatible with the organic solvent. If it is less than 0.1% by weight, it is not preferable because the strength of the formed film is low. If the amount of water exceeds 10% by weight of the organic solvent, it is not preferable because a good film cannot be obtained. Furthermore, depending on the type of organic solvent used, even if the amount of water is 10% by weight or less of the organic solvent, it may not be completely compatible with the organic solvent. In this case, the uniformity of the composition as a whole is lost and the properties of the resulting film are also adversely affected, which is not good. The composition of the present invention can be prepared by mixing required amounts of a tin compound, an antimony compound, an organic solvent, and water. The composition of the invention thus obtained is highly stable and has a long shelf life. When stored in an airtight container,
It remains stable for more than 6 months without any deterioration. Furthermore, even if exposed to the atmosphere during coating, changes such as precipitation or thickening do not occur. Therefore, the coating operation can be performed smoothly and a good transparent conductive film can be stably formed. In order to form a transparent conductive film using the composition of the present invention, the composition, which is a coating liquid, may be applied to the surface of a substrate by an appropriate method, and after drying, the coating film may be baked in an oxidizing atmosphere. To apply the coating liquid to the substrate,
Although conventional methods such as dipping, spraying, spinner coating, and brushing can be used, the dipping method is particularly preferred. The coating film on the substrate is dried at a temperature of room temperature to about 150°C.
For example, it may be dried by leaving it at room temperature for 30 minutes and then placing it at 100°C for 15 minutes. Various drying temperatures and times can be selected. Firing after drying may normally be carried out in air, but may also be carried out in an oxygen atmosphere to promote oxidation of the composition. The firing temperature is preferably 300°C or higher, and an appropriate temperature is selected depending on the heat resistance of the substrate. At temperatures below 300°C, it is difficult to obtain a complete oxide film.
The time required for firing is about 10 seconds to about 1 hour, and is determined depending on the firing temperature and other factors. A transparent conductive film can be formed on a substrate by the method described above. This film has good properties such as translucency, conductivity, strength, and adhesion to the substrate. The substrate on which a transparent conductive film is formed using the composition of the present invention can be made of any material as long as the composition exhibits wettability (wettability) and can withstand the firing temperature of the coating film. It may be something that exists. Examples of such materials include inorganic materials such as soda lime glass, borosilicate glass, quartz glass, quartz, various optical glasses, and alumina, as well as synthetic resins such as silicone resins and fluorine resins. EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but these Examples are merely illustrative of the present invention. Examples 1 to 15 In a 200 ml flask, 10 g of various tin compounds and 0.5 g of triethoxyantimony were mixed with 100 g of an organic solvent.
ml and the amount of water shown in Table 1 to prepare a coating solution. A 25 x 75 mm soda lime glass plate with a well-washed surface was immersed in this coating solution, pulled out, left in the air at room temperature for 30 minutes, then dried at 100°C for 15 minutes, and then heated at 500°C. Heat for 30 minutes. As a result, a colorless and transparent conductive film was obtained on the surface of the glass plate. The average sheet resistance of the film was measured, and the light transmittance, film strength, and adhesion to the substrate were also examined. The results are also shown in Table 1. In addition, the shelf life of the prepared coating solution was measured as follows. After putting the coating solution into a sealed container and performing the above operations every month to form a transparent conductive film on the substrate, the average sheet resistance, translucency, film strength, and adhesion of the film were measured. Stability was determined by comparing with the value of . The results are also shown in Table 1.

【表】【table】

【表】 ** 比較例1の安定性:6ケ月で沈殿発生のため
塗布不能となつた。
実施例 6〜20 表2に示すように、200mlのフラスコ中で、ジ
エトキシスズジクロライド10gと様々な量のトリ
エトキシアンチモンとを、酢酸エチル100mlと蒸
留水1gに溶かして塗布液を調製した。実施例1
と同様の手順でガラスプレート表面に膜を形成し
た。結果を表2に示す。なお、透光性、膜強度、
膜の密着性等はいずれも良好であつた。
[Table] ** Stability of Comparative Example 1: Coating became impossible after 6 months due to precipitation.
Examples 6-20 As shown in Table 2, coating solutions were prepared by dissolving 10 g of diethoxytin dichloride and various amounts of triethoxyantimony in 100 ml of ethyl acetate and 1 g of distilled water in a 200 ml flask. Example 1
A film was formed on the surface of the glass plate using the same procedure as above. The results are shown in Table 2. In addition, light transmittance, film strength,
The adhesion of the film was good in all cases.

