JPH0224604A - Color filter - Google Patents
Color filterInfo
- Publication number
- JPH0224604A JPH0224604A JP63175666A JP17566688A JPH0224604A JP H0224604 A JPH0224604 A JP H0224604A JP 63175666 A JP63175666 A JP 63175666A JP 17566688 A JP17566688 A JP 17566688A JP H0224604 A JPH0224604 A JP H0224604A
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- light shielding
- shielding layer
- light
- filter element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明はフルカラー液晶装置に用いると好適なカラーフ
ィルターに係わり、更に詳細には透明基体上に多数の微
細な色分解用カラーフィルター素子及び遮光層を設けた
カラーフィルターに関する。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a color filter suitable for use in a full-color liquid crystal device, and more particularly, it relates to a color filter that is suitable for use in a full-color liquid crystal device, and more specifically, a large number of fine color separation color filter elements and light shielding elements on a transparent substrate. This invention relates to a layered color filter.
〈従来技術〉
フルカラー液晶表示装置は、幾つかの方式が実用化され
ているが、第2図は薄膜トランジスタ(TPT)素子を
用いたアクティブマトリックス方式の一例であり、以下
第2図を参照しながら説明する。ここでパネル(^)は
透明基体(1)の一方の面上に色分解用の微細なカラー
フィルター素子(4)。<Prior Art> Several types of full-color liquid crystal display devices have been put into practical use. Figure 2 shows an example of an active matrix type using thin film transistor (TPT) elements. explain. Here, the panel (^) has a fine color filter element (4) for color separation on one side of a transparent substrate (1).
(4°)、(4“)及び遮光層(3)、透明電極(5)
、配向膜(8)を形成し、裏面に検光子0ωを設ける。(4°), (4"), light shielding layer (3), transparent electrode (5)
, an alignment film (8) is formed, and an analyzer 0ω is provided on the back surface.
パネル(B)は透明基体(2)の上にTPT素子(6)
、透明電極(7)及び配向膜(8)を形成し、反対面に
偏光子(9)を設け、パネル(A) とパネル(B)の
間に液晶01)を封入する。Panel (B) has a TPT element (6) on a transparent substrate (2).
, a transparent electrode (7) and an alignment film (8) are formed, a polarizer (9) is provided on the opposite side, and a liquid crystal 01) is sealed between the panel (A) and the panel (B).
カラーフィルター素子(4)と透明電極(7)及びTP
T素子(6)は対をなして、フルカラー液晶画素を構成
する。各カラーフィルター素子の境界部分に不透明な遮
光層(3)を設けることにより、画像の境界がより鮮明
になり、視覚的効果が期待できる。またTPTを用いた
第2図のような構造の液晶デイスプレーでは、外光によ
るTPT素子特性の劣化を防ぐことができる。Color filter element (4), transparent electrode (7) and TP
The T elements (6) form a pair to constitute a full-color liquid crystal pixel. By providing an opaque light-shielding layer (3) at the boundary between each color filter element, the boundaries of the image become clearer, and a visual effect can be expected. Further, in a liquid crystal display using TPT and having a structure as shown in FIG. 2, deterioration of TPT element characteristics due to external light can be prevented.
遮光層(3)は大別して無機系と有機系に分類できる。The light shielding layer (3) can be roughly classified into inorganic type and organic type.
無機系ではガラス基板上に金属クロム、酸化クロム等の
単体又は二つ以上の組合せ方式がある。Inorganic systems include metal chromium, chromium oxide, etc. alone or in combination of two or more on a glass substrate.
有機系では水溶性コロイド中に重クロム酸塩等を添加し
て感光化をなし、常法に従ってパターン化した後、染料
で染色する方式や、ハロゲン化銀を分散させた後、還元
して銀を析出させて黒化する方式がある。また感光性樹
脂にカーボン等を分散させた後、露光、現像してパター
ニングする方式、黒色インキで印刷する方式がある。In organic systems, dichromate or the like is added to water-soluble colloids to make them photosensitized, patterned according to conventional methods, and then dyed with dyes, or silver halide is dispersed and reduced to produce silver. There is a method of precipitating and blackening. There are also methods in which carbon or the like is dispersed in a photosensitive resin, followed by exposure and development for patterning, and methods in which printing is performed with black ink.