【表】 実施例 21 実施例1にしたがつて製造した塗布液にシリコ
ーン樹脂からなるプレート、及びフツ素樹脂から
なるプレートをそれぞれ浸漬し、引上げ、常温で
大気中に30分間放置し、次いで100℃で15分間乾
燥した。その後300℃で30分間加熱した結果、い
ずれの場合もプレート表面に無色透明な導電膜が
得られた。導電膜は、透光性、強度、密着性のい
ずれも良好であつた。平均シート抵抗は、それぞ
れ6.2×103kΩ/□(シリコーン樹脂プレート)、
及び4.5×103kΩ/□(フツ素樹脂プレート)で
あつた。
[Table] Example 21 A plate made of silicone resin and a plate made of fluororesin were respectively immersed in the coating solution produced according to Example 1, pulled out, and left in the air at room temperature for 30 minutes, then 100% Dry for 15 minutes at °C. After heating at 300°C for 30 minutes, a colorless and transparent conductive film was obtained on the plate surface in each case. The conductive film had good translucency, strength, and adhesion. The average sheet resistance is 6.2×10 3 kΩ/□ (silicone resin plate), respectively.
and 4.5×10 3 kΩ/□ (fluororesin plate).

Claims (1)

【特許請求の範囲】 1 式SnClx(OR)4-x〔ここで、Rはアルキル基
を表し、xは1〜3の整数である〕で表されるス
ズ化合物と、アンチモン化合物と、適当な有機溶
剤と、水とからなる組成物であつて; スズ化合物の含有量が有機溶剤1当りSnO2
に換算して200gを超えず、該組成物中のスズお
よびアンチモンの量をそれぞれSnO2および
Sb2O3として換算したときに、Sb2O3/(SnO2
Sb2O3)の重量比が0.01〜0.15の範囲にあり、ま
た水の量が有機溶剤の量の0.1〜10重量%であつ
てしかも有機溶剤と完全に相溶する範囲内である
透明導電膜形成用組成物。
[Claims] 1. A tin compound represented by the formula SnClx(OR) 4-x [where R represents an alkyl group, and x is an integer of 1 to 3], an antimony compound, and a suitable A composition comprising an organic solvent and water, wherein the content of the tin compound is SnO 2 per 1 organic solvent.
The amount of tin and antimony in the composition does not exceed 200 g in terms of SnO 2 and
When converted as Sb 2 O 3 , Sb 2 O 3 / (SnO 2 +
A transparent conductive material in which the weight ratio of Sb 2 O 3 ) is in the range of 0.01 to 0.15, and the amount of water is 0.1 to 10% by weight of the amount of organic solvent, and is completely compatible with the organic solvent. Composition for film formation.
JP7292583A 1983-04-27 1983-04-27 Composition for forming transparent conductive film Granted JPS59198608A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7292583A JPS59198608A (en) 1983-04-27 1983-04-27 Composition for forming transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7292583A JPS59198608A (en) 1983-04-27 1983-04-27 Composition for forming transparent conductive film

Publications (2)

Publication Number Publication Date
JPS59198608A JPS59198608A (en) 1984-11-10
JPH0221082B2 true JPH0221082B2 (en) 1990-05-11

Family

ID=13503412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7292583A Granted JPS59198608A (en) 1983-04-27 1983-04-27 Composition for forming transparent conductive film

Country Status (1)

Country Link
JP (1) JPS59198608A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01115010A (en) * 1987-10-28 1989-05-08 Central Glass Co Ltd Composition for transparent conductive film and forming method for film thereof

Also Published As

Publication number Publication date
JPS59198608A (en) 1984-11-10

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