〈発明が解決しようとする課題〉
第2図に示すフルカラー液晶デイスプレーでは光源(1
21から出た光(i、)は透明電橿(7)、液晶(11
)、カラーフィルター素子(4)を通過して(++°)
とじて観察者に至る。この間に光源(+2+から出た光
(i、)は信号に応じて変化する。同様なことがカラー
フィルター素子(4”)、(4°“)についてもいえる
。<Problem to be solved by the invention> In the full-color liquid crystal display shown in Fig. 2, the light source (1
The light (i,) emitted from the transparent electric rod (7) and the liquid crystal (11
), passes through the color filter element (4) (++°)
and reaches the observer. During this time, the light (i,) emitted from the light source (+2+) changes according to the signal. The same thing can be said about the color filter elements (4'') and (4°'').
一方観察者に至る光として、外部光(12)が遮光層(
3)で反射する場合がある。特に、(i、’)が弱い場
合(暗部の映像)、相対的に(i、’)に比較して(i
、’)が明るくなる。前述のごとく、遮光層の役割の一
つは、カラーフィルター素子間の境界を明確にするので
あるから、外光の反射光(i、’)は少ないことが望ま
しい。On the other hand, external light (12) reaches the observer through the light shielding layer (
3) may be reflected. In particular, when (i,') is weak (dark image), (i,') is relatively weak compared to (i,').
,') become brighter. As mentioned above, one of the roles of the light shielding layer is to clarify the boundaries between color filter elements, so it is desirable that the amount of reflected external light (i,') is small.
遮光層(3)の材質として耐久性のすぐれた金属系を用
いると、Hz”)値は更に高くなり、液晶デイスプレー
の品質をそこなう、したがって遮光層(3)の反射率を
下げると同時に、全反射を少なくすることによって視覚
しうる画質を改善することができる。If a highly durable metal-based material is used as the material for the light-shielding layer (3), the Hz") value will become even higher, impairing the quality of the liquid crystal display. Therefore, at the same time, the reflectance of the light-shielding layer (3) will be lowered. By reducing total internal reflection, visible image quality can be improved.
く課題を解決するための手段〉
本発明は上述のように、遮光層の反射率を下げると同時
に全反射の少ない視覚画像の良好なカラーフィルターを
提供するものであり、第1図に従って本発明を説明する
。Means for Solving the Problems As described above, the present invention provides a color filter that reduces the reflectance of a light-shielding layer and at the same time provides a good visual image with less total reflection. Explain.
部ち、ガラス板等の透明基体(1)の片面に微細な凹凸
を設け、その上に遮光層(3)を設ける。このような構
造の場合外光(1つ)の反射光(iz’)は拡散される
ので、第2図に示す場合より観察者に視覚しうる外光の
反射光は少なくなり、反射率が同じ材質による遮光N(
3)でも、第1図の場合と第2図の場合では、視覚的効
果に大きい差が生じる。First, fine irregularities are provided on one side of a transparent substrate (1) such as a glass plate, and a light shielding layer (3) is provided thereon. In such a structure, the reflected light (iz') of external light (one) is diffused, so the reflected external light that is visible to the observer is smaller than in the case shown in Figure 2, and the reflectance is reduced. Shading N (by the same material)
3) However, there is a large difference in visual effect between the case of Fig. 1 and the case of Fig. 2.
〈発明の詳述〉
第1図に示すカラーフィルターの透明基体(1)の凹凸
の深さは10μm以下、望ましくは、3μm以下である
。ガラス板等の透明基体(1)の表面を凹凸に加工する
技術として、化学エツチング方式、及び物理的、機械的
加工方式がある。また平坦なガラス板上に粒状性透明顔
料を塗布して形成することができる。<Detailed Description of the Invention> The depth of the unevenness of the transparent substrate (1) of the color filter shown in FIG. 1 is 10 μm or less, preferably 3 μm or less. Techniques for processing the surface of a transparent substrate (1) such as a glass plate into irregularities include chemical etching methods and physical and mechanical processing methods. Alternatively, it can be formed by coating a granular transparent pigment on a flat glass plate.
遮光N(3)の形成にあたっては、金属あるいは金属酸
化物をスパッタ等の方法で形成し、化学エツチングによ
ってパターン化する技術は極めて一般的に行われている
。In forming the light shielding layer N(3), a very common technique is to form a metal or metal oxide by a method such as sputtering and pattern it by chemical etching.
また、感光性樹脂をパターン化して、黒色染料で染色す
ることや、感光性樹脂中にカーボンブラック、有機黒色
顔料、または不透明顔料を分散し、マスク露光すること
により、黒色パターンを製造することも可能である。In addition, black patterns can also be produced by patterning a photosensitive resin and dyeing it with black dye, or by dispersing carbon black, organic black pigments, or opaque pigments in the photosensitive resin and exposing it to light using a mask. It is possible.
微細な色分解用カラーフィルター素子(4)は通常赤、
青、緑色であり、各種方式によって形成できる。透明基
板の凹凸は外光を散乱させるためにはを効であるが、液
晶セルとしてみた場合、セル間隔が部分的に異なるため
に色の純度を劣化させる。The fine color separation color filter element (4) is usually red,
They are blue and green, and can be formed using various methods. The unevenness of the transparent substrate is effective for scattering external light, but when viewed as a liquid crystal cell, the cell spacing is partially different, which deteriorates the purity of color.
したがってカラーフィルター素子(4)の表面は十分平
坦であることが望ましい。そのためには凹凸の深さを3
μm以下にし、第3図のように遮光層(3)を形成後、
アンダーコート層側をコートして後、カラーフィルター
素子を形成するか又は第4図のように遮光層(3)およ
びカラーフィルター素子(4)の上にトップコート層θ
力を設けるのが望ましい。Therefore, it is desirable that the surface of the color filter element (4) is sufficiently flat. To achieve this, the depth of the unevenness should be set to 3
μm or less, and after forming a light shielding layer (3) as shown in Figure 3,
After coating the undercoat layer side, a color filter element is formed, or a top coat layer θ is formed on the light shielding layer (3) and the color filter element (4) as shown in FIG.
It is desirable to provide a force.
〈実施例1〉
透明基体(1)として薄板ガラスの表面をフロスト加工
により微細な凹凸を形成した。1200メッシェの研摩
材による加工の場合、凹凸は10μm以下であった。次
に該透明基体(])の凹凸面を十分洗浄後、スパッタリ
ングによって酸化クロム膜を1350人の膜厚で製膜し
た。<Example 1> As a transparent substrate (1), fine irregularities were formed on the surface of a thin plate glass by frosting. In the case of processing using a 1200 mesh abrasive material, the unevenness was 10 μm or less. Next, after thoroughly cleaning the uneven surface of the transparent substrate (), a chromium oxide film was formed by sputtering to a thickness of 1350 mm.
このときの透過濃度は2.8、反射率は31%であった
。次にフォトリソグラフィーの常法に従って該酸化クロ
ム膜をエツチング加工して遮光層(3)を形成した。更
に該遮光層(3)上に、分子1i1万のゼラチン10重
量部および重クロム酸アンモ72重量部を純水500重
量部に混合溶解してえられた水溶性感光剤を塗布乾燥し
、常法によりパターン化し、その後酸性染料により赤色
に着色し、タンニン酸溶液に浸漬して防染処理を行ない
、カラーフィルター素子(4)を形成した。以下同様に
して緑色のカラーフィルター素子(4゛)及び青色のカ
ラーフィルター素子(4°°)を形成して第1図で示す
カラーフィルターを製造した。遮光層(3)の反射率は
31%であったが、全反射が少ないため、視覚的にはよ
り黒色に近い感を与えた。At this time, the transmission density was 2.8 and the reflectance was 31%. Next, the chromium oxide film was etched according to a conventional photolithography method to form a light shielding layer (3). Further, on the light-shielding layer (3), a water-soluble photosensitizer obtained by mixing and dissolving 10 parts by weight of gelatin with molecules of 1i10,000 and 72 parts by weight of ammonium dichromate in 500 parts by weight of pure water is coated and dried. The filter element (4) was patterned using a method, then colored red with an acid dye, and immersed in a tannic acid solution for resist dyeing treatment to form a color filter element (4). Thereafter, a green color filter element (4°) and a blue color filter element (4°) were formed in the same manner to produce the color filter shown in FIG. 1. Although the reflectance of the light-shielding layer (3) was 31%, since total reflection was low, it gave a visual appearance closer to black.
〈実施例2〉
実施例1で使用した透明基体(1)の表面に同様に酸化
クロム膜を形成し遮光層(3)を形成した。次に東し■
製セミコファイン5P−9101重量部に対しN−メチ
ル2ピロリジノン(以下、NMPと記す)0.5重量部
添加してスピンナーコートにより膜厚3μmで形成し、
100℃より50°Cきざみで300’Cまで各30分
間保持して、第3図に示すアンダーコート層側を形成し
た。<Example 2> A chromium oxide film was similarly formed on the surface of the transparent substrate (1) used in Example 1 to form a light shielding layer (3). Next, go east■
0.5 parts by weight of N-methyl 2-pyrrolidinone (hereinafter referred to as NMP) was added to 1 part by weight of Semicofine 5P-910 manufactured by Manufacturer Co., Ltd., and a film thickness of 3 μm was formed by spinner coating.
The undercoat layer side shown in FIG. 3 was formed by holding the temperature from 100°C to 300'C in 50°C increments for 30 minutes each.
次に同じくセミコファイン5P−91090,1gに対
し顔料及び分散剤をそれぞれ9.0 g 、0.9 g
添加して三本ロールで十分混合して、赤、緑、青色ワニ
スを作った。顔料の一例を下記に示す。Next, 9.0 g and 0.9 g of pigment and dispersant were added to 1 g of Semicofine 5P-91090, respectively.
They were added and thoroughly mixed on a triple roll to make red, green, and blue varnishes. An example of the pigment is shown below.
赤色フィルター用;リオトゲンレッドGD(東洋インキ
製造■製)
緑色フィルター用;リオノールグリーン2YS(東洋イ
ンキ製造■製)
青色フィルター用;リオノールES
(東洋インキ製造■製)
次に赤色ワニス10gに対しNMPを5g添加して、十
分攪拌し、前記アンダーコート層0ωを形成したガラス
板上にスピンナーにより1250rpmで60秒間回転
塗布し、60°C15分間及び引き続いて130°C3
0分間加熱し赤色フィルター層上に日本合成ゴム■製”
JSI?−CBl?−M901″ネガレジストを20
00rpmでスピンコードし80°C30分間のプレベ
ータ後パターン露光して専用現像剤で現像した。For red filters: Liotogen Red GD (manufactured by Toyo Ink Manufacturing ■) For green filters: Lionol Green 2YS (manufactured by Toyo Ink Manufacturing ■) For blue filters: Lionol ES (manufactured by Toyo Ink Manufacturing ■) Next, for 10 g of red varnish 5g of NMP was added, thoroughly stirred, and applied by spinner at 1250rpm for 60 seconds onto the glass plate on which the undercoat layer 0ω was formed, and heated at 60°C for 15 minutes and then at 130°C3.
Heat for 0 minutes and place Japanese synthetic rubber on the red filter layer.
JSI? -CBl? -M901″ negative resist 20
After spin-coding at 00 rpm and pre-beta at 80°C for 30 minutes, pattern exposure was performed and development was performed using a special developer.
次に125°C30分間ボストベーク後マイクロポジッ
ト現像剤MP−312(シブレイ・ファーイースト■)
を純水で1;1に稀釈したアルカリ溶液で該赤色被膜の
開口部をエツチング除去した。次に窒素気流中で250
°C60分間過熱してカラーフィルター素子(4)を形
成した。Next, after boiling at 125°C for 30 minutes, Microposit developer MP-312 (Sibley Far East ■)
The openings of the red coating were removed by etching with an alkaline solution diluted 1:1 with pure water. Then 250 ml in a nitrogen stream
A color filter element (4) was formed by heating at °C for 60 minutes.
以下、前掲の緑色ワニス及び青色ワニスをもちいて順次
同様の工程でカラーフィルター素子(4′)及びカラー
フィルター素子(4”)を形成し、第3図で示すカラー
フィルターを製造した。Thereafter, a color filter element (4') and a color filter element (4'') were sequentially formed using the green varnish and blue varnish described above in the same steps to produce the color filter shown in FIG. 3.
〈実施例3〉
ガラス板上にフン酸をもちいてフロスト加工した青板ガ
ラスに、チンソー製C3G−L−0800をスピンナー
コートして後450°C60分加熱焼成した。このガラ
スに金属クロムをスパッタリングにより1000人の膜
厚のクロム薄膜を形成した。<Example 3> C3G-L-0800 manufactured by Chinso Co., Ltd. was coated with a spinner onto a soda-lime glass plate that had been frosted using hydronic acid on a glass plate, and then baked at 450°C for 60 minutes. A thin chromium film with a thickness of 1000 mm was formed on this glass by sputtering metallic chromium.
次にフォトアプリケーションの常法に従って、遮光層(
3)を形成した。この膜の透過率は0.2%以下、反射
率は約50%であった。次に実施例1と同様にして第4
図で示すカラーフィルター素子(4)(4’) (4”
)をそれぞれ形成した。次に住人バイエルウレタン■製
スミジュールN−75;75 gに対し住友バイエル
ウレタン■製ディスモヘン1200.100gを混合し
、セロソルブアセテート及び酢酸ブチルをそれぞれ3〇
−及び10m添加して、ただちにスピンナー1000r
pn1で回転塗布し、150°C90分加熱硬化しオー
バーコート層(+71を形成し、第4図に示すようなカ
ラーフィルターを作製した。Next, according to the usual method for photo applications, a light-shielding layer (
3) was formed. The transmittance of this film was 0.2% or less, and the reflectance was about 50%. Next, in the same manner as in Example 1, a fourth
Color filter elements (4) (4') (4") shown in the figure
) were formed respectively. Next, 75 g of Sumidur N-75 (manufactured by Sumitomo Bayer Urethane ■) was mixed with 1200.100 g of Dismohen (manufactured by Sumitomo Bayer Urethane ■), and 30 m and 10 m of cellosolve acetate and butyl acetate were added, respectively.
The coating was spin-coated with pn1 and cured by heating at 150° C. for 90 minutes to form an overcoat layer (+71) to produce a color filter as shown in FIG. 4.
〈実施例4〉
実施例1で使用したフロストカ■ニガラスに以下の組成
からなる黒色ワニスを塗布しパターン化した。<Example 4> The frosted glass used in Example 1 was coated with a black varnish having the following composition and patterned.
(1)セミコファイン5P−710東し■製膜6.1部
(2)カーボンブラック 4,5部(3)チ
タン白 1.3部(4)リオノール
ES
(東洋インキ製造■製) 3.5部
(5)リオトゲンレッドCD
(東洋インキ製造■製) 3.2部
(6)分散助剤 1.4部以上(1
)〜(6)の組成を3本ロールで十分混合分散し、黒色
ワニスを得た。(1) Semico Fine 5P-710 Toshi ■ Film forming 6.1 parts (2) Carbon black 4.5 parts (3) Titanium white 1.3 parts (4) Lionol ES (manufactured by Toyo Ink Manufacturing ■) 3.5 Part (5) Lyotogen Red CD (manufactured by Toyo Ink Manufacturing ■) 3.2 parts (6) Dispersion aid 1.4 parts or more (1
The compositions of ) to (6) were thoroughly mixed and dispersed using three rolls to obtain a black varnish.
次に該黒色ワニス1部に対しNMPI部、ジメチルホル
ムアミド1部を混合して、上記ガラス基板上に適当量滴
下し、スピンナーで100Or p mi。Next, 1 part of the black varnish was mixed with 1 part of NMPI and 1 part of dimethylformamide, and an appropriate amount of the mixture was dropped onto the glass substrate, and the mixture was heated to 100 Or p mi using a spinner.
秒間回転塗布し、150’Cで乾燥した。Spin coating for seconds and drying at 150'C.
次にマイクロポジット1400−25 (シュプレー・
ファーイースト■製)を150Or p mで15秒ス
ピンコードした。90°C30分ソフトベーク後パター
ン露光し、MF312を純水でI:1に稀釈した現像液
で現像し、同時に黒色パターンを形成した。Next, Microposite 1400-25 (Spree
(manufactured by Far East ■) was spin-coded at 150 Orpm for 15 seconds. After soft baking at 90° C. for 30 minutes, pattern exposure was carried out, and development was performed using a developer prepared by diluting MF312 with pure water at a ratio of 1:1 to form a black pattern at the same time.
次に酢酸ノルマルブチル溶液でマイクロポジット140
0−25を剥離し、280°Cで60分加熱した。以上
の工程で黒色パターンを形成した。以下、実施例2と同
様にしてR,G、Bからなるカラーフィルターを製造し
た。Next, use Microposit 140 with n-butyl acetate solution.
0-25 was peeled off and heated at 280°C for 60 minutes. A black pattern was formed through the above steps. Thereafter, a color filter consisting of R, G, and B was manufactured in the same manner as in Example 2.
〈発明の効果〉
本発明によるカラーフィルターは、耐久性が優れ、かつ
透過濃度の高い金属並びに金属酸化膜を使用した場合で
も、外光の反射が平均化され遮光層はより黒色に近くな
った。そのために液晶表示装置に使用した場合には、画
像の鮮明度が向上した。<Effects of the Invention> The color filter according to the present invention has excellent durability, and even when using metals and metal oxide films with high transmission density, the reflection of external light is averaged and the light-shielding layer becomes closer to black. . Therefore, when used in a liquid crystal display device, the clarity of the image was improved.
第1図は本発明のカラーフィルターの一実施例の断面説
明図。
第2図は従来のカラーフィルターを用いた液晶デイスプ
レーの説明図。
第、3図、第4図は本発明のカラーフィルターの他実施
例を示す断面説明図である。
1.2・・・透明基体 3・・・遮光層4.4.
4” ・・・カラーフィルター素子6・・・TPT素子
5.7・・・透明電極
9・・・偏光子
11・・・液晶
13・・・アンダーコート層
8・・・配向膜
10・・・検光子
12・・・光源
14・・・オーバーコート層FIG. 1 is an explanatory cross-sectional view of one embodiment of the color filter of the present invention. FIG. 2 is an explanatory diagram of a liquid crystal display using a conventional color filter. 3 and 4 are cross-sectional explanatory views showing other embodiments of the color filter of the present invention. 1.2... Transparent substrate 3... Light shielding layer 4.4.
4”...Color filter element 6...TPT element 5.7...Transparent electrode 9...Polarizer 11...Liquid crystal 13...Undercoat layer 8...Alignment film 10... Analyzer 12...Light source 14...Overcoat layer
Claims (1)
の色分解用カラーフィルター素子及び遮光層を設けたこ
とを特徴とするカラーフィルター。 2)遮光層が金属又は金属酸化物の薄膜であることを特
徴とする請求項1記載のカラーフィルター。 3)遮光層が樹脂中に染料又は顔料が分散された膜であ
ることを特徴とする請求項1記載のカラーフィルター。 4)透明基体と色分解用カラーフィルター素子の中間に
透明な樹脂層を設けて、凹凸面を平坦にしたことを特徴
とする請求項1記載のカラーフィルター。 5)色分解用カラーフィルター素子及び遮光層の表面に
透明な樹脂層を設けて平坦化したことを特徴とする請求
項1記載のカラーフィルター。[Scope of Claims] 1) A color filter characterized in that a large number of color separation color filter elements and a light shielding layer are provided on a transparent substrate having fine irregularities on one surface. 2) The color filter according to claim 1, wherein the light shielding layer is a thin film of metal or metal oxide. 3) The color filter according to claim 1, wherein the light shielding layer is a film in which a dye or a pigment is dispersed in a resin. 4) The color filter according to claim 1, characterized in that a transparent resin layer is provided between the transparent substrate and the color separation color filter element to make the uneven surface flat. 5) The color filter according to claim 1, wherein a transparent resin layer is provided on the surface of the color separation color filter element and the light shielding layer to flatten the surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17566688A JP2887317B2 (en) | 1988-07-14 | 1988-07-14 | Color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17566688A JP2887317B2 (en) | 1988-07-14 | 1988-07-14 | Color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0224604A true JPH0224604A (en) | 1990-01-26 |
| JP2887317B2 JP2887317B2 (en) | 1999-04-26 |
Family
ID=16000100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17566688A Expired - Fee Related JP2887317B2 (en) | 1988-07-14 | 1988-07-14 | Color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2887317B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03120502A (en) * | 1989-10-04 | 1991-05-22 | Stanley Electric Co Ltd | Color filter and production thereof |
| JPH03142417A (en) * | 1989-10-30 | 1991-06-18 | Sharp Corp | Color liquid crystal display |
| JPH052163A (en) * | 1990-11-16 | 1993-01-08 | Canon Inc | Ferroelectric liquid crystal element and liquid crystal display device |
| JPH055875A (en) * | 1991-06-28 | 1993-01-14 | Nec Corp | Production of liquid crystal display element |
| JPH06331975A (en) * | 1993-05-24 | 1994-12-02 | Nec Corp | Color liquid crystal display |
| JPH09304763A (en) * | 1996-05-20 | 1997-11-28 | Nec Corp | Color liquid crystal display |
| US7479939B1 (en) | 1991-02-16 | 2009-01-20 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582808A (en) * | 1981-06-29 | 1983-01-08 | Nec Corp | Color filter and color solid-state image pickup element |
| JPS6261028A (en) * | 1985-09-12 | 1987-03-17 | Sharp Corp | Color liquid crystal display element |
| JPS6310105A (en) * | 1986-07-02 | 1988-01-16 | Fuji Photo Optical Co Ltd | Manufacture of color separation filter |
-
1988
- 1988-07-14 JP JP17566688A patent/JP2887317B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582808A (en) * | 1981-06-29 | 1983-01-08 | Nec Corp | Color filter and color solid-state image pickup element |
| JPS6261028A (en) * | 1985-09-12 | 1987-03-17 | Sharp Corp | Color liquid crystal display element |
| JPS6310105A (en) * | 1986-07-02 | 1988-01-16 | Fuji Photo Optical Co Ltd | Manufacture of color separation filter |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03120502A (en) * | 1989-10-04 | 1991-05-22 | Stanley Electric Co Ltd | Color filter and production thereof |
| JPH03142417A (en) * | 1989-10-30 | 1991-06-18 | Sharp Corp | Color liquid crystal display |
| JPH052163A (en) * | 1990-11-16 | 1993-01-08 | Canon Inc | Ferroelectric liquid crystal element and liquid crystal display device |
| US7479939B1 (en) | 1991-02-16 | 2009-01-20 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device |
| JPH055875A (en) * | 1991-06-28 | 1993-01-14 | Nec Corp | Production of liquid crystal display element |
| JPH06331975A (en) * | 1993-05-24 | 1994-12-02 | Nec Corp | Color liquid crystal display |
| JPH09304763A (en) * | 1996-05-20 | 1997-11-28 | Nec Corp | Color liquid crystal display |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2887317B2 (en) | 1999-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